• 제목/요약/키워드: Aluminum oxide (Al2O3)

검색결과 232건 처리시간 0.036초

Analysis of the Inhibition Layer of Galvanized Dual-Phase Steels

  • Wang, K.K.;Wang, H.-P.;Chang, L.;Gan, D.;Chen, T.-R.;Chen, H.-B.
    • Corrosion Science and Technology
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    • 제11권1호
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    • pp.9-14
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    • 2012
  • The formation of the Fe-Al inhibition layer in hot-dip galvanizing is a confusing issue for a long time. This study presents a characterization result on the inhibition layer formed on C-Mn-Cr and C-Mn-Si dual-phase steels after a short time galvanizing. The samples were annealed at $800^{\circ}C$ for 60 s in $N_{2}$-10% $H_{2}$ atmosphere with a dew point of $-30^{\circ}C$, and were then galvanized in a bath containing 0.2 %Al. X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM) was employed for characterization. The TEM electron diffraction shows that only $Fe_{2}Al_{5}$ intermetallic phase was formed. No orientation relationship between the $Fe_{2}Al_{5}$ phase and the steel substrate could be identified. Two peaks of Al 2p photoelectrons, one from metallic aluminum and the other from $Al^{3+}$ ions, were detected in the inhibition layer, indicating that the layer is in fact a mixture of $Fe_{2}Al_{5}$ and $Al_{2}O_{3}$. TEM/EDS analysis verifies the existence of $Al_{2}O_{3}$ in the boundaries of $Fe_{2}Al_{5}$ grains. The nucleation of $Fe_{2}Al_{5}$ and the reduction of the surface oxide probably proceeded concurrently on galvanizing, and the residual oxides prohibited the heteroepitaxial growth of $Fe_{2}Al_{5}$.

펄스 YAG 레이저 용접시 유기하는 플라즈마의 스펙트럼선 동정과 발광특성 (Spectral Line Identification and Emission Characteristics of the Laser-Induced Plasma in Pulsed Nd:YAG Laser Welding)

  • 김종도
    • Journal of Advanced Marine Engineering and Technology
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    • 제23권3호
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    • pp.360-368
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    • 1999
  • The paper describes spectroscopic characteristics of plasma induced in the pulsed YAG laser welding of alloys containing a large amount of volatile elements. The authors have conducted the spectroscopic analyses of laser induced Al-Mg alloys plasma in the air and argon atmosphere. In the air environment the identified spectra were atomic lines of Al, Mg, Cr, Mn, Cu, Fe and Zn and singly ionized Mg lines as well as the intense molecular spectra of ALO and MgO formed by chemi-cal reactions of evaporated Al and Mg atoms from the pool surface with oxygen in the air. In argon atmosphere MgO and AlO spectra vanished but AlH spectrum was detected. the hydrogen source was presumable hydrogen dissolved in the base metals water absorbed on the surface oxide layer or $H_2$ and $H_2O$ in the shielding gas. The resonant lines of Al and Mg were strongly self-absorbed in particular self-absorption of the Mg line was predominant. These results show that the laser induced plasma was made of metallic vapor with relatively low temperature and high density.

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기계적합금화에 의한 $Fe/Al_2O_3$$Fe/TiO_2$계 나노복합분말의 제조 (Synthesis of $Fe/Al_2O_3$ and $Fe/TiO_2$ nanocomposite powder by mechanical alloying)

  • 이성희;이충효
    • 한국결정성장학회지
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    • 제19권4호
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    • pp.202-207
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    • 2009
  • 본 연구에서는 $Fe/Al_2O_3$$Fe/TiO_2$계 나노복합분말을 제조하기 위하여 실온 기계적 합금화법(MA)을 적용하였다. $Fe_3O_4-M$(M= AI, Ti)이고 여기서 순금속 Al 및 Ti은 고상반응 시 환원제로서 선택하였다. $Fe_3O_4$-순금속의 각각 25시간 및 75시간 MA 처리한 결과 $Fe/Al_2O_3$$Fe/TiO_2$ 나노복합분발이 얻어졌으며, 이것은 나노결정립의 ${\alpha}$-Fe 기지에 $Al_2O_3$$TiO_2$가 각각 미세하게 분산된 나노복합분말임을 알 수 있었다. 또한 Fe$_3$O$_4$-AI계에서 보다 짧은 반응 시간에 복합분말이 생성되는 것은 $Fe_3O_4$의 Al에 의한 환원반응 시 큰 반응열에 기인하는 것으로 사료된다. MA법으로 제조된 $Fe/TiO_2$ 복합분말의 X선 회절분석으로부터 ${\alpha}$-Fe 결정립 크기는 30 nm 임을 알 수 있었다. 또한 MA 과정 중 시료의 자기 측정으로부터 $Fe_3O_4$의 순금속 Al 및 Ti 에 의한 고상환원반응 과정을 자세히 관찰할 수 있었다.

