• Title/Summary/Keyword: Aluminum film

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Investigation of aluminum-induced crystallization of amorphous silicon and crystal properties of the silicon film for polycrystalline silicon solar cell fabrication (다결정 실리콘 태양전지 제조를 위한 비정절 실리콘의 알루미늄 유도 결정화 공정 및 결정특성 연구)

  • Jeong, Hye-Jeong;Lee, Jong-Ho;Boo, Seong-Jae
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.20 no.6
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    • pp.254-261
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    • 2010
  • Polycrystalline silicon (pc-Si) films are fabricated and characterized for application to pc-Si thin film solar cells as a seed layer. The amorphous silicon films are crystallized by the aluminum-induced layer exchange (ALILE) process with a structure of glass/Al/$Al_2O_3$/a-Si using various thicknesses of $Al_2O_3$ layers. In order to investigate the effects of the oxide layer on the crystallization of the amorphous silicon films, such as the crystalline film detects and the crystal grain size, the $Al_2O_3$ layer thickness arc varied from native oxide to 50 nm. As the results, the defects of the poly crystalline films are increased with the increase of $Al_2O_3$ layer thickness, whereas the grain size and crystallinity are decreased. In this experiments, obtained the average pc-Si sub-grain size was about $10\;{\mu}m$ at relatively thin $Al_2O_3$ layer thickness (${\leq}$ 16 nm). The preferential orientation of pc-Si sub-grain was <111>.

Preparation and Properties of Y2O3-Doped ZrO2 Films on Etched Al Foil by Sol-Gel Process

  • Chen, Fei;Park, Sang-Shik
    • Korean Journal of Materials Research
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    • v.25 no.2
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    • pp.107-112
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    • 2015
  • The oxide films formed on etched aluminum foils play an important role as dielectric layers in aluminum electrolytic capacitors. $Y_2O_3$-doped $ZrO_2$ (YZ) films were coated on the etched aluminum foils by sol-gel dip coating, and the electrical properties of YZ-coated Al foils were characterized. YZ films annealed at $450^{\circ}C$ were crystallized into a cubic phase, and as the $Y_2O_3$ doping content increased, the unit cell of $ZrO_2$ expanded and the grain size decreased. The etch pits of Al foils were filled by YZ sol when it dried at atmospheric pressure after repeating for several times, but this step could essentially be avoided when being dried in a vacuum. YZ-coated foils indicated that the specific capacitance and dissipation factor were $2-2.5{\mu}F/cm^2$ and 2-4 at 1 kHz, respectively, and the leakage current and withstanding voltage of films approximately 200 nm thick were $5{\times}10^{-4}A$ at 21 V and 22 V, respectively. After being anodized at 500 V, the foils exhibited a specific capacitance and dissipation factor of $0.6-0.7{\mu}F/cm^2$ and 0.1-0.2, respectively, at 1 kHz, while the leakage current and withstanding voltage were $2{\times}10^{-4}-3{\times}10^{-5}A$ at 400 V and 420-450 V, respectively. This suggests that YZ film is a promising dielectric that can be used in high voltage Al electrolytic capacitors.

Effects of the Additives on Etching Characteristics of Aluminum Foil (첨가제에 의한 알루미늄박의 에칭특성변화)

  • Kim, Seong-Gap;Shin, Dong-Cheol;Jang, Jae-Myeong;Lee, Jong-Ho;Oh, Han-Jun;Chi, Chung-Su
    • Korean Journal of Materials Research
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    • v.11 no.1
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    • pp.48-54
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    • 2001
  • The effects of additives in the HCI etching solution on etching behaviors of aluminum foil as dielectric film for electrolytic capacitors were investigated. The etch pits formed in 1M hydrochloric acid containing ethylene glycol as an additive contain more fine and homogeneous etch tunnels compared to those in 1 M hydrochloric acid only, which led to the increase in the effective internal surface area of aluminum foil. After anodizing of aluminum foil etched in etching solutions, the LCR meter results have shown that the capacitance of dielectric film etched in hydrochloric acid with ethylene glycol was increased remarkably compared to that etched in hydrochloric acid only.

