• Title/Summary/Keyword: 표면에칭

Search Result 273, Processing Time 0.027 seconds

Fabrication of Silica Nanoparticles by Recycling EMC Waste from Semiconductor Molding Process and Its Application to CMP Slurry (반도체 몰딩 공정에서 발생하는 EMC 폐기물의 재활용을 통한 실리카 나노입자의 제조 및 반도체용 CMP 슬러리로의 응용)

  • Ha-Yeong Kim;Yeon-Ryong Chu;Gyu-Sik Park;Jisu Lim;Chang-Min Yoon
    • Journal of the Korea Organic Resources Recycling Association
    • /
    • v.32 no.1
    • /
    • pp.21-29
    • /
    • 2024
  • In this study, EMC(Epoxy molding compound) waste from the semiconductor molding process is recycled and synthesized into silica nanoparticles, which are then applied as abrasive materials contains CMP(Chemical mechanical polishing) slurry. Specifically, silanol precursor is extracted from EMC waste according to the ultra-sonication method, which provides heat and energy, using ammonia solution as an etchant. By employing as-extracted silanol via a facile sol-gel process, uniform silica nanoparticles(e-SiO2, experimentally synthesized SiO2) with a size of ca. 100nm are successfully synthesized. Through physical and chemical analysis, it was confirmed that e-SiO2 has similar properties compared to commercially available SiO2(c-SiO2, commercially SiO2). For practical CMP applications, CMP slurry is prepared using e-SiO2 as an abrasive and tested by polishing a semiconductor chip. As a result, the scratches that are roughly on the surface of the chip are successfully removed and turned into a smooth surface. Hence, the results present a recycling method of EMC waste into silica nanoparticles and the application to high-quality CMP slurry for the polishing process in semiconductor packaging.

Electrochemical Characteristics of 2-Dimensional Titanium Carbide(MXene)/Silicon Anode Composite Prepared by Electrostatic Self-assembly (정전기적 자가결합법으로 제조된 2차원 티타늄 카바이드(MXene)/실리콘 음극 복합소재의 전기화학적 특성)

  • Dong Min Kim;Jong Dae Lee
    • Korean Chemical Engineering Research
    • /
    • v.62 no.3
    • /
    • pp.262-268
    • /
    • 2024
  • In this study, the MXene/Si composite was prepared by electrostacic assembly with 2-dimensional structured titanium carbide (MXene) and nano silicon for anode material of high-performance lithium-ion battery. Ti3C2Tx MXene was synthesized by etching the Ti3AlC2 MAX with LiF/HCl, and the surface of nano silicon was charged to positively using CTAB (Cetyltrimethylammonium bromide). The MXene/Si anode composite was successfully manufactured by simple mixing process of synthesized MXene and charged silicon. The physical and electrochemical properties of prepared composite were investigated with MXene-silicon composition ratio, and the surface of electrode after cycles was analyzed to evaluate stability of the electrode. The MXene/Si composites demonstrated high initial discharge capacities of 1962.9, 2395.2 and 2504.3 mAh/g as the silicon composition ratio increased to 2, 3 and 4 compared to MXene, respectively. MXene/Si-4, which is MXene and silicon ratio with 1 : 4, exhibited 1387.5 mAh/g of reversible capacity, 74.5% of capacity retention at 100 cycles and high capacity of 700.5 mAh/g at high rate of 4.0 C. As the results, the MXene/Si composite prepared by electrostatic-assenbly could be applied to anode materials for high-performance LIBs.

