• 제목/요약/키워드: Aluminum oxide (Al2O3)

검색결과 232건 처리시간 0.023초

반도체 가공 작업환경에서 부산물로 발생되는 주요 금속산화물의 입자 크기, 형상, 결정구조에 따른 독성 고찰 (Size, Shape, and Crystal Structure-dependent Toxicity of Major Metal Oxide Particles Generated as Byproducts in Semiconductor Fabrication Facility)

  • 최광민
    • 한국산업보건학회지
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    • 제26권2호
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    • pp.119-138
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    • 2016
  • Objectives: The purpose of this study is to review size, shape, and crystal structure-dependent toxicity of major metal oxide particles such as silicon dioxide, tungsten trioxide, aluminum oxide, and titanium dioxide as byproducts generated in semiconductor fabrication facility. Methods: To review the toxicity of major metal oxide particles, we used various reported research and review papers. The papers were searched by using websites such as Google Scholar and PubMed. Keyword search terms included '$SiO_2$(or $WO_3$ or $Al_2O_3$ or $TiO_2$) toxicity', 'health effects $SiO_2$(or $WO_3$ or $Al_2O_3$ or $TiO_2$). Additional papers were identified in references cited in the searched papers. Results: In various cell lines and organs of human and animals, cytotoxicity, genotoxicity, hepatoxicity, fetotoxicity, neurotoxicity, and histopathological changes were induced by silicon dioxide, tungsten trioxide, aluminium oxide, and titanium dioxide particles. Differences in toxicity were dependent on the cell lines, organs, doses, as well as the chemical composition, size, surface area, shape, and crystal structure of the particles. However, the doses used in the reported papers were higher than the possible exposure level in general work environment. Oxidative stress induced by the metal oxide particles plays a significant role in the expression of toxicity. Conclusions: The results cannot guarantee human toxicity of the metal oxide particles, because there is still a lack of available information about health effects on humans. In addition, toxicological studies under the exposure conditions in the actual work environment are needed.

졸-겔법에 의한 $Al_2O_3$.$2SiO_2$ 유리의 제조 (Preparation of $Al_2O_3$.$2SiO_2$ glass by the sol-gel process)

  • 이준;지응업;조동수
    • 한국세라믹학회지
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    • 제20권1호
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    • pp.3-12
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    • 1983
  • In the present study an attempt was made to synthesize the $Al_2O_3$.$2SiO_2$ glass in which atomic ratio is Al:Si=1:1 by sol-gel process. And at such a low temperature as 55$0^{\circ}C$ clear amorphous gel derived glass with Si-O-Al bonding was obtained. $Si(OC_2H_5)_4$ and $Al(NO_3)_3$.$9H_2O$ were used as the precursor and among the mutual solvents only n-butanol gave good results for the synthesis of the gel derived glass. Partial hydrolysis of TEOS with one-fold mol of $H_2O$ prior to the reaction with aluminum nitrate gave the better results., Total oxide content to the total reactants by weight was affective to the results.

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DUV와 열의 하이브리드 저온 용액공정에 의해 형성된 Al2O3 게이트 절연막 연구 (Study of Low Temperature Solution-Processed Al2O3 Gate Insulator by DUV and Thermal Hybrid Treatment)

  • 장현규;김원근;오민석;권순형
    • 한국전기전자재료학회논문지
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    • 제33권4호
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    • pp.286-290
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    • 2020
  • The formation of inorganic thin films in low-temperature solution processes is necessary for a wide range of commercial applications of organic electronic devices. Aluminum oxide thin films can be utilized as barrier films that prevent the deterioration of an electronic device due to moisture and oxygen in the air. In addition, they can be used as the gate insulating layers of a thin film transistor. In this study, aluminum oxide thin film were formed using two methods simultaneously, a thermal process and the DUV process, and the properties of the thin films were compared. The result of converting aluminum nitrate hydrate to aluminum oxide through a hybrid process using a thermal treatment and DUV was confirmed by XPS measurements. A film-based a-IGZO TFT was fabricated using the formed inorganic thin film as a gate insulating film to confirm its properties.

