Journal of the Korean Vacuum Society (한국진공학회지)
- Volume 2 Issue 4
- /
- Pages.480-485
- /
- 1993
- /
- 1225-8822(pISSN)
Design of a Large Magnetron Sputtering System for TFT LCD and Investigation of Sputtered AI Film Properties
TFT LCD 제조용 대면적 Magnetron Sputtering 장치 설계와 Al 성장막 특성 조사
Abstract
Factros considered building the magnetron sputtering system for TFT LCD (thin film transistor liquid crystal display0 metallization were thin film thichnes uniformity, temperature uniformity and the pressure gradient of sputtering gas flow in vacuum chamber, base pressure, and the stability fo the carrier moving . The system was consisted of a deposition chamber, a pre-heating chamber, a RF-precleaning chamber and a load/unload lock chamber. The system was designed to handle a substrate with dimension of 400
Keywords