Etching Mechanism Of Bi4-xEuxTiO12 (BET) Thin films Using Ar/CF4 Inductively Coupled Plasma (Ar/CF4 유도결합 플라즈마를 이용한 BET 박막의 식각 메카니즘)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.16 no.4
- /
- pp.298-303
- /
- 2003