P123-Templated Co3O4/Al2O3 Mesoporous Mixed Oxides for Epoxidation of Styrene

  • Jung, Mie-Won;Kim, Young-Sil
    • 한국재료학회지
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    • 제22권6호
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    • pp.316-320
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    • 2012
  • $Co_3O_4$, $Al_2O_3$ and $Co_3O_4$/$Al_2O_3$ mesoporous powders were prepared by a sol-gel method with starting matierals of aluminum isopropoxide and cobalt (II) nitrate. A P123 template is employed as an active organic additive for improving the specific surface area of the mixed oxide by forming surfactant micelles. A transition metal cobalt oxide supported on alumina with and without P123 was tested to find the most active and selective conditions as a heterogeneous catalyst in the reaction of styrene epoxidation. A bBlock copolymer-P123 template was added to the staring materials to control physical and chemical properties. The properties of $Co_3O_4$/$Al_2O_3$ powder with and without P123 were characterized using an X-ray diffractometer (XRD), a Field-Emission Scanning Electron Microscope (FE-SEM), a Bruner-Emmertt-Teller (BET) surface analyzer, and $^{27}Al$ MAS NMR spectroscopy. Powders with and without P123 were compared in catalytic tests. The catalytic activity and selectivity were monitored by GC/MS, $^1H$, and $^{13}C$-NMR spectroscopy. The performance for the reaction of epoxidation of styrene was observed to be in the following order: [$Co_3O_4$/$Al_2O_3$ with P123-1173 K > $Co_3O_4$/$Al_2O_3$ with P123-973 K > $Co_3O_4$-973 K>$Co_3O_4$/$Al_2O_3$-973 K > $Co_3O_4$/$Al_2O_3$ with P123-1473 K > $Al_2O_3$-973 K]. The existence of ${\gamma}$-alumina and the nature of the surface morphology are related to catalytic activity.

알루미늄 기반 Oxide/Metal/Oxide 구조의 투명전극 적용성 기초 연구 (Aluminum Based Oxide/Metal/Oxide Structures for the Application in Transparent Electrodes)

  • 김대균;최두호
    • 한국전기전자재료학회논문지
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    • 제31권7호
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    • pp.481-485
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    • 2018
  • In this study, oxide/metal/oxide-type transparent electrodes based on Al and ZnO were investigated. Thin films of these materials were sputter-deposited at room temperature. To evaluate the thickness dependence of the oxide layers, the top and bottom ZnO layers were varied in the range of 5~80 nm and 2.5~20 nm, respectively. When the thicknesses of the top and bottom ZnO layers were fixed at 30 nm and 2.5 nm, a maximum transmitance of 66% and sheet resistance of $16.5{\Omega}/{\square}$ were achieved, which is significantly improved compared with the Al layer without top and bottom ZnO layers showing a maximum transmitance of 44.3% and sheet resistance of $44{\Omega}/{\square}$.

Experimental Investigation of Mechanical and Tribological Characteristics of Al 2024 Matrix Composite Reinforced by Yttrium Oxide Particles

  • Hamada, Mohanad Lateef;Alwan, Ghazwan Saud;Annaz, Abdulkader Ahmed;Irhayyim, Saif Sabah;Hammood, Hashim Shukur
    • 한국재료학회지
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    • 제31권6호
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    • pp.339-344
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    • 2021
  • Composite materials offer distinct and unique properties that are not naturally inherited in the individual materials that make them. One of the most attractive composites to manufacture is the aluminum alloy matrix composite, because it usually combines easiness of availability, light weight, strength, and other favorable properties. In the current work, Powder Metallurgy Method (PMM) is used to prepare Al2024 matrix composites reinforced with different mixing ratios of yttrium oxide (Y2O3) particles. The tests performed on the composites include physical, mechanical, and tribological, as well as microstructure analysis via optical microscope. The results show that the experimental density slightly decreases while the porosity increases when the reinforcement ratio increases within the selected range of 0 ~ 20 wt%. Besides this, the yield strength, tensile strength, and Vickers hardness increase up to a 10 wt% Y2O3 ratio, after which they decline. Moreover, the wear results show that the composite follows the same paradigm for strength and hardness. It is concluded that this composite is ideal for application when higher strength is required from aluminum composites, as well as lighter weight up to certain values of Y2O3 ratio.

