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Effects of Various Deposition Rates of Al2O3 Gate Insulator on the Properties of Organic Thin Film Transistor

알루미늄 옥사이드 절연층의 증착율이 유기박막 트랜지스터의 특성에 미치는 영향

  • 최경민 (경원대학교 전자공학과) ;
  • 형건우 (홍익대학교 신소재공학과) ;
  • 김영관 (홍익대학교 정보디스플레이공학과) ;
  • 조의식 (경원대학교 전자공학과) ;
  • 권상직 (경원대학교 전자공학과)
  • Published : 2009.12.01

Abstract

In this study, we fabricated pentacene organic thin film trasistors(OTFTs) which used aluminum oxide as the gate insulator. Aluminum oxide for OTFTs was deposited on glass substrate with a different deposition rate by E-beam evaporation. In case of the deposition rate of $0.1\;{\AA}$, the fabricated aluminum oxide gate insulating OTFT showed a threshold voltage of -1.36 V, an on/off current ratio of $1.9{\times}10^3$ and field effect mobility $0.023\;cm^2/V_s$.

Keywords

References

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