• Transactions on Electrical and Electronic Materials
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• v.5 no.4
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• pp.143-147
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• 2004

Surface defects and bulk defects on SOI wafers are studied. Two new metrologies have been proposed to characterize surface and bulk defects in epitaxial layer transfer (ELTRAN) wafers. They included the following: i) laser scattering particle counter and coordinated atomic force microscopy (AFM) and Cu-decoration for defect isolation and ii) cross-sectional transmission electron microscope (TEM) foil preparation using focused ion beam (FIB) and TEM investigation for defect morphology observation. The size of defect is 7.29 urn by AFM analysis, the density of defect is 0.36 /cm$^2$ at as-direct surface oxide defect (DSOD), 2.52 /cm$^2$ at ox-DSOD. A hole was formed locally without either the silicon or the buried oxide layer (Square Defect) in surface defect. Most of surface defects in ELTRAN wafers originate from particle on the porous silicon.

• Journal of the Korean Applied Science and Technology
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• v.28 no.2
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• pp.213-218
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• 2011

Displacement current measuring technique has been applied on the study of polyamic acid monolayer containing p-nitroazobenzene. The displacement current was generated from monolayer on the water surface by monolayer compression and expansion. Maxwell displacement current(MDC) was generated when the area per molecule was about $200{\AA}^2$ and $70{\AA}^2$. Maxwell displacement currents were investigated in connection with monolayer compression cycles. It was found that the maximum of MDC appeared at the molecular area just before the initial rise of surface pressure in compression cycles. The monolayer surface morphology of the LB film have been measured by Atomic Force Microscope(AFM). As a result, we confirmed that the microscopic properties of LB film by AFM showed the good orientation of monolayer molecules and the thickness of monolayer was 3.5-4.1nm.

• Tribology and Lubricants
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• v.35 no.4
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• pp.199-205
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• 2019

Two-dimensional materials such as graphene, h-BN, and $MoS_2$ have attracted increased interest as solid lubricant and protective coating layer for nanoscale devices owing to their superior mechanical properties and low friction characteristics. In this work, the frictional properties of single-layer graphene, h-BN, and $MoS_2$ are experimentally investigated under various normal forces using atomic force microscope (AFM) tips with a spherical and flat end, with the aim to gain a better understanding of frictional behaviors. The nonlinear relationship between friction and normal force friction was clearly observed for single-layer graphene, h-BN, $MoS_2$ specimens slid against the spherical and flat AFM tips. The results also indicate that single-layer graphene, h-BN, $MoS_2$ exhibit low frictional properties (e.g., friction coefficient below 0.1 under 70~100 nN normal force). In particular, graphene is found to be superior to h-BN and $MoS_2$ in terms of frictional properties. However, the friction of single-layer graphene, h-BN, $MoS_2$ against the flat tip is larger than that against the spherical tip, which may be attributed to the relatively large adhesion. Furthermore, it is shown that the fluctuation of friction is more significant for the flat tip than the spherical tip. The resutls of this study may be helpful to elucidate the feasibility of using two-dimensional materials as solid lubricant and protective coating layer for nanoscale devices.

• Journal of Advanced Marine Engineering and Technology
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• v.37 no.1
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• pp.72-77
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• 2013

The effect of sputtering condition on the structural properties of ZnO thin films grown by RF magnetron sputtering system was investigated for TFT driver circuit. ZnO thin films were grown with ZnO target varying RF power and working pressure. Structural properties were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM). The ZnO thin films have sufficient crystallinity on the 100W RF power. But, the surface roughness of ZnO films was increased as increased RF power. As increased working pressure from 5 mTorr to 15 mTorr, a full width at half maximum (FWHM) of ZnO (002) peak was increased.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.322-325
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• 2006

The nano/microstructure and mechanical properties of the eutectic regions in thixo and rheo cast A356 alloy parts were investigated using nano/micro-indentation and mechanical scratching, combined with optical microscopy and atomic force microscope (AFM).Most eutectic Si crystals in the A356 alloy showed a modified morphology as fine-fibers, however Si particles of network in eutectic region was formed quickly with aging time increase in thixo-cast. The aging responses of the eutectic regions in both the thixo and rheo cast A356 alloys aged at $150^{\circ}C$ for different times (0, 2, 4, 8, 10, 16, 24, 36, and 72 h) were investigated. Both Vickers hardness ($H_V$) and indentation ($H_{IT}$) test results showed almost the same trend of aging curves, the peak was obtained at the same aging time of 10 h.

• Journal of the Korean Vacuum Society
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• v.7 no.2
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• pp.112-117
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• 1998

TiN has been investigated as a good candidate for a diffusion barrier of Cu. Therefore, in this study, the grain boundary diffusion of Cu in TiN film was investigated by X-ray photoelectron spectroscopy(XPS). In general, TiN has a columnar grain structure. In the relatively lower temperature, less than 1/3 of the melting point, it was observed that Cu diffused into TiN mainly along the grain boundaries of TiN. The grain size of TiN was measured by atomic force microscope (AFM). In order to estimate the grain boundary diffusion constants, we used the modified surface accumulation method. The activation energy, $Q_b$ was 0.23 eV, and the diffusivity, $D_{bo}$ was $5.5\times10^{-12{\textrm{cm}^2$/sec.

• Textile Coloration and Finishing
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• v.16 no.5
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• pp.28-34
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• 2004

The polarizing film application exploits the unique physicochemical properties between PVA(Poly vinyl alcohol) film and CTA(Cellulose triacetate) film. However, hardly any research was aimed at improving the adhesion characteristics of the CTA film by radio frequency(RF) plasma treatment at argon(Ar) gaseous state. In this report, we deal with surface treatment technology for protective CTA film developed specifically for high adhesion applications. After Ar plasma, surface of the films is analyzed by atomic force microscopy(AFM), roughness parameter and peel strength. Furthermore, the wetting properties of the CTA film were studied by contact angle analysis. Results obtained for CTA films treated with a glow discharge showed that this technique is sensitive to newly created physical functions. The roughness and peel strength value increased with an increase in treatment time for initial treatment, but showed decreasing trend for continuous treatment time. The result of contact angle measurement refer that the hydrophilicity of surface was increased. AFM studies indicated that no considerable change of surface morphology occurred up to 3 minutes of treatment time, but a considerable uneven of surface structure resulted from treating time after 5 minutes.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2008.11a
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• pp.666-667
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• 2008

• Journal of the Korean Society for Precision Engineering
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• v.21 no.4
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• pp.24-31
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• 2004

The objective of this work is to suggest a mastless pattern fabrication technique using the combination of machining by Nanoindenter(equation omitted) XP and HF wet etching. Sample line patterns were machined on a borosilicate surface by constant load scratch (CLS) of the Nanoindenter(equation omitted) XP with a Berkovich diamond tip, and they were etched in HF solution to investigate chemical characteristics of the machined borosilicate surface. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.302-303
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• 2003

원자간력-현미경(Atomic Force Microscope)은 비파괴적인 방법으로 광소자의 단면 형상과 거칠기에 관한 정보를 원자단위의 해상도로 얻어낼 수 있다. 그러나 탐침의 형상에 의해서 공간분해능에 제한을 받는다. 이 문제를 해결하기 위해, 원자간력-현미경 탐침의 끝부분에 나노튜브를 부착하였다. 주사형 전자현미경에 설치한 나노조작기를 사용하여 나노튜브를 탐침에 밀착하도록 이동시킨 후에, 탄화물 증착으로 접착시키는 방법을 사용하였다.