• Title/Summary/Keyword: 트래핑층

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An Analysis of Radio Interference in 800 MHz-Band from Japan (일본에서 도래하는 800 MHz 대역의 전파 간섭 분석)

  • Jeon, Joong-Sung
    • Journal of Advanced Marine Engineering and Technology
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    • v.36 no.4
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    • pp.520-526
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    • 2012
  • Along with the increase of demand of radio communication and with the rapid progress of communication systems, the radio frequency interference of neighbor nations is a matter of argue. This problem is a delicate matter which must be dealt with technical background. The radio interference has been experienced in the Korean TRS service on the south seashore due to the seashore base station in Japan. The radio interference problem between neighbor nations has become the matter of conflict. For the purpose to solve this problem, we has measured the radio waves that come from Japan mainly to Korea and also analyzed the radio interference.

Electrical Characteristics of Ambipolar Thin Film Transistor Depending on Gate Insulators (게이트 절연특성에 의존하는 양방향성 박막 트랜지스터의 동작특성)

  • Oh, Teresa
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.5
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    • pp.1149-1154
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    • 2014
  • To observe the tunneling phenomenon of oxide semiconductor transistor, The Indium-gallum-zinc-oxide thin film transistors deposited on SiOC as a gate insulator was prepared. The interface characteristics between a dielectric and channel were changed in according to the properties of SiOC dielectric materials. The transfer characteristics of a drain-source current ($I_{DS}$) and gate-source voltage ($V_{GS}$) showed the ambipolar or unipolar features according to the Schottky or Ohmic contacts. The ambipolar transfer characteristics was obtained at a transistor with Schottky contact in a range of ${\pm}1V$ bias voltage. However, the unipolar transfer characteristics was shown in a transistor with Ohmic contact by the electron trapping conduction. Moreover, it was improved the on/off switching in a ambipolar transistor by the tunneling phenomenon.

Improvement of Operating Stabilities in Organic Field-Effect Transistors by Surface Modification on Polymeric Parylene Dielectrics (Parylene 고분자 유전체 표면제어를 통한 OFET의 소자 안정성 향상 연구)

  • Seo, Jungyoon;Oh, Seungteak;Choi, Giheon;Lee, Hwasung
    • Journal of Adhesion and Interface
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    • v.22 no.3
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    • pp.91-97
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    • 2021
  • By introducing an organic interlayer on the Parylene C dielectric surface, the electrical device performances and the operating stabilities of organic field-effect transistors (OFETs) were improved. To achieve this goal, hexamethyldisilazane (HMDS) and octadecyltrichlorosilane (ODTS), as the organic interlayer materials, were used to control the surface energy of the Parylene C dielectrics. For the bare case used with the pristine Parylene C dielectrics, the field-effect mobility (μFET) and threshold voltage (Vth) of dinaphtho[2,3-b:2',3'-f ]thieno[3,2-b]- thiophene (DNTT) FET devices were measured at 0.12 cm2V-1s-1 and - 5.23 V, respectively. On the other hand, the OFET devices with HMDS- and ODTS-modified cases showed the improved μFET values of 0.32 and 0.34 cm2V-1s-1, respectively. More important point is that the μFET and Vth of the DNTT FET device with the ODTS-modified Parylene C dielectric presented the smallest changes during a repeated measurement of 1000 times, implying that it has the most stable operating stability. The results could be meaned that the organic interlayer, especially ODTS, effectively covers the Parylene C dielectric surface with alkyl chains and reduces the charge trapping at the interface region between active layer and dielectric, thereby improving the electrical operating stability.

Effect of microwave power on aging dynamics of solution-processed InGaZnO thin-film transistors

