• Journal of the Korean Vacuum Society
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• v.16 no.3
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• pp.181-186
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• 2007

We have investigated and analyzed the effects of the evaporation rate of MgO films on the MgO properties and the discharge characteristics of a plasma display panel(PDP). The MgO properties such as the crystal orientation, the surface roughness, the film structure, and cathode-luminescence (CL) spectra were inspected using XRD (X-ray diffraction), AFM(atomic force microscopy). And the discharging characteristics of the PDP such as the firing voltage, discharging current, and luminescence were measured using a vacuum chamber with oscilloscope (TDS 540C), current probe (TCP-312A), color meter (CS-100A) and etc. From the experiments results we confirmed the optimum evaporation rate at $5{\AA}/sec$, the MgO properties were shown to be strongly dependent on the evaporation rate, and the MgO properties had an effecton the optical and electrical characteristics. In other words, if the evaporation rates increase than $5{\AA}/sec$, the intensity of (200) orientation and cathode-luminescence (CL) spectra reduce, and the firing vlotage was increased. So the luminuous efficiency grows worse.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.8
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• pp.749-753
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• 2006

The $ZnGa_2O_4$ phosphor thick films were fabricated using a screen printing method on Si(100) substrates at various sintering temperatures. The XRD patterns show that the $ZnGa_2O_4$ thick films have a (311) main peak and a spinel structure with increasing sintering temperatures. The particle sizes of $ZnGa_2O_4$ phosphor were about 100 nm and the thickness of $ZnGa_2O_4$ thick film was $10{\mu}m$. The CL and PL properties of $ZnGa_2O_4$ showed main peak of 420nm and maximum intensity at the sintering temperature of $900^{\circ}C$. These results indicate that $ZnGa_2O_4$ phosphor thick films hold promise for displays such as plasma display panel and field emission display.

• Journal of the Korean Society of Radiology
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• v.2 no.3
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• pp.11-18
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• 2008

In this study, the particle properties and luminescence properties of Gd2O3 nano powder with various Eu content were studied. Gd2O3:Eu nano powder was fabricated using special solvent which mixed the alcohol and the distilled water at specific ratio. This solvent by the solution method showed short fabrication time because solution time of Gd and Eu was reduced. From this experiment with Gd2O3:Eu, the particle properties og nano powder phosphor way analysed using SEM (scanning electron microscope) and EDX(Energy Dispersive X-ray). Also the luminescence properties of nano powder was measured using PL(Photoluminescence) and CL (CathodeLuminescence). The size of powder was 30nm~40nm. The magnitude of powder showed the best peak at 620nm. Among 1,3,5wt% of Eu content, the more Eu content was added in powder, the more photons wre generated. Also it shows luminescence efficiency was improved adding 5% of Eu content.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.8
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• pp.716-719
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• 2007

The effects of the evaporation rate of MgO films using an electron beam on the MgO properties and the discharge characteristics of a plasma display panel (PDP) were investigated and analyzed. MgO films were deposited with the various MgO evaporation rates. The MgO properties such as the crystal orientation, the surface roughness, and the film structure were inspected using XRD (X-ray diffraction), AFM (atomic force microscopy). From the experiments and Paschen law, the maximum value of the secondary electron emission coefficient $({\gamma})$ was obtained at the evaporation rate of $5{\AA}/sec$. The XRD results and cathode-luminescence (CL) spectra show the ${\gamma}$ values are correlated with F/F+ centers of the molecular structure of MgO films. The minimum firing voltage and the maximum luminous efficiency were obtained at an evaporation rate of $5{\AA}/sec$. In the MgO film deposited at $5{\AA}/sec$, the (200) orientation and F+ center were most intensive.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.12
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• pp.12-17
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• 2007

The effects of the evaporation rate of MgO films using an electron beam on the MgO properties and the discharge characteristics of a plasma display panel(PDP) were investigated and analyzed. Mgo films were deposited with the various MgO evaporation rates. The MgO properties such as the crystal orientation, the surface roughness, and the film structure, were inspected using XRD(X-ray diffractometry), AFM(atomic force microscopy). From the experiments and Paschen law, the maximum value of the secondary, electron emission coefficient $(\gamma)$ was obtained at the evaporation rate of $5\AA/sec$. The minimum firing voltage and the maximum luminous efficiency were obtained at an evaporation rate of $5\AA/sec$. In the MgO film deposited at $5\AA/sec$, the (200) orientation and $F^+$ center were most intensive. The XRD results and cathode-luminescence(CL) spectra show the $\gamma$ values are correlated with $F/F^+$ centers of the molecular structure of MgO films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.8
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• pp.744-748
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• 2006