Histomorphometry and Stability Analysis of Loaded Implants with two Different Surface Conditions in Beagle Dogs (하중을 가한 두 가지 표면의 임플란트에 관한 조직형태학적 분석 및 안정성 분석 (비글견을 이용한 연구))

  • Kim, Sang-Mi;Kim, Dae-Gon;Cho, Lee-Ra;Park, Chan-Jin
    • Journal of Dental Rehabilitation and Applied Science
    • /
    • v.24 no.4
    • /
    • pp.337-349
    • /
    • 2008
  • Despite an improved bone reactions of Mg-incorporated implants in the animals, little yet has been carried out by the experimental investigations in functional loading conditions. This study investigated the clinical and histologic parameters of osseointegrated Mg-incorporated implants in delayed loading conditions. A total of 36 solid screw implants (diameter 3.75 mm, length 10mm) were placed in the mandibles of 6 beagle dogs. Test groups included 18 Mg-incorporated implants. Turned titanium Implants served as control. Gold crowns were inserted 3 months. Radiographic assessments and stabilitytests were performed at the time of fixture installation, $2^{nd}$ stage surgery, 1 and 3 months after loading. Histological observations and morphometrical measurements were also performed. Of 36 implants, 32 displayed no discernible mobility, corresponding to successful clinical function. There was no statistically significant difference between test implants and controls in marginal bone levels (p=0.413) and RFA values. The mean BIC % in the Mg-implants was $54.4{\pm}20.2%$. The mean BIC % in the turned implant was $48.9{\pm}8.0%$. These differences between the Mg-implant and control implant were not statistically significant (P=0.264). In the limitation of this study, bone-to-implant contact (BIC) and bone area of Mg-incorporated oxidized implant were similar to machine-turned implant. The stability analysis showed no significantly different ISQ values and marginal bone loss between two groups. Considering time-dependent bone responses of Mg-implant, it seems that Mg-implants enhanced bone responses in early loading conditions and osseointegrated similarly to cp Ti implants in delayed loading conditions. However, further investigations are necessary to obtain long-term bone response of the Mg-implant in human.

GaN Epitaxy with PA-MBE on HF Cleaned Cobalt-silicide Buffer Layer (HF 크리닝 처리한 코발트실리사이드 버퍼층 위에 PA-MBE로 성장시킨 GaN의 에피택시)

  • Ha, Jun-Seok;Chang, Ji-Ho;Song, Oh-Sung
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.11 no.2
    • /
    • pp.409-413
    • /
    • 2010
  • We fabricated 10 nm-thick cobalt silicide($CoSi_2$) as a buffer layer on a p-type Si(100) substrate to investigate the possibility of GaN epitaxial growth on $CoSi_2/Si(100)$ substrates. We deposited 500 nm-GaN on the cobalt silicide buffer layer at low temperature with a PA-MBE (plasma assisted-molecular beam epitaxy) after the $CoSi_2/Si$ substrates were cleaned by HF solution. An optical microscopy, AFM, TEM, and HR-XRD (high resolution X-ray diffractometer) were employed to determine the GaN epitaxy. For the GaN samples without HF cleaning, they showed no GaN epitaxial growth. For the GaN samples with HF cleaning, they showed $4\;{\mu}m$-thick GaN epitaxial growth due to surface etching of the silicide layers. Through XRD $\omega$-scan of GaN <0002> direction, we confirmed the cyrstallinity of GaN epitaxy is $2.7^{\circ}$ which is comparable with that of sapphire substrate. Our result implied that $CoSi_2/Si(100)$ substrate would be a good buffer and substrate for GaN epitaxial growth.

Study on the Flame Retardation and Thermal Resistance for CPE Rubber Material Added Etching By-product of Aluminum (알루미늄 엣칭부산물을 첨가한 CPE 고무재료의 난연성 및 내열성 연구)

  • Kim, Kyung Hwan;Lee, Chang Seop
    • Journal of the Korean Chemical Society
    • /
    • v.45 no.4
    • /
    • pp.341-350
    • /
    • 2001
  • Aluminum Hydroxide was employed as a thermal retardent and flame retardent for Chloropolyethylene (CPE) rubbery materials which is the construction material of automotive oil cooler hose. and then cure characteristics, physical properties, thermal resistance and flame retardation of compounded rubber were investigated, and optimum mixing conditions of rubber and flame retarding agent were deduced from the experimental results. CPE rubber material which has excellent properties of chemical corrosion resistance and cold resistance and inexpensive in price was used to prepare rubber specimen. The by-product of ething, produced from the process of surface treatment of aluminum was processed to aluminum hydroxide via crushing and purification, which is characterized by XRD, PSA, SEM and ICP-AES techniques in terms of phase, size, distribution, morphology and components of particles and then mixed to CPE rubber materials in the range of 0~80 phr. Hardness, tensile strength, elongation and thermal properties of compounded rubber specimens were tested. The optimum mixing ratio of rubber to additives to give maximum effect on thermal resistance and flame retardation, within the range of tolerable specification for rubber materials, was determined to be 40 phr. The flame retardation of CPE rubber materials was found to be increased by 5 times at this mixing ratio.

