• Title/Summary/Keyword: Cleaning Method

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Survey of Bovine Mastitis in Gyeonggi Province 2. Infection Rate of Bovine Masitis and Dairy Farm Situations (경기도지역(京畿道地域)의 유우유방염(乳牛乳房炎)에 관한 조사(調査) 2. 유방염감염율(乳房炎感染率)과 목장실태(牧場實態)에 관한 조사(調査))

  • Son, Bong Whan;Han, Joo Woong;Kim, Hyo Min;Kim, Soo Chang
    • Korean Journal of Veterinary Research
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    • v.14 no.2
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    • pp.273-279
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    • 1974
  • Studies were made on the relation of mastitis infection rate to the management and sanitations of dairy farms by examining 46 dairy herds. The results obtained were as follows: 1. The higher infection rate was observed in farms managed by employees than by owners, and in impoprted cattle than cattle horn in Korea. 2. Type of education and the period of experience of management were not correlated to the infection rate. 3. The infection rate was the highest in Summer and in cattle of 5~8 lactating age group. 4. It was observed that the amount of water supply, time of cleaning stall, frequency of disinfection, the method of using cleaning towel and the method of milking were correlated to the infection rate.

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A Study on the Thermally Stimulated Current in CdS Single Crystal (CdS단결정의 열랄격전류에 관한 연구)

  • 유용택
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.7 no.2
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    • pp.59-65
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    • 1982
  • In this paper, the CdS single crystal, which was grown as piper-polish method, was Ion-bombarded with Sb and In, and the thermally stimulated current of the spot that was Ionbombarded was measured. In the sample which was individually bombarded by Sb and In, the over-lapping peak was found, this over lapping peak was separated, by the method of thermal cleaning, showing the trap levels of 0.25(eV) and 0.31(eV) at the temperature of 147(K) and 181(K). While the spot is being cooled down and excited with photolight at the same time, the trap level 0.25(eV) disappeared and the new trap level of 0.85(eV) appeared. It can be said that the better photo-conductive crystals, the T.S.C is better measured.

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Protection of STS304 Steel with Photo-Functional Material $TiO_2$ Coating (광기능성 재료 $TiO_2$ 피막에 의한 STS304강의 방식)

  • Nam, Ki-Woo;Lee, Sung-Yeon;Ahn, Seok-Hwan;Kim, Jong-Soon;Park, In-Duck
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2002.10a
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    • pp.307-311
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    • 2002
  • This study was investigated the photoelectrochemical behavior of STS304 steel with $TiO_2$ thin films coating, applied by sol-gel method, for the purpose of cathodic photoprotection of the steel corrosion. One time $TiO_2$-coated STS304 steel adopted two kinds of $TiO_2$ sol solution has the most dominant photopotential abilities, which was -200mV vs. SCE and -500mV vs. SCE under illumination with 40W fluorescent lamp, respectively. That was more negative than the corrosion potential of the bare metal(-150 mV). The bleaching of TCE was confirmed on $TiO_2$-coated STS304 under UV-illumination with 20 W Black-light. This Study was concluded that $TiO_2$-coated STS304 exhibited both a cathodic photoprotection effect against corrosion and photocatalytic self-cleaning effect.

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A study on the fabrication of SOI wafer using silicon surfaces activated by hydro (수소 플라즈마에 의해 표면 활성화된 실리콘 기판을 이용한 SOI 기판 제작에 관한 연구)

  • Choi, W.B.;Joo, C.M.;Lee, J.S.;Sung, M.Y.
    • Proceedings of the KIEE Conference
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    • 1999.07g
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    • pp.3279-3281
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    • 1999
  • This paper describes a method of direct wafer bonding using surfaces activated by a radio-frequency hydrogen plasma. The hydrogen plasma cleaning of silicon in the RIE mode was investigated as a pretreatment for silicon direct bonding. The cleaned silicon surface was successfully terminated by hydrogen, The hydrogen-terminated surfaces were rendered hydrophilic, which could be wetted by Dl water rinse. Two wafers of silicon and silicon dioxide were contacted to each other at room temperature and postannealed at $300{\sim}1100^{\circ}C$ in an $N_2$ atmosphere for 2 h. From the AFM results, it was revealed that the surface became rougher with the increased plasma exposure time and power. The effect of the plasma treatment on the surface chemistry was investigated by the AES analysis. It was shown that the carbon contamination at the surface could be reduced below 5 at %. The interfacial energy measured by the crack propagation method was 122 $mJ/m^2$ and 384 $mJ/m^2$ for RCA cleaning and hydrogen plasm, respectively.

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A study on an experimental basis a special quality character of thin film use in order to TiN a conditioned immersion (TiN증착 조건에 따른 박막의 특성에 대한 실험적 연구)

  • Park, Il-Soo
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.11
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    • pp.4711-4717
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    • 2011
  • Formation of TiN films by PVD method and the DC and RF sputtering deposition method can be applied, the injected gas to generate plasma ionization rate of the film forming speed is slow away, anything to increase the adhesion between films limitations have. To improve this, to investigate the deposition and ion beam evaporation simultaneously IBAD(Ion beam assisted deposition) when used, Ion beam surface coating material prior to the survey because the surface cleaning effect of a large, high film adhesion can be obtained. In addition, the high vacuum and low temperature, high purity thin film of uniform thickness in the benefits is.

