• Title/Summary/Keyword: 전계 효과 트랜지스터

Search Result 230, Processing Time 0.028 seconds

Design and Numerical Analyses of SOI Trench-MOS Bipolar-Mode Field Effect Transistor (SOI 트렌치-모스 바이폴라-모드 전계효과 트랜지스터 구조의 설계 및 수치해석)

  • Kim, Du-Yeong;O, Jae-Geun;Han, Min-Gu;Choe, Yeon-Ik
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.49 no.5
    • /
    • pp.270-277
    • /
    • 2000
  • A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer.

  • PDF

High-Performance Silicon-on-Insulator Based Dual-Gate Ion-Sensitive Field Effect Transistor with Flexible Polyimide Substrate-based Extended Gate (유연한 폴리이미드 기판 위에 구현된 확장형 게이트를 갖는 Silicon-on-Insulator 기반 고성능 이중게이트 이온 감지 전계 효과 트랜지스터)

  • Lim, Cheol-Min;Cho, Won-Ju
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.28 no.11
    • /
    • pp.698-703
    • /
    • 2015
  • In this study, we fabricated the dual gate (DG) ion-sensitive field-effect-transistor (ISFET) with flexible polyimide (PI) extended gate (EG). The DG ISFETs significantly enhanced the sensitivity of pH in electrolytes from 60 mV/pH to 1152.17 mV/pH and effectively improved the drift and hysteresis phenomenon. This is attributed to the capacitive coupling effect between top gate and bottom gate insulators of the channel in silicon-on-transistor (SOI) metal-oxide-semiconductor (MOS) FETs. Accordingly, it is expected that the PI-EG based DG-ISFETs is promising technology for high-performance flexible biosensor applications.

Bipolar Characteristics of Organic Field-effect Transistor Using F16CuPc with Active Layer ($F_{16}CuPC$를 활성층으로 사용한 유기전계효과트랜지스터의 바이폴라 특성연구)

  • Lee, Ho-Shik;Park, Young-Pil;Cheon, Min-Woo;Kim, Tae-Gon;Kim, Young-Phyo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2009.06a
    • /
    • pp.303-304
    • /
    • 2009
  • We fabricated organic field-effect transistors (OFETs) based a fluorinated copper phthalocyanine. ($F_{16}CuPc$) as an active layer. And we observed the surface morphology of the $F_{16}CuPc$ thin film. The $F_{16}CuPc$ thin film thickness was 40nm, and the channel length was $50{\mu}m$, channel width was 3mm. We observed the typical current-voltage (I-V) characteristics and capacitance-voltage (C-V) in $F_{16}CuPc$ FET and we calculated the effective mobility.

  • PDF

Electrical Properties with Varying CuPc Thickness and Channel Length of the Field-effect Transistor (CuPc 두께 변화 및 채널 길이 변화에 따른 전계 효과 트랜지스터의 전기적 특성 연구)

  • Lee, Ho-Shik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.20 no.1
    • /
    • pp.47-52
    • /
    • 2007
  • Organic field-effect transistors (OFETS) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with varying channel length. The CuPc FET device was made a top-contact type and the channel length was a $100\;{\mu}m,\;50\;{\mu}m,\;40\;{\mu}m,\;and\;30\;{\mu}m$ and the channel width was a fixed at 3 mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET with varying channel length (L) and we calculated the effective mobility. Also, we measured a capacitance-voltage (C-V) by applied bias voltage with varying frequency at 43, 100, 1000 Hz.

An analytical consideration of the MOS type field-effect transistor differential amplifier (MOS형 전계효과 트랜지스터 차동증폭기에 관한 소고)

  • 정만영
    • 전기의세계
    • /
    • v.14 no.6
    • /
    • pp.1-7
    • /
    • 1965
  • This paper provides the analysis of the differential amplifier using the insulated gate, metala-oxide-semiconductor type field-effect-transistor(MOS FET), for its active element and the power drift of the amplifer. From these analytical considerations some design standardsn were found for the MOS FET differential amplifier available for the measurement of the very small current (pico-ampare range). A differential amplifier was designed and built in the view of above considerations. Its equivalent input gate voltages of the thermal drift and the power drift were 0.57mV/.deg. C in the range 25.deg. C-60.deg. C and 8.8mV/V in the range of 20% drift of its orginal value, respectively.

