• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.603-606
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• 2000

This dissertation is concerned with ultra-precision profile measurement of aspheric surfaces using contact probing technique. A contact probe has been designed as a sensing device to obtain measuring resolutions in nanometer regime utilizing a leaf spring mechanism and a capacitive-type sensor. The contact probe is attached on the z-axis during measurement while aspheric objects are supported on an precision xy-stage whose lateral motions are monitored by a set of two orthogonal plane mirror type laser interferometers. Experimental results show that the contact probing technique developed in this investigation is capable of providing a repeatability of 50 nanometers with a $\pm$3$\sigma$ uncertainty of 300 nanometers. Thermal disturbance is found the most significant factor that should be precisely controlled for accurate measurement.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 2004년도 요약집 춘계학술발표대회
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• pp.104.2-104.2
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• 2004

• 한국정밀공학회지
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• 제29권8호
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• pp.845-852
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• 2012

The diaphragm-type stylus probe was developed for ultra-precision on-machine measurement (OMM) application. This probe is equipped with two diaphragms which are parallel and one capacitive sensor is used for detecting the vertical motion of end tip in the stylus when it is contacted to the optical freeform surface. For better performance of proposed probes, several design parameters such as axial stiffness and the lateral deformations were investigated with finite element analysis techniques. To verify the feasibility, the profiles of the master sphere ball were measured on the ultra-precision milling machine. The measurement results show that the proposed probe can calculate the radius of the circle within the accuracy of 0.1 ${\mu}m$ for the ultraprecision optical surface.

• 반도체디스플레이기술학회지
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• 제13권4호
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• pp.1-5
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• 2014

The plasma density distribution in between the electrode and lateral wall of a narrow gap CCP was investigated. The plasma density distribution was obtained using single Langmuir probe, having two peaks of density distribution at the center of electrode and at the peripheral area of electrodes. The plasma density distribution was compared with the RF fluctuation of plasma potential taken from capacitive probe. Ionization reactions obtained from numerical analysis using CFD-$ACE^+$ fluid model based code. The peaks in two region for plasma density and voltage fluctuation have similar spatial distribution according to input power. It was found that plasma density distribution between the electrode and the lateral wall is closely related with the local ionization.

• Journal of Electrical Engineering and Technology
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• 제6권1호
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• pp.111-118
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• 2011

In recent years, various types of partial discharge (PD) methods such as capacitive, inductive, electromagnetic, and acoustic coupling techniques have been developed for diagnosing rotating machines. An electromagnetic (EM) probe, which is an inductively coupled type of sensor, is required for detecting corona and internal discharges during off-line tests. In this study, a new technique for enhancing the measurement sensitivities for corona and internal discharge based on an EM inductive position sensor is proposed. An EM probe that winds wires around horseshoe-shaped and cylindershaped ferrites as helices is designed and optimized for the implementation of off-line PD monitoring of the stator winding of a rotating machine. The measurement system based on this design is implemented, and it is verified from the results of the experiment performed in this study that the probe provides similar performance as existing commercial products.

• 센서학회지
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• 제13권5호
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• pp.363-368
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• 2004

A reliable voltage measurement system is necessary to monitor status of power facilities in substations, which is easy to set up and is not influenced by electromagnetic interference in and around substation. In this paper, we described a voltage measurement system (VMS) which is composed of a capacitive voltage probe, an impedance converter, and an optical linker. To get a wide-band characteristic of the VMS, a high speed impedance converter was used, and the output impedance of the VMS was set at $50{\Omega}$ to match any types of observing instruments. The frequency bandwidth of the VMS. which was estimated by a step pulse, was ranges from 11.42 Hz to 13.65 MHz, and the VMS showed a good response characteristic in a high frequency domain such as impulse voltages as well as a commercial frequency voltage.

• 한국전자파학회논문지
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• 제12권3호
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• pp.329-338
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• 2001

본 논문에서는 마이크로스트립 패치안테나의 단점인 협대역을 개선하기위해 안테나를 설계, 분석하였다. Probe 급전 방식의 안테나에서 reactance 성분을 줄이기 위해 capacitive gap을 추가하였다. 단일 패치와 보조도선을 사용하여 이중공진모드를 형성하였다. 이로 인해 대역폭이 증가되었고, 이득도 향상되었다. 이를 실험적으로 검증하기위해 PCS 주파수 대역의 안테나를 설계, 제작하였다. 제작된 PCS 주파수 대역 안테나의 측정 결과 는 VSWR,1.5에서 대역폭이 190 MHz이고, 이득은 8.6dB이다.

• 한국전자파학회논문지
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• 제14권6호
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• pp.638-647
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• 2003

삼각형 패치 안테나에 대해 이론적인 방법과 실험을 통해 연구하였다. 삼각형 패치 안테나는 사각형 패치 안테나와 비슷한 복사 특성을 갖으나, 그 크기를 더 줄일 수 있다. 본 논문에서는 정삼각형 마이크로스트립 패치 안테나를 공동 모델을 사용하여 해석하고, 설계 하였다. 또한 대역폭 향상을 위해 커패시티브 갭과 공기층 갭을 이용하였다. 커패시티브 갭은 패치의 급전점 부근에서 사각형 모양으로 만들었고, 공기층 갭은 유전체 기판과 그라운드 사이에 삽입하여 프로브 인덕턴스를 조정하였다. 안테나 각 부분의 효과와 특성 해석을 위해 상업용 시뮬레이션 툴인 Ensemble 5.0을 사용하였다. 시뮬레이션과 실험을 통하여 삼각형 마이크로스트립 안테나의 대역폭 개선의 가능성을 발견하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.257-257
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• 2012

Fault detection was carried out in a etcher of capacitive coupled plasma with OES (Optical Emission Spectroscopy) and impedance by VI probe that are widely used for process control and monitoring at semiconductor industry. The experiment was operated at conventional Ar and Fluorocarbon plasma with variable change such as pressure and addition of N2 and O2 to assume atmospheric leak, RF power and pressure that are highly possible to impact wafer yield during wafer process, in order to observe OES and VI Probe signals. The sensitivity change on OES and Impedance by VI probe was analyzed by statistical method including PCA to determine healthy of process. The main goal of this study is to find feasibility and limitation of OES and Impedances for fault detection by shift of plasma characteristics and to enhance capability of fault detection using PCA.

• 한국정밀공학회지
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• 제17권5호
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• pp.124-130
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• 2000

For measuring out the submicron order straightness, a precision measuring device is developed in this paper. The device is constructed with a hydrostatic feed table and a capacitive type sensor which is mounted to the feed table. Straightness is acquired as substracting the motion error of feed table from the measured profile with probe. Motion error of feed table is simultaneously compensated upto 0.120${\mu}{\textrm}{m}$ of linear motion error and 0.20arcsec of angular motion error using the active controlled capillary. Reversal method and strai호t-edge is used fur estimating the measuring accuracy and from the experimental result, it is verified that the device has the measuring accuracy 0.030m. Also, through the practical application on the measurement of ground surface, it is confirmed that the device is very effective to measure the submicron order straightness.