• Laser Solutions
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• v.4 no.3
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• pp.22-29
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• 2001

A development of new surface clwaning technol ogies such as laser and aerosol in paeallel with the improvement of conventional wet mwthods becomes more essential in semiconductor industry due the confrontation of new challenges such as significant device shrink, environmental foralum inum do not work for copper as a new interconnection material, and more effective cleaning tools are required with decreasing the feature size less than 0.13 ㎛ as well as increasing the wafer size from 200 ㎜ to 300 ㎜. In this article, various cleaning techniques increasing laser cleaning are compared methodolgically hi order to understand their unique characteristics such as advantages and disadvantages according to the current clean ing issues. In particular, the current state of art of laser technique for semiconductors md prospects as a try cleaning method are described.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.103-104
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• 2006

$Pb(Zr,Ti)O_3(PZT)$ is very attractive ferroelectric materials for ferroelectric random access memory (FeRAM) applications because of its high polarization ability and low process temperature. However, Chemical Mechanical Polishing (CMP) pressure and velocity must be carefully adjusted because FeRAM shrinks to high density devices. The contaminations such as slurry residues due to the absence of the exclusive cleaning chemicals are enough to influence on the degradation of PZT thin film capacitors. The surface characteristics of PZT thin film were investigated by the change of process parameters and the cleaning process. Both the low CMP pressure and the cleaning process must be employed, even if the removal rate and the yield were decreased, to reduce the fatigue of PZT thin film capacitors fabricated by damascene process. Like this, fatigue characteristics were partially controlled by the regulation of the CMP process parameters in PZT damascene process. And the exclusive cleaning chemicals for PZT thin films were developed in this work.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.5
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• pp.438-441
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• 2004

In this paper, an apparatus for unbinding the rope is studied to solve continuous work of the auto cleaning apparatus of a pillar. During operation of the auto cleaning apparatus of a pillar, in order to not swing the apparatus is down by it's weight according as electric motor velocity. We focus on the design and the implementation to upgrade the auto cleaning apparatus of a pillar that had been implemented.

• Clean Technology
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• v.7 no.3
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• pp.215-223
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as electrolyzed water(EW) are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed water was generated by an electrolysis system which consists of three anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH4Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO2 concentration changes dissolved from air. Contact angles of UPW, AW, and CW on DHF treated Si wafer surfaces were measured to be $65.9^{\circ}$, $66.5^{\circ}$ and $56.8^{\circ}$, respectively, which characterizes clearly the eletrolyzed water. To analyze the amount of metallic impurities on Si wafer surface, ICP-MS was introduced. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. To analyze the number of particles on Si wafer surfaces, Tencor 6220 were introduced. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about $9{\ell}$ chemicals, while EW did only $400m{\ell}$ HCl electrolyte or $600m{\ell}$ NH4Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for promoting environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• Journal of Preventive Medicine and Public Health
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• v.31 no.4 s.63
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• pp.628-643
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• 1998

To investigate the exposure levels of organic solvents and subjective symptoms of dry-cleaning workers, 77 male and 52 female dry-cleaning workers who had been worked in a small city of Chungnam province, and a large city, Taejon were selected for the study group. Air concentrations of organic solvents in the working environment were analyzed, and subjective symptoms of dry-cleaning workers were surveyed, from July to August 1996. The results obtained were as follows : 1. The concentrations of organic solvents in the working environment were within permissible TLV-TWA limits. 2. For the 13 symptom clusters, the most frequently complained symptom clusters were fatigue as 71.3%, and followed by depression and urinary disturbances as 53.5% and 51.9%. Other symptom clusters complained were below 50%. 3. Positive response rates of subjective symptoms were significantly higher in worker groups such as lived in a large city, female, higher education level, more frequently alcohol drinking, higher concentration of organic solvent in working environment, work in alone. 4. Workers who had used solvent B showed 2.3 point higher scores of subjective symptoms than those of solvent A. Of the subjective symptoms scores, amnesia and nervousness were higher in solvent B user group than solvent B user group. 5. As a result of factor analysis, 3 factors such as depression, urinary disturbance and neurologic disturbance were selected. 6. As a result of the logistic regression analysis, sex, the number of fellow workers, working time, region, job tenure, smoking, alcohol drinking, ventilating system, concentration of organic solvent in working environment and place of residence were selected for the related variables. For the conclusion, even though the concentrations of organic solvents in the working environments of dry-cleaning workers were within permissible limit of TLV-TWA, many dry-cleaning workers complained symptoms, such as fatigue, depression, urinary disturbances and so on. And the factors affecting to the symptoms of dry-cleaning workers were the number of fellow workers, work hours, region, job tenure, smoking and alcohol drinking.

