• Title/Summary/Keyword: 전계효과 트랜지스터

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Analysis of the Electirical Characteristics on n-channel LDD structured poly-Si TFT's (LDD 구조를 가지는 n-채널 다결정 실리콘 박막 트랜지스터의 전기적 특성 분석)

  • 김동진;강창수
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.37 no.2
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    • pp.12-16
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    • 2000
  • The electrical characteristics of n-channel LDD structured poly-Si TFT's have been systematically investigated. It have been found that the LDD regions act as the effect of series resistance and reducing the electric field. Kink effect is disappeared and off current is greatly reduced, while on current is slightly reduced. On/off current ratio graph shows that LDD device's switching characteristic is better than that of conventional device. As a result of study, it is concluded that the effect of electric field's reduction is more dominant than that of series resistance.

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Fabrication of wrap-around gate nanostructures from electrochemical deposition (전기화학적 도금을 이용한 wrap-around 게이트 나노구조의 제작)

  • Ahn, Jae-Hyun;Hong, Su-Heon;Kang, Myung-Gil;Hwang, Sung-Woo
    • Journal of IKEEE
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    • v.13 no.2
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    • pp.126-131
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    • 2009
  • To overcome short channel effects, wrap-around field effect transistors have drawn a great deal of attention for their superior electrostatic coupling between the channel and the surrounding gate electrode. In this paper, we introduce a bottom-up technique to fabricate a wrap-around field effect transistor using silicon nanowires as the conduction channel. Device fabrication was consisted mainly of electron-beam lithography, dielectrophoresis to accurately align the nanowires, and the formation of gate electrode using electrochemical deposition. The electrolyte for electrochemical deposition was made up of non-toxic organic-based solution and liquid nitrogen was used as a method of maintaining the shape of polymethyl methacrylate(PMMA) during the process of electrochemical deposition. Patterned PMMA can be used as a nano-template to produce wrap-around gate nano-structures.

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Highly Stable Graphene Field-effect Transistors using Inverse Transfer Method (역전사법을 활용한 고안정성 그래핀 기반 전계효과 트랜지스터 제작)

  • Lee, Eunho;Bang, Daesuk
    • Journal of Adhesion and Interface
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    • v.22 no.4
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    • pp.153-157
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    • 2021
  • Graphene, a two-dimensional carbon allotrope, has outstanding mechanical and electrical properties. In particular, the charge carrier mobility of graphene is known to be about 100 times higher than that of silicon, and it has received attention as a core material for next-generation electronic devices. However, graphene is very sensitive to environmental conditions, especially vulnerable to moisture or oxygen. It becomes a disadvantage in that the stability of the graphene-based electronic device, so various attempts are being made to solve this problem. In this work, we report a method to greatly improve the stability by controlling the surface energy of the polymer layer used for transferring the insulating layer of the graphene field-effect transistor. As the surface energy of the polymer used as the insulating layer was lowered, the stability could be improved by effectively controlling the adsorption of impurities in the atmosphere such as water molecules or oxygen.

그래핀-탄소나노튜브 혼성 나노구조 합성

  • Jeong, Sang-Hui;Song, U-Seok;Lee, Su-Il;Kim, Yu-Seok;Cha, Myeong-Jun;Kim, Seong-Hwan;Jo, Ju-Mi;Jeong, Min-Uk;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.613-613
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    • 2013
  • 그래핀은 저차원계 구조에서 기인하는 뛰어난 전기적, 물리적, 기계적 성질을 지니고 있어 실리콘 기반 기술을 대체할 전계 효과 트랜지스터 이외에도 투명전극, 초고용량 커패시터, 전계방출 디스플레이 등 다양한 응용분야에 적용 가능하다. 최근에는 이러한 응용 연구분야에서 그래핀과 탄소나노튜브 각각의 단점을 최소화하고 장점을 극대화하기 위한 그래핀-탄소나노튜브 혼성 나노구조에 대한 연구들이 진행되고 있는 추세이다. 이전 연구들에서 환원된 그래핀 산화물(Reduced Graphene Oxide, RGO)을 이용한 그래핀-탄소나노튜브 혼성 나노구조가 제작되었는데, 이는 RGO의 제작과정에서 복잡한 공정과 긴 합성과정이 요구될 뿐 아니라, 복합 물질에서 탄소나노튜브의 밀도 제어가 어렵다는 단점을 지닌다. 또한 현재까지 제작된 그래핀-탄소나노튜브 혼성 나노구조의 경우, 열 화학기상증착법으로 합성된 다층(few-layers)의 그래핀과 탄소나노튜브 혼성 나노구조를 제작하였다 [1-6]. 본 연구에서는 우수한 전기적 특성을 가진 단층(monolayer)의 그래핀을 열 화학기상증착법으로 합성한 후, 그래핀 위에 단일벽 탄소나노튜브를 성장시킴으로써 그래핀-탄소나노튜브 혼성 나노구조를 제작하였다. 합성된 그래핀-탄소나노튜브의 구조적 특징은 주사 전자 현미경과 라만 분광기 측정을 통해 확인하였고, 촉매의 표면 형상 및 화학적 상태는 원자힘 현미경과 X선 광전자 분광법을 통해 확인하였다. 또한 그래핀 기반의 전계 효과 트랜지스터의 경우, 상온에서 그래핀은 우수한 전하 이동도를 가지며 웨이퍼 스케일에서 제작하기 쉬우나 밴드 갭이 없으므로 높은 Ion/Ioff를 가지는 그래핀 기반의 트랜지스터를 만드는 것이 과제이다. 반면 탄소나노튜브는 큰 에너지 갭을 가지고 있으므로 높은 Ion/Ioff를 구현하는 소자 제작이 가능하다. 그리하여 제작된 그래핀-탄소나노튜브 혼성 나노구조의 소자 제작을 통해 전기적 특성을 조사하였다.

