• Title/Summary/Keyword: C-축배향

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Preparation of Co-Cr Thin Films by Facing Targets Sputtering (대향타겟스퍼터링에 의한 Co-Cr 박막의 제작)

  • ;;;;;S. Nakagawa;M.Naoe
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.5
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    • pp.418-422
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    • 1998
  • The Co-Cr films are one of the most suitable candidates for perpendicular magnetic recording media. The facing targets sputtering(FTS) system has a advantage of preparing films over a wide range of working gas pressure on plasma-free substrate. In this study, we investigated the possibility of employing FTS system for depositing Co-Cr films. The Co-Cr thin films were deposited with various sputter gas pressure($P_Ar$, 0.1~10mTorr) by using FTS apparatus at temperature of $40^{\circ}C and 220^{\circ}C$, respectively. Crystallographic and magnetic characteristics were evaluated by x-ray diffractometry (XRD) and vibrating sample magnetometer(VSM), respectively. Under argon gas pressure at 0.1mTorr, films with morphologically dense microstructure, good c-axis orientation and higher coercivity were obtained. It has been confirmed that the FTS system is very useful for preparing Co-Cr thin film recording media.

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Preparation of Co-Cr-Ta recording layers by FTS (FIS에 의한 Co-Cr-Ta 기록층의 제작)

  • 공석현;손인환;박창옥;김재환;김경환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.578-581
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    • 1999
  • The Co-Cr-Ta films are one of the most suitable candidates for perpendicular magnetic recording media. The facing targets sputtering(FTS) system has a advantage of preparing films over a wide range of working gas pressure on plasma-free substrates. In this study, we investigated the effect underlayers on the growths layers of Co-Cr-Ta recording layers. The Co-Cr-Ta/Ti(CoCr) double layers were deposited with sputter gas pressure$(P_N, 0.3-1mTorr)$ by using FTS apparatus at temperature of$40^{\circ}C~-300^{\circ}C$, respectively. Crystallographic and magnetic characteristics were evaluated by x-ray diffractometry(XRD) and vibrating sample magnetometer(VSM), respectively.

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Growth Conditions of $SrTiO_3 $ Film on Textured Metal Substrate for $YBa_2CU_3O_{7-\delta}$ Coated Conductor ($YBa_2CU_3O_{7-\delta}$ coated Conductor 완충층으로의 응용을 위한 $SrTiO_3 $ 박막의 성장 조건)

  • Chung, J.K.;Ko, R.K.;Song, K.J.;Park, C.;Kim, C.J.
    • Korean Journal of Crystallography
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    • v.14 no.2
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    • pp.51-55
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    • 2003
  • SrTiO₃ (STO) thin fims were deposited on the biaxially textured Ni-3 wt%W alloy substrates to be used as a single buffer layer for YBa₂CU₃O/sub 7-8/(YBCO) coated conductor. Thin films of YBCO and STO were deposited using pulsed laser. The deposition condition for epitaxial growth of STO on the textured metal was identified, and YBCO coated conductor with a single STO buffer layer with critical current density of 1.2 MA㎠ at 77 K under zero magnetic field and critical temperature of 86 K, was fabricated.