• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.272.1-272.1
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• 2016

In a three-dimensional topological insulator Bi2Se3, a stress control for band gap manipulation was predicted but no systematic investigation has been performed yet due to the requirement of large external stress. We report herein on the strain-dependent results for Bi2Se3 films of various thicknesses that are grown via a self-organized ordering process. Using small angle X-ray scattering and Raman spectroscopy, the changes of d-spacings in the crystal structure and phonon vibration shifts resulted from stress are clearly observed when the film thickness is below ten quintuple layers. From the UV photoemission/inverse photoemission spectroscopy (UPS/IPES) results and ab initio calculations, significant changes of the Fermi level and band gap were observed. The deformed band structure also exhibits a Van Hove singularity at specific energies in the UV absorption experiment and ab initio calculations. Our results, including the synthesis of a strained ultrathin topological insulator, suggest a new direction for electronic and spintronic applications for the future.

• 한국진공학회지
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• 제3권3호
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• pp.309-315
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• 1994

순간증착법으로 p형(Bi0.5Sb1.5Te3)과 n형(Bi2Te24Se0.6)열전박막을 제조하여 상온에서 Seebeck 계 수, 전기전도도 및 열전성능지수를 측정하였다. 또한 금속재 mask를 이용하여 다중접점 박막형 열전소 자를 제작하고 그 작동특성을 조사하였다. 이때 소자의 고온부와 저온부의 온도를 직접측정하기 위하여 copper/constantan 박막을 접점부에 증착하여 열전쌍이 되게 하였다. p/n 접점이 5쌍이 소자의 경우 Peltier 효과에 의해 생성된 최대온도차는 22K이었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.59-59
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• 2011

We will report atomically sharp epitaxial growth of $Bi_2Se_3$ three-dimensional topological insulator films on Si(111) substrate with molecular beam epitaxy (MBE). It was achieved by employing two step growth temperatures to prevent any formation of second phase, like as $SiSe_2$ clusters, between $Bi_2Se_3$ and Si substrate at the early stage of growth. The growth rate was determined completely by Bi flux and the Bi:Se flux ratio was kept ~1:15. The second-phase-free atomically sharp interface was verified by RHEED, TEM and XRD. Based on the RHEED analysis, the lattice constant of $Bi_2Se_3$ relaxed to its bulk value during the first quintuple layer implying the absence of strain from the substrate. Single-crystalline XRD peaks of $Bi_2Se_3$ were observed in films as thin as 4 QL. TEM shows full epitaxial structure of $Bi_2Se_3$ film down to the first quintuple layer without any second phases. This growth method was used to grow high quality epitaxial $Bi_2Se_3$ films from 3 QL to 3600 QL. The magneto-transport properties of these thin films show a robust 2D surface state which is thickness independent.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.231-231
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• 2010

Thermoelectric properties of a multi-layered thin film, which was composed with indium selenide and bismuth telluride, were investigated. The structure of the layered thin film is Bi-Te /In-Se/Bi-Te and it was prepared on sapphire substrate by RF magnetron sputter using stoichiometric $Bi_2Te_3$ (99.9%) and $In_2Se_3$(99.99%) target at room temperature. Then, it was annealed at temperature range of 150 - $500^{\circ}C$ in Ar ambient. Structural characterizations were done using X-ray diffraction(XRD, BRUKER, D8, 60kW) and transmission electron microscopy (TEM, FEI, Tecnai, F30 S-Twin), respectively. Cross-section of multi-layer structure was observed by Scanning electron microscopy (SEM). The resistivity and Seebeck coefficient of these samples were also measured by conventional equipment at room temperature. The maximum value of power factor was $1.16\;{\mu}W/k^2m$ at annealing temperature of $400^{\circ}C$.

