• Journal of the Korea Computer Graphics Society
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• v.17 no.4
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• pp.1-10
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• 2011

The general technique of ink-and-wash drawing consists of brush, ink and paper modeling and brush movement, ink diffusion and paper material simulation. In this paper, we suggest the simplified Qing's tank model that can decrease the computational time of ink diffusion and absorption on korean paper. The suggested drawing system is classified the characteristics of ink-and-wash into ink-shade, diffusion, line and paper. Also, the user's movement using motion sensor and IR sensor in wiimote is transmitted to brush position and direction.

• Journal of Korea Game Society
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• v.10 no.2
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• pp.11-20
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• 2010

Recently there are various innovative user interfaces such as a wireless motion controller Wiimote appeared to give a new user experience which is different from the traditional devices like a joystick, mouse, or keyboard. With the advent of technologies, display devices become larger and larger in screen size and offer high-resolutions, and tiled display systems are also used in various applications. Although there are some efforts on investigating new interfaces developed for the large screen, there are a few studies conducted on user interaction on large displays such as tiled display. In this paper, we present a study evaluating and analyzing the effects of mouse or Wiimote user interactions on four different kinds of displays with various sizes and resolutions.

• Korean Journal of Materials Research
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• v.6 no.7
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• pp.661-670
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• 1996

리모트 수소 플라즈마를 이용하여 실리콘 웨이퍼 표면 위에 있는 금속불순물의 제거 및 제거기구에 관하여 조사하였다. 실리콘의 표면과 내부분석을 위하여 TXRF(total reflection x-ray fluorescence)와 SPV(surface photovoltage), AFM(atomic force microscope)을 사용하였다. TXRF 분석결과 리모트 수소 플라즈마가 금속오염물질 제거에 상당한 효과가 있는 것으로 나타났다. TXRF분석결과 리모트 수소 플라즈마가 금속오염물질 제거에 상당한 효과가 있는 것으로 나타났다. 리모트 수소플라트마 처리 후 금속오염은 금속원소의 종류에 따라 1010atoms/$\textrm{cm}^2$-1011atoms/$\textrm{cm}^2$수준이었다. SPV분석결과를 보면 수소 플라즈마 처리에 의해 minority carrier 수명이 전반적으로 증가하였다. AFM 분석을 통하여 수소 플라즈마 처리가 표면 손상을 일으키지 않으며 표면의 거칠기에 나쁜 영향을 미치지 않음을 알 수 있었다. 또한 본 실험에서 나타난 결과들을 종합해 볼 때 금속오염물의 제거기구는 자연산화막 혹은 수소로 passivate된 실리콘 웨이퍼 표면을 수소 플라즈마에서 발생된 수소원자가 실리콘표면을 약하게 에칭할 때 떨어져 나가는 'lift-off'가 유력한 것으로 판단된다.

• Journal of Korea Multimedia Society
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• v.13 no.10
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• pp.1547-1556
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• 2010

Until now, many Computer Aided Education(CAE) contents are developed for kids and children with disabilities The contents cover various types of training, including visual perception training, intelligence development training, and literature education areas. Major problems on those contents are those contents requires long training time on desktop machine, which deteriorates human activities. These problems also cause inaction syndrome for young kids and children with disabilities. Solving this problem, we require a human motion sensing contents on touch screen or touch board, which interacts with a trainees and enhancing activity, collaboration and immersiveness. We implement and develope an education contents interacts with a trainee using beam projector or screen and IR(Infra-Red) pens using wiimote controller sensing technology.

• Journal of the Korean Vacuum Society
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• v.10 no.2
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• pp.267-274
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• 2001

Removal of Cr, Ni and Cu impurities on Si surfaces using remote plasma-excited hydrogen was investigated. Si surfaces were contaminated intentionally by acetone with low purity. To determine the optimum process condition, remote plasma-excited hydrogen cleaning was conducted for various rf-powers and plasma exposure times. After remote plasma-excited hydrogen cleaning, Si surfaces were analyzed by Total X-ray Reflection Fluorescence(TXRF), Surface Photovoltage(SPV) and Atomic Forece Microscope(AFM). The concentrations of Cr, Ni and Cu impurities were reduced and the minority carrier lifetime increased after remote plasma-excited hydrogen. Also RMS roughness decreased by more than 30% after remote plasma-excited hydrogen cleaning. AFM analysis results also show that remote plasma-excited hydrogen cleaning causes no damage to the Si surface. TXRF analysis results show that remote plasma-excited hydrogen cleaning is effective in eliminating metallic impurities from Si surface only if it is performed under an optimum process conditions. The removal mechanism of the Cr, Ni and Cu impurities using remote plasma-excited hydrogen treatments is proposed to be the lift-off during removal of underlying chemical oxides.

