• Korean Journal of Soil Science and Fertilizer
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• v.36 no.5
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• pp.263-271
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• 2003

Effects of the existence of $CO_2$ gas and pH on the silica surface characteristics at silica/Pb(II) and sodium dodecyl sulfonate (SDS, $C_{12}H_{25}SO_3Na$) solution interface were studied. The hydrophobic characteristics of silica surface was delineated by contact angle measurement and surface force measurement using atomic force microscopy (AFM). In $CO_2$ free condition provided by purging $N_2$ gas, the contact angle of fused silica surface in $10^{-4}M$ Pb(II) and SDS solution increased greatly up to $90^{\circ}$ compared with $40^{\circ}$ in atmospheric condition. It was due to the precipitation of $PbCO_3$ in atmospheric condition. In $CO_2$ free condition the change of contact angle and adhesion force ($F_{ad}$) in AFM, affected by pH change, was similar to the distribution of $PbOH^+$ ion in speciation diagram corresponding to $10^{-4}M$ total Pb(II). Therefore, it was convinced that the $PbOH^+$ ion among Pb(II) species would be the main adsorbing type on silica surface. Both of contact angle measurement and surface force measurement using AFM showed that the Pb only treatment made the silica surface hydrophobic. However, it could not be explained theoretically by current knowledge, and required further study in atomic level to solve the problem.

• Journal of the Korean Vacuum Society
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• v.7 no.4
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• pp.320-327
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• 1998

The chemical aspects of nitridated surface of sapphire(0001) have been studied by X-ray photoelectron spectroscopy. Nitridated layer was formed by remote plasma enhanced-ultrahigh vacuum deposition at a low temperature range. It was confirmed that this nitridated surface was mainly consists of AIN layer. The relative amounts of nitrogen reacted with AL on the sapphire surface and their surface morphology were investigated with X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) as a function of radio-frequency power, reaction temperature, and reaction time. The amounts of atomic nitrogen activated by plasma which was subsequently incorporated into sapphire were increased with RF power. But the amounts of nitrogen reacted with AI in sapphire was initially increased and then remained constant. However, the relative amounts of AIN were nearly constant with irrespective of nitridation temperature and time. Furthermore, a depth porfile of nitridated layer with XPS showed that the nitridated surface consisted of three layers with different stoichiometry.

• Journal of the Korean Vacuum Society
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• v.15 no.2
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• pp.194-200
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• 2006

Self-assembled InAs/InAl(Ga)As quantum dots (QDs) were grown on InP substrates by a molecular-beam epiaxy, and their structural and optical properties were investigated by atomic force microscopy (AFM), transmission electron microscopy (TEM), and room-temperature photoluminescence (PL). AFM images indicated that the InAs quantum structures showed various shapes such as quantum dashes, asymmetric and symmetric QDs mainly caused by the initial surface conditions of InAl(Ga)As with the intrinsic phase separation. For the buried InAs QDs in an InAlGaAs matrix, the average lateral size and height of QDs were 23 and 2 nm, respectively. By changing the growth conditions for the QD samples, the emission wavelength of $1.55{\mu}m$ was obtained, which is one of the wavelength windows for fiber optic communications.

• Journal of Advanced Marine Engineering and Technology
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• v.37 no.1
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• pp.72-77
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• 2013

The effect of sputtering condition on the structural properties of ZnO thin films grown by RF magnetron sputtering system was investigated for TFT driver circuit. ZnO thin films were grown with ZnO target varying RF power and working pressure. Structural properties were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM). The ZnO thin films have sufficient crystallinity on the 100W RF power. But, the surface roughness of ZnO films was increased as increased RF power. As increased working pressure from 5 mTorr to 15 mTorr, a full width at half maximum (FWHM) of ZnO (002) peak was increased.

