• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.493-496
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• 1997

We have made disperse diazo black D(DB-D) ultrathin films using Langmur-Blodgett(LB) and vacuum-evaporation technique. Physical and electrical properties of the films were investigated. Solution was made with a concentration of 10$^{-3}$ mol/$\ell$ using chloroform. Moving wall apparatus (NL-LB140 S-MWC) was employed to make the LB films. X,Y and Z-type LB films were manufactured and studied by UV/visible absorbance spectra and morphology of surface using atomic force microscopy. Vacuum-evaporated DB-D think films were made at a pressure of 10$^{-5}$ torrr. The absorption peaks appear at 200 and 40nm in the LB films and vacuum-deposited films. And we have studied photoluminescence spectrum of the DB-D films. Also TGA and DSC properties of the DB-D have been observed and current -voltage characteristics of the DB-D LB films have been measured along the perpendicular direction.

• The Journal of the Korea Contents Association
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• v.12 no.3
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• pp.17-24
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• 2012

Andre Bazin called the movie frame as "the window open to the world." This expression is close to realization through 3D films. The 'Avatar' released in 2009 was a new turning point for 3D films. Nowadays the theory and information about 3D films is overflowed. It is necessary to find practices and to accumulate data useful in production of 3D films. There are several ways of working to achieve high quality 3D films. In any way that's chosen, there are priorities to be considered to create well-balanced 3D films. The aim of this article is to review primary considerations in film-making and share the technical issues experienced during the production of "Let's go to the amusement park again, Mom." Because the current practical knowledge in making 3D film is shallow, this article will offer a possible reference for further research.

• The Journal of the Korea Contents Association
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• v.11 no.2
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• pp.229-237
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• 2011

All over the world, the interest in technology and industrial value has been increasing rapidly due to the continuing commercial successes of three dimensional films. However, after the commercial success of , without exception, lots of three dimensional films had been produced thoughtlessly. Hereby, these films incurred a censure owing to bad degree of completion related to insufficient storytelling and directing. For three dimensional films, characteristic of producing should be considered perfectly in the planning stage unlike previous films. This study concentrates upon proper directing for three dimensional films, and analyzes the method of it, roughly divided into three parts ; the lapse of time, directing the screen which can highlight space sense, and the point of sight. Henceforth, The demand of three dimensional contents will increase all around the world, at such time, we also should take note of the change, and then produce excellent contents which can lead to have a chance to gain the supper hand in the market of three dimensional contents.

• Journal of Magnetics
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• v.17 no.4
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• pp.265-270
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• 2012

We report improved low-field magnetoresistance (LFMR) effects of the $La_{0.7}Sr_{0.3}Mn_{1+d}O_3-Mn_3O_4$ composite films with the nominal composition of $La_{0.7}Sr_{0.3}MnO_3$(LSMO)-50 mol% $Mn_3O_4$. The composite films were fabricated by ex-situ solid phase crystallization (SPC) of amorphous films at the annealing temperature region of $900-1100^{\circ}C$ for 2 h in a pure oxygen atmosphere. The amorphous films were deposited on polycrystalline $BaZrO_3$ (poly-BZO) substrates by dc-magnetron sputtering at room temperature. The Curie temperatures ($T_C$) of all composite films were insignificantly altered in the range of 368-372 K. The highest LFMR value of 1.29 % in 0.5 kOe with the maximum dMR/dH value of $37.4%kOe^{-1}$ at 300 K was obtained from 900 nm-thick composite film annealed at $1100^{\circ}C$. The improved LFMR properties of the composite films are attributed to effective spin-dependent scattering at the $La_{0.7}Sr_{0.3}Mn_{1+d}O_3$ grain boundaries sharpened by adjacent chemically compatible $Mn_3O_4$ grains.

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1333-1335
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• 1997

We have made disperse diazo black D(DBD) thin films using Langmuir-Blodgett(LB) and vacuum-evaporation technique. Physical and optical properties of the films were investigated. Solution was made with a concentration of $10^{-3}mol/{\ell}$ using chloroform. Moving wall apparatus, (NL-LB140S-MWC) was employed to make the LB films. X,Y and Z-type LB films were manufactured and studied UV/visible absorbance spectra and morphology of surface using atomic force microscopy(AFM). Vacuum-evaporated DB D thin films were made at a pressure of $10^{-5}$ torr. The absorption peaks were observed at 200 and 400 nm in the LB films and vacuum-deposited films. We have also studied photoluminescence spectrum of the DBD films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.1
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• pp.112-117
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• 2004