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Effects of Mobility-Gap States on the Performance of a-Si:H Field-Effect Transistors (이동도갭 상태들의 수소화된 비결정 실리콘 전계효과 트랜지스터 성능에 대한 영향)

  • 제갈장
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.52-57
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    • 1995
  • An accurate and efficient single-integral semi-numerical model is developed and applied to analyse effects of localized electronic states in the mobility gap on the drain-current versus gale-voltage characteristics of hydrogenated amorphous field-effect transistors. It is shown that the low-density deep-gap states distributed in the midgap also sensitively and largely influence the device electronic performance as well as well as the large-density tail states distributed near the conduction band edge.

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Degradation Characteristics of Mobility in Channel of P-MOSFET's by Hot Carriers (핫 캐리어에 의한 피-모스 트랜지스터의 채널에서 이동도의 열화 특성)

  • 이용재
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.1
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    • pp.26-32
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    • 1998
  • We have studied how the characteristics degradation between effective mobility and field effect mobility of gate channel in p-MOSFET's affects the gate channel length being follow by increased stress time and increased drain-source voltage stress. The experimental results between effective and field-effect mobility were analyzed that the measurement data are identical at the point of minimum slope in threshold voltage, the other part is different, that is, the effective mobility it the faster than the field-effect mobility. Also, It was found that the effective and field-effect mobility. Also, It was found that the effective and field-effect mobility of p-MOSFET's with short channel are increased by decreased channel length, increased stress time and increased drain-source voltage stress.

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Pyro Squib Circuit Design with Stable Constant Current Driving Method (안정적인 정전류 구동 방식의 파이로 스퀴브 회로 설계)

  • Soh, KyoungJae
    • Journal of the Korea Institute of Military Science and Technology
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    • v.25 no.5
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    • pp.545-551
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    • 2022
  • We proposed a design method for constant current pyro squib circuit. The current method using N MOSFET for the stability problem has a weakness of the current change, requiring a new design. This paper identified the problem with conventional squib circuit where the current is reduced by 25 % when maximum resistance is 3 ohms. Thus, we proposed a stable constant current driving circuit using P MOSFET and PNP BJT. We confirmed stable constant circuit operation through simulations and measurements of the proposed circuit design where the current did not change until the resistance reached 3 ohms.

Surface Roughness Effects on Polycrystalline silicon Thin Film Transistor (계면 거칠기가 다결정 박막 트랜지스터에 미치는 영향)

  • Choi, Hyoung-Bae;Park, Cheol-Min;Han, Min-Ku
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1627-1629
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    • 1997
  • 엑시머 레미저를 이용한 다결정 실리콘막과 게이트 절연막 사이의 계면 거칠기를 개선하기 위해 변형핀 방법의 레이저 어닐링으로 다결정 실리콘 박막 트랜지스터를 제작하였다. SEM(scanning electron microscope)으로 활성층과 게이트 절연층과의 표면 이미지를 관찰한 결과 기존의 레이저 어닐링 결정화에 의한 것보다 계면 거칠기 정도가 상당히 줄었음을 관찰 하였다. 이렇게 개선된 계면 거칠기가 다결정 박막 트랜 지스터의 성능에 미치는 효과를 분석하기 위해 기존의 방법으로 제작된 소자와 계면 거칠기를 줄인 소자의 여러 가지 전기적 변수들(문턱 전압 기울기, 문턱 전압, 누설 전류)을 비교해 보았다. 우리는 또한 계면 거칠기와 다결정 박막 트랜지스터 소자의 상관 관계를 보기 위해 컴퓨터 시뮬레이션도 함께 병행하였다. 시뮬레이션을 통해 거친 계면 부근의 전계 집중 효과 같은 것으로 인해 소자의 성능이 저하된다는 것을 알 수 있었다.

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Electrical Characteristics of IGBT for Gate Bias under $\gamma$ Irradiation (게이트바이어스에서 감마방사선의 IGBT 전기적 특성)

  • Lho, Young-Hwan
    • Journal of the Institute of Electronics Engineers of Korea SC
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    • v.46 no.2
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    • pp.1-6
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    • 2009
  • The experimental results of exposing IGBT (Insulated Gate Bipolar Transistor) samples to gamma radiation source show shifting of threshold voltages in the MOSFET and degradation of carrier mobility and current gains. At low total dose rate, the shift of threshold voltage is the major contribution of current increases, but for more than some total dose, the current is increased because of the current gain degradation occurred in the vertical PNP at the output of the IGBTs. In the paper, the collector current characteristics as a function of gate emitter voltage (VGE) curves are tested and analyzed with the model considering the radiation damage on the devices for gate bias and different dose. In addition, the model parameters between simulations and experiments are found and studied.

Control of the Gold Electrode Work Function for High Performance Organic Thin Film Transistors (표면개질된 금 전극의 일함수 조절을 통한 고성능 유기박막 트랜지스터 개발)

  • Park, Yeong Don
    • Applied Chemistry for Engineering
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    • v.23 no.3
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    • pp.289-292
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    • 2012
  • Au electrodes modified with self-assembled monolayers (SAMs) were used to control the work function of source/drain electrodes in triethylsilylethynyl anthradithiophene (TES ADT)-based organic thin film transistors (OTFTs). By using benzothiol (BT) and pentafluorobenzothiol (PFBT) SAMs, the hole injection barrier between Au and the highest occupied molecular orbital (HOMO) of TES ADT was controlled. After a solvent annealing, TES ADT OTFTs with PFBT SAM-treated Au electrodes were found to exhibit high field-effect mobilities of $0.05\;cm^2/Vs$ and on/off current ratios of $10^6$.