• 제목/요약/키워드: C-axis preferred growth

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Effect of heat-treatment on the structural and electrical properties of ZnO thin films by the sol-gel method

  • Lee, Seung-Yup;Park, Byung-Ok
    • 한국결정성장학회지
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    • 제18권2호
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    • pp.72-75
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    • 2008
  • Zinc oxide (ZnO) thin films were prepared by a sol-gel method. The structural and electrical properties were investigated by varying drying and annealing temperatures. The thin films were coated (250 nm) by spin-coating method on glass substrates. The optimum drying temperature of ZnO thin films was 300$^{\circ}C$ where the resistivity was the lowest and the preferred c-axis orientation was the highest. The annealing was carried out in air and inert atmospheric conditions. The degree of the preferred c-axis orientation was estimated. The highest preferred c-axis orientation was recorded at 600$^{\circ}C$. The preferred c-axis orientation and grain growth resulted in the mobility enhancement of the ZnO thin films, and the lowest resistivity was 0.62${\Omega}{\cdot}cm$ at 600$^{\circ}C$.

Deposition of ZnO Films for FBAR Device Fabrication

  • Song Hae-il;Mai Linh;Yim Munhyuk;Yoon Giwan
    • Journal of information and communication convergence engineering
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    • 제3권3호
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    • pp.131-136
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    • 2005
  • The effects of the deposition temperature on the growth characteristics of the ZnO films were studied for film bulk acoustic wave resonator (FBAR) device applications. All films were deposited using a radio frequency (RF) magnetron sputtering technique. It was found that the growth characteristics of the ZnO films have a strong dependence on the deposition temperature from 25 to $350^{\circ}C$. The ZnO films deposited below $200^{\circ}C$ exhibited reasonably good columnar grain structures with a highly preferred c-axis orientation while those above 200°C showed very poor columnar grain structures with a mixed-axis orientation. This study seems very useful for the future FBAR device applications.

R.F. 마그네트론 스퍼터링에 의한 제조된 $SrBi_2$$Ta_2$$O_9$ 박막의 C축 배향성장에 미치는 Bi양의 영향 (The Effect of Bi Content on the C-axis Oriented Growth of $SrBi_2$$Ta_2$$O_9$ Thin Films Fabricateed by R.F. Magnetron Sputtering)

  • 배철휘;이전국;이시형;정형진
    • 한국세라믹학회지
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    • 제35권10호
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    • pp.1107-1112
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    • 1998
  • We could obtan c-axis oriented $SrBi_2$$Ta_2$$O_9$ thin films on usual Pt(111)/Ti/$SiO_2$/Si(100) substrate using a r. f. magnetron sputtering technique. According to the increase of sputtering pressure from 250 to 300 mTorr the Bi content and degree of the c-a xis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films were increased. By controlling Bi(or $Bi_2O_3$) loss from $SrBi_2$$Ta_2$$O_9$ thin films during post annealing and by inserting $Bi_2O_3$ layer in $SrBi_2$$Ta_2$$O_9$ thin films the effect of Bi content on the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films could be investigated without the effect of sputtering pressure. The degree of the c-axis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films was increased with increasing with increasing Bi content by control of Bi(or $Bi_2O_3$) loss of $SrBi_2$$Ta_2$$O_9$ thin films. But the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films disappeared by the inserting of $Bi_2O_3$ lay-er in $SrBi_2$$Ta_2$$O_9$ thin films.