Emission characteristics of terbium-activated $InBO_3$ under cathode-ray(c.r.) and vacuum ultra violet(v.u.v.) irradiation have been investigated as a functions of norminal compositions and firing conditions. From the x-ray analysis, it was found that some of the synthesized samples contained excess $In_2O_3$ and the amount of the excess $In_2O_3$ varied with the norminal composition and heat treatment conditions. The samples with remanent excess $In_2O_3$ showed lower luminescence intensities than the ones free of excess $In_2O_3$. The phosphors of norminal composition of $InBO_3+10mol%B_2O_3:2mol%Tb$ synthesized at $1250^{\circ}C$ showed excellent CL and PL properties.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.463-465
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• 2005

The $ZnGa_2O_4$:Mn phosphor was synthesized through solid-state reactions at the various molar ratio of Mn from 0.002 % to 0.01 %. Structural and optical properties of the $ZnGa_2O_4$:Mn phosphor was investigated by using X-ray diffraction (XRD), and cathodoluminescence (CL) measurements. The XRD patterns show that the Mn-doped $ZnGa_2O_4$ has a (311) main peak and a spinel phase. Also the emission wavelength shifts from 420 to 510 nm in comparison with $ZnGa_2O_4$ when Mn is doped in $ZnGa_2O_4$. These results indicate that $ZnGa_2O_4$:Mn phosphors hold promise for potential applications in field-emission display devices with high brightness operating in green spectral regions.

• The Korean Journal of Ceramics
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• v.3 no.4
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• pp.245-248
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• 1997

Photoluminescence (PL) and cathodoluminescence (CL) characteristics of Ce-activated $Y_{2-x}Ce_xSiO_5$ have been investigated as functions of Ce concentration and firing condition. According to the X-ray, PL and CL results, $Y_2SiO_5$ is found to have two phases depending on the firing temperature. For the specimen fired above 127$0^{\circ}C$, the emission band peaked at 395nm with a shoulder at 424 nm under ultraviolet (u.v.) and cathode-ray (c.r.) excitation. However, for the specimen fired below 120$0^{\circ}C$ in air the peak was observed at 424 nm and it shifted to longer wavelength with reduction level. The reduced specimen for x=0.02 showed the brightest emission under u.v. excitation whereas under c.r. excitation the brightest emission was observed for the reduced specimen for x=0.06.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.37 no.3
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• pp.14-19
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• 2000

Free-standing GaN single crystal substrates have been obtained by growing thick GaN epitaxial layers on (0001) sapphire substrates using hydride vapor phase epitaxy (HVPE) method. After growing the GaN thick film of 200 ${\mu}{\textrm}{m}$, a free-standing GaN with a size of 10 mm $\times$10 mm were obtained by mechanical polishing process to remove sapphire substrate. Crack-free GaN substrates have been obtained by GaCl pre-treatment prior to the growth of GaN epitaxial layers. Properties of free-standing GaN substrates have been compared with those of lateral epitaxial overgrowth (LEO) GaN films by double-crystal x-ray diffraction (DC-XRD), cathodoluminescence (CL) and photoluminescence (PL) measurements.

• Korean Journal of Materials Research
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• v.19 no.3
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• pp.163-168
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• 2009

$Eu^{3+}$-doped $Y_2O_3$ red phosphor was synthesized in a flux method using the chemicals $Y_2O_3,\;Eu_2O_3,\;H_3BO_3$ and $BaCl_2{\cdot}2H_2O$. The effect of a flux addition on the preparation of $Y_2O_3:Eu_{3+}$ red phosphor used as a cold cathode fluorescence lamp was investigated. $H_3BO_3$ and $BaCl_2{\cdot}2H_2O$ fluxes were used due to their different melting points. The crystallinity, thermal properties, morphology, and emission characteristics were measured using XRD, TG-DTA, SEM, and a photo-excited spectrometer. Under UV excitation of 254 nm, $Eu_2O_3$ 3.7 mol% doped $Y_2O_3$ exhibited a strong narrow-band red emission, peaking at 612 nm. From this result, the phosphor synthesized by firing $Y_2O_3$ with 3.7 mol% of $Eu_2O_3$, 0.25 mol% of $H_3BO_3$ and 0.5 mol% of $BaCl_2{\cdot}2H_2O$ fluxes at $1400^{\circ}C$ for 2 hours had a larger particle size of $4{\mu}m$ on average compared to the phosphor of the $H_3BO_3$ flux alone. In addition, a phosphor synthesized by the two fluxes together had a rounder corner shape, which led to the maximum emission intensity.