• Journal of the Korean Vacuum Society
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• v.7 no.2
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• pp.112-117
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• 1998

TiN has been investigated as a good candidate for a diffusion barrier of Cu. Therefore, in this study, the grain boundary diffusion of Cu in TiN film was investigated by X-ray photoelectron spectroscopy(XPS). In general, TiN has a columnar grain structure. In the relatively lower temperature, less than 1/3 of the melting point, it was observed that Cu diffused into TiN mainly along the grain boundaries of TiN. The grain size of TiN was measured by atomic force microscope (AFM). In order to estimate the grain boundary diffusion constants, we used the modified surface accumulation method. The activation energy, $Q_b$ was 0.23 eV, and the diffusivity, $D_{bo}$ was $5.5\times10^{-12{\textrm{cm}^2$/sec.

• Textile Coloration and Finishing
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• v.16 no.5
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• pp.28-34
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• 2004

The polarizing film application exploits the unique physicochemical properties between PVA(Poly vinyl alcohol) film and CTA(Cellulose triacetate) film. However, hardly any research was aimed at improving the adhesion characteristics of the CTA film by radio frequency(RF) plasma treatment at argon(Ar) gaseous state. In this report, we deal with surface treatment technology for protective CTA film developed specifically for high adhesion applications. After Ar plasma, surface of the films is analyzed by atomic force microscopy(AFM), roughness parameter and peel strength. Furthermore, the wetting properties of the CTA film were studied by contact angle analysis. Results obtained for CTA films treated with a glow discharge showed that this technique is sensitive to newly created physical functions. The roughness and peel strength value increased with an increase in treatment time for initial treatment, but showed decreasing trend for continuous treatment time. The result of contact angle measurement refer that the hydrophilicity of surface was increased. AFM studies indicated that no considerable change of surface morphology occurred up to 3 minutes of treatment time, but a considerable uneven of surface structure resulted from treating time after 5 minutes.

• Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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• 2006.06a
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• pp.51-59
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• 2006

The surface of various mechanical pulp fibres including thermomechanical pulp (TMP), chemithermomechanical pulp (CTMP), and alkaline peroxide mechanical pulp (APMP) fibres, were characterized using SEM, AFM, and XPS. With SEM and AFM, middle lamella material was observed to be non-fibrillar, patch-like, while fibre secondary wall was observed to have a microfibrillar structure. It was found that after the first-stage refiner, lignin-rich middle lamella remainders are present on the fibre surface of all three pulps, although most of the fibre surfaces expose microfibrillar structure. After the final-stage refining, large amounts of granules are present on the TMP fibre surface. In contrast, most middle lamella remainders remain on the surface of CTMP fibres after final stage refining and even after peroxide bleaching. XPS results have confirmed that the non-fibrillar surface material is the lignin-rich middle lamella remainder., and the remainders of middle lamella contribute to the high surface lignin concentration.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.344-345
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• 2015

Various concentration of copper was dopped in Fe-35%Ni thin sheet by electroforming and their electromagnetic, surface properties were determined. Microstructure observation by scanning electron microscopy revealed that the thin sheet had columnar grains with about 150 nm long. Phase analysis by X-ray diffractometry revealed that the alloy thin sheets were fine crystalline. The average surface roughnesses measured by atomic force microscopy (AFM) were about 14.38 nm. Nano hardnesses determined by tribo-nano indenter were 4.13 GPa. The surface resistances were 2.28 ohm/sq. The maximum magnetization, residual magnetization and coercive force depended on the copper concentration.

• Bulletin of the Korean Chemical Society
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• v.29 no.8
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• pp.1451-1458
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• 2008

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.602-604
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• 2004

NPB surface morphologies deposited on different temperature substrates were investigated using atomic force microscopy(AFM). It has been found that the NPB morphology turned from island morphology at high temperature(100$^{\circ}C$) to grain morphology at room temperature. To characterize the effect of NPB surface morphology, the devices with the structure of Glass/ITO/NPB/$Alq_3$/Al were fabricated using NPB films deposited at different substrate temperature and their performances were compared.