  • Kim, Gyeong-Jun;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.256-256
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    • 2016
  • 기존의 디스플레이 기슬은 마스크를 통해 특정 부분에만 유기재료를 증착시키는 방법을 사용하였으나, 기판의 크기가 커짐에 따라 공정조건에 제약이 발생하였다. 이를 해결하기 위해 최근 용액 공정에 대한 연구가 활발히 진행되고 있다. 용액 공정은 기존 진공 증착 방식과 비교하였을 때 상온, 대기압에서 증착이 가능하며 경제적이고, 대면적 균일 증착에 유리하다는 장점이 있다. 반면, 용액 공정으로 제작한 소자는 시간이 지남에 따라 점차 전기적 특성이 변하는 aging effect를 보인다. Aging effect는 용액에 포함된 C기와 OH기 기반의 불순물의 영향으로 시간의 경과에 따라서 문턱전압, subthreshold swing 및 mobility 등의 전기적 특성이 변하는 현상으로 고품질의 박막을 형성하기 위해서는 고온의 열처리가 필요하다. 지금까지 고품질 박막 형성을 위한 열처리는 퍼니스 (furnace) 장비에서 주로 이루어졌는데, 시간이 오래 걸리고, 상대적으로 고온 공정이기 때문에 유리, 종이, 플라스틱과 같은 다양한 기판에 적용하기 어렵다는 단점이 있다. 따라서, 본 연구에서는 $100^{\circ}C$ 이하의 저온에서도 열처리가 가능한 microwave irradiation (MWI) 방법을 이용하여 solution-processed InGaZnO TFT를 제작하였고, 기존의 열처리 방식인 furnace로 열처리한 TFT 소자와 aging effect를 비교하였다. 먼저, solution-processed IGZO TFT를 제작하기 위해 p type Si 기판을 열산화시켜서 100 nm의 SiO2 게이트 산화막을 성장시켰고, 스핀코팅 방법으로 a-IGZO 채널층을 형성하였다. 증착후 열처리를 위하여 1000 W의 마이크로웨이브 출력으로 15분간 MWI를 실시하여 a-IGZO TFT를 제작하였고, 비교를 위하여 furnace N2 gas 분위기에서 $600^{\circ}C$로 30분간 열처리한 TFT를 준비하였다. 제작된 직후의 TFT 특성을 평가한 결과, MWI 열처리한 소자가 퍼니스 열처리한 소자보다 높은 이동도, 낮은 subthreshold swing (SS)과 히스테리시스 전압을 가지는 것을 확인하였다. 한편, aging effect를 평가하기 위하여 제작 후에 30일 동안의 특성변화를 측정한 결과, MWI 열처리 소자는 30일 동안 문턱치 전압(VTH)의 변화량 ${\Delta}VTH=3.18[V]$ 변화되었지만, furnace 열처리 소자는 ${\Delta}VTH=8.56[V]$로 큰 변화가 있었다. 다음으로 SS의 변화량은 MWI 열처리 소자가 ${\Delta}SS=106.85[mV/dec]$인 반면에 퍼니스 열처리 소자는 ${\Delta}SS=299.2[mV/dec]$이었다. 그리고 전하 트래핑에 의해서 발생하는 게이트 히스테리시스 전압의 변화량은 MWI 열처리 소자에서 ${\Delta}V=0.5[V]$이었지만, 퍼니스 열처리 소자에서 ${\Delta}V=5.8[V]$의 큰 수치를 보였다. 결과적으로 MWI 열처리 방식이 퍼니스 열처리 방식보다 소자의 성능이 우수할 뿐만 아니라 aging effect가 개선된 것을 확인할 수 있었고 차세대 디스플레이 공정에 있어서 전기적, 화학적 특성을 개선하는데 기여할 것으로 기대된다.

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Analysis of Capacitance and Mobility of ZTO with Amorphous Structure (비정질구조의 ZTO 박막에서 커패시턴스와 이동도 분석)

  • Oh, Teresa
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.6
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    • pp.14-18
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    • 2019
  • The conductivity of a semiconductor is primarily determined by the carriers. To achieve higher conductivity, the number of carriers should be high, and an energy trap level is created so that the carriers can cross the forbidden zone with low energy. Carriers have a crystalline binding structure, and interfacial mismatching tends to make them less conductive. In general, high-concentration doping is typically used to increase mobility. However, higher conductivity is also observed in non-orthogonal conjugation structures. In this study, the phenomena of higher conductivity and higher mobility were observed with space charge limiting current due to tunneling phenomena, which are different from trapping phenomena. In an atypical structure, the number of carriers is low, the resistance is high, and the on/off characteristics of capacitances are improved, thus increasing the mobility. ZTO thin film improved the on/off characteristics of capacitances after heat treating at $150^{\circ}C$. In charging and discharging tests, there was a time difference in the charge and discharging shapes, there was no distinction between n and p type, and the bonding structure was amorphous, such as in the depletion layer. The amorphous bonding structure can be seen as a potential barrier, which is also a source of space charge limiting current and causes conduction as a result of tunneling. Thus, increased mobility was observed in the non-structured configuration, and the conductivity increased despite the reduction of carriers.