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Metallizations and Electrical Characterizations of Low Resistivity Electrodes(Al, Ta, Cr) in the Amorphous Silicon Thin Film Transistor (비정질 실리콘 박막 트랜지스터 소자 특성 향상을 위한 저 저항 금속 박막 전극의 형성 및 전기적 저항 특성 평가)

  • Kim, Hyung-Taek
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1993.05a
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    • pp.96-99
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    • 1993
  • Electrical properties of the Thin Film Transistor(TFT) electrode metal films were investigated through the Test Elements Group(TEG) experiment. The main purpose of this investigation was to characterize the electrical resistance properties of patterned metal films with respect to the variations of film thickness and TEG metal line width. Aluminum(Al), Tantalum(Ta) and Chromium(Cr) that are currently used as TFT electrode films were selected as the probed metal films. To date, no work in the electrical characterizations of patterned electrodes of a-Si TFT was accomplished. Bulk resistance$(R_b)$, sheet resistance$(R_s)$, and resistivities($\rho$) of TEG patterned metal lines were obtained. Electrical continuity test of metal film lines was also performed in order to investigate the stability of metallization process. Almost uniform-linear variations of the electrical properties with respect to the metal line displacements was also observed.

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Effects on the Al2O3 Thin Film by the Ar Pulse Time in the Atomic Layer Deposition (원자층 증착에 있어서 아르곤 펄스 시간이 Al2O3 박막에 미치는 효과)

  • Kim, Ki Rak;Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.157-160
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    • 2021
  • As an insulator for a thin film transistor(TFT) and an encapsulation material of organic light emitting diode(OLED), aluminum oxide (Al2O3) has been widely studied using several technologies. Especially, in spite of low deposition rate, atomic layer deposition (ALD) has been used as a process method of Al2O3 because of its low process temperature and self-limiting reaction. In the Al2O3 deposition by ALD method, Ar Purge had some crucial effects on the film properties. After reaction gas is injected as a formation of pulse, an inert argon(Ar) purge gas is injected for gas desorption. Therefore, the process parameter of Ar purge gas has an influence on the ALD deposited film quality. In this study, Al2O3 was deposited on glass substrate at a different Ar purge time and its structural characteristics were investigated and analyzed. From the results, the growth rate of Al2O3 was decreased as the Ar purge time increases. The surface roughness was also reduced with increasing Ar purge time. In order to obtain the high quality Al2O3 film, it was known that Ar purge times longer than 15 sec was necessary resulting in the self-limiting reaction.

Design of a Large Magnetron Sputtering System for TFT LCD and Investigation of Sputtered AI Film Properties (TFT LCD 제조용 대면적 Magnetron Sputtering 장치 설계와 Al 성장막 특성 조사)

  • 유운종
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.480-485
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    • 1993
  • Factros considered building the magnetron sputtering system for TFT LCD (thin film transistor liquid crystal display0 metallization were thin film thichnes uniformity, temperature uniformity and the pressure gradient of sputtering gas flow in vacuum chamber, base pressure, and the stability fo the carrier moving . The system was consisted of a deposition chamber, a pre-heating chamber, a RF-precleaning chamber and a load/unload lock chamber. The system was designed to handle a substrate with dimension of 400$\times$400mm. The temperautre uniformity of a heater table developed showed $250 ^{\circ}C\pm$5% accuracyon the substrate glass. A base pressure of 1.8 $\times$10-7 torr was obtained after 24 hours pumping with a cryo pump. After an aluminum target was installed in a sputtering source and the film wa sdeposited on the glass, the uniformity, reflectivity and sheet resistance of the deposited film were measured.