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RF 필터응용을 위한 FBAR 소자제작과 증착온도가 ZnO 박막의 결정성장에 미치는 영향 (FBAR Devices Fabrication and Effects of Deposition Temperature on ZnO Crystal Growth for RF Filter Applications)

  • Munhyuk Yim;Kim, Dong-Hyun;Dongkyu Chai;Mai Linh;Giwan Yoon
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2003년도 춘계종합학술대회
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    • pp.88-92
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    • 2003
  • 본 논문에서는 Al 하부전극 상에서 RF magnetron sputtering 기술을 이용한 ZnO 박막 증착 및 공정온도가 ZnO 결정성장에 미치는 영향을 고려하여 제작한 FBAR 소자에 대한 연구를 발표한다. 결과적으로, 20$0^{\circ}C$의 공정온도에서 주상형 결정립(columnar grain)을 가지고 c축 우선 배향된 ZnO 박막을 얻을 수 있었다. 이렇게 얻은 ZnO 박막을 FBAR 소자에 적용하여 제작한 결과, 2.05GHz의 공진 주파수에서 ~19.5dB의 반사손실을 보였다.

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Orientation Control of $SrBi_2Ta_2O_9$ Thin Films on Pt (111) Substrates

  • Lee, Si-Hyung;Lee, Jeon-Kook;Choelhwyi Bae;Jung, Hyung-Jin;Yoon, Ki-Hyun
    • The Korean Journal of Ceramics
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    • 제6권2호
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    • pp.116-119
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    • 2000
  • The a-axis and c-axis prefer oriented SBT thin films could be deposited on Pt(111)/Ti/$SiO_2$$650^{\circ}C$). The c-axis preferred orientation of SBT film can be obtained by Sr deficiency and high compressive stress. However, the a-axis-oriented grains can be formed under stoichiometric Sr content and nearly stress-free state.

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TEM study on a-axis outgrowth formation in c-axis oriented YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films

  • Hahn, T.S.;Hong, K.S.;Kim, C.H.
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.51-55
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    • 2000
  • Using modified melt-textured grown targets, YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films were prepared by pulsed laser deposition technique at the laser energy density from 1 J/cm$_2$ to 4 J/cm$_2$. All the films showed c-axis preferred orientations, however, a-axis outgrowths on the film surface were considerably increased with an increase of the laser energy density. To examine the origin of the a-axis outgrowth formation, the microstructures of films deposited at 2 J/cm$_2$ and 4 J/cm$_2$ were investigated using X-ray diffraction, transmission electron microscopy, and high-resolution electron microscopy. It was shown that a significant number of Y$_2$O$_3$ inclusions were formed during the growth of c-axis oriented films at 4 J/cm$_2$. These inclusions formed nucleation sites for the a-axis outgrowths. It is considered that, due to the unstable growth conditions with a high flux density of incident vapor species and the strain induced by the surrounding c-axis films, the Y$_2$O$_3$ inclusions would prefer the nucleation of α-axis grains.

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FBAR 필터 응용을 위한 Al 하부전극 상에서 ZnO 박막 증착 및 온도가 ZnO 결정의 성장에 미치는 영향 (ZnO Film Deposition on Aluminum Bottom Electrode for FBAR Filter Applications and Effects of Deposition Temperature on ZnO Crystal Growth)

  • 윤기완;임문혁;채동규
    • 한국정보통신학회논문지
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    • 제7권2호
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    • pp.255-262
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    • 2003
  • 본 논문에서는 FBAR(film bulk acoustic wave resonator) 필터 응용을 위해 Al 하부전극 상에서 RF magnetron sputtering 기술을 이용한 ZnO 박막 증착 및 공정온도가 ZnO 결정성장에 미치는 영향에 대한 연구결과를 발표한다 ZnO 박막의 압전특성은 FBAR 소자의 공진특성을 결정하는 가장 중요한 요소이고 압전성은 증착된 ZnO박막의 c축 우선배향성의 정도에 의해 결정된다는 사실을 고려한다면 ZnO 결정성장에 미치는 공정온도에 관한 연구는 매우 의미 있는 일이다. 본 실험을 통하여 ZnO 박막의 성장특성은 상온에서부터 35$0^{\circ}C$까지의 실험조건에서 c축 우선배향성의 정도에 따라 RF power에 관계없이 온도를 2개의 임계온도에 의해 나눠진 3개의 온도구간으로 구분할 수 있었다. 결과적으로 20$0^{\circ}C$ 이하의 공정온도에서는 주상형 결정립을 가진 c축 우선배향의 ZnO 박막을 얻을 수 있었다. 이렇게 얻은 ZnO박막을 사용하여 FBAR 다층박막 구조를 구현하였다.

