• Title/Summary/Keyword: Annealing time

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Preparation and Characterization of Poly(vinyl alcohol)/Poly(acrylic acid) Hydrogel by Radiation (방사선을 이용하여 제조한 poly(vinyl alcohol)/poly(acrylic acid) 하이드로젤의 제조 및 특성)

  • Park, Jong-Seok;Kim, Hyun-A;Choi, Jong-Bae;Gwon, Hui-Jeong;Lim, Youn-Mook;Nho, Young-Chang
    • Journal of Radiation Industry
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    • v.5 no.4
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    • pp.377-382
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    • 2011
  • Poly(vinyl alcohol) (PVA) is an interesting material with good biocompatibility, high elasticity and hydrophilic chacrateristics. In this study, crosslinked hydrogels based on PVA, and poly(acrylic acid) (PAAc) were prepared by gamma-ray irradiation. PVA and PAAc powders were dissolved in deionized water, and then irradiated by a gamma-ray with a radiation dose of 50 kGy to make hydrogels. The hydrogels were then annealed in an oven at $120^{\circ}C$ for 10 min, 30 min and 50 min under nitrogen atmosphere. The properties of a hydrogel such as gel fraction, swelling behavior, thermogravimetric analysis (TGA) and adhesive strength as a function of PAAc content and annealing time were investigated. The gel fraction decreases with decreasing PAAc content and increasing annealing time. The thermal behaviors have shown different patterns according to the annealing time. The adhesive strength increases with increasing PAAc content.

Effects of the Convector Plate Shape and the Atmospheric Gas on Characteristics of Heat Transfer in a Batch Annealing Furnace (BAF에서 분위기 가스와 대류판 형태가 열전달 특성에 미치는 영향)

  • Yoon, Soon Hyun;Kim, Moon Kyung;Kim, Dae Seong
    • Journal of the Korean Society for Precision Engineering
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    • v.13 no.8
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    • pp.72-79
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    • 1996
  • In a BAF(Batch Annealing Furnace), various studies have been pursued in order to reduce energy consumption rate to improve productivity and to stabilize the properties of products. The purpose of this study was to investigate the effects of both the atmospheric gas and convector plate shapes on the augmentation of heat transfer. The use of hydrogen instead of nitrogen as an atmospheric gas, combined with high convection in the BAF, has shown that considerable increases in furnace out put and significantly improved material quality are attainable. Because convector plate shapes make the atmosheric gas easily flow density, high diffusivity and reducing character of hydrogen, a better heat transfer rates resulting in uniform material temperature distribution and improved coil surface quality can be achieved. Also, it was found that the closed convector plate took more time for the annealing cycle time than the other plate type(open-type)by about ten hours.

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Ant Colony Optimization Approach to the Utility Maintenance Model for Connected-(r, s)-out of-(m, n) : F System ((m, n)중 연속(r, s) : F 시스템의 정비모형에 대한 개미군집 최적화 해법)

  • Lee, Sang-Heon;Shin, Dong-Yeul
    • IE interfaces
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    • v.21 no.3
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    • pp.254-261
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    • 2008
  • Connected-(r,s)-out of-(m,n) : F system is an important topic in redundancy design of the complex system reliability and it's maintenance policy. Previous studies applied Monte Carlo simulation and genetic, simulated annealing algorithms to tackle the difficulty of maintenance policy problem. These algorithms suggested most suitable maintenance cycle to optimize maintenance pattern of connected-(r,s)-out of-(m,n) : F system. However, genetic algorithm is required long execution time relatively and simulated annealing has improved computational time but rather poor solutions. In this paper, we propose the ant colony optimization approach for connected-(r,s)-out of-(m,n) : F system that determines maintenance cycle and minimum unit cost. Computational results prove that ant colony optimization algorithm is superior to genetic algorithm, simulated annealing and tabu search in both execution time and quality of solution.