$CF_4$ 플라즈마에서 반응성 이온식각한 알루미늄 박막의 표면분석 (Surface analysis of reactively ion-etched aluminum films in $CF_4$ plasma)

  • 김동원;이원종
    • 한국결정성장학회지
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    • 제5권4호
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    • pp.351-357
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    • 1995
  • $CF_4$ 플라즈마 분위기에서 반응성 이온식각된 알루미늄의 표면을 XPS 분석하였다. 알루미늄의 표면에$AlF_3$가 형성되었으며 표면에서의 깊이가 깊어질수록 Al - F 결합에 의한 $Al_{2p}$ peak 강도가 감소하고 금속 알루미늄 결합에 의한 $Al_{2p}$ peak 강도가 증가하였다. 입자의 충돌에 의해서 표면원자들이 mixing 됨으로써 알루미늄의 표면에 50~100 $\AA$ 정도의 두께를 가진 $AlF_x$ 층이 형성되는 것으로 분석되었다. 같은 조건에서 반응성 이온식각된 알루미늄 산화막의 경우에는 mixing 효과가 알루미늄보다 작으므로 상대적으로 얕은 범위(10~20 $\AA$)에서 F가 O를 치환하여 $AlF_x$층이 형성되었다.

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Electrical Behavior of Aluminum Nitride Ceramics Sintered with Yttrium Oxide and Titanium Oxide

  • Lee, Jin-Wook;Lee, Won-Jin;Lee, Sung-Min
    • 한국세라믹학회지
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    • 제53권6호
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    • pp.635-640
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    • 2016
  • Electrical behavior of AlN ceramics sintered with $Y_2O_3$ as a sintering aid has been investigated with respect to additional $TiO_2$ dopant. From the impedance spectroscopy, it was found that the grain and grain boundary conductivities have greatly decreased with addition of $TiO_2$ dopant. The $TiO_2$ dopant also increased the activation energy of the grain conductivity by about 0.37 eV; this increase was attributed to the formation of an associate between Al vacancies and Ti ions at the Al sites. Similarly, the electronic conductivity was reduced by $TiO_2$ addition. However, $TiO_2$ solubility in AlN grains was below the detection limit of typical EDX analysis. Grain boundary was clean, without liquid films, but did show yttrium segregation. The transference number of ions was close to 1, showing that AlN is a predominantly ionic conductor. Based on the observed results, the implications of using AlN applications as insulators have been discussed.

고분자 전해질 연료전지 금속 분리판용 금속의 염화물 농도에 따른 전기화학적 특성 연구 (Investigation on Electrochemical Characteristics of Metallic Bipolar Plates with Chloride Concentrations for PEMFC)

  • 신동호;김성종
    • Corrosion Science and Technology
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    • 제20권6호
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    • pp.347-360
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    • 2021
  • Currently, the demand for eco-friendly energy sources is high, which has prompted research on polymer electrolyte membrane fuel cells. Both aluminum alloys and nickel alloys, which are commonly considered as materials of bipolar plates in fuel cells, oxide layers formed on the metal surface have excellent corrosion resistance. In this research, the electrochemical characteristics of 6061-T6 aluminum alloy and Inconel 600 were investigated with chloride concentrations in an acid environment that simulated the cathode condition of the PEMFC. After potentiodynamic polarization experiments, Tafel analysis and surface analysis were performed. Inconel 600 presented remarkably good corrosion resistance under all test conditions. The corrosion current density of 6061-T6 aluminum alloy was significantly higher than that of Inconel 600 under all test conditions. Also, 6061-T6 aluminum alloy and Inconel 600 presented uniform corrosion and intergranular corrosion, respectively. The Ni, Cr, and Fe, which are the main chemical compositions of Inconel 600, are higher than Al in the electromotive force series. And a double oxide film of NiO-Cr2O3, which is more stable than Al2O3, is formed. Thus, the corrosion resistance of Inconel 600 is better.

알루미늄 옥사이드 절연층의 증착율이 유기박막 트랜지스터의 특성에 미치는 영향 (Effects of Various Deposition Rates of Al2O3 Gate Insulator on the Properties of Organic Thin Film Transistor)

  • 최경민;형건우;김영관;조의식;권상직
    • 한국전기전자재료학회논문지
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    • 제22권12호
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    • pp.1063-1066
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    • 2009
  • In this study, we fabricated pentacene organic thin film trasistors(OTFTs) which used aluminum oxide as the gate insulator. Aluminum oxide for OTFTs was deposited on glass substrate with a different deposition rate by E-beam evaporation. In case of the deposition rate of $0.1\;{\AA}$, the fabricated aluminum oxide gate insulating OTFT showed a threshold voltage of -1.36 V, an on/off current ratio of $1.9{\times}10^3$ and field effect mobility $0.023\;cm^2/V_s$.