• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.24-24
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• 2009

투명전극 (TCO Transparent Conductive Oxide)은 Solar cell, Touch panel, Sensor 등 많은 분야에 이용되어지고 있다. ZnO 그리고 $SnO_2$는 ITO룰 대체하기 위하여 오래전부터 연구가 되어지고 있다. 하지만 ZnO가 가지고 있는 많은 장점에도 불구하고 ITO를 대체하기 위한 전기적 특성이 충분하지 않다. 따라서 ZnO에 Al를 도핑하는 등 다양한 연구가 진행되어왔다. 본 실험은 우수한 광학특성 및 전기적 (10-5) 특성을 확보하기 위하여 AZO/Ag/AZO 다층박막구조 형성하였다. 또한 염료감응 태양전지에 적용하기 위하여 다층박막구조를 이용한 안정성 테스트를 진행하였다.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2007.06a
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• pp.207-210
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• 2007

We prepared Al doped ZnO/Ag/Al doped ZnO on the polymer substrate by Facing Target Sputtering (FTS). FTS featured Facing Target Sputtering featured that deposition is stable at the low pressure, it has high plasma density and suppresses the substrate damage from energetic particles. We fixed to 50nm up and down thickness of AZO layer, respectively and that of intermediate Ag layer was adjusted with deposition time. In the result, AZO/Ag/AZO multilayer thin films have much better electrical conductivity than AZO single layer thin film. As increasing the thickness of Ag layer, the transmittance decreased.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.12
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• pp.1072-1076
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• 2007

We prepared the Al doped ZnO (AZO) thin film on polyethersulfon (PES) without any substrate heating by Facing Targets Sputtering (FTS) system. FTS system has two different facing targets. One is ZnO doped the content of Al 2 wt% and the other is Zn in order to decrease resistivity. The electrical, structural and optical properties of AZO thin films were investigated. To evaluate the as-deposited thin film properties, we employed four-point probe (CMT-R100nw, Changmin), Surface profiler (Alpha-step, Tencor), UV/VIS spectrometer (HP), X-ray diffractometer (XRD, Rigaku) and Field Emission Scanning Electron Microscopy (FESEM, Hitachi S-4700). As a result, We obtained that AZO thin film deposited on PES substrate at a DC Power of 150 W, working pressure of 1 mTorr and $O_2$ gas flow ratio of 0.2 exhibited the resistivity of $4.2{\times}10^{-4}\;[{\Omega}cm]$ and the optical transmittance of about 85 % in the visible range.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.97-98
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• 2007

DC magnetron sputtering법을 이용하여 다양한 $Al_2O_3:$ 함량비( 1, 2, 3 wt%)를 가진 고밀도 세라믹 타겟을 사용하여 기판온도 $RT{\sim}300^{\circ}C$에서 AZO박막을 제작하였다. $Al_2O_3:$함량 및 기판온도의 증가에 따라 AZO박막의 결정성은 향상됨을 확인할 수 있었다. 결과적으로 기판온도 $300^{\circ}C$에서 $Al_2O_3:$ 3 wt%를 함유한 AZO 타겟을 사용하여 증착한 AZO박막은 가시광 영역에서 85%이상의 높은 투과율과 $7.8{\times}10^{-4}{\Omega}cm$의 비저항 값을 나타내었다.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1349-1350
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• 2007

Epitaxial thin films of aluminum-doped zinc oxide (AZO) have been deposited on commercial corning glass using an Nd:YAG pulsed laser deposition technology. The structural, electrical and optical properties of these films were investigated as a function of oxygen pressure. The experimental results show that the electrical resistivity of films deposited at 5 mTorr with substrate temperature of $300^{\circ}C$ were $4.633{\times}10^{-4}$. The average transmission of AZO thin films in the visible range were over 90%.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.285-285
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• 2014

