• 제목/요약/키워드: BARRIER METAL

검색결과 417건 처리시간 0.028초

Texturization을 이용한 Al-MIS 태양 전지의 효율 개선 (Efficiency Improvement of Al-MIS Solar Cell Using Texturization)

  • 김진섭;이우일;김기완;정호선
    • 대한전자공학회논문지
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    • 제19권5호
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    • pp.26-31
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    • 1982
  • 태양 전지의 효율을 개선하기 위한 여러 가지 방법중 실리콘 표면을 이방성 부식하여 태양광의 수광 효율을 증대시켜 태양 전지의 효율을 높이는 texturization방법을 Al-MIS 태양 전지에 적용하였다. MIS 태양 전지를 제조하기 위해 질소 분위기에서 행한 산화 조건은 500℃에서 20분간이 가장 좋았으며, 알루미늄 장벽금속(barrier metal)의 두께는 약 100Å이 적합하였다. Texturization 용액으로서 hydratinehydrate와 pyrocathecol을 혼합하여 사용하였다. 실리콘 표면을 texturization함으로써 texturization하지 않은 MIS태양 전지에 비해 100mW/㎠의 조명하에서 1.2∼1.6%의 효율을 개선할 수 있었다.

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Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD

  • Park, Hyun-Ah;Lim, Jong-Min;Lee, Chong-Mu
    • 한국세라믹학회지
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    • 제41권6호
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    • pp.435-438
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    • 2004
  • MOCVD is one of the major deposition techniques for Cu thin films and Ta-Si-N is one of promising barrier metal candidates for Cu with high thermal stability. Effects of hydrogen plasma pretreatment of the underlying Ta-Si-N film surface on the Cu nucleation in Cu MOCVD were investigated using scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron emission spectrometry analyses. Cu nucleation in MOCVD is enhanced as the rf-power and the plasma exposure time are increased in the hydrogen plasma pretreatment. The optimal plasma treatment process condition is the rf-power of 40 Wand the plasma exposure time of 2 min. The hydrogen gas flow rate in the hydrogen plasma pretreatment process does not affect Cu nucleation much. The mechanism through which Cu nucleation is enhanced by the hydrogen plasma pretreatment of the Ta-Si-N film surface is that the nitrogen and oxygen atoms at the Ta-Si-N film surface are effectively removed by the plasma treatment. Consequently the chemical composition was changed from Ta-Si-N(O) into Ta-Si at the Ta-Si-N film surface, which is favorable for Cu nucleation.

표면 습식 식각 및 열처리에 따른 GaN 단일 나노로드 소자의 전기적 특성변화 (The Electrical Properties of GaN Individual Nanorod Devices by Wet-etching of the Nanorod Surface and Annealing Treatment)

  • 지현진;최재완;김규태
    • 한국전기전자재료학회논문지
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    • 제24권2호
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    • pp.152-155
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    • 2011
  • Even though nano-scale materials were very advantageous for various applications, there are still problems to be solved such as the stabilization of surface state and realization of low contact resistances between a semiconducting nanowire and electrodes in nano-electronics. It is well known that the effects of contacts barrier between nano-channel and metal electrodes were dominant in carrier transportation in individual nano-electronics. In this report, it was investigated the electrical properties of GaN nanorod devices after chemical etching and rapid thermal annealing for making good contacts. After KOH wet-etching of the contact area the devices showed better electrical performance compared with non-treated GaN individual devices but still didn't have linear voltage-current characteristics. The shape of voltage-current properties of GaN devices were improved remarkably after rapid thermal annealing as showing Ohmic behaviors with further bigger conductivities. Even though chemical etching of the nanorod surfaces could cause scattering of carriers, in here it was shown that the most important and dominant factor in carrier transport of nano-electronics was realization of low contact barrier between nano-channel and metal electrodes surely.