Development of ROS2-on-Yocto-based Thin Client Robot for Cloud Robotics (클라우드 연동을 위한 ROS2 on Yocto 기반의 Thin Client 로봇 개발)

  • Kim, Yunsung;Lee, Dongoen;Jeong, Seonghoon;Moon, Hyeongil;Yu, Changseung;Lee, Kangyoung;Choi, Juneyoul;Kim, Youngjae
    • The Journal of Korea Robotics Society
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    • v.16 no.4
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    • pp.327-335
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    • 2021
  • In this paper, we propose an embedded robot system based on "ROS2 on Yocto" that can support various robots. We developed a lightweight OS based on the Yocto Project as a next-generation robot platform targeting cloud robotics. Yocto Project was adopted for portability and scalability in both software and hardware, and ROS2 was adopted and optimized considering a low specification embedded hardware system. We developed SLAM, navigation, path planning, and motion for the proposed robot system validation. For verification of software packages, we applied it to home cleaning robot and indoor delivery robot that were already commercialized by LG Electronics and verified they can do autonomous driving, obstacle recognition, and avoidance driving. Memory usage and network I/O have been improved by applying the binary launch method based on shell and mmap application as opposed to the conventional Python method. Finally, we verified the possibility of mass production and commercialization of the proposed system through performance evaluation from CPU and memory perspective.

Particle Removal on Buffing Process After Copper CMP (구리 CMP 후 버핑 공정을 이용한 연마 입자 제거)

  • Shin, Woon-Ki;Park, Sun-Joon;Lee, Hyun-Seop;Jeong, Moon-Ki;Lee, Young-Kyun;Lee, Ho-Jun;Kim, Young-Min;Cho, Han-Chul;Joo, Suk-Bae;Jeong, Hae-Do
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.1
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    • pp.17-21
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    • 2011
  • Copper (Cu) had been attractive material due to its superior properties comparing to other metals such as aluminum or tungsten and considered as the best metal which can replace them as an interconnect metal in integrated circuits. CMP (Chemical Mechanical Polishing) technology enabled the production of excellent local and global planarization of microelectronic materials, which allow high resolution of photolithography process. Cu CMP is a complex removal process performed by chemical reaction and mechanical abrasion, which can make defects of its own such as a scratch, particle and dishing. The abrasive particles remain on the Cu surface, and become contaminations to make device yield and performance deteriorate. To remove the particle, buffing cleaning method used in post-CMP cleaning and buffing is the one of the most effective physical cleaning process. AE(Acoustic Emission) sensor was used to detect dynamic friction during the buffing process. When polishing is started, the sensor starts to be loaded and produces an electrical charge that is directly proportional to the applied force. Cleaning efficiency of Cu surface were measured by FE-SEM and AFM during the buffing process. The experimental result showed that particles removed with buffing process, it is possible to detect the particle removal efficiency through obtained signal by the AE sensor.

A Study on the Prevention Measures against Fire and Explosion Accidents during Splash Filling in Batch Process (회분식 공정에서 스플래쉬 필링(Splash Filling) 작업으로 인한 화재·폭발 사고 예방대책에 관한 연구)

  • Kim, Sang Ryung;Lee, Dae Jun;Kim, Jung Duk;Kim, Sang Gil;Yang, Won Baek;Rhim, Jong Guk
    • Journal of the Korean Institute of Gas
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    • v.24 no.3
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    • pp.33-39
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    • 2020
  • In general, in a batch reaction process in which products are made using flammable liquids, splash filling is used to clean the walls of the reactor by spraying flammable liquids, which are raw materials used for product, during cleaning of the reactor after work. During this process, mist of flammable liquid is generated, the lower limit of explosion is lowered, and fire·explosion may occur due to discharges caused by various types of complex charges, such as flow charge, collision charge, and ejection charge. Therefore, based on the recent accident case, to identify the risk when working in the form of splash filling with toluene in a batch process and perform an explosion impact analysis using the TNT equivalent method After that, we will analyze the accident results and suggest preventive measures such as constant purge system, improvement of cleaning method, and use of tantalum to prevent such accident.

Development of wast vinyl pretreatment system by dry method (폐비닐의 건식 전처리시스템 개발)

  • Lee Hyun-Yong;Lee Jae-Kyung;Ryoo Byung-Soon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.69-70
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    • 2006
  • Waste vinyl tretreatment system has been developed by the joint project between KIMM and Woosung Co. General process for removal of impurities from waste vinyl is consisted of feeding, separating, cutting, washing, drying and recovering impurities. However, there are problems such as wastewater when washing of waste vinyl. In order to solve these problems we have developed new dry type cleaning system.

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The Fundamental Study on Pulse Jet Cleaning of Rectangular Bag-Filter System (사각형 여과 집진기 충격기류 탈진시스템의 기초 연구)

  • Piao, Cheng Xu;Kim, Tae Hyeung;Yang, Jun Ho;Li, Xiao Yu;Ha, Hyun Chul;Jung, Jae Hun
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.18 no.2
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    • pp.149-160
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    • 2008
  • Bag-filter system has been widely used in industrial field to remove the particulate matters from the exhaust gas. The cylindrical type of bag-filter has been generally used. But it has many shortcomings. The reattachment of separated particles on the surface of bags could result in high pressure drop of bag-filter system and subsequent decrease of air flow rate since the cylindrical type bag-filter system should have the upward flow pattern. In addition, the supply of very high pressure pulse air jet to remove particulate matters on the surface of filter could result in a frequent rupture of bags. To overcome these shortcomings of the cylindrical type, the rectangular type was developed in the developed countries and imported to Korea. But, there was not many design data available to understand the mechanisms. Thus, the fundamental experiments were conducted in this study to get some ideas about the pulse jet cleaning of rectangular type bag filter system. The experimental factors are as follows; pulse distance, pulse duration, pulse interval, pulse pressure and pulse nozzle type. Experiments followed the factorial design method. With the shorter pulse distance, the distribution of pressure drops was relatively not uniform while the particulate removal efficiency was higher. With the longer duration of pulsing and the more number of pulse nozzle, the removal efficiency was higher and the pressure drop distribution was more uniform.