Thermal Properties and Crystallization Behaviors of Poly(ethylene terephthalate) at Various Annealing Conditions (열처리 조건에 따른 폴리(에틸렌 테레프탈레이트)의 열적 특성 및 결정화 거동)

  • 류민영;배유리
    • Polymer(Korea)
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    • v.27 no.2
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    • pp.113-119
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    • 2003
  • The thermal properties and crystallization behaviors of poly(ethylene terephthalate) (PET) were investigated by controlling the annealing conditions of PET sample, such as relative humidity, temperature, and time. The variations of moisture content, glass transition temperature ($T_g$) and cold crystallization temperature ($T_{\propto}$) were examined after annealing the PET sample. Subsequently crystallization process was performed with the annealed PET specimen, and then the degree of crystallinity and heat distortion temperature (HDT) of variously crystallized PET specimen were examined. Residual stress relaxation in the injection molded PET sample after annealing was also observed through polarized films. Moisture content in the PET specimen increased up to 6000 ppm with increasing the relative humidity, temperature, and time of annealing. $T_g$ and $T_{\propto}$ of the annealed PET specimen decreased with increasing moisture content. The degree of crystallinity increased as increasing moisture content in the PET specimen. However for same moisture content, the degree of crystallinity varied with annealing conditions. The relaxations of residual stress in the PET sample differed from annealing conditions, and the maximum degree of crystallinity increased with decreasing residual stress in the PET sample.

Annealing of Electrodeposited Cu(In,Ga)Se2 Thin Films Under Se Gas Atmosphere (전해증착 Cu(In,Ga)Se2 박막의 Se가스 분위기 열처리)

  • Shin, Su-Jung;Kim, Myung-Han
    • Korean Journal of Materials Research
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    • v.21 no.8
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    • pp.461-467
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    • 2011
  • Cu(In, Ga)$Se_2$ (CIGS) precursor films were electrodeposited on Mo/glass substrates in acidic solutions containing $Cu^{2+}$, $In^{3+}$, $Ga^{3+}$, and $Se^{4+}$ ions at -0.6 V (SCE) and pH. 1.8. In order to induce recrystallization, the electrodeposited $Cu_{1.00}In_{0.81}Ga_{0.09}Se_{2.08}$ (25.0 at.% Cu + 20.2 at.% In + 2.2 at.% Ga + 52.0 at.% Se) precursor films were annealed under a high Se gas atmosphere for 15, 30, 45, and 60 min, respectively, at $500^{\circ}C$. The Se amount in the film increased from 52 at.% to 62 at.%, whereas the In amount in the film decreased from 20.8 at.% to 9.1 at.% as the annealing time increased from 0 (asdeposited state) to 60 min. These results were attributed to the Se introduced from the furnace atmosphere and reacted with the In present in the precursor films, resulting in the formation of the volatile $In_2Se$. CIGS precursor grains with a cauliflower shape grew as larger grains with the $CuSe_2$ and/or $Cu_{2-x}Se$ faceted phases as the annealing times increased. These faceted phases resulted in rough surface morphologies of the CIGS films. Furthermore, the CIGS layers were not dense because the empty spaces between the grains were not removed via annealing. Uniform thicknesses of the $MoSe_2$ layers occurred at the 45 and 60 min annealing time. This implies that there was a stable reaction between the Mo back electrode and the Se diffused through the CIGS film. The results obtained in the present research were sufficiently different from comparable studies where the recrystallization annealing was performed under an atmosphere of Ar gas only or a low Se gas pressure.

Improvement of Resonant Characteristics due to the Thermal Annealing Effect in Multi-layer Thin-film SMR Devices (Thermal Annealing 효과에 의한 다층 박막 FBAR 소자의 공진 특성 개선)

  • ;;Mai Linh
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2003.10a
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    • pp.633-636
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    • 2003
  • In this work, We, for the first time, present the effects of the thermal annealing of the W/SiO$_2$ multi-layer quarter wavelength reflectors on the resonant properties of the ZnO-based SMR devices. In order to improve the resonant properties of the SMR devices, we annealed thermally the reflectors formed on a silicon substrate using a RF magnetron sputtering technique. As a result, the resonant properties of the SMR devices were observed to strongly depend on the annealing conditions applied to the reflectors. The SMR devices with the reflectors annealed at 40$0^{\circ}C$/30min showed excellent resonance properties as compared to those with the reflectors non-annealed (as-deposited). The newly proposed simple thermal annealing process will be very useful to more effectively improve the resonant properties of the future SMR devices with W/SiO$_2$ multi-layer quarter wavelength reflectors.

