• Title/Summary/Keyword: Atomic vapor cell

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Fabrication of High-purity Rb Vapor Cell for Electric Field Sensing

  • Jae-Keun Yoo;Deok-Young Lee;Sin Hyuk Yim;Hyun-Gue Hong;Sun Do Lim;Seung Kwan Kim;Young-Pyo Hong;No-Weon Kang;In-Ho Bae
    • Current Optics and Photonics
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    • v.7 no.2
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    • pp.207-212
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    • 2023
  • In this paper, we introduce our system for manufacturing a Rb vapor cell and describe its fabrication process in a sequence of removing impurities, cold trapping, and sealing off. Saturated absorption spectroscopy was performed to verify the quality of our cell by comparing it to that of a commercial one. By using the lab-fabricated Rb vapor cell, we observed electromagnetically induced transparency in a ladder-type system corresponding to the 5S1/2-5P3/2-28D5/2 transition of the 85Rb atom. A highly excited Rydberg atomic system was prepared using two counter-propagating external cavity diode lasers with wavelengths of 780 nm and 480 nm. We also observed the Autler-Townes splitting signal while a radio-frequency source around 100 GHz incidents into the Rydberg atomic medium.

Study on Reliability of Vapor Cell by Laser Packaging with Au/Au-Sn Heterojunction (Au/Au-Sn 이종접합 적용 레이저 패키징을 통한 Vapor Cell 신뢰성 연구)

  • Kwon, Jin Gu;Jeon, Yong Min;Kim, Ji Young;Lee, Eun Byeol;Lee, Seong Eui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.5
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    • pp.367-372
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    • 2020
  • As packaging processes for atomic gyroscope vapor cells, the glass tube tip-off process, anodic bonding, and paste sealing have been widely studied. However, there are stability issues in the alkali metal which are caused by impurity elements and leakage during high-temperature processes. In this study, we investigated the applicability of a vapor cell low-temperature packaging process by depositing Au on a Pyrex cell in addition to forming an Au-Sn thin film on a cap to cover the cell, followed by laser irradiation of the Au/Au-Sn interface. The mechanism of the thin film bonding was evaluated by XRD, while the packaging reliability of an Ne gas-filled vapor cell was characterized by variation of plasma discharge behavior with time. Furthermore, we confirmed that the Rb alkaline metal inside the vapor cell showed no color change, indicating no oxidation occurred during the process.

Atomic Coherence Spectroscopy in the Paraffin Coated Rb Atom Vapor Cell (파라핀 코팅된 Rb원자 증기 셀에서 원자결맞음 분광)

  • Lee, Hyun-Joon;Yu, Ye-Jin;Bae, In-Ho;Moon, Han-Seb
    • Korean Journal of Optics and Photonics
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    • v.19 no.4
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    • pp.334-340
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    • 2008
  • We investigated the electromagnetically induced transparency (EIT) and the Hanle spectrum in a paraffin coated Rb vapor cell. The EIT spectrum was observed in the $F_g=2$, $3{\rightarrow}F_e=3$ transition of the $^{85}Rb$ $D_1$-line by using two independent external cavity diode lasers, and the Hanle spectrum was observed by using one external cavity diode laser in the $\Lambda$-type scheme between the Zeeman sublevels of the $F_g=2{\rightarrow}F_e=1$ transition of the $^{87}Rb$ $D_1$-line. In the Hanle spectrum, we could observe the dual-structured spectrum in the paraffin coated vapor cell. We investigated the dual-structured lineshape by applying an external magnetic field, and varying the direction of the magnetic field. The narrow linewidth of dual-structured EIT was measured to be approximately 200 Hz.

Comparative Measurement of Transverse Nuclear Magnetization of Polarized 129Xe and 131Xe by Spin-exchange Optical Pumping

  • Yu, Ye Jin;Min, Seong Ho;Moon, Han Seb
    • Current Optics and Photonics
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    • v.4 no.6
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    • pp.466-471
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    • 2020
  • We analyze the transverse nuclear magnetizations of 129Xe and 131Xe in a vapor cell containing natural Xe, 87Rb, and buffer gases. Th e Xe atoms are polarized th rough spin-exch ange optical pumping (SEOP) with Rb atoms under low-magnetic-field conditions. From the free-induction-decay (FID) signal, we measure the nuclear magnetization of the Xe atoms in the Xe-Rb vapor cell. Furthermore, we measure the dependence of the gyromagnetic ratio on the magnetization of 129Xe and 131Xe by examining the amplitude of the FID signal of each isotope, and we evaluate the relationship between the magnetic field gradient and transverse relaxation rate for both of the 129Xe and 131Xe isotopes.

Optimization of Diode-pumped Cesium Vapor Laser Using Frequency Locked Pump Laser

  • Hong, Seongjin;Kong, Byungjoo;Lee, Yong Soo;Oh, Kyunghwan
    • Current Optics and Photonics
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    • v.2 no.5
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    • pp.443-447
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    • 2018
  • We propose a diode-pumped cesium laser using frequency locking of a pump laser that can effectively increase the maximum output power of the cesium laser. We simultaneously monitored the absorption spectrum of cesium and the laser output power, and the frequency of pump laser was locked at the center of the $D_2$ absorption line of the cesium atom to obtain an effective gain enhancement. Using this scheme, we have achieved output power increase of ~0.1 W compared to when frequency locking was not applied. Furthermore, by optimizing the temperature of the cesium cell and the reflectivity of the output coupler, we successfully achieved an output power of 1.4 W using the pump power of 2.9 W, providing a slope efficiency of 61.5% and optical-to-optical efficiency of 49%.