스퍼터링에 의한 산화아연박막의 구조적 특성 및 전파경계조건 (Constructional Characteristics and Propagation Conditions on ZnO Films by Sputtering)

  • 이동윤
    • 한국콘텐츠학회:학술대회논문집
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    • 한국콘텐츠학회 2009년도 춘계 종합학술대회 논문집
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    • pp.807-809
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    • 2009
  • 압전성을 갖는 산화아연 박막을 스퍼터링을 이용하여 실리콘 기판위에 증착하였고 여러 증착 공정변수들이 물성에 미치는 영향과 박막의 구조적 특성 및 전파경계조건을 고찰하였다. 특히, 평탄한 표면을 갖는 압전 박막을 제조하여 전파 특성에 우수한 증착조건을 제시하고 탄성표면파의 전파및 경계조건을 분석한다. 박막의 구조적 특성 분석을 위하여 여러가지 증착조건 중 아르곤과 산소의 가스비율 과 기판온도가 박막의 제조에 미치는 특성을 분석하였다. 스퍼터링 가스인 산소양이 50%이상으로 증가할수록 박막의 표면 거칠기가 나빠지는 특성을 보였다. 비저항과 표면형상은 유입되는 산소에 큰 영향을 받는다는 것을 알 수 있었다.

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건조 온도에 따른 YMnO$_3$ 박막의 구조 및 전기적 특성 (Effect of drying temperature on the electrical and structural properties of YMnO$_3$ thin film)

  • 박재화;김경태;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.50-53
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    • 2002
  • YMnO$_3$ thin films were spun-coated on the Pt/Ti/SiO$_2$/Si substrates by sol-gel process using alkoxides, and then dried on hot plates from 300 to 450 $^{\circ}C$. The prepared YMnO$_3$ thin films were annealed at 850 $^{\circ}C$ in O$_2$ atmosphere for 1 h. The crystallization of YMnO$_3$ thin films were improved to preferred c-axis orientation and the dielectric characteristics were progressed by increasing the drying temperature. The range of dielectric constant of thin film dried at 450 $^{\circ}C$ is 12.9-22.3 and close to that of YMnO$_3$ single crystal. The ferroelecrtic property of YMnO$_3$ thin film was observed on the YMnO$_3$ films. The maximum remnant polarization (2Pr) of YMnO$_3$ thin films dried at 450 $^{\circ}C$ was about 2.91 ${\mu}$ C/cm2. It was suggested that the drying temperature affect to the initial stage of thin film growth of preferred c-axis orientation.

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Crystal growth and optical properties with preheating temperature of sol-gel derived ZnO thin films

  • Kim, Young-Sung;Lee, Choong-Sun;Kim, Ik-Joo;Ko, Hyung-Duk;Tai, Weon-Pil;Song, Yong-Jin;Suh, Su-Jeung
    • 한국결정성장학회지
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    • 제14권5호
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    • pp.187-192
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    • 2004
  • We try to use isopropanol which has low boiling point to prepare ZnO thin films at low temperature. ZnO thin films were prepared by sol-gel spin-coating method using zinc acetate dehydrate-isopropanol-monoethanolamine (MEA) solution. The c-axis preferred orientation and optical properties of ZnO films with preheating temperature have been investigated. ZnO thin films were preheated at 200 to $300^{\circ}C$ with an interval of $25^{\circ}C$ and post-heated at $650^{\circ}C$. The ZnO film preheated at $275^{\circ}C$ and post-heated at $650^{\circ}C$ was highly oriented along c-axis (002) plane, and the surface with homogeneous and dense microstructures was formed having nano-sized grains. The optical transmittance was above 90 % in the visible range and exhibited absorption edges at 368 nm wavelength.