NdFeB 영구자석에의 Al/Al2O3 다층막 코팅 및 부식 특성 (Preparation of Al/Al2O3 Multilayer Coatings on NdFeB Permanent Magnet and their Corrosion Characteristics)

  • 정재인;양지훈
    • 한국표면공학회지
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    • 제42권2호
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    • pp.86-94
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    • 2009
  • Various types of multilayer coatings including Al/$Al_2O_3$ structure have been prepared on Nd-Fe-B permanent magnet to modify the morphology of the coating and to enhance the corrosion resistance of the magnet. Magnetron sputtering has been employed to make the multilayer coatings. $Al_2O_3$sputtering conditions were optimized in reactive sputtering by varying the deposition parameters. The formation of $Al_2O_3$ film was confirmed from the binding energy shift measured by electron spectroscopy for chemical analysis. 3 types of coating structures were designed and prepared by magnetron sputtering. The coating structures consist of (1) single Al coating, (2) modified coatings having oxide or plasma treated layer in the middle of coating structure, and (3) Al/$Al_2O_3$ multilayer coatings. Surface and cross-sectional morphologies showed that Al/$Al_2O_3$ multilayer grew as a layered structure, and that very compact Zone 3 like structure were formed. X-ray diffraction peak showed that the crystal orientations of multilayer coatings were similar to that of the bulk powder pattern. Hardness increased drastically when the Al thickness was around 1im in the Al/$Al_2O_3$ multilayer. From the salt spray test and pressure cooker test, it has been shown that the multilayer coatings showed good corrosion resistance compared to Al single or modified layer coatings.

Influence of nano alumina coating on the flexural bond strength between zirconia and resin cement

  • Akay, Canan;Tanis, Merve Cakirbay;Mumcu, Emre;Kilicarslan, Mehmet Ali;Sen, Murat
    • The Journal of Advanced Prosthodontics
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    • 제10권1호
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    • pp.43-49
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    • 2018
  • PURPOSE. The purpose of this in vitro study is to examine the effects of a nano-structured alumina coating on the adhesion between resin cements and zirconia ceramics using a four-point bending test. MATERIALS AND METHODS. 100 pairs of zirconium bar specimens were prepared with dimensions of $25mm{\times}2mm{\times}5mm$ and cementation surfaces of $5mm{\times}2mm$. The samples were divided into 5 groups of 20 pairs each. The groups are as follows: Group I (C) - Control with no surface modification, Group II (APA) - airborne-particle-abrasion with $110{\mu}m$ high-purity aluminum oxide ($Al_2O_3$) particles, Group III (ROC) - airborne-particle-abrasion with $110{\mu}m$ silica modified aluminum oxide ($Al_2O_3+SiO_2$) particles, Group IV (TCS) - tribochemical silica coated with $Al_2O_3$ particles, and Group V (AlC) - nano alumina coating. The surface modifications were assessed on two samples selected from each group by atomic force microscopy and scanning electron microscopy. The samples were cemented with two different self-adhesive resin cements. The bending bond strength was evaluated by mechanical testing. RESULTS. According to the ANOVA results, surface treatments, different cement types, and their interactions were statistically significant (P<.05). The highest flexural bond strengths were obtained in nano-structured alumina coated zirconia surfaces (50.4 MPa) and the lowest values were obtained in the control group (12.00 MPa), both of which were cemented using a self-adhesive resin cement. CONCLUSION. The surface modifications tested in the current study affected the surface roughness and flexural bond strength of zirconia. The nano alumina coating method significantly increased the flexural bond strength of zirconia ceramics.

황화 암모늄을 이용한 Al2O3/HfO2 다층 게이트 절연막 트랜지스터 전기적 및 계면적 특성 향상 연구 (Improvement of the carrier transport property and interfacial behavior in InGaAs quantum well Metal-Oxide-Semiconductor Field-Effect-Transistors with sulfur passivation)

  • 김준규;김대현
    • 센서학회지
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    • 제29권4호
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    • pp.266-269
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    • 2020
  • In this study, we investigated the effect of a sulfur passivation (S-passivation) process step on the electrical properties of surface-channel In0.7Ga0.3As quantum-well (QW) metal-oxide-semiconductor field-effect transistors (MOSFETs) with S/D regrowth contacts. We fabricated long-channel In0.7Ga0.3As QW MOSFETs with and without (NH4)2S treatment and then deposited 1/4 nm of Al2O3/HfO2 through atomic layer deposition. The devices with S-passivation exhibited lower values of subthreshold swing (74 mV/decade) and drain-induced barrier lowering (19 mV/V) than the devices without S-passivation. A conductance method was applied, and a low value of interface trap density Dit (2.83×1012 cm-2eV-1) was obtained for the devices with S-passivation. Based on these results, interface traps between InGaAs and high-κ are other defect sources that need to be considered in future studies to improve III-V microsensor sensing platforms.