$Y_2$$_{-x}$G $d_{x}$ $O_3$:E $u^{3+}$(x=0.0, 0.3, 0.6, 1.0, 1.4) luminescent thin films have been grown on Si (100) substrates using pulsed laser deposition. The films grown under different deposition conditions have been characterized using microstructural and luminescent measurements. The crystallinity, the surface morphology and photoluminescence (PL) of the films are highly dependent on the amount of Gd. The photoluminescence (PL) brightness data obtained from $Y_2$$_{-x}$G $d_{x}$ $O_3$:E $u^{3+}$ films grown under optimized conditions have indicated that Si (100) is one of promised substrates for the growth of high quality $Y_2$$_{-x}$G $d_{x}$ $O_3$:E $u^{3+}$ thin film red phosphor. In particular, the incorporation of Gd into $Y_2$ $O_3$ lattice could induce a remarkable increase of PL. The highest emission intensity was observed with $Y_{1.35}$G $d_{0.60}$ $O_3$: $E^{3+}$, whose brightness was increased by a factor of 1.95 in comparison with that of $Y_2$ $O_3$:E $u^{3+}$ films.3+/ films.films.lms.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.916-919
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• 2000

A great deal of research has been done in the field of characterization for piezoelectric thin films after the first report on the measurement for the piezoelectric coefficient of thin films in 1990. The main idea of this research is to provide a distinctive solution for the measurement of both the longitudinal and the transverse piezoelectric d-coefficients, d$\sub$33/ and d$\sub$3l/, of ferroelectric thin films and also thick films. In general, to get these two coefficients of thin films, two different measuring systems are required. Here, we propose the improved method for the evaluation of these two coefficients with single equipment and with the relatively convenient procedure. The two-step loading process of applying the both positive and the negative pressure has been designed to acquire the piezoelectric coefficients. These results have beer calibrated for both the longitudinal and the transverse piezoelectric d-coefficients, d$\sub$33/ and d$\sub$31/, of thin films. In the first stage of the experiments, we have obtained d$\sub$33/ of 108pC/N and d$\sub$31/ of 57pC/N for the PZT thin films.

• Journal of the Korean institute of surface engineering
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• v.25 no.5
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• pp.235-252
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• 1992

(Ti, Al)N films were deposited on 304 stainless steel sheet by D.C. magnetron sputtering using Al target and Ti plate. The high temperature oxidation of (T, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The high temperature oxidation test of (Ti, Al)N showed that (Ti, Al)N has better high temperature resistance than TiN and TiC films. TiC films were cracked at 40$0^{\circ}C$ in air TiN films quickly were oxidised at $600^{\circ}C$, were spalled more than $700^{\circ}C$. But (Ti, Al)N films are relatively stable to$ 900^{\circ}C$. The good resistance to high temperature oxida-tion of (Ti, Al)N films are due to the formation of dense Al2O3 and TiO2 oxide layer. Especially, Al2O3 oxide layer is more important. The results obtained from this study show, it is believe that the (Ti, Al)N film by D.C. magnetron sputtering is promising for the use of high temperature and wear resistance mate-rials.

• Journal of the Korean Ceramic Society
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• v.37 no.7
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• pp.686-692
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• 2000

Tin-doped In2O3 (ITO) films were fabricated using a d.c. magnetron reactive sputteirng of a In-10 wt% Sn alloy target in an Ar and O2 gas mixture. To understand the behavior of the carrier mobility in ITO films with O2 partial pressure, the resistivity, carrier concentration and mobility, film density, and intrinsic stress in the films were measured with O2 partial pressure. It was found experimentally that the carrier mobility increased rapidly as the film density increased. In the ITO film with the density close to theoretical one, the mean free path was the same as the columnar diameter. This indicated that the mobility in ITO films was strongly influenced by the crystall size. However, in the case where the film density was smaller than a theoretical density, the mean free paths were also smaller the columnar diameter. It was analyzed that the electron scattering at pores and holes within the crystalline was the major obstacle for electron conduction in ITO films. The measurement of intrinsic stress in ITO films also made it clear that the density of ITO films was controlled by the bombardment of oxygen neutrals on the growing film.

• Journal of the Korean Vacuum Society
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• v.5 no.4
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• pp.359-364
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• 1996

$SrTiO_3$ thin films were deposited on Pt/Ti/$SiO_2$/Si substrates at low temperatures below $300^{\circ}C$ by r.f. magnetron sputtering. The materials and the electrical properties of the deposited films were investigated with controlling deposition parameters such as substrate temperature(T_s) and positive substrate d.c. bias voltage. Stoichiometric $SrTiO_3$ films were obtained at Ts of $300^{\circ}C$, but Sr content in the film was less than that of a target when Ts was lower than $300^{\circ}C$, resulting in poor electrical properties. By introducing a positive substrate d.c. bias during deposition, the crystallinity and the dielectric properties of the films were markedly improved. 400 nm thick $SrTiO_3$, films deposited at $300^{\circ}C$ with a positive substrate d.c. bias of 20V showed a columnar structure with <211> crystallographic direction and a dielectric constant of 98.