• 한국진공학회지
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• 제14권3호
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• pp.153-158
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• 2005

순간 증착법으로 제조한 n형 $Bi_2Te_{2.4}Se_{0.6}$ 박막에 대하여 유효 평균 자유 행로 모델을 적용하여 박막의 두께가 열전 특성에 영향을 미치지 않는 임계 두께를 구하였다. 또한 열처리 전후 전자 농도 및 이동도의 변화를 조사하여 열처리에 의한 열전 특성의 변화를 역구조 결함과 관련하여 설명하였다. Seebeck 계수와 전기 비저항 모두 두레의 역수와 직선적인 관계를 보였으며, 이로부터 구한 평균 자유 행로는 $5120\AA$이었다. 열처리에 의해 전자의 이동도가 증가하였지만, 역구조 결함의 감소로 인해 운반자의 전자 농도가 현저히 감소하여, 결국 전기전도도가 감소하고 Seebeck 계수가 증가하였다 473k에서 1시간 동안 열처리한 Seebeck 계수와 전기전도도는 각각 $-200\;\mu V/k$와 $510\omega^{-1}cm^{-1}$이었다 또한, 열처리에 의해 열전 성능 인자가 상당히 향상되어 $20\times10^{-4}\;W/(mK^2)$를 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.624-627
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• 2003

The BLT thin-films were one of the promising ferroelectric materials with a good leakage current and degradation behavior on Pt electrode. The BLT target was sintered at $1100^{\circ}C$ for 4 hours at the air ambient. $Bi_{3.25}La_{0.75}Ti_3O_{12}$ (BLT) thin-film deposited on $Pt/Ti/SIO_2/Si$ wafer by rf magnetron sputtering method. At annealed $700^{\circ}C$, (117) and (006) peaks appeared the high intensity. The hysteresis loop of the BLT thin films showed that the remanent polarization ($2Pr=Pr^+-Pr^-$) was $16uC/cm^2$ and leakage current density was $1.8{\times}10^{-9}A/cm^2$ at 50 kV/cm with coersive electric field when BLT thin-films were annealed at $700^{\circ}C$. Also, the thin film showed fatigue property at least up to $10^{10}$ switching bipolar pulse cycles under 7 V. Therefore, we induce access to optimum fabrication condition of memory device application by rf-magnetron sputtering method in this report.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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• pp.156-157
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• 1998

It is a diffcult and challenging pproblem to control the growth of eppitaxial films. Heteroeppitaxy is esppecially idfficult because of the lattice mismatch between sub-strate and depposited layers. This mismatch leads usually to a three dimensional(3D) island growth. But the use of surfactants such as As, Sb, and Bi can be beneficial in obtaining high quality heteroeppitaxial films. In this study medium energy ion scattering sppectroscoppy(MEIS) was used in order to reveal the growth mode of Ge on Si(001) and the strain of depposited film without and with dynamically supplied atomic hydrogen at the growth thempperature of 35$0^{\circ}C$. It was ppossible to control the growth mode from layer-by-layer followed by 3D island to layer-by-layer by controlling the hydrogen flux. In the absent of hydro-gen the film grows in the layer-by-layer mode within the critical thickness(about 3ML) and the 3D island formation is followed(Fig1). The 3D island formation is suppressed by introducing hydrogen resulting in layer-by-layer growth beyond the critical thickness(Fig2) We measured angular shift of blocking dipp in order to obtain the structural information on the thin films. In the ppressence of atomic hydrogen the blocking 야 is shifted toward higher scattering angle about 1。. That means the film is distorted tetragonally and strained therefore(Fig4) In other case the shift of blocking dipp at 3ML is almost same as pprevious case. But above the critical thickness the pposition of blocking dipp is similar to that of Si bulk(Fig3). It means the films is relaxed from the first layer. There is 4.2% lattice mismatch between Ge and Si. That mismatch results in about 2。 shift of blocking dipp. We measured about 1。 shift. This fact could be due to the intermixing of Ge and Si. This expperimental results are consistent with Vegard's law which says that the lattice constant of alloys is linear combination of the lattic constants of the ppure materials.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.173-173
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• 2010