  • PDF

The effects of hydrogen treatment on the properties of Si-doped Ga0.45In0.55P/Ge structures for triple junction solar cells

  • Lee, Sang-Su;Yang, Chang-Jae;Ha, Seung-Gyu;Kim, Chang-Ju;Sin, Geon-Uk;O, Se-Ung;Park, Jin-Seop;Park, Won-Gyu;Choe, Won-Jun;Yun, Ui-Jun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.143-144
    • /
    • 2010
  • 3-5족 화합물 반도체를 이용한 집광형 삼중 접합 태양전지는 40% 이상의 광변환 효율로 많은 주목을 받고 있다[1]. 삼중 접합 태양전지의 하부 셀은 기계적 강도가 높고 장파장을 흡수할 수 있는 Ge이 사용된다. Ge위에 성장될 III-V족 단결정막으로서 Ge과 격자상수가 일치하는 GaInP나 GaAs가 적합하고, 성장 중 V족 원소의 열확산으로 인해 Ge과 pn접합을 형성하게 된다. 이때 GaInP의 P의 경우 GaAs의 As보다 확산계수가 낮아 태양전지 변환효율향상에 유리한 얇은 접합 형성이 가능하고, 표면 에칭효과가 적기 때문에 GaInP를 단결정막으로 선택하여 p-type Ge기판 위 성장으로 단일접합 Ge구조 제작이 가능하다. 하지만 이종접합 구조 성장으로 인해 발생한 계면사이의 전위나 미세결함들이 결정막내부에 존재하게 되며 이러한 결함들은 광학소자 응용 시 비발광 센터로 작용할 뿐 아니라 소자의 누설전류를 증가시키는 원인으로 작용하여 태양전지 변환효율을 감소시키게 된다. 이에 결함감소를 통해 소자의 전기적 특성을 향상시키고자 수소 열처리나 플라즈마 공정을 통해 수소 원자를 박막내부로 확산시키고, 계면이나 박막 내 결함들과 결합시킴으로서 결함들의 비활성화를 유도하는 연구가 많이 진행되어 왔다 [2][3]. 하지만, 격자불일치를 갖는 GaInP/Ge 구조에 대한 수소 열처리 및 불순물 준위의 거동에 대한 연구는 많이 진행되어 있지 않다. 따라서 본 연구에서는 Ga0.45In0.55P/Ge구조에 수소 열처리 공정을 적용을 통하여 단결정막 내부 및 계면에서의 결함밀도를 제어하고 이를 통해 태양 전지의 변환효율을 향상시키고자 한다. <111> 방향으로 $6^{\circ}C$기울어진 p-type Ge(100) 기판 위에 유기금속화학증착법 (MOCVD)을 통해 Si이 도핑된 200 nm의 n-type GaInP층을 성장하여 Ge과 단일접합 n-p 구조를 제작하였다. 제작된 GaInP/Ge구조를 furnace에서 250도에서 90~150분간 시간변화를 주어 수소열처리 공정을 진행하였다. 저온 photoluminescence를 통해 GaInP층의 광학적 특성 변화를 관찰한 결과, 1.872 eV에서 free-exciton peak과 1.761 eV에서 Si 도펀트 saturation에 의해 발생된 D-A (Donor to Acceptor)천이로 판단되는 peak을 검출할 수 있었다. 수소 열처리 시간이 증가함에 따라 free-exciton peak 세기 증가와 반가폭 감소를 확인하였고, D-A peak이 사라지는 것을 관찰할 수 있었다. 이러한 결과는 수소 열처리에 따른 단결정막 내부의 수소원자들이 얕은 불순물(shallow impurity) 들로 작용하는 도펀트들이나, 깊은 준위결함(deep level defect)으로 작용하는 계면근처의 전위, 미세결함들과의 결합으로 결함 비활성화를 야기해 발광세기와 결정질 향상효과를 보인 것으로 판단된다. 본 발표에서는 상술한 결과를 바탕으로 한 수소 열처리를 통한 박막 및 계면에서의 결함준위의 거동에 대한 광분석 결과가 논의될 것이다.