Effect of Laser Ablation on Rear Passivation Stack for N-type Bifacial Solar Cell Application (N형 양면 수광 태양전지를 위한 레이저 공정의 후면 패시베이션 적층 구조 영향성)

  • Kim, Kiryun;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.30 no.5
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    • pp.262-266
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    • 2020
  • In this paper, we investigated the effect of the passivation stack with Al2O3, hydrogenated silicon nitride (SiNx:H) stack and Al2O3, silicon oxynitride (SiONx) stack in the n type bifacial solar cell on monocrystalline silicon. SiNx:H and SiONx films were deposited by plasma enhanced chemical vapor deposition on the Al2O3 thin film deposited by thermal atomic layer deposition. We focus on passivation properties of the two stack structure after laser ablation process in order to improve bifaciality of the cell. Our results showed SiNx:H with Al2O3 stack is 10 mV higher in implied open circuit voltage and 60 ㎲ higher in minority carrier lifetime than SiONx with Al2O3 stack at Ni silicide formation temperature for 1.8% open area ratio. This can be explained by hydrogen passivation at the Al2O3/Si interface and Al2O3 layer of laser damaged area during annealing.

Characteristics on Silicon Oxynitride Stack Layer of ALD-Al2O3 Passivation Layer for c-Si Solar Cell (결정질 실리콘 태양전지 적용을 위한 ALD-Al2O3 패시베이션 막의 산화질화막 적층 특성)

  • Cho, Kuk-Hyun;Cho, Young Joon;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.25 no.5
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    • pp.233-237
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    • 2015
  • Silicon oxynitride that can be deposited two times faster than general SiNx:H layer was applied to fabricate the passivation protection layer of atomic layer deposition (ALD) $Al_2O_3$. The protection layer is deposited by plasma-enhanced chemical vapor deposition to protect $Al_2O_3$ passivation layer from a high temperature metallization process for contact firing in screen-printed silicon solar cell. In this study, we studied passivation performance of ALD $Al_2O_3$ film as functions of process temperature and RF plasma effect in plasma-enhanced chemical vapor deposition system. $Al_2O_3$/SiON stacks coated at $400^{\circ}C$ showed higher lifetime values in the as-stacked state. In contrast, a high quality $Al_2O_3$/SiON stack was obtained with a plasma power of 400 W and a capping-deposition temperature of $200^{\circ}C$ after the firing process. The best lifetime was achieved with stack films fired at $850^{\circ}C$. These results demonstrated the potential of the $Al_2O_3/SiON$ passivated layer for crystalline silicon solar cells.

Study of I layer deposition parameters of deposited micro-crystalline silicon by PECVD at 27.12MHz (27.12MHz PECVD에 의해 증착된 uc-Si의 I층 공정 파라미터 연구)

  • Lee, Kise;Kim, Sunkue;Kim, Sunyoung;Kim, Sangho;Kim, Gunsung;Kim, Beomjoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.66.1-66.1
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    • 2010
  • Microcrystalline silicon at low temperatures has been developed using plasma enhanced chemical vapor deposition (PECVD). It has been found that energetically positive ion and atomic hydrogen collision on to growing surface have important effects on increasing growth rate, and atomic hydrogen density is necessary for the increasing growth rate correspondingly, while keeping ion bombardment is less level. Since the plasma potential is determined by working pressure, the ion energy can be reduced by increasing the deposition pressure of 700-1200 Pa. Also, correlation of the growth rate and crystallinity with deposition parameters such as working pressure, hydrogen flow rate and input power were investigated. Consequently an efficiency of 7.9% was obtained at a high growth rate of 0.92 nm/s at a high RF power 300W using a plasma-enhanced chemical vapor deposition method (27.12MHz).

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Anomalous Dispersion in Cs Atomic Vapor Cell (세슘원자셀에서의 비정상 분산)

  • 강훈수;김재필;오차환;송석호;김필수
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.254-255
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    • 2001
  • 매질의 공진주파수 근처에서는 주파수가 커짐에 따라 매질의 굴절률이 감소하는 비정상 분산 특성을 나타낸다. 본 실험에서는 세슘원자의 비정상 분산 특성을 실험적으로 관측할 수 있는 방법을 연구하였다. 가열된 세슘원자셀(16$0^{\circ}C$)에 CS D$_2$ 전이선에 공진되는 레이저빔을 입사하여 레이저의 주파수에 따른 레이저빔의 굴절각도를 측정하였다(그림1) 레이저빔의 굴절각의 변화를 용이하게 측정하기 위해 원자셀 벽에 굴절률이 1.5 인 프리즘을 장착하고 원자빔을 전반사의 임계각보다 조금 작은 각도로 입사하여 투과광의 굴절각을 측정하였다. (중략)

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