• Journal of information and communication convergence engineering
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• 제6권1호
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• pp.38-42
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• 2008

Highly sensitive and mechanically stable gas sensors have been fabricated using the microfabrication and micromachining techniques. The sensing materials used to detect the offensive $CH_3SH$ and $(CH_3)_3N$ gases are 1 wt% Pd-doped $SnO_2$ and 6 wt% $Al_2O_3$-doped ZnO, respectively. The optimum operating temperatures of the devices are $250^{\circ}C$ and $350^{\circ}C$ for $CH_3SH$ and $(CH_3)_3N$, respectively and the corresponding heater power is, respectively, about 55mW and 85mW. Excellent thermal insulation is achieved by the use of a double-layer membrane: i.e. $0.2{\mu}m$-thick silicon nitride and $1.4{\mu}m$-thick phosphosilicate glass. The sensors are mechanically stable enough to endure the heat cycles between room temperature and $350^{\circ}C$, at least for 30 days.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 하계종합학술대회 논문집
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• pp.679-684
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• 1989

In this paper, we describe the PTP notion of robot manipulators by neural networks. The PTP motion requires the inverse kinematic redline and the joint trajectory generation algorithm. We use the multi-layered Perceptron neural networks and the Error Back Propagation(EBP) learning rule for inverse kinematic problems. Varying the number of hidden layers and the neurons of each hidden layer, we investigate the performance of the neural networks. Increasing the number of learning sweeps, we also discuss the performance of the neural networks. We propose a method for solving the inverse kinematic problems by adding the error compensation neural networks(ECNN). And, we implement the neural networks proposed by Grossberg et al. for automatic trajectory generation and discuss the problems in detail. Applying the neural networks to the current trajectory generation problems, we can refute the computation time for trajectory generation.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권12호
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• pp.755-760
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• 1999

Various fluoride films were investigated for a gate insulator of thin film transistor application. Conventional oxide containing materials like $SiO_2\;Ta_2O_5\; and \; Al_2O_3$ exhibited high interface states which lead to an increased threshold voltage and poor stability of TFT. In this paper, we investigated gate insulators using a binary matrix system of fluoride such as $CaF_2,\; SrF_2\; MgF_2,\; and\; BaF_2$. These materials exhibited an improvement in lattice mismatch, interface state and electrical stability. MIM and MIS devices were employed for an electrical characterization and structural property examination. Among the various fluoride materials, $CaF_2$ film showed an excellent lattice mismatch of 5%, breakdown electric field higher than 1.2MV/cm and leakage current density of $10^{-7}A/cm^2$. MIS diode having $Ca_2$ film as an insulation layer exhibited the interface states as low as $1.58\times10^{11}cm^{-2}eV^{-1}$. This paper probes a possibility of new gate insulator materials for TFT applications.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권12호
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• pp.567-572
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• 2002

In these days, diesel vehicle or power plant emits $NO_X\; and SO_2$ which cause air pollution like acid-rain, ozone layer destroy and optical smoke, therefore there are many kinds of methods considered for removing them such as SCR, catalyst, plasma process, and plasma-catalyst hybrid process. T$TiO_2$ is commonly used as catalyst to remove $NO_X$ gas because it have very excellent chemical characteristic as photo catalyst. In this paper, $NO_X$ sensing characteristic of $TiO_2$ thin film deposited by R.F Magnetron sputtering is investigated. A finger shaped electrode on $Al_2$O$_3$ substrate is designed and $TiO_2$ is deposited on the electrode by the magnetron sputtering deposition system. Chemical composition of the deposited $TiO_2$ thin film is $TiO_{1.9}$ by RBS analysis. When the UV is irradiated on it with flowing air, capacitance of $TiO_2$ thin film increases, however, when NO gas is put into the system with air, it immediately decreases because of photo chemical reaction. and it monotonously decreases with increasing NO concentration.

• 한국전기전자재료학회논문지
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• 제18권7호
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• pp.641-646
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• 2005

To fabricate a single layer white organic light emitting diode (OLED), a novel non-conjugated blue emitting material PPPMA-co-DTPM copolymer was synthesized containing a perylene moiety unit with hole transporting and blue emitting ability and a triazine moiety unit with electron transporting ability. The devices were fabricated using PPPMA-co-DTPM $(PPPMA[70\;wt\%]:DTPM[30\;wt\%])$ copolymer by varying the doping concentrations of each red, green and blue fluorescent dye, by molecular-dispersing into Toluene solvent with spin coating method. In case of ITO/PPPMA-co-DTPM:TPB$(3\;mol\%):C6(0.04\;mol\%):NR(0.015\;mol\%)/Al$ structure, as they were molecular-dispersing into 30 mg/ml Toluene solvent, nearly-pure white light was obtained both (0.325, 0.339) in the CIE coordinates at 18 V and (0.335, 0.345) at 15 V. The turn-on voltage was 3 V, the light-emitting turn-on voltage was 4 V, and the maximum external quantum efficiency was $0.667\%$ at 24.5 V. Also, in case of using 40 mg/ml Toluene solvent, the CIE coordinate was (0.345, 0.342) at 20 V.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1070-1073
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• 2004