Magni 565 코팅 볼트의 내식성 및 토오크 특성에 대한 연구 (A Study of Corrosion Resistance and Torque in Bolt Coated with Magni 565)

  • 김상수;김무길;정병호
    • 열처리공학회지
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    • 제20권4호
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    • pp.195-202
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    • 2007
  • Corrosion resistance and torque of M10 bolt coated with Magni 565 were investigated. Corrosion protection mechanism were also studied with the microstructure of coating film. The bolts with the optimum conditions showed around $10{\mu}m$ layer thickness, a great corrosion resistance in salt spray test and a proper torque in torque/tension test. But torque coefficient k increased with the number of bolting and clamping force of M10 bolt showed significantly lower than that of specified value 28.3kN. It was thought that the repeated bolting made the coating film peel off and powdery. The sample coated with optimum coating conditions showed more higher polarization resistance and corrosion potential than the specimens of top and base coat only. The base coating film was composed of lamellar zinc flakes, which provides a large sacrificial cathodic protection. Meanwhile, the top coating film was composed of organic aluminium pigments layer, which provides barrier protection to the corrosion circumstances.

Li:Al cathode layer and its influence on interfacial energy level and efficiency in polymer-based photovoltaics

  • 박순미;전지혜;박오옥;김정원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.72-72
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    • 2010
  • Recent development of organic solar cell approaches the level of 8% power conversion efficiency by the introduction of new materials, improved material engineering, and more sophisticated device structures. As for interface engineering, various interlayer materials such as LiF, CaO, NaF, and KF have been utilized between Al electrode and active layer. Those materials lower the work function of cathode and interface barrier, protect the active layer, enhance charge collection efficiency, and induce active layer doping. However, the addition of another step of thin layer deposition could be a little complicated. Thus, on a typical solar cell structure of Al/P3HT:PCBM/PEDOT:PSS/ITO glass, we used Li:Al alloy electrode instead of Al to render a simple process. J-V measurement under dark and light illumination on the polymer solar cell using Li:Al cathode shows the improvement in electric properties such as decrease in leakage current and series resistance, and increase in circuit current density. This effective charge collection and electron transport correspond to lowered energy barrier for electron transport at the interface, which is measured by ultraviolet photoelectron spectroscopy. Indeed, through the measurement of secondary ion mass spectroscopy, the Li atoms turn out to be located mainly at the interface between polymer and Al metal. In addition, the chemical reaction between polymer and metal electrodes are measured by X-ray photoelectron spectroscopy.

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이중 베리어 방전 반응기를 사용한 $NO_x$ 제거에 관한 연구 (A Study on the Double Dielectric Barrier Discharge for $NO_x$ reduction)

  • 김동욱;김응복;정영식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 E
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    • pp.2182-2185
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    • 1999
  • In this experimental study we propose the double dielectric barrier discharge(DDBD) reactor to produce as high an electric field as possible. DDBD reactor is designed to remove $NO_x$ at atmospheric pressures from the moving pollution source such as diesel automobile DDBD reactor consisted of two cylinder glass tubes arranged so that the gas flow was directed between the two tubes. Inside of the inner tube was filled with small metal beads and outside of the inner tube was wounded with stainless wire to form the electrode. The outer tube was surrounded by an aluminum foil In this reactor there are three electrodes, i.e. metal bead(C), helical wire(I) and aluminum foil(0). By using DDBD reactor we will report some interesting results of treatment of the gas which is the dilute mixtures of NO in N2. And then we compared thee results with the results of cylinder-wire(CW) which is one of popularly used reactor in non-thermal plasma applications.

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Improving Interface Characteristics of Al2O3-Based Metal-Insulator-Semiconductor(MIS) Diodes Using H2O Prepulse Treatment by Atomic Layer Deposition

  • Kim, Hogyoung;Kim, Min Soo;Ryu, Sung Yeon;Choi, Byung Joon
    • 한국재료학회지
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    • 제27권7호
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    • pp.364-368
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    • 2017
  • We performed temperature dependent current-voltage (I-V) measurements to characterize the electrical properties of $Au/Al_2O_3/n-Ge$ metal-insulator-semiconductor (MIS) diodes prepared with and without $H_2O$ prepulse treatment by atomic layer deposition (ALD). By considering the thickness of the $Al_2O_3$ interlayer, the barrier height for the treated sample was found to be 0.61 eV, similar to those of Au/n-Ge Schottky diodes. The thermionic emission (TE) model with barrier inhomogeneity explained the final state of the treated sample well. Compared to the untreated sample, the treated sample was found to have improved diode characteristics for both forward and reverse bias conditions. These results were associated with the reduction of charge trapping and interface states near the $Ge/Al_2O_3$ interface.

