Physical Properties of Diamond-like Carbon Thin Films Prepared by a Microwave Plasma-Enhanced Chemical Vapor Deposition

마이크로웨이브 화학기상증착법으로 성장된 다이아몬드상 카본박막의 물리적인 특성연구

  • Choi, Won-Seok (School of Information and Communication Engineering, Sungkyunkwan Univ.) ;
  • Hong, Byung-You (School of Information and Communication Engineering, Sungkyunkwan Univ.)
  • 최원석 (성균관대학교 정보통신공학부) ;
  • 홍병유 (성균관대학교 정보통신공학부)
  • Published : 2003.07.10

Abstract

DLC thin films were prepared by microwave plasma-enhanced chemical vapor deposition method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas mixture. The negative DC bias ($-450V{\sim}-550V$) was applied to enhance the adhesion between the film and the substrate. The films were characterized by Raman spectrometer. The surface morphology was observed by an atomic force microscope (AFM). And also, the friction coefficients were investigated by AFM in friction force microscope (FFM) mode, which were compared with the pin-on-disc (POD) measurement.

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