• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.476-477
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• 2013

반도체의 성능은 최근 10년 사이에 급격하게 발전했고 아날로그 및 디지털 회로 소자들에 있어 저전력/고속 특성 요구가 커지고 있다 [1]. 상온에서 30,000 $cm^2$/Vs 이상의 전자 이동도를 가지며 큰 conduction band offset을 갖는 InAs/AlSb 2차원전자가스(2DEG) 소자는 Spinorbit-interaction의 값이 매우 커서 SPIN-FET 소자로 크게 주목받고 있다 [2]. 본 발표자들은 GaAs 기판위에 성장한 InAs 2DEG HEMT 소자의 전/자기적인 특성과 고속반응 물질로 주목 받는 InSb 박막소자의 doping 특성에 따른 전기적/물리적인 특성의 평가에 대해 그 결과를 소개하고자 한다. 격자정합과 Semi-insulating 기판의 부재로 상용화되어 있는 GaAs와 InP 기판위에 물질차이에 따른 고유의 한계 특성을 줄이기 위한 Pseudomorphic이라 불리는 특별한 박막 성장 기법을 적용하여 높은 전자 이동도를 가지며 spin length가 길어 Spin-FET로서 크게 주목받고 있는 InAs 2DEG HEMT 소자를 완성시켰다. 60,000 ($cm^2$/Vs) 이상의 높은 전자 이동도를 갖는 소자의 구현을 목표로 연구를 진행하였으며 1.8 K에서 측정된 Spin-orbit interaction의 값은 6.3e-12 (eVm)이다. InAs/InGaAs/InAlAs 및 InGaAs/InAlAs 구조의 InP 기반의 소자에서 보다 큰 값으로 향후 Spin-FET 응용에 크게 기대하고 있다. 또한, GaAs 기판위에 구현된 InSb 소자는 격자부정합 감소를 위해 InAs 양자점을 사용하여 약 $2.6{\mu}m$ 두께로 구현된 InSb 박막 소자는 상온에서 약 60,400 ($cm^2$/Vs)의 상온 전자이동도를 보였으며 현재 동일 두께에서 세계 최고결과(~50,000 $cm^2$/Vs)에 비해 월등하게 높은 값을 보이고 있다. Hall bar pattern 공정을 거쳐 완성된 소자는 측정 결과 10~20% 이상 향상된 전자 이동도를 보였다. 2e18/$cm^3$ 미만의 p-doping의 경우, 상온에서 n-type 특성을 보이나, 저온에서 p-type으로 변하는 특성을 보였고 n-doping의 경우 5e17/$cm^3$까지는 전자 이동도만 감소하고, doping에 의한 효과는 크게 없었다. 1e18/$cm^3$의 높은 doping을 할 경우 carrier가 증가하는 것을 확인했다. 이상의 측정 결과로 Spin-FET 소자로서 아주 우수하다는 것을 확인할 수 있었고 n-/p- type이 특성을 고려한 high quality InSb 박막소자의 응용을 위한 중요한 정보를 얻을 수 있었다.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.35 no.1
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• pp.27-32
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• 2009

Human hair is an excretory system for trace metals and thus metal content in human hair can reflect the body status. The investigation of trace elements in human hair has been correlated with the diagnosis of various diseases as well as the monitoring of deficiency statues in nutrition. Many chronic diseases may be related to mineral status, some may be related to toxic mineral. Hair samples were collected from 120 inhabitants of the city of Seoul, Korea. In this study the concentrations of 10 elements (Hg, Pb, Cd, Al, As, U, Bi, Sb, Ba, Be) in hair were determined by inductively coupled plasma mass spectroscopy (ICP-MS). The conclusions showed that people in Seoul, Korea were affected by some kinds of toxic minerals. The Hg concentrations of male are higher than those of female and reference range. The mean concentration of Sb was higher in the female than male and reference range. In age distribution, the mean concentration of Hg was in 40's are higher than 20's and 30's and reference range. The concentrations of Al were the highest in the 20's. After analyzing, we concluded that a compounded treatment should be conducted, which considers the variety of factors related to detoxification.