$Bi_4Ti_3O_{12}$ ($B_4T_3$) is a unique ferroelectric material that has a relatively high dielectric constant, high Curie temperature, high breakdown strength, and large spontaneous polarization. As a result this material has been widely studied for many applications, including nonvolatile ferroelectric random memories, microelectronic mechanical systems, and nonlinear-optical devices. Several reports have appeared on the use of Mn dopants to improve the electrical properties of $B_4T_3$ thin films. Mn ions have frequently been used for this purpose in thin films and multilayer capacitors in situations where intrinsic oxygen vacancies are the major defects. However, no systematic study of the optical properties of $B_4T_3$ films has appeared to date. Here, we report optical data for these films, determined by spectroscopic ellipsometry (SE). We also report the effects of thermal annealing and Mn doping on the optical properties. The SE data were analyzed using a multilayer model that is consistent with the original sample structure, specifically surface roughness/$B_4T_3$ film/Pt/Ti/$SiO_2$/c-Si). The data are well described by the Tauc-Lorentz dispersion function, which can therefore be used to model the optical properties of these materials. Parameters for reconstructing the dielectric functions of these films are also reported. The SE data show that thermal annealing crystallizes $B_4T_3$ films, as confirmed by the appearance of $B_4T_3$ peaks in X-ray diffraction patterns. The bandgap of $B_4T_3$ red-shifts with increasing Mn concentration. We interpret this as evidence of the existence deep levels generated by the Mn transition-metal d states. These results will be useful in a number of contexts, including more detailed studies of the optical properties of these materials for engineering high-speed devices.

• 대한전자공학회논문지SD
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• 제37권2호
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• pp.5-12
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• 2000

열전퇴의 고온 접합부가 Si/sub 3/N/sub 4//SiO/sub 2//Si/sub 3/N/sub 4/ 멤브레인에 의해 실리콘 기판으로부터 열차단되고, 열전퇴의 저온 접합부는 방열판 역할을 하는 실리콘 림(rim)에 의해 지지되는 멤브레인위에 놓여지며, Au-black이 적외선 흡수체로 사용되는 비냉각 금속 박막형 열전퇴 적외선 검지기를 제작하고, 적외선 검지기의 성능지수에 대해 논의하였다. 3∼14㎛의 파장범위에서 Au-black의 적외선 흡수도는 대개 90%정도였고, Au 증발시의 챔버압력 및 증착된 Au-black의 단위면적당 질량에 크게 의존하였다. 쵸핑 주파수가 5 Hz일 때 Bi-Sb 열전퇴 적외선 검지기의 전압 감응도, 잡음등가전력 및 비검지도는 실온의 공기중에서 각각 약 10.5V/W, 2.3 ㎻/㎐½, 및 1.9×10/sup 7/㎝·㎐½/w였다.

• 센서학회지
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• 제12권3호
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• pp.103-111
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• 2003

$Si_3N_4/SiO_2/Si_3N_4$ 열차단막을 이용한 크로멜-알루멜(chromel-alumel) 열전(thermoelectric) 유량센서를 제작하였다. 백금 박막 히터의 저항온도계수는 약 $0.00397/^{\circ}C$이었고, 크로멜-알루멜 열전쌍(thermocouple)의 Seebeck 계수는 약 $36\;{\mu}V/K$이었다. 기체의 열전도도가 증가할수록 유량센서가 나타내는 열기전력은 감소하였으며, 히터의 온도가 증가하거나 히터와 열전쌍 사이의 간격이 감소할수록 유량센서의 $N_2$ 유량에 대한 감도는 증가하였다. 히터 전압을 약 2.5 V로 하였을 때 유량센서의 $N_2$ 유량에 대한 감도는 약 $1.5\;mV/sccm^{1/2}$이었고, 열 응답시간은 약 0.18초이었다. 크로멜-알루멜 열전 유량센서의 유량감도에 있어서 선형 범위가 Bi-Sb 유랑센서의 것보다 더 넓게 나타났다.