새로운 플라즈마 소스를 이용하여 Al doped ZnO (AZO) 박막을 증착하였다. 이 실험에서 박막의 증착두께를 200nm로 고정하였다. 인가전력, 공정압력 그리고 기판거리를 변수로 하였을 경우 AZO 박막의 방향성과 결정성을 XRD로 측정하고 분석하였고 박막의 전기적 특성을 Hall measurment로 측정하였다. 그 결과 인가파워가 2W/cm2, 공정압력이 2mTorr이고 기판거리가 2cm 일 때 박막의 전기적 특성이 가장 좋게 나타났다.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.5
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• pp.1-7
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• 2007

AZO thin films have been fabricated on quartz substrate with various Al doping concentrations and annealing temperatures by sol-gel method. The bset condition of (002) orientation and smooth surface (rms = 1.082 nm) is obtained for the AZO thin film doped with 1 mol % Al and annealed at 550 $^{\circ}C$. The optical transmittance of AZO thin films is higher than 80 % in the visible region. We observe that the energy band gap extends with increasing the Al doping concentration. This phenomenon is due to the Burstein-Moss effect. Through the measurement of Hall effect, it is observed that the AZO thin film has larger carrier concentration and smaller electrical resistivity than the pure ZnO thin film. However, the AZO thin film shows the decrease of carrier concentration and the increase of resistivity with the increase of Al concentration, that is due to the segregation of Al at grain boundaries. The maximum carrier concentration of $1.80{\times}10^{19}\;cm^{-3}$ and the minimum resistivity of 0.84 ${\Omega}cm$ are obtained for the AZO thin film doped with 1 mol % Al and annealed at 550 $^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.338.2-338.2
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• 2016

Al doped ZnO (AZO) thin films were deposited on Si substrates with rod-shaped-surface by pulsed laser deposition method (PLD). Si-rods were prepared through chemical etching. To analyze the influence on the formation of the rod structure, samples with various chemical etching conditions such as AgNO3/HF ratio, etching time, and solution temperature were prepared. The morphology of Si-rod structures were examined by FE-SEM. Fig. 1 shows a typical structure of n-AZO/p-Si-rod juncions. The fabricated n-AZO/p-Si-rod devices exhibited p-n diode current-voltage characteristics. We compared the I-V characteristics of n-AZO/p-Si-rod devices with the samples without Si-rod structure.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.785-787
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• 2002

Conductivity and transmittancy of ZnO is very excellent and the price is low. So the study of transparent electrode materials and electromagnetic wave shielding wall is actively in progress. We add $Al_2O_3$(0.0, 2.0, 3.0, 5.0wt%) to ZnO and observe microscopic structure and conductivity. For XRD observation, Al peak of AZO is increased by increasing the amount of $Al_2O_3$. We observe that the size of grain is reduced by increasing the liquid phase of grain boundary to SEM observation. Conductivity of AZO is increased by increasing the amount of $Al_2O_3$. We confirm the application possibility of the materials for electromagnetic wave reflection materials.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.23-24
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• 2008

Bipolar pulsed dc magnetron sputtering을 이용하여 태양전지의 투명 전도막용으로 유리기판 위에 Al doped ZnO (AZO) 박막을 증착하였다. $400{\times}400\;mm$의 대면적 기판에 증착하기 위해서 $5{\times}25$ inch 대형 사각 AZO target (Al 2 wt%)을 사용했고, $50{\sim}250\;kHz$의 bipolar pulse를 인가하였다. 실제로는 $400{\times}400\;mm$ 면적의 기판에 slide glass 16개를 사용했으며, 약 700 nm 두께에서 두께와 투과도, 비저항의 균일도를 평가하였다. Bipolar pulse의 주파수 150 kHz일 때, 가장 우수한 특성을 갖는 AZO가 증착되었으며, $2.13{\times}10^{-3}{\Omega}{\cdot}cm$의 비저항에 가시광선 영역에서 82%의 투과율을 보였다. 또한, $400{\times}400\;mm$ 대면적 기판에서의 두께와 투과도, 비저항의 불균일도는 각각 5%, 1%, 9% 였다.