• Journal of IKEEE
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• v.13 no.4
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• pp.23-27
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• 2009

Ohmic contact formation and etching processes for the fabrication of MBE (molecular beam epitaxy) grown GaSb-based p-channel HEMT devices on Si substrate have been studied. Firstly, mesa etching process was established for device isolation, based on both HF-based wet etching and ICP-based dry etching. Ohmic contact process for the source and drain formation was also studied based on Ge/Au/Ni/Au metal stack, which resulted in a contact resistance as low as $0.683\;{\Omega}mm$ with RTA at $320^{\circ}C$ for 60s. Finally, for gate formation of HEMT device, gate recess process was studied based on AZ300 developer and citric acid-based wet etching, in which the latter turned out to have high etching selectivity between GaSb and AlGaSb layers that were used as the cap and the barrier of the device, respectively.

• Journal of the Optical Society of Korea
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• v.18 no.4
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• pp.359-364
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• 2014

We report parameters that allow the dielectric functions ${\varepsilon}={\varepsilon}_1+i{\varepsilon}_2$ of $AlAs_xSb_{1-x}$ alloys to be calculated analytically over the entire composition range $0{\leq}x{\leq}1$ in the spectral energy range from 0.74 to 6.0 eV by using the dielectric function parametric model (DFPM). The ${\varepsilon}$ spectra were obtained previously by spectroscopic ellipsometry for x = 0, 0.119, 0.288, 0.681, 0.829, and 1. The ${\varepsilon}$ data are successfully reconstructed and parameterized by six polynomials in excellent agreement with the data. We can determine ${\varepsilon}$ as a continuous function of As composition and energy over the ranges given above, and ${\varepsilon}$ can be converted to complex refractive indices using a simple relationship. We expect these results to be useful for the design of optoelectronic devices and also for in situ monitoring of AlAsSb film growth.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.159-159
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• 2010

본 논문은 테라헤르츠 소스로 저온 InGaAs를 대체하기 위한 저온 $In_{0.64}Al_{0.36}Sb$의 실리콘(Si) 도핑 농도에 따른 광학적 특성 변화를 photoluminescence (PL)과 time-resolved PL (TRPL) 측정을 이용하여 분석하였다. $In_{0.64}Al_{0.36}Sb$ 시료는 분자선 엑피탁시 (molecular beam epitaxy)법으로 GaAs 기판 위에 약 $420^{\circ}C$에서 $3.7\;{\mu}m$ 두께 성장하였다. Si은 $In_{0.64}Al_{0.36}Sb$ 시료에서 도핑 농도가 낮을 때는 어셉터(acceptor)로 작용하다가 도핑 농도가 증가함에 따라 도너(donor)로 작용하였다. 본 연구에 사용한 $In_{0.64}Al_{0.36}Sb$ 시료의 Si 도핑 농도는 $4.5{\times}10^{16}\;cm^{-3}$ (n형), $4{\times}10^{16}\;cm^{-3}$ (n형), $8{\times}10^{15}\;cm^{-3}$ (n형), $1{\times}10^{15}\;cm^{-3}$ (p형), $4{\times}10^{14}\;cm^{-3}$ (p형)인 다섯 개의 시료를 사용하였다. Si 도핑한 시료의 PL 피크는 undoped 시료보다 약 100-200 nm 단파장에서 나타나고 PL 세기도 크게 증가하였다. 그러나 Si 도핑 농도가 가장 낮은 n형과 p형 시료의 PL 피크가 가장 짧은 파장 (높은 에너지)에 나타나고 도핑 농도가 증가함에 따라 장파장으로 이동함을 보였다. n형 시료의 도핑 농도가 $8{\times}10^{15}\;cm^{-3}$에서 $4.5{\times}10^{16}\;cm^{-3}$로 증가하였을 때 PL 피크는 1232 nm에서 1288 nm까지 장파장쪽으로 이동하였으며, p형 시료는 도핑 농도가 $4{\times}10^{14}\;cm^{-3}$에서 $1{\times}10^{15}\;cm^{-3}$로 증가하였을 때 PL 피크가 1248 nm에서 1314 nm로 이동함을 보였다. 또한 시료 온도에 따른 PL 결과는 온도가 증가함에 따라 PL 피크는 장파장으로 이동하면서 PL 세기는 급격하게 감소하고 약 100 - 150 K에서 소멸하였다. 그러나 ~1500 nm 이상 장파장 영역에 매우 넓은 새로운 피크가 나타났으며 온도가 증가함에 따라 PL 세기가 증가함을 확인하였다. Si 도핑 농도에 따른 운반자 수명시간 변화를 TRPL을 이용하여 측정하였다. 운반자 수명시간은 double exponential function을 이용하여 얻었다. Si 도핑 시료의 운반자 수명시간이 undoped 시료에 비해 매우 길게 나타났으며, Si 도핑 시료에서는 p형 시료들보다 n형 시료들의 운반자 수명시간이 길게 나타났다. PL 방출파장에 따른 운반자 수명시간은 Si 도핑 농도에 따라 다르게 나타났다. 이러한 PL과 TRPL 결과로부터 $In_{0.64}Al_{0.36}Sb$의 발광 특성 및 운반자 동역학은 Si 도핑에 크게 영향을 받는다는 것을 확인하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.377-380
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• 2004

