• Advances in environmental research
• /
• v.3 no.1
• /
• pp.11-28
• /
• 2014

Advanced oxidation processes using UV and catalysts like $TiO_2$ and ZnO have been recently applied for the photocatalytic degradation of MTBE in water. Attempts have been made to replace the UV radiation by the solar spectrum. This review intends to shed more light on the work that has been done so far in this area of research. The information provided will help in crystallizing the ideas required to shift the trend from UV photocatalysis to sunlight photocatalysis. The careful optimization of the reaction parameters and the type of the dopant employed are greatly responsible for any enhancement in the degradation process. The advantage of shifting from UV photocatalysts to visible light photocatalysts can be observed when catalysts like $TiO_2$ and ZnO are doped with suitable metals. Therefore, it is expected that in the near future, the visible light photocatalysis will be the main technique applied for the remediation of water contaminated with MTBE.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.06a
• /
• pp.194-194
• /
• 2008

Boron doped ZnO:Al(AZOB) thin films were prepared on glass substrates by dc magnetron sputtering. Influence of the annealing treatment on the electrical and optical properties of AZOB thin films were investigated. The lowest resistivity of $1.6\times10^{-3}\Omega$-cm was obtained at an annealing temperature of $400^{\circ}C$. The average transmittance of the films is over 80% in the visible range. It was also shown that by introducing boron impurity into AZO system improve the uniformity, the resistivity, and thermal stability of ZnO-based conducting thin films.

• Proceedings of the KIEE Conference
• /
• 2008.07a
• /
• pp.1260-1261
• /
• 2008

Aluminium doped zinc oxide (ZnO:Al) thin film has emerged as one of the most promising transparent conducting electrode in flat panel displays(FPD) and in photovoltaic devices since it is inexpensive, mechanically stable, and highly resistant to deoxidation. In this paper ZnO:Al thin film was deposited on the polyethylene terephthalate(PET) substrate by the capacitively coupled r.f. magnetron sputtering method. Wide ranges of bias voltage, -30V${\sim}$45V, was applied to the growing films as an additional energy instead of substrate heating, and the effect of positive and negative bias on the film structure and electrical properties of ZnO:Al films was studied and discussed. The results showed that a bias applied to the substrate during sputtering contributed to the improvement of electrical properties of the film by attracting ions and electrons in the plasma to bombard the growing films. These bombardments provided additional energy to the growing ZnO film on the substrate, resulting in significant variations in film structure and electrical properties. The film deposited on the PET substrate at r. f. discharge power of 200 W showed the minimum resistivity of about $2.4{\times}10^{-3}{\Omega}-cm$ and a transmittance of about 87%.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2006.06a
• /
• pp.120-121
• /
• 2006

To investigate the ZnO thin films which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF magnetron sputtering system. Al sputtering process of ZnO thin films substrate temperature, work pressure respectively is $100^{\circ}C$ and 15 mTorr, and the purity of target is ZnO 5N. The ZnO thin films were in-situ annealed at $600^{\circ}C$, $800^{\circ}C$ in $O_2$ atmosphere. Phosphorus (P) and arsenic (As) were diffused into ZnO thin films sputtered by RF magnetron sputtering system in ampoule tube which was below $5{\times}10^{-7}$ Torr. The dopant sources of phosphorus and arsenic were $Zn_3P_2$ and $ZnAS_2$. Those diffusion was perform at $650^{\circ}C$ during 3hr. We confirmed that p-type properties of ZnO thin films were concerned with dopant sources rather than diffusion temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.11a
• /
• pp.26-27
• /
• 2008

본 연구는 투명전도성전극(TCO)인 ITO를 대체하기 위해 ZnO에 $Al_2O_3$, $SiO_2$, $TiO_2$의 불순물을 도핑하여 박막의 전기적 및 광학적 특성에 관한 연구를 하였다. 불순물 도핑은 2wt.%로 진행 하였고, 동일한 전압과 두께로 그 특성을 비교 하였으며, 특성으로는 UV-Vis를 이용한 광투과율 측정과 광투과율을 이용한 박막의 광학적 밴드갭과 굴절률을 계산 하였다. 전기적 특성으로는 4-Point Probe로 면저항과 비저항값을 측정하였다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.192-192
• /
• 2010

Transparent Conductive Oxides (TCO) 박막은 지금 까지 산업 전반에 걸쳐 많이 응용되어 사용되어지는 박막 중에 하나이다. 그대표적인 산업은 디스플레이 산업 중 평면디스플레이 산업에서 투명 전극으로 사용하는 LCD 및 터치패널에 사용되는 전극으로 사용되어져 왔다. 현재에는 솔라 셀의 전극 및 기판으로서의 응용이 많이 연구되어지고 있다. 이와 같은, 산업에서 사용되는 투명전극 재료는 낮은 전기적 특성 및 애칭특성이 우수하고 높은 광 투과도를 필요로 하고 있으며, 이러한 특성을 모두 만족하며 가장 우수한 물성을 나타내는 물질이 (Indium Tin Oxide) film이다. 하지만 Indium의 고갈과 희소성에 따른 고가라는 점의 문제로 인해 대체재료로써 부상되고 있는 ZnO의 연구가 활발히 진행되고 있다. 본 연구에서는 투명 전도성 산화물인 ZnO박막과 Al이 도핑된 AZO박막을 저온공정이 가능한 대향 타겟식 스퍼터링 방법(FTS)을 이용하여 산소가스 분압과 Al타겟에 인가되는 Current에 따른 박막의 전기적, 광학적 특성을 파악하여 적용여부에 대해 조사하였다. ZnO박막의 결정성은 유입되는 산소가스의 유량에 따라 증가하며 일정 영역이상에서는 감소하였다. 산소가스 유량이 1.2 sccm일 때 가장 높은 결정성을 얻었다. 또한 산소가스 유량을 1.2 sccm으로 고정시킨 후 Al타겟에 인가되는 Current에 변화를 주었을 때 0.5A에서 가장 낮은 비저항을 얻었다. ZnO박막의 미세구조는 Xray-diffraction method를 이용하여 측정하였고, 산소 분압에 따른 표면조도 분석을 위해 AFM을 사용하였고 Zn와 Oxide bonding의 화학적 분석을 위해 XPS를 이용하여 분석하였다. 또한 전기적 특성은 Hall measurement, 광 투과도는 UV-VIS Spectrometer를 이용하였다.