항온항습 환경에 노출된 Al2O3 ALD 박막의 특성 평가 (Characteristics Evaluation of Al2O3 ALD Thin Film Exposed to Constant Temperature and Humidity Environment)

  • 김현우;송태민;이형준;전용민;권정현
    • 반도체디스플레이기술학회지
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    • 제21권2호
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    • pp.11-14
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    • 2022
  • In this work, we evaluated the Al2O3 film, which was deposited by atomic layer deposition, degraded by exposure to harsh environments. The Al2O3 films deposited by atomic layer deposition have long been used as a gas diffusion barrier that satisfies barrier requirements for device reliability. To investigate the barrier and mechanical performance of the Al2O3 film with increasing temperature and relative humidity, the properties of the degraded Al2O3 film exposed to the harsh environment were evaluated using electrical calcium test and tensile test. As a result, the water vapor transmission rate of Al2O3 films stored in harsh environments has fallen to a level that is difficult to utilize as a barrier film. Through water vapor transmission rate measurements, it can be seen that the water vapor transmission rate changes can be significant, and the environment-induced degradation is fatal to the Al2O3 thin films. In addition, the surface roughness and porosity of the degraded Al2O3 are significantly increased as the environment becomes severer. the degradation of elongation is caused by the stress concentration at valleys of rough surface and pores generated by the harsh environment. Becaused the harsh envronment-induced degradation convert amorphous Al2O3 to crystalline structure, these encapsulation properties of the Al2O3 film was easily degraded.

Selective Laser Sintering of Alumina Using an Inorganic Binder Monoclinic $HBO_2$ and Post-Processing

  • 이인섭
    • 한국분말재료학회지
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    • 제5권3호
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    • pp.199-209
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    • 1998
  • A new low melting inorganic binder, monoclinic $HBO_2$, has been developed for Selective Laser Sintering (SLS) of alumina powder by dehydration process of boron oxide powder in a vacuum oven at $120^{\circ}C$. It led to better green SLS parts and higher bend strength far green and fired parts compared to other inorganic binders such as aluminum and ammmonium phosphate. This appeared to be due to its low viscosity and better wettability of the alumina particle surface. A low density single phase ceramic, aluminum borate ($Al_{18}B_4O_{33}$), and multiphase ceramic composites, $A_{12}O_3-A_{14}B_2O_9$, were successfully developed by laser processing of alumina-monoclinic $HBO_2$ powder blends followed by post-thermal processing; both $Al_{18}B_4O_{33}$ and $A_{14}B_2O_9$ have whisker-like grains. The physical and mechanical properties of these SLS-processed ceramic parts were correlated to the materials and processing parameters. Further densification of the $A_{12}O_3-A_{14}B_2O_9$ ceramic composites was carried out by infiltration of colloidal silica, and chromic acid into these porous SLS parts followed by heat-treatment at high temperature ($1600^{\circ}C$). The densities obtained after infiltration and subsequent firing were between 75 and 80% of the theoretical densities. The bend strengths are between 15 and 33 MPa.

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Contrast Improvement of OLED Using Multi-layer of Metal and Metal Oxide

  • Hwang, Soo-Woong;Lee, Soo-Hwan;Choi, Jae-Youn;Yoon, Hyun-Soo;Kim, You-Hyun;Chae, Soo-Joh;Kim, Woo-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.530-532
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    • 2008
  • Inorganic metal multi-layer(IMML) consisting of Al/Al:SiO/Al was developed as a cathode for OLED to reduce the reflectance generated from ambient light. Device structure of green OLED was ITO/2-TNATA/$\alpha$-NPD/$Alq_3$:C545T/Balq/$Alq_3$/LiF/IMML and IMML was composed of three different layers: thin aluminum layer, aluminum layer doped with silicon monoxide and thick aluminum layer. Average reflectance of green OLED was 9.63% while that of conventional OLED with or without polarizer showed the average reflectance of 8.54% and 66% respectively at visible range from 380 nm to 780 nm.

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마이크로웨이브 magnetron sputtering법으로 제막된 ZnO:Al 박막의 전기광학적 특성 (Electrical and optical properties of ZnO:Al thin films prepared by microwave magnetron sputtering)

  • 유병석;오근호
    • 한국결정성장학회지
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    • 제8권4호
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    • pp.587-591
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    • 1998
  • 마이크로 웨이브를 보조 여기원으로 사용한 직류 magnetron 스퍼터링법으로 Aluminum이 2wt% 포함되어 있는 Zn:Al 합금타겟을 사용하여 AZO(Aluminum doped zinc oxide) 투명 전도막을 제막하였고 그 영향을 조사하였다. 타겟인가 전압이 420V에서 증착된 막의 투과율, 비저항 그리고 증착속도는 각각 50~70%, $5.5{\times}10^{-3}{\Omega}$cm 그리고 6,000$\AA\textrm{mm}^2$/J 이었다. 이 막을 40$0^{\circ}C$에서 30분간의 열처리하면 광투과율은 80% 이상으로 열처리전에 비해 향상되었으며 전도도는 2배 이상 향상되어 비저항값이 $2.0{\times}10^{-3}{\Omega}$cm인 막을 얻을 수 있었다.

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