  • PDF

Organic Electronics, Organic Thin-Film Transistor (유기 전자소자, OTFT)

  • Kim, S.H.;Lee, J.H;Lim, S.C.;Ku, J.B.;Ku, C.H.;Sung, G.Y.;Zyung, T.H.
    • Electronics and Telecommunications Trends
    • /
    • v.20 no.5 s.95
    • /
    • pp.56-69
    • /
    • 2005
  • 유기물이 반도체 성질을 가질 수 있다는 것이 밝혀지면서 많은 여러 가지 응용분야에 많은 연구가 진행되어 왔다. 유기 반도체는 무기 반도체와 다르게 적절한 용매에 녹는다는 장점이 있다. 이 장점을 활용해 소자 제작에 직접 인쇄법인 그래픽 인쇄 방식을 사용할 수 있다. 본 기고문에서는 유기 반도체의 여러 응용 분야 중 직접 인쇄법으로 제작한 유기 전계효과 트랜지스터(OTFT)를 중심으로 기술 발전 방향과 연구 동향, 대표적 벤처 기업 등에 관하여 기술하였다.

Electrical Properties of CuPc Field-effect Transistor (CuPc를 이용한 전계효과트랜지스터의 전기적 특성)

  • Lee, Ho-Shik;Park, Yong-Pil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.410-411
    • /
    • 2008
  • Organic field-effect transistors (OFETs) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with different metal electrode. The CuPc FET device was made a top-contact type and the substrate temperature was room temperature. The source and drain electrodes were used an Au and Al materials. The CuPc thickness was 40nm, and the channel length was $50{\mu}m$, channel width was 3mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET with different electrode materials.

  • PDF

Output Characteristics of Carbon-nanotube Field-effect Transistor Dependent on Nanotube Diameter and Oxide Thickness (나노튜브 직경과 산화막 두께에 따른 탄소나노튜브 전계 효과 트랜지스터의 출력 특성)

  • Park, Jong-Myeon;Hong, Shin-Nam
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.26 no.2
    • /
    • pp.87-91
    • /
    • 2013
  • Carbon-nanotube field-effect transistors (CNFETs) have drawn wide attention as one of the potential substitutes for metal-oxide-semiconductor field-effect transistors (MOSFETs) in the sub-10-nm era. Output characteristics of coaxially gated CNFETs were simulated using FETToy simulator to reveal the dependence of drain current on the nanotube diameter and gate oxide thickness. Nanotube diameter and gate oxide thickness employed in the simulation were 1.5, 3, and 6 nm. Simulation results show that drain current becomes large as the diameter of nanotube increases or insulator thickness decreases, and nanotube diameter affects the drain current more than the insulator thickness. An equation relating drain saturation current with nanotube diameter and insulator thickness is also proposed.

Development of Nanoscale Thermoelectric Coefficient Measurement Technique Through Heating of Nano-Contact of Probe Tip and Semiconductor Sample with AC Current (탐침의 첨단과 반도체 시편 나노접접의 교류전류 가열을 통한 나노스케일 열전계수 측정기법 개발)

  • Kim, Kyeongtae;Jang, Gun-Se;Kwon, Ohmyoung
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.30 no.1 s.244
    • /
    • pp.41-47
    • /
    • 2006
  • High resolution dopant profiling in semiconductor devices has been an intense research topic because of its practical importance in semiconductor industry. Although several techniques have already been developed. it still requires very expensive tools to achieve nanometer scale resolution. In this study we demonstrated a novel dopant profiling technique with nanometer resolution using very simple setup. The newly developed technique measures the thermoelectric voltage generated in the contact point of the SPM probe tip and MOSFET surface instead of electrical signals widely adopted in previous techniques like Scanning Capacitance Microscopy. The spatial resolution of our measurement technique is limited by the size of contact size between SPM probe tip and MOSFET surface and is estimated to be about 10 nm in this experiment.

Chebyshev Approximation of Field-Effect Mobility in a-Si:H TFT (비정질 실리콘 박막 트랜지스터에서 전계효과 이동도의 Chebyshev 근사)

  • 박재홍;김철주
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.31A no.4
    • /
    • pp.77-83
    • /
    • 1994
  • In this paper we numerically approximated the field-effect mobility of a-Si:H TFT. Field-effect mobility, based on the charge-trapping model and new effective capacitance model in our study, used Chebyshev approximation was approximated as the function of gate potential(gate-to-channel voltage). Even though various external factors are changed, this formula can be applied by choosing the characteristic coefficients without any change of the approximation formula corresponding to each operation region. Using new approximated field-effect mobility formula, the dependences of field-effect mobility on materials and thickness of gate insulator, thickness of a-Si bulk, and operation temperature in inverted staggered-electrode a-Si:H TFT were estimated. By this was the usefulness of new approximated mobility formula proved.

  • PDF