• Title/Summary/Keyword: AFM(Atomic force microscope

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Nanotribological characteristics of silicon surfaces modified by IBAD (IBAD로 표면개질된 실리콘표면의 나노 트라이볼로지적 특성)

  • 윤의성;박지현;양승호;공호성;장경영
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.06a
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    • pp.127-134
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    • 2001
  • Nano adhesion and friction between a Sj$_3$N$_4$ AFM tip and thin silver films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various ranges of normal load. Thin silver films deposited by IBAD (ion beam assisted deposition) on Si-wafer (100) and Si-wafer of different surface roughness were used. Results showed that nano adhesion and friction decreased as the surface roughness increased. When the Si surfaces were coated by pure silver, the adhesion and friction decreased. But the adhesion and friction were not affected by the thickness of IBAD silver coating. As the normal force increased, the adhesion forces of bare Si-wafer and IBAD silver coating film remained constant, but the friction forces increased linearly. Test results suggested that the friction was mainly governed by the adhesion as long as the normal load was low.

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Universal LC Method for a Determination of Fourteen Cationic Surfactants Widely Used in Surfactant Industry

  • Ryu, Ho-Ryul;Park, Hong-Soon;Rhee, Choong-Kyun
    • Bulletin of the Korean Chemical Society
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    • v.28 no.1
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    • pp.85-88
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    • 2007
  • Ab initio periodic Hartree-Fock calculations with the full potential and minimum basis set are applied to interpretation of scanning tunneling microscope (STM) and atomic force microscope (AFM) images on 1TVTe2. Our results show that the simulated STM image shows asymmetry while the simulated AFM image shows the circular electron densities at the bright spots without asymmetry of electron density to agree with the experimental AFM image. The bright spots of both the STM and AFM images of VTe2 are associated with the surface Te atoms, while the patterns of bright spots of STM and AFM images are different.

Analysis of Microstructure for Resistance Spot Welded TRIP Steels using Atomic Force Microscope (원자력간 현미경을 이용한 TRIP강 저항 점용접부의 미세조직 분석에 관한 연구)

  • Choi, Chul Young;Ji, ChangWook;Nam, Dae-Geun;Jang, Jaeho;Kim, Soon Kook;Park, Yeong-Do
    • Journal of Welding and Joining
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    • v.31 no.1
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    • pp.43-50
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    • 2013
  • The spot welds of Transformation Induced Plasticity (TRIP) steels are prone to interfacial failure and narrow welding current range. Hard microstructures in weld metal and heat affected zone arenormally considered as one of the main reason to accelerate the interfacial failure mode. There fore, detailed observation of weld microstructure for TRIP steels should be made to ensure better weld quality. However, it is difficult to characterize the microstructure, which has similar color, size, and shape using the optical or electron microscopy. The atomic force microscope (AFM) can help to analyze microstructure by using different energy levels for different surface roughness. In this study, the microstructures of resistance spot welds for AHSS are analyzed by using AFM with measuring the differences in average surface roughness. It has been possible to identify the different phases and their topographic characteristics and to study their morphology using atomic force microscopy in resistance spot weld TRIP steels. The systematic topographic study for each region of weldments confirmed the presence of different microstructures with height of 350nm for martensite, 250nm for bainite, and 150nm for ferrite, respectively.

Pitch Measurement of 150 nm 1D-grating Standards Using an Nano-metrological Atomic Force Microscope

  • Jonghan Jin;Ichiko Misumi;Satoshi Gonda;Tomizo Kurosawa
    • International Journal of Precision Engineering and Manufacturing
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    • v.5 no.3
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    • pp.19-25
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    • 2004
  • Pitch measurements of 150 nm one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the 'nano-metrological AFM'. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$ stabilized He-Ne laser at a wavelength of 633 nm. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 nm. The average pitch value was 146.65 nm and the combined standard uncertainty was less than 0.262 nm. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

A study of the design and control system for the ultra-precision stage (초정밀 스테이지 설계 및 제어 시스템에 관한 연구)

  • Park Jongsung;Jeong Kyuwon
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.54-59
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    • 2005
  • Recently, the ultra-precision stage is widely used in the fields of the nano-technology, specially in AFMs(Atomic Force Microscope) and STMs(Scanning Tunneling Microscope). In this paper, the ultra-precision stage which consists of flexure hinges, piezoelectric actuator, and ultra-precision linear encoder, is designed and developed. The guide mechanism which consisted of flexure hinges is analyzed by Finite Element Method. And we derived the transfer function of the system in 1st order system from step responses according to the magnitude. We performed simulation for the model to tune the control gain and applied the gains to the developed system. Experimental results found that the stage can be controlled in 5 nm resolution by PID controller.

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Nano-scale Patterning of Al thin film on 4H-SiC using AFM tip Scratching (AFM Scratching 기법을 이용한 4H-SiC기판상의 Al 박막 초미세 패턴 형성 연구)

  • Ahn, Jung-Joon;Kim, Jae-Hyung;Park, Yea-Seul;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.351-351
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    • 2010
  • Nanoscale patterning using an atomic force microscope tip induced scratching was systematically investigated in AI thin film on 4H-SiC. To identify the effects of the scratch parameters, including the tip loading force, scratch speed, and number of scratches, we varied each parameters and evaluated the major parameter which has intimate relationship with the scale of patterns. In this work, we present the successful demonstration of nano patterning of Al thin film on a 4H-SiC substrate using an AFM scratching and evaluated the scratch parameters on Al/4H-SiC.

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A Study on Failure Analysis of Turbine Blade using AFM and FEM (AFM과 유한요소법을 이용한 터빈 블레이드의 파손해석에 관한 연구)

  • 최우성;이동우;홍순혁;조석수;주원식
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.11a
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    • pp.489-493
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    • 2000
  • Turbine blade has trouble of cracking at root region. Fracture surface of blade root is surveyed by SEM and AFM to clear relation between fracture mechanical parameter and surface parameter (striation width and surface roughness). Service stress is predicted by maximum height roughness $R_{max}$, on fractured surface and stress analysis on turbine blade. It is to thought that turbine blade is fractured by abnormal condition such as incorrect fittings between pin and pin hole but isn't fractured by normal service conditions such as steam pressure, centrifugal force and torsional force.

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Physical Properties of Diamond-like Carbon Thin Films Prepared by a Microwave Plasma-Enhanced Chemical Vapor Deposition (마이크로웨이브 화학기상증착법으로 성장된 다이아몬드상 카본박막의 물리적인 특성연구)

  • Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.791-794
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    • 2003
  • DLC thin films were prepared by microwave plasma-enhanced chemical vapor deposition method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas mixture. The negative DC bias ($-450V{\sim}-550V$) was applied to enhance the adhesion between the film and the substrate. The films were characterized by Raman spectrometer. The surface morphology was observed by an atomic force microscope (AFM). And also, the friction coefficients were investigated by AFM in friction force microscope (FFM) mode, which were compared with the pin-on-disc (POD) measurement.

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