• Korean Journal of Materials Research
• /
• v.20 no.12
• /
• pp.629-635
• /
• 2010

Abstract In this study characteristics of Al-doped ZnO thin film by HIPIMS (High power impulse sputtering) are discussed. Deposition speed of HIPIMS with conventional balanced magnetic field is measured at about 3 nm/min, which is 30% of that of conventional RF sputtering process with the same working pressure. To generate additional magnetic flux and increase sputtering speed, electromagnetic coil is mounted at the back side of target. Under unbalanced magnetic flux from electromagnet with 1.5A coil current, deposition speed of AZO thin film is increased from 3 nm/min to 4.4 nm/min. This new value originates from the decline of particles near target surface due to the local magnetic flux going toward substrate from electromagnet. AZO film sputtered by HIPIMS process shows very smooth and dense film surface for which surface roughness is measured from 0.4 nm to 1 nm. There are no voids or defects in morphology of AZO films with varying of magnetic field. When coil current is increased from 0A to 1A, transmittance of AZO thin film decreases from 80% to 77%. Specific resistance is measured at about $2.9{\times}10-2\Omega{\cdot}cm$. AZO film shows C-axis oriented structure and its grain size is calculated at about 5.3 nm, which is lower than grain size in conventional sputtering.

• Transactions on Electrical and Electronic Materials
• /
• v.15 no.4
• /
• pp.213-216
• /
• 2014

The microstructure and varistor properties of ZPCCAE ($ZnO-Pr_6O_{11}-CoO-Cr_2O_3-Al_2O_3-Er_2O_3$) ceramics were investigated with different erbium amounts. Analysis of the microstructure indicated that the ceramics consisted of ZnO grains as a bulk phase, and intergranular layers (mixture of $Pr_6O_{11}$ and $Er_2O_3$) as a minor secondary phase. With the increase of the doped erbium amount, the densities of sintered pellets increased from 5.63 to $5.82g/cm^3$, and the average grain size decreased from 9.0 to $5.7{\mu}m$. The increase of the doped erbium amount increased the breakdown field from 2,649 to 5,074 V/cm, and the nonlinear coefficient from 27.6 to 39.1. It was found that in the range of 0.25 to 0.5 mol%, the doped erbium had little effect on the microstructure and electrical properties.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.27 no.5
• /
• pp.317-321
• /
• 2014

Hydrothermal synthesis technique could be carried out for growth of ZnO nanowires at relatively low process temperature, and it could be freely utilized with various substrates for fabrication process of functional electronic devices. However, it has also a demerit of relatively slow growth characteristics of the resulting ZnO nanowires. In this paper, an external DC bias of positive and negative 0.5 [V] was applied in the hydrothermal synthesis process for 2~8 [h] to prepare ZnO nanowires on a seed layer of AZO with high electrical conductivity. Growth characteristics of the synthesized ZnO nanowires were analyzed by FE-SEM. Material property of the grown ZnO nanowires was examined by PL analysis. The ZnO nanowires grown with positive bias revealed distinctively enhanced growth characteristics, and they showed a typical material property of ZnO.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.102-102
• /
• 2011

ZnO는 우수한 전기적, 광학적 특성으로 LED, solar cell 등과 같은 광전자소자의 응용을 목적으로 많은 연구가 진행되고 있다. 최근에는 ZnO 동종접합을 만들고자 많은 연구가 진행되고 있으나 p형 ZnO의 낮은 용해성과 높은 불순물에 따른 제조의 어려움으로 현재까지는 n형 ZnO만이 전도성 기판 위에 성장되어 응용되고 있다. 전도성 기판으로서 Si의 경우 낮은 가격, 공정의 용이함 등으로 GaN, SiC 등의 기판에 비하여 많은 응용이 가능하다. 따라서 본 연구에서는 전기화학증착법을 이용하여 p-n 접합을 형성하기 위하여 p형 Si 기판 위에 n형 ZnO 나노구조를 성장하고 그 특성을 분석하였다. 전기화학증착법은 낮은 온도 및 간단한 공정과정으로 빠른 성장 속도를 가지고 나노구조를 효과적으로 성장할 수 있는 방식이다. Seed 층 및 열처리에 따른 n형 ZnO 나노구조의 성장 특성 분석을 위하여 radio frequency (RF) magnetron 스퍼터를 사용하여 ZnO 및 Al doped ZnO (AZO) seed 층을 p형 Si 기판 위에 증착 후 다양한 온도로 열처리를 수행하였다. 질산아연(zinc nitrate)과 HMT가 희석된 용액에 KCl 촉매를 일정량 첨가한 후 다양한 공정 온도, 공정시간 및 질산아연의 몰농도를 변화시켜 n형 ZnO 나노구조를 성장하였다. 성장된 나노구조의 특성은 field emission scanning microscopy (FE-SEM), energy dispersive X-ray (EDX), photoluminescence (PL) 등의 장비를 사용하여 구조적, 광학적 특성을 분석하였다.