  • PDF

A Study on the Performance Improvement of ta-C Thin Films Coating on Tungsten Carbide(WC) Surface for Aspherical Glass Lens by FCVA Method Compared with Ir-Re coating (Ir-RE 코팅 대비 자장여과필터방식을 이용한 비구면 유리 렌즈용 초경합금(WC)표면의 ta-C 박막 코팅 성능 개선 연구)

  • Jung, Kyung-Seo;Kim, Seung-Hee
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.20 no.12
    • /
    • pp.27-36
    • /
    • 2019
  • The demand for a low dispersion lens with a small refractive index and a high refractive index is increasing, and accordingly, there is an increasing need for a releasable protective film with high heat resistance and abrasion resistance. On the other hand, the optical industry has not yet established a clear standard for the manufacturing process and quality standards for mold-releasing protective films used in aspheric glass lens molding. Optical lens manufacturers treat this technology as proprietary information. In this study, an experiment was conducted regarding the optimization of ion etching, magnetron, and arc current at each source and filter part, and bias voltage in FCVA (filtered cathode vacuum arc)-based Ta-C thin film coatings. This study found that compared to iridium-rhenium alloy thin film sputtering products, the coating conditions were improved by approximately 50%, 20%, and 40% in terms of thickness, hardness, and adhesive strength of the film, respectively. The thin-film coating process proposed in this study is expected to contribute significantly to the development and utilization of glass lenses, which will help enhance the minimum mechanical properties and quality of the mold-release thin film layer required for glass mold surface forming technology.

타원편광분석법을 이용한 $In_xAl_{1-x}P$ 박막의 광물성 연구

  • Byeon, Jun-Seok;Hwang, Sun-Yong;Kim, Tae-Jung;Kim, Yeong-Dong;Aspnes, D.E.;Chang, Y.C.;Yun, Jae-Jin;Lee, Eun-Hye;Bae, Min-Hwan;Song, Jin-Dong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.02a
    • /
    • pp.423-423
    • /
    • 2013
  • 3~5 족 반도체 물질인 phosphorus 화합물 중 대표적인 InAlP 삼종화합물은 작은 굴절률, 큰 밴드갭, GaAs와 lattice 일치 때문에 큰 주목을 받고 있고, p-type high electron mobility transistors(p-HEMT), laser diodes 등의 고속 전자소자 및 광전 소자에 응용이 가능한 매우 중요한 물질이다. 최적의 소자 응용기술을 위해서는, 정확한 광물성 연구가 수행되어야 하지만 InxAl1-xP 화합물에 대한 유전율 함수 및 전자전이점 등의 연구는 미흡한 실정이다. 이에 본 연구에서는 1.5~6.0 eV 에너지 영역에서 각기 다른 In 조성비를 갖는 InxAl1-xP 화합물의 가유전율 함수 ${\varepsilon}={\varepsilon}_1+i{\varepsilon}_2$와 전자전이점 데이터를 보고한다. GaAs 기판 위에 molecular beam epitaxy (MBE)를 이용하여 InxAl1-xP (x=0.000, 0.186, 0.310, 0.475, 0.715, 0.831, 1.000) 박막을 성장하였고 타원편광분석기를 이용하여 유전율 함수를 측정하였다. 또한 실시간 화학적 에칭을 통하여 시료 표면에 자연산화막을 제거함으로써 순수한 InAlP의 유전율 함수를 측정할 수 있었고, 측정된 유전율 함수를 이차미분하여 In 조성비에 따른 전자전이점을 얻을 수 있었다. 얻어진 전자전이점 값을 이용하여 linear augmented Slater-type orbital method (LASTO) 를 통해 이론적 전자 밴드 구조 계산을 하였고, 이를 바탕으로 $E_0$, $E_1$, $E_2$ 전이점 지역의 여러 전자전이점($E_1$, $E_1+{\Delta}_1$, $E_0'$, $E_0'+{\Delta}_0'$, $E_2$, $E_2'$)의 특성을 정의할 수 있었고, $E_0'$$E_2$ 전이점의 에너지 값이 In 조성비가 증가함에 따라 서로 교차함을 발견할 수 있었다. 타원 편광 분석법을 이용한 유전율 함수 및 전자전이점 연구는 InAlP의 광학적 데이터베이스를 확보하는 성과와 더불어 새로운 디바이스 기술 및 광통신 산업에도 유용한 정보가 될 것이다.