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Annealing Effects on Ultra thin MOS Capacitors

  • Ng, Alvin Chi-hai;Xu, Jun;Xu, J.B.;Cheung, W.Y.
    • Electrical & Electronic Materials
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    • v.16 no.9
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    • pp.62.1-62
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    • 2003
  • Silicon oxide with thickness lee than 9 nm is fabricated by tube furnace oxidation. Nitrogen is added to dilute the oxidation rate. Aluminum dots with radius of 0.05 cm are deposited on the oixde. High frequency capacitance-voltage(HF C-V), conductance-voltage(G-V) and current-voltage(I-V) characteristics are measured. Annealing under nitrogen atmosphere is carried out with different time and at different temperature. Densities of the interface states before and after annealing are compared. After annealing, a decrease in density of the interface states is found. Experiments show that 45$0^{\circ}C$ annealing for 30 minutes has the lowest density of the interface states.

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Optimization of Aerospace Structures using Resealed Simulated Annealing (Rescaled Simulated Annealing에 의한 항공우주 구조물의 최적설계)

  • Ji, Sang-Hyun;Park, Jung-Sun
    • Proceedings of the KSME Conference
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    • 2004.11a
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    • pp.522-527
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    • 2004
  • Resealed Simulated Annealing (RSA) has been devised for improving the disadvantage of Simulated Annealing (SA) which require tremendous amount of computation time. RSA and SA have been for optimization of satellite structures and for comparison of results from two algorithms. As a practical application, a satellite structure is optimized by the two algorithms. Weights of satellite upper platform and propulsion module are minimized. MSC/NASTRAN is used for the static and dynamic analysis. The optimization results of the RSA are compared with results of the classical SA. The numbers of optimization iterations could be effectively reduced by the RSA.

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The characteristics of D.C. switching threshold voltage for amorphous $As_{10}Ge_{15}Te_{75}$ thin film (비정질 $As_{10}Ge_{15}Te_{75}$박막의 D.C. 스위칭 임계전압 특성)

  • 이병석;이현용;이영종;정홍배
    • Electrical & Electronic Materials
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    • v.9 no.8
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    • pp.813-818
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    • 1996
  • Amorphous As$_{10}$Ge$_{15}$ Te$_{75}$ device shows the memory switching characteristics under d.c. bias. In bulk material, a-As$_{10}$Ge$_{15}$ Te$_{75}$ switching threshold voltage (V$_{th}$) is very high (above 100 volts), but in the case of thin film, V$_{th}$ decreases to a few or ten a few volts. The characteristics of V$_{th}$ depends on the physical dimensions such as the thickness of thin film and the separation between d.c. electrodes, and the annealing conditions. The switching threshold voltage decreases exponentially with increasing annealing temperature and annealing time, but increases linearly with the thickness of thin film and exponentially with increasing the separation between d.c. electrodes. The desirable low switching threshold voltage, therefore, can be obtained by the stabilization through annealing and changing physical dimensions.imensions.sions.

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Temperature-dependent Morphology of Self-assembled InAs Quantum Dots Grown on Si Substrates (Si 기판 위에 형성된 InAs 양자점의 열처리에 의한 표면 상태의 변화)

  • Yoo, Choong-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.10
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    • pp.864-868
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    • 2007
  • Effect of high-temperature annealing on morphology of fully coherent self-assembled InAs quantum dots' grown on Si (100) substrates at $450^{\circ}C$ by atmospheric pressure metalorganic chemical vapor deposition(APMOCVD) was investigated by atomic force microscopy(AFM). When the dots were annealed at 500 - 600$^{\circ}C$ for 15 sec - 60 min, there was no appreciable change in the dot density but the heights of the dots increased along with the reduction in the diameters. In segregation from the InAs quantum dots and/or from the 2-dimensional InAs wetting layer which was not transformed into quantum dots looked responsible for this change in the dot size. However the change rates remained almost same regardless of annealing time and temperature, which may indicate that the morphological change due to thermal annealing is done instantly when the dots are exposed to high temperature annealing.