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Photoswitching Characteristics of Biodevice Consisting of Chlorophyll $\alpha$ Langmuir-Blodgett Film

  • Nam, Yun-Suk;Choi, Jeong-Woo;Lee, Won-Hong
    • Journal of Microbiology and Biotechnology
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    • v.14 no.5
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    • pp.1038-1042
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    • 2004
  • The photoelectric responses of a biodevice consisting of chlorophyll $\alpha$ Langmuir-Blodgett film were investigated. Chlorophyll $\alpha$ Langmuir-Blodgett films were deposited onto ITO and Au coated glass. To confirm film formation, surface analysis of chlorophyll $\alpha$ Langmuir-Blodgett film was carried out by measurement using atomic force microscopy. The metal/insulator/metal structured biodevice was constructed by depositing aluminum onto the chlorophyll $\alpha$ Langmuir-Blodgett film surface. To investigate the photoelectric response, the current-voltage characteristic was measured by the conducting metal tip. The photoswitching function and transient photovoltage characteristics of the proposed device were measured by irradiation with Ar ion laser and $N_2$ pulse laser, respectively. This research suggested that the proposed biodevice consisting of chlorophyll $\alpha$ could be applied to the molecular scale biosensor and/or bioelectronic device.

Heat Transfer Enhancement Characteristics for Falling-Film Evaporation on Horizontal Enhanced Tubes with Aqueous LiBr Solution (LiBr 수용액을 이용한 수평관 유하액막 증발의 촉진관 전열향상 특성)

  • Kim, Dong Kwan;Kim, Moo Hwan
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.22 no.9
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    • pp.1267-1276
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    • 1998
  • Falling-film evaporation experiments with aqueous lithium bromide (LiBr) solution were performed to investigate the heat transfer characteristics of enhanced copper tubes. Enhanced tubes (a knurled tube, a spirally grooved tube, and a tube coated with $20{\mu}m$ aluminum particles) and a bare tube were selected as test specimens. Averaged evaporation fluxes of water were obtained from horizontal tubes with various film Reynolds numbers, system pressures, LiBr concentrations and degrees of wall superheat. The enhanced performance of steam generation was compared between tubes with varying parameters. The knurled tube geometry showed the most excellent performance among the tubes tested. The specified enhanced tubes were more useful for generating steam on a low grade heat source such as waste heat.

The Experimental Study of Radiant Cooling Test System under Different Covers (복사냉각 시스템에서 커버의 영향)

  • Byun, Ki-Hong;Smith, Theodore F.
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.19 no.11
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    • pp.797-802
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    • 2007
  • The effects of window cover on the performance of the plate type radiant cooling test system are studied. The cover materials tested are 2mm, 1mm, 0.7mm glass, Cokin 007 filter, and PVC film. The measurements are performed during the September nights of 2005 at the rooftop of the building in Seoul. The equivalent height of the building is about a building with twelve floors. The radiant cooling performance of the black painted and aluminum film coated plate are compared under no cover condition. Also the results are compared when the system has cover over the plate. In general, the covers reduce the radiant cooling temperature differences during the nighttime. Among these covers, the PVC film cover shows the best performance. In some cases, the plate with PVC film cover shows lower temperatures than the system without cover.

A calculation on the Metal-Film Mixing by Intense Pulse Ion Beam (IPIB)

  • Le, X.Y.;Yan, S.;Zhao, W.J.;Wang, Y.G.;Xue, J.M.
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.74-78
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    • 2003
  • In this paper, we studied, by numerical calculation, a system, which was composed of metal-film and metal-substrate irradiated by IPIB with beam ion energy 250 keV, current density 10 to 250 A/$\textrm{cm}^2$. While the IPIB irradiation was going on, an induced effect named mixing occurred. In this case, metal-film and part of metal-substrate melted and mixed. The mixing state was kept as it was in melting phase due to the fast cooling rate. Our works were simulating the heating and cooling process via our STEIPIB program and tried to find proper parameters for a specific film-substrate system, 500 nmtitanium film coated on aluminum, to get best mixing results. The parameters calculated for such Ti-Al system were compared with the experimental results and were in good accordance to the experimental results.