Application of $CF_{4}$ plasma etching to $Ta_{0.5}Al_{0.5}$ alloy thin film
($CF_{4}$ 기체를 이용한 $Ta_{0.5}Al_{0.5}$ 합금 박막의 플라즈마 식각)
-
- Journal of the Korean Crystal Growth and Crystal Technology
- /
- v.9 no.1
- /
- pp.60-63
- /
- 1999