• Proceedings of the Korea Contents Association Conference
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• 2009.05a
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• pp.70-73
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• 2009

Wii Remote is the primary controller for Nintendo's Wii console. A main feature of the Wii Remote is its motion sensing capability, which allows the user to interact with and manipulate items on screen via movement and pointing through the use of accelerometer and optical sensor technology. Another feature is its expandability through the use of Bluetooth. In this Study, use of motion sensors and Bluetooth capabilities. The user holding the remote on the screen, pointing to receive information about the values of the coordinates on the screen indicating the drawing of the implementation.

• Korean Journal of Materials Research
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• v.6 no.8
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• pp.817-824
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• 1996

Removal of Cu impurities on Si substrates using remote H-plasma was investigated. Si substrates were intentionally contaminated by 1ppm ${CuCI}_{2}$, standard chemical solution. To determine the optimal process condition, remote H-plasma cleaning was conducted varying the parameters of rf power, cleaning time and remoteness(the distance between the center of plasma and the surface of Si substrate). After remote H-plasma cleaning was conducted, Si surfaces were analysed by TXRF(total x-ray reflection fluorescence) and AFM(atomic force microscope). The concentration of Cu impurity was reduced by more than a factor of 10 and its RMS roughness was improved by more than 30% after remote H-plasma cleaning. TXRF analysis results show that remote H-plasma cleaning is effective in eliminating Cu impurity on Si surface when it is performed under the optimal process condition. AFM analysis results also verifies that remote H-plasma cleaning makes no damage to the Si surface. The deposition mechanism of Cu impurity may be explained by the redox potential(oxidation-reduction reaction potential) theory. Based on the XPS analysis results we could draw a conclusion that Cu impurities on the Si substrate are removed together with the oxide by a "lift-off" mechanism when the chemical oxide( which forms when Cu ions are adsorbed on the Si surface) is etched off by reactive hydrogen atoms.gen atoms.

• Proceedings of the Korea Information Processing Society Conference
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• 2010.11a
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• pp.1446-1449
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• 2010

닌텐도 위 출시 이후 가속센서를 활용한 체감형 게임기에 관한 관심이 급증하고 있다. 닌텐도의 경우 위 리모트에 가속센서를 탑재하여 사용자가 라켓이나 배트를 휘두르는 것과 같은 조작이 가능하게 한다. 스마트폰 또한 가속센서를 내장해 출시되고 있기 때문에 스마트폰의 가속센서를 활용해 게임을 개발할 수 있다. 하지만 스마트폰 플랫폼은 다양하기 때문에 한 플랫폼에서 개발을 완료하였다 하더라도 다른 플랫폼에서 동작하려면 대상 플랫폼에 맞게 프로그램을 재작성 해야 하는 단점이 있다. 해결책으로 웹 어플리케이션이 제안되어 왔다. 그러나 웹 어플리케이션은 자바스크립트 보안 정책 때문에 파일시스템, 센서 등 로컬 자원에 대한 접근이 불가능하다. 이러한 단점을 극복하고자 웹 어플리케이션이 센서를 조작하고 파일시스템에 접근할 수 있도록 지원하는 PhoneGap, BONDI 등의 솔루션이 개발되었다. 본 논문은 센서를 사용한 웹 게임의 구현을 통해 센서를 이용한 웹 게임 개발 방법을 제시한다.

• Korean Journal of Materials Research
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• v.8 no.8
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• pp.751-756
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• 1998

Effects of remote hydrogen plasma cleaning process parameters on the removal of Fe impurities on Si surfaces and the Fe removal mechanism were investigated. Fe removal efficiency is enhanced with decreasing the plasma exposure time and increasing the rf-power. The optimum plasma exposure time and rf-power are 1 min and 100W. respectively, in the range below 10 min and 100W. Fe removal efficiency is better under lower pressures than higher pressures, and the optimum $\textrm{H}_2$ flow rate was found to be 20 and 60sccm, respectively, under a low and a high pressure. The post-RHP(remote hydrogen plasma) annealing enhanced metallic contaminants removal efficiency, and the highest efficiency was achieved at $600^{\circ}C$. According to the AFM analysis results Si surface roughness was improved by 30-50%, which seems to be due to the removal of particles by the plasma cleaning. Also. Fe impurities removal mechanisms by remote hydrogen plasma are discussed.

• Journal of Korea Game Society
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• v.16 no.4
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• pp.25-34
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• 2016

Recent stealth games are mainly action games with frontal confrontation or combat features. In this paper, we designed and implemented an stealth game, where characters are weak person and play is conducted by avoiding the situation, not by frontal confrontation. We chose the light as the key factor for the avoidance. The players can survive and fulfill the missions by blocking the enemy's vision. After implementing the first version, we found that the game using only the avoidance is not as fun as expected. To make the game more interesting, we added limited attack function, provided mini map for better user interface, and this paper describes the options we had and experiences of the decision making process to make the better game.