• 제목/요약/키워드: CVD합성

검색결과 173건 처리시간 0.033초

Characterization of Diamond-like Carbon Films on Si-Wafer Deposited by DC Plasma CVD.

  • Ju Tack Han;Jong-Gi Jee;Eun-joo Shin;Dongho Kim
    • 한국진공학회지
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    • 제3권4호
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    • pp.434-441
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    • 1994
  • 메탄과 수소 혼합가스로 직류 플라즈마 화학 증착법을 이용하여 방전전류 반응압력 메탄농도 및 피착체의 온도를 변화시키면서 다이아몬드 유산탄소 박막(DLCF)을 Si(111)-웨이퍼 위에 합성하였다. 주 사전자 현미경(SEM)과 레이져 Raman 스펙트로포토메터로 확인된 양질의 DLCF를 얻은 조건은 방전전 류 반응 압력, 메탄농도 그리고 피착체의 온도가 각각 480mA, 32 Torr, 1.0 vol% 및 85$0^{\circ}C$ 였다. 이 DLCF는 대부분 sp3 탄소결합으로 된 구형의 알갱이들로 구성되어 있고 그굴절률은 2.2로 천연다이아몬 드와 비슷한 값을 가지고 있다. 또한 DLCF 성장에서 수소피복이 매우 중요한 것으로 밝혀졌다.

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마이크로웨이브 플라즈마 화학증착법에 의해 메탄, 수소, 산소의 혼합가스로부터 다이아몬드 박막의 합성 (Diamond Film Deposition by Microwave Plasma CVD Using a Mixture of $CH_4$, $H_2$, $O_2$,)

  • 이길용;제정호
    • 한국세라믹학회지
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    • 제27권4호
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    • pp.513-520
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    • 1990
  • Diamond film was deposited on Si wafer substrate from a gas mixture of methane, hydrogen and oxygen by microwave plasma-assisted chemical vapor deposition. The effects of the pre-treatments of the substrate and of the oxygen addition on the diamond film synthesis are described. In order to obtain diamond film, the substrate was pre-treated with 3 kinds of methods. When the substrate was ultrasonically vibrated within the ethyl alcohol dispersed with 25${\mu}{\textrm}{m}$ diamond powder, the denset diamond film was deposited. Addition of oxygen in the gas mixture of methane and hydrogen improved the crystallinity of the deposited diamond film and also increased the deposition rate of the diamond film more than two times.

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열화학기상증착법에 의한 백금 기판 위의 그래핀 합성 (Graphene Synthesis on Pt Substrate using a Chemical Vapor Deposition Method)

  • 이병주;정구환
    • 산업기술연구
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    • 제35권
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    • pp.89-94
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    • 2015
  • Graphene is a carbon-based two dimensional honeycomb lattice with monoatomic thickness and has attracted much attention due to its superior mechanical, electronic, and physical properties. Here, we present a synthesis of high quality graphene on Pt substrate using a chemical vapor deposition (CVD). We optimized synthesis condition with various parameters such as synthesis temperature, time, and cooling rate. Based on the results, we concluded that graphene synthesis is driven by mainly carbon adsorption on surface rather than precipitation of carbon which is dominant in other metal substrate. In addition, Pt substrate can be repeatedly used several times with high quality graphene.

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플라즈마를 이용한 도파민 합성 (Synthesis of Dopamine by Plasma)

  • 김성인;이덕연;이해신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.121.2-121.2
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    • 2014
  • Synthesis of catecholamine from aniline is achieved by plasma enhanced CVD process. Catecholamine has a variety of functions in body such as brain and bloodstream controls. Catecholamine also has an interesting property of a material independent ability of functionalizing surface, which is found at mussels' adhesive nature. Synthesis of catecholamine has only been available from DOPA by chemical reduction and oxidation. This study presents the direct synthesis of catecholamine from further elemental source, aniline, which has not been achieved by a conventional chemical method. The process also indicates that a variety of catecholamine can be formed by controlling reactant gases. In additional to PECVD's very useful properties such as conformal, ultrathin and uniform coatings, a direct synthesis from aniline and a capability of controlling formation of a variety catecholamine is believed to open up a numerous applications.

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전도성 다이아몬드 생성 및 전기적 특성 연구

  • 문성수;김현정;이우진;김태규
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.69-69
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    • 2011
  • 다이아몬드는 절연 물질이지만, 합성 다이아몬드를 생성할 때 결정 내에 도핑(doping) 과정을 통해 불순물을 혼입함으로써 반도체 성질을 가지게 된다. 본 연구에서는 마이크로웨이브 CVD 장치를 이용하여 다이아몬드 박막의 생성 조건을 최적화하고 여기에 다이아몬드 박막 생성시 디보란(Diborane, B2H6)을 주입하여 전기적 특성을 갖는 보론-도핑 된 다이아몬드 박막을 생성하였다. 실험 조건으로는 방전전력 1.4 Kw, 진공압력 40 Torr의 상태에서 디보란의 주입량을 각각 다르게 하여 실험을 진행하였다. 이 때 사용된 기판으로는 전기적 특성이 서로 다른 사파이어($Al_2O_3$), Si, Ti 기판을 사용하여 박막과 기판과의 연관성도 조사하였다. 각각의 보론-도핑 농도와 기판에 따른 다이아몬드 결정구조를 Micro Raman, SEM으로 분석하였고, 다이아몬드 박막의 I-V특성을 통해 다이아몬드의 전기적 특성을 조사하였다.

