References
- Semiconductor Integrated Circuit Processing Technology W.R. Runyan;K.E. Bean
- Handbook of Semiconductor Wafer Cleaning Technology W. Kern
- Proc. Second Inter. Symp. on Cleaning Technol. in Semicond. Dev. Macufacturing R.M. Gluck;R.M. Gluck;J. Ruzyllo(ed.);R. Novak(ed.)
- Proc. Second Inter. Symp. on Cleaning Technol. in Semicond. Dev. Macufacturing J.C. Ivankovits;D.A. Bohling;A. Lane;D.A. Roverts;J. Ruzyllo(ed.);R. Novak(ed.)
- Proc. Second Inter. Symp. on Cleaning Technol. in Semicond. Dev. Macufacturing B. Witowski;J. Chacon;B. Menon;J. Ruzyllo(ed.);R. Novak(ed.)
- Proc. First Inter. Symp. on Cleaning Technol. in Semicond. Dev. Macufacturing T. Ito;T. Sugino;S. Watanabe;Y. Nara;Y. Sato;J. Ruzyllo(ed.);R. Novak(ed.)
- Microcontamination S. Bat;J. Delarios;B. Doris;M. Gordon;W. Krusell;D. McKean;G. Smolinsky
- Metal Impurities in Silicon-Device Fabrication K. Graff
- Surface Science the first thirty years 299/300 J. Lagowski;C. B. Duke(eds)
- J. Electrochem. Sco. v.142 no.4 J.A. Sees;L.H. Hall
- J. Vac. Sci. Technol. v.B12 no.5 C.W. Nam;S. Ashok
- Glow Discharge Process B. Chapman
- J. Appl. Phys. v.71 no.2 M. Delfino;S. Salimian;D. Hodul;A. Ellingboe;W. Tsai
- J. Vac. Sci. Technol. v.A11 no.5 W. Tsai;M. Delfino;M.E. Day;T. Sheng;B.C. Chung;S. Salimian
- J. Vac. Sci. Technol. v.B12 no.4 M. Lshii;K. Nakashima;T. Hayakawa;I. Tajima
- J. Electrochem. Soc. v.140 no.11 Z.H. Zhou;E.S. Aydil;R.A. Gottscho;Y.J. Chabal;R. Rief