Nanocrystalline-Si Thin Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition (ICP-CVD) at $150^{\circ}C$
(극저온($150^{\circ}C$ )에서 ICP-CVD로 증착한 Nanocrystalline-Si 박막)
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- Proceedings of the KIEE Conference
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- 2005.11a
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- pp.12-14
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- 2005