Diffusion Coefficients and Membrane Potential within Carrier Membrane by Reverse Transport System

  • Yang, Wong-Kang;Jeong, Sung-Hyun;Lee, Won-Chul
    • Korean Membrane Journal
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    • 제4권1호
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    • pp.36-40
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    • 2002
  • The diffusion coefficients of ions in the reverse transport system using the carrier mediated membrane were estimated from the diffusional membrane permeabilities and the ion activity in membrane system. In the aqueous alkali metal ions-membrane system diffusional flux of alkali metal ions driven by coupled proton was analyzed. The aqueous phase I contained NaOH solution and the aqueous phase II also contained NaCl and HCl mixed solution. The concentration of Na ions of both phases were $10^{0},\;10^{-1},\;10^{-2},\;5{\times}10^{-1}\;and\;5{\times}10^{-2}\;mol{\cdot}dm^{-3}$ and the concentration of HCI in aqueous phase II was always kept at $1{\times}10^{-1}\;mol{\cdot}dm^{-3}$. Moreover, the carrier concentration in liquid membrane was $10^{-2}\;mol{\cdot}dm^{-3}$. The results indicated that the diffusion coefficients depend strongly on the concentration of both phases electrolyte solution equilibriated with the membrane. The points were interpreted in terms of the energy barrier theory. Furthermore, eliminating the potential terms from the membrane equation was derived.

접합 및 무접합 이중게이트 MOSFET에 대한 문턱전압 이동 및 드레인 유도 장벽 감소 분석 (Analysis of Threshold Voltage Roll-Off and Drain Induced Barrier Lowering in Junction-Based and Junctionless Double Gate MOSFET)

  • 정학기
    • 한국전기전자재료학회논문지
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    • 제32권2호
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    • pp.104-109
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    • 2019
  • An analytical threshold voltage model is proposed to analyze the threshold voltage roll-off and drain-induced barrier lowering (DIBL) for a junction-based double-gate (JBDG) MOSFET and a junction-less double-gate (JLDG) MOSFET. We used the series-type potential distribution function derived from the Poisson equation, and observed that it is sufficient to use n=1 due to the drastic decrease in eigenvalues when increasing the n of the series-type potential function. The threshold voltage derived from this threshold voltage model was in good agreement with the result of TCAD simulation. The threshold voltage roll-off of the JBDG MOSFET was about 57% better than that of the JLDG MOSFET for a channel length of 25 nm, channel thickness of 10 nm, and oxide thickness of 2 nm. The DIBL of the JBDG MOSFET was about 12% better than that of the JLDG MOSFET, at a gate metal work-function of 5 eV. It was also found that decreasing the work-function of the gate metal significantly reduces the DIBL.

산화물 반도체 가스 센서의 습도 의존성 제거 기술 (Humidity Dependence Removal Technology in Oxide Semiconductor Gas Sensors)

  • 박지호;윤지욱
    • 한국전기전자재료학회논문지
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    • 제37권4호
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    • pp.347-357
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    • 2024
  • Oxide semiconductor gas sensors are widely used for detecting toxic, explosive, and flammable gases due to their simple structure, cost-effectiveness, and potential integration into compact devices. However, their reliable gas detection is hindered by a longstanding issue known as humidity dependence, wherein the sensor resistance and gas response change significantly in the presence of moisture. This problem has persisted since the inception of oxide semiconductor gas sensors in the 1960s. This paper explores the root causes of humidity dependence in oxide semiconductor gas sensors and presents strategies to address this challenge. Mitigation strategies include functionalizing the gas-sensing material with noble metal/transition metal oxides and rare-earth/rare-earth oxides, as well as implementing a moisture barrier layer to prevent moisture diffusion into the gas-sensing film. Developing oxide semiconductor gas sensors immune to humidity dependence is expected to yield substantial socioeconomic benefits by enabling medical diagnosis, food quality assessment, environmental monitoring, and sensor network establishment.