The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser beam; hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. GeSbTe(GST), AsSbTe(AST), SeSbTe(SST) used to phase change materials by appling electrical pulses. Thickness of ternary chalcogenide thin films have about 100nm. Upper and lower electrode were made of Al. It is compared with I-V characteristics after impress the variable pulses.

• Journal of the Korean Society of Propulsion Engineers
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• v.3 no.1
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• pp.78-85
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• 1999

Burning characteristics of solid propellants embedded with four kinds of metal wires(Ag, Cu, Al, Ni-Cr wire) were studied with varying wire diameters(O.10.8 mm) lot N-5 propellant. It was found that the order of the burning rate increment ratio($r_w$/$r_sb$) was Ag wire > Cu wire > Al wire> Ni-Cr wire which was the same as the order of the magnitude of thermal diffusivity. The burning rate increment ratio($r_w$/$r_sb$) of N-5 propellant was less than that of composite Propellant because of the difference of adiabatic flame temperature and flame structure. When Ag, Cu and Al wire having high thermal diffusivity were embedded in N-5 propellant, the plateau and mesa characteristics of the double base propellant were disappeared, but not disappeared in the case of propellant embedded with Ni-Cr wire due to its poor thermal conductivity.

• 전기의세계
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• v.28 no.9
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• pp.60-73
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• 1979

이 논문은 1979년 vol. 28 n. 4에 이어지는 글이다.

• Korean Journal of Materials Research
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• v.31 no.12
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• pp.672-676
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• 2021

In this paper, the effect of Ni (0, 0.5 and 1.0 wt%) additions on the microstructure, mechanical properties and electrical conductivity of cast and extruded Al-MM-Sb alloy is studied using field emission scanning electron microscopy, and a universal tensile testing machine. Molten aluminum alloy is maintained at 750 ℃ and then poured into a mold at 200 ℃. Aluminum alloys are hot-extruded into a rod that is 12 mm in diameter with a reduction ratio of 39:1 at 550 ℃. The addition of Ni results in the formation of Al₁₁RE₃, AlSb and Al3Ni intermetallic compounds; the area fraction of these intermetallic compounds increases with increasing Ni contents. As the amount of Ni increases, the average grain sizes of the extruded Al alloy decrease to 1359, 536, and 153 ㎛, and the high-angle grain boundary fractions increase to 8, 20, and 34 %. As the Ni content increases from 0 to 1.0 wt%, the electrical conductivity is not significantly different, with values from 57.4 to 57.1 % IACS.

• Journal of the Korean Vacuum Society
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• v.22 no.6
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• pp.327-334
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• 2013

Long-wave infrared detectors using the type-II InAs/GaSb strained superlattice (T2SL) material system with the nBn structure were designed and fabricated. The band gap energy of the T2SL material was calculated as a function of the thickness of the InAs and GaSb layers by the Kronig-Penney model. Growth of the barrier material ($Al_{0.2}Ga_{0.8}Sb$) incorporated Te doping to reduce the dark current. The full width at half maximum (FWHM) of the $1^{st}$ satellite superlattice peak from the X-ray diffraction was around 45 arcsec. The cutoff wavelength of the fabricated device was ${\sim}10.2{\mu}m$ (0.12 eV) at 80 K while under an applied bias of -1.4 V. The measured activation energy of the device was ~0.128 eV. The dark current density was shown to be $1.0{\times}10^{-2}A/cm^2$ at 80 K and with a bias -1.5 V. The responsivity was 0.58 A/W at $7.5{\mu}m$ at 80 K and with a bias of -1.5 V.