  • PDF

Surface Modification of Li Metal Electrode with PDMS/GO Composite Thin Film: Controlled Growth of Li Layer and Improved Performance of Lithium Metal Battery (LMB) (PDMS/GO 복합체 박막의 리튬 금속 표면 개질: 리튬전극의 성장 제어 및 리튬금속전지(LMB) 성능 향상)

  • Lee, Sanghyun;Seok, Dohyeong;Jeong, Yohan;Sohn, Hiesang
    • Membrane Journal
    • /
    • v.30 no.1
    • /
    • pp.38-45
    • /
    • 2020
  • Although Lithium metal battery (LMB) has a very large theoretical capacity, it has a critical problem such as formation of dendrite which causes short circuit and short cycle life of the LMB. In this study, PDMS/GO composite with evenly dispersed graphene oxide (GO) nanosheets in poly (dimethylsiloxane) (PDMS) was synthesized and coated into a thin film, resulting in the effect that can physically suppress the formation of dendrite. However, PDMS has low ion conductivity, so that we attained improved ion conductivity of PDMS/GO thin film by etching technic using 5wt% hydrofluoric acid (HF), to facilitate the movement of lithium (Li) ions by forming the channel of Li ions. The morphology of the PDMS/GO thin film was observed to confirm using SEM. When the PDMS/GO thin film was utilized to lithium metal battery system, the columbic efficiency was maintained at 87.4% on average until the 100th cycles. In addition, voltage profiles indicated reduced overpotential in comparison to the electrode without thin film.

Fabrication and Characteristics of High Efficiency Silicon PERL (passivated emitter and rear locally-diffused cell) Solar Cells (PERL (passivated emitter and rear locally-diffused cell) 방식을 이용한 고효율 Si 태양전지의 제작 및 특성)

  • Kwon, Oh-Joon;Jeoung, Hun;Nam, Ki-Hong;Kim, Yeung-Woo;Bae, Seung-Chun;Park, Sung-Keoun;Kwon, Sung-Yeol;Kim, Woo-Hyun;Kim, Ki-Wan
    • Journal of Sensor Science and Technology
    • /
    • v.8 no.3
    • /
    • pp.283-290
    • /
    • 1999
  • The $n^+/p/p^+$ junction PERL solar cell of $0.1{\sim}2{\Omega}{\cdot}cm$ (100) p type silicon wafer was fabricated through the following steps; that is, wafer cutting, inverted pyramidally textured surfaces etching by KOH, phosphorus and boron diffusion, anti-reflection coating, grid formation and contact annealing. At this time, the optical characteristics of device surface and the efficiency of doping concentration for resistivity were investigated. And diffusion depth and doping concentration for n+ doping were simulated by silvaco program. Then their results were compared with measured results. Under the illumination of AM (air mass)1.5, $100\;mW/cm^2$ $I_{sc}$, $V_{oc}$, fill factor and the conversion efficiency were 43mA, 0.6 V, 0.62. and 16% respectively.

  • PDF