In this study, Tri(1-phenylpyrazolato)iridium $(Ir(ppz)_3)$ was prepared for the pure blue phosphorescent dopant and various host materials were used for the appropriate energy alignment. Although the luminance was pure blue with the CIE coordinates of x = 0.158, y = 0.139, device efficiencies didn't improve yet. Instead of finding the proper host materials, the alteration of structure of OLEDs affected the improvement of electrical and optical characteristics of the devices. It was worthy that insertion the exciton formation zone with the host material between the emitting zone and the exciton blocking layer. The device with a structure of ITO/NPB/Ir(ppz)3 doped in CBP/CBP for the exciton formation zone/BCP/Liq/Al was fabricated and the characteristics were observed compared with the devices without the exciton formation zone. When CBP was used for the exciton formation zone, the device efficiency reached to over 0.25 cd/A. While the device used CBP only for the host showed the luminous efficiency of under 0.11 cd/A

• Transactions on Electrical and Electronic Materials
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• 제11권3호
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• pp.145-148
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• 2010

White organic light emitting devices were fabricated to improve the stability through a structural change using the two peak emission method. The fabricated devices were composed of indium tin oxide (100 nm)/ $\alpha$-NPD (30 nm)/4,40-bis(2,20-diphenylvinyl)-1,10-biphenyl (DPVBi, d: variable)/DPVBi: Rubrene (40 nm)/2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline(5 nm)/ $Alq_3$(5 nm)/ Al (100 nm). A DPVBi for blue emissions was used as the host material in the emitters. The doping concentration of the Rubrene was fixed at 2.0% (by weight). The white emission with Commission Internationale De L'Eclairage coordinates of (0.3342, 0.3439) occurred at 14 V with a thickness d of 1 nm. It was insensitive to the drive voltage, and the devices had a maximum luminance of $211\;cd/cm^2$. At 19 V, the current density and maximum external quantum efficiency were $173\;mAcm^2$ and 0.478%, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.185-185
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• 2010

유기 발광 소자에서 $Li_2CO_3$를 전자 주입층으로 사용하여 전류, 전압, 휘도 그리고 수명을 살펴 보았다. 전자 주입층을 사용함으로써 음전극과 전자 수송층 사이의 전자 주입의 에너지 장벽을 낮출 수 있다. 전자 주입층에 Ca, Mg, Li 등과 같은 낮은 일 함수의 금속을 사용하면, 음전극과 유기물층 사이의 효과적인 전자 주입을 도울 수 있다. 소자의 구조는ITO/TPD(40nm)/$Alq_3$(60nm)/$Li_2CO_3$(xnm)/Al(100nm)으로 하였으며, $Li_2CO_3$의 두께를 0.1, 0.2, 0.3, 0.5, 0.7, 0.9, 1.2, l.5nm로 변화시켜 소자를 제작하였다. $Li_2CO_3$의 박막 두께가 0.3nm일 때, 전자 주입층을 사용하지 않은 소자에 비하여 효율은 2.4배 증가하였고, 구동전압은 0.75V 낮아졌다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.298-299
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• 2008

Images of deposited layers of organic light-emitting diodes were observed by scanning-electron microscope (SEM). We were able to see a clear cross-sectional view of deposited layers. The SEM is a type of electron microscope that images the sample surface by scanning it with a high-energy beam of electrons in a raster scan pattern. A thickness of deposited layer measured by thickness monitor is close to a real value measured by a-step surface profiler within 5%. We were able to see a formation of domains of size about 50-100nm from a surface morphology of Al, and pin holes of size about 50nm.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.262-263
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• 2008

The Metal-Insulator-Silicon (MIS) capacitors with $SiO_2$ and high-k dielectric were investigated. The high-k dielectrics were obtained by atomic layer deposit (ALD) system. The electrical characteristics were investigated by measuring the current-voltage (I-V) characteristics. The conduction mechanisms were analyzed by using the Fowler-Nordheim (FN) plot and Direct Tunneling (DT) plot. As a result, the MIS capacitors with high-k dielectrics have lower leakage current densities than conventional tunnel-barrier with $SiO_2$ dielectrics.