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N2+H2 ICP 표면처리를 이용한 CVD 그래핀 도핑 연구

  • 이승환;최민섭;임영대;유원종
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.181-182
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    • 2012
  • 본 연구에서는 반도체 기술의 핵심으로 알려있는 플라즈마 표면 처리 공정을 이용하여 인위적으로 그래핀과 기능기 반응을 통한 도핑효과를 일으켜, 전계효과(Electric Field Effect)를 인가하였을 때 그래핀 내에서 발생하는 Electron & Hole carrier 들의 accumulation & Depletion 효과에 의한 Charge Density 변화를 Graphene Field Effect Transistors (GFETs) 소자의 전기적 특성 변화를 확인하였다. 특히, 그래핀 내 Conduction of electron을 높이기 위하여, $N_2+H_2$ 가스 조합을 플라즈마 방전가스로 사용하였으며, Optical Emission Spectroscopy (OES) 및 Langmuir-probe 측정을 통하여 합성가스의 ICP 방전 상태 및 효과를 예측하였다.

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촉매화학기상증착법에 의한 단일벽 탄소나노튜브의 합성과 미세구조 (Synthesis and Microstructure of Single-Walled Carbon Nanotubes by Catalytic Chemical Vapor Deposition Method)

  • 김종식;김관하;김창일
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권7호
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    • pp.359-363
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    • 2006
  • Single-walled carbon nanotubes (SWCNTs) with few defects and very small amount of amorphous carbon coating have been synthesized by catalytic decomposition of methane in $H_2$ over well-dispersed metal particles supported on MgO. The yield of SWCNTs was estimated to be 88.5% and the purities of SWCNTs thus obtained were more than 90%. Peak of the radial breathing mode in the Raman spectrum demonstrated that the diameters of synthesized CNTs are in the range 0.4-2.0 nm. Our results also indicated that MgO support materials are useful to a large-scale synthesis of high-quality SWCNTs. Increasing temperature could remarkably increase the yield and also improve the quality of SWCNTs from catalytic decomposition of methane. The morphologies and microstructures of the synthesized carbon materials were characterized by scanning electron microscopy (SEM), Thermogravimetric analysis (TGA), Raman spectroscopy, and X-ray diffraction (XRD).

CVD법으로 합성된 알루미나 박막 및 분말의 열처리에 따른 특성 (Properties of the Chemically Vapor Deposited Alumina Thin Film and Powder on Heat Treatment)

  • 최두진;정형진
    • 한국세라믹학회지
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    • 제26권2호
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    • pp.235-241
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    • 1989
  • A study on the APCVD(atmospheric pressure chemical vapor deposition) Al2O3 was done by using the aluminum-tri-isopropoxide/N2 reaction system at 40$0^{\circ}C$. When the flow rate of the carrier gas(N2) was over 2SLPM, heterogeneous reaction was observed. However, when the flow rate of the carrier gas was below 2SLPM, a porously deposited film or powder formation was observed. The film formed by a heterogeneous reaction was optically dense. The dense film is thought to be a kind of a hydrated alumina. After a thermal treatment of the film in the range of temperature from $600^{\circ}C$ to 1, 20$0^{\circ}C$, properties of the film seems to be changed due to dehydration and densification process. In the case of the powder on heat treatment(600~1, 20$0^{\circ}C$), both a phase transformation and the change of OH peak was observed.

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Microwave Plasma CVD에 의한 Diamond 박막의 합성에 관한연구 (A Study on the Diamond thin firms Synthesized by Microwave Plasma Enhanced Chemical Vapor Deposition)

  • 이병수;이상희;이덕출;박상현;박구범;박종관;유도현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.289-292
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    • 1998
  • The methastable state diamond films have been deposited on Si substrates using MWPCVD. Effects of each experimental parameters of MWPCVD including CH$_4$ concentrations, Oxygen additions, Operating pressure, deposition time, etc. on the growth rate and crystallinity were investigated. The best crystallinity of the finn at 3% methane concentration addition of oxygen to the CH$_4$-$H_2O$ mixture gave an improved film crystallinity at 50% oxygen concentration. Upon increasing the operating pressure and time, the growth rate and crystallinity were increased simultaneously.

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고주파 플라즈마 CVD에 의한 초경합금상에 다이아몬드 박막의 합성 (Synthesis of diamond thin film on WC-Co by RF PACVO)

  • 김대일;이상희;박종관;박구범;조기선;박상현;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.452-455
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    • 2000
  • Diamond thin films were synthesized on WC-Co substrate at various experimental parameters using 13.56MHz RF PACVD(radio frequency plasma-assisted chemical vapor deposition). In order to increase the nucleation density, the WC-Co substrate was polished with 3$\mu\textrm{m}$ diamond paste. And the WC-Co substrate was pretreated in HNO$_3$: H$_2$O = 1:1 and O$_2$ plasma. In H$_2$-CH$_4$gas mixture, the crystallinity of thin film increased with decreasing CH$_4$concentration at 800W discharge power and 20torr reaction pressure. In H$_2$-CH$_4$-O$_2$gas mixture, the crystallinity of thin film increased with increasing O$_2$concentration at 800W discharge power, 20torr reaction pressure and 4% CH$_4$concentration.

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