• Korean Journal of Labor Studies
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• v.24 no.2
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• pp.247-291
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• 2018

This study investigates the employment structure and the social safety net experience of the subcontracting cleaning workers in Korea, who have been main targets of the labor outsourcing despite the necessity and permanence of their labour. This study specifically focuses on the fact that these subcontracting cleaning workers are mostly female and in their old age, and analyzes how the combination of their age, gender, and employment structure leads to the (mis)match with the Korean social security system. Case study with in-dept interview method has been conducted to the old-aged female subcontracting cleaning workers in Korea. The result of this study is as follows. It was the income insecurity that led them to (re)enter the labour market, and the cleaning work was the almost the only wage work they could do considering their age and gender. Cleaning workers are mostly employed in the subcontracting company, and thus their labour contracts depend on the business contract period between the original and subcontracting company. Consequently, their employment relationship is mostly insecure unless they are guaranteed employment succession through the collective agreement of trade union. Moreover, it has been discovered that the employment insecurity due to the indirect employment relationship led to the poor labour conditions, low wage, and the exclusion from the social safety net.

• Journal of the Korean Graphic Arts Communication Society
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• v.28 no.2
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• pp.87-99
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• 2010

The ink which is left by sealed more than 6 months, it clogs head nozzle of machine due to precipitation and coagulation. In addition, if you stop printing about 3~4 hours in the middle of printing work, the head nozzles of printer could be naturally clogged. To prevent of this situation, worker should implement cleaning and checking head nozzle before hands. When the nozzle is clogged in the middle of work, running a head cleaning mode can clear the clogged nozzle. Yet, large amount of waste inks which are passed clogged nozzle will be remained after cleaning. It would be very nice that ink companies take the waste ink back by green marketing, but none of them are doing it currently. The purpose of this research is that making a black water-based recycle ink by waste inks which are left of nozzle clogging or passed expiration date. This recycle ink will improved working environment and reduce cost of disposing waste inks. Furthermore, it is very environment friendly and economical. It is called a recycle ink which is water-based black ink made by waste inks.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2002.11a
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• pp.117-119
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• 2002

A semiconductor cleaning technology has been based upon RCA cleaning which consumes vast amounts of chemicals and ultra pure water. This technology hence gives rise to many environmental issues, and some alternatives such as electrolyzed water are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed waters were obtained in anode and cathode with oxidation reduction potentials and pH of -1050mV and 4.8, and -750mV and 10.0, respectively. The electrolyzed water deterioration was correlated with $CO_2$ concentration changes dissolved from air. Overflowing of electrolyzed water during cleaning particles resulted in the same cleanness as could be obtained with RCA clean. The roughness of patterned wafer surfaces after EW clean maintained that of as-received wafers. RCA clean consumed about $9\ell$ chemicals, while electrolyzed water clean did only $400m\ell$ HCl or $600m\ell$ $NH_4$Cl to clean 8" wafers in this study. It was hence concluded that electrolyzed water cleaning technology would be very effective for releasing environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.ring.

• Proceedings of the IEEK Conference
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• 2003.07b
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• pp.1089-1092
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• 2003

This paper has been studied on wafer cleaning and photoresist striping in semiconductor fabrication processes using ozone solved deionized water. In this work, we have developed high concentration ozone generating system and high contact ratio ozone solving system to get high efficiency DIO$_3$. Through this study, we obtained 11% ozone gas concentration, 99.5% of ozone efficiency and 51% of solubility in deionized water.

• Air Cleaning Technology
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• v.18 no.1 s.68
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• pp.53-78
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• 2005

Construction work is an art of making something out of nothing. To run the construction project smoothly, budget, organization and engineering should be balanced. Standardization and simplification of construction bill are needed in order to maximize the