• Title/Summary/Keyword: 원자간력-현미경

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Non-contact mode measurement of high aspect ratio tip (High aspect ratio 팁의 비접촉모드에서의 측정)

  • Shin Y.H.;Han C.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.463-464
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    • 2006
  • This paper present experimental results by non-contact mode Atomic Force Microscopy using high aspect ratio tips (HAR-T). We fabricated the carbon nanotube tip based on dielectrophoresis and the carbon nano probe by focused ion beam after dielectrophoretic assembling. In this paper, we measure AAO sample and trench structure to estimate HAR-T's performance and compared with conventional Si tip. We confirmed that results of HAR-T's performance in non contact mode was very superior than conventional tip.

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Analysis and Control f Contact Mode AFM (접촉모드 AFM의 시스템 분석 및 제어)

  • 정회원;심종엽;권대갑
    • Journal of the Korean Society for Precision Engineering
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    • v.15 no.3
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    • pp.99-106
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    • 1998
  • Recently, scientists introduced a new type of microscope capable of investigating nonconducting surfaces in an atomic scale, which is called AFM (Atomic Force Microscope). It was an innovative attempt to overcome the limitation of STM (Scanning Tunnelling Microscope) which has been able to obtain the image of conducting surfaces. Surfaces of samples are imaged with atomic resolution. The AFM is an imaging tool or a profiler with unprecedented 3-D resolution for various surface types. The AFM technology, however, leaves a lot of room for improvement due to its delicate and fragile probing mechanism. One of the room for improvements is gap control between probe tip and sample surface. Distance between probe tip and sample surface must be kept in below one Angtrom in order to measure the sample surface in Angstrom resolution. In this paper, AFM system modeling, experimental system identification and control scheme based on system identification are performed and finally sample surface is measured by home-built AFM with such a control scheme.

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Analysis of Dynamic Behavior of Piezoelectric Atomic Force Microscope Cantilever (압전형 AFM 외팔보의 동적거동 해석)

  • 하성규;박성균;김영호
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.12 no.3
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    • pp.187-194
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    • 2002
  • A seven-port impedance and admittance matrices of multilayered piezoelectric beam are derived for the analysis of piezoelectric AFM ( atomic force microscope) cantilever that is partially covered by the piezoelectric layer. The variational principle is used for deriving the extensional and flexural motional equations and the conjugate parameters. Overall impedance matrix of AFM cantilever can be obtained by combining two impedance matrices of the covered and the non-covered. she resonance and antiresonance frequencies and the effective electromechanical coupling factors are calculated using the derived matrices. The results and the three dimensional finite element solutions are compared with the experimental results in other publication.

Method of manufacturing and characteristics of a functional AFM cantilever (기능성 원자간력 현미경 캔틸레버 제조 방법과 특성)

  • Suh Moon Suhk;Lee Churl Seung;Lee Kyoung Il;Shin Jin-Koog
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.56-58
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    • 2005
  • To illustrate an application of the field effect transistor (FET) structure, this study suggests a new cantilever, using atomic force microscopy (AFM), for sensing surface potentials in nanoscale. A combination of the micro-electromechanical system technique for surface and bulk and the complementary metal oxide semiconductor process has been employed to fabricate the cantilever with a silicon-on-insulator (SOI) wafer. After the implantation of a high-ion dose, thermal annealing was used to control the channel length between the source and the drain. The basic principle of this cantilever is similar to the FET without a gate electrode.

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Surface potential mapping using a functional AFEM cantilever (기능성 원자간력 현미경 캔틸레버를 이용한 표면 전위 측정)

  • Suh Moon Suhk;Lee Churl Seung;Lee Kyoung Il;Shin Jin-Koog
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.53-55
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    • 2005
  • The surface potential variations are measured, according to the enhanced measuring speed and voltage sensitivity, using an active device, such as a field effect transistor $(FET)^{1-3}$. In this study, the surface potential was mapped in the patterned $SiO_2$ medium at room temperature. An improved FET-tip cantilever, which has a source, a drain, and an n- channel, was used in this study. The potential images were analyzed both in the contact mode and the non-contact mode, using only a pre-amplifier system instead of a lock-in the amplifier.

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Development of a measurement system for the surface of micro-parts (초소형 마이크로 부품 표면 측정 시스템 개발)

  • Hong Seong-Wook;Ko Myung-Jun;Shin Young-Hyun;Lee Deug-Woo
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2005.05a
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    • pp.413-418
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    • 2005
  • This paper proposes a measurement method for the surface of micro-parts by using AFM(Atomic Force Microscope). To this end, two techniques are presented to extend the capacity of AFM. First, the measurement range is extended by using an image matching method based on correlation coefficients. To account for the inaccuracy of the coarse stage implemented in AFM's, the image matching technique is applied to two neighboring images intentionally overlapped with each other. Second, a method to measure the shape of relatively large specimen is presented by using the inherent trigger mechanism due to the atomic force. The proposed method is proved effective through a series of experiments.

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A Study on Material Properties and Fabrication of ITO Thin Films by Unbalanced-Magnet Structure in Magnetron Sputtering (DC 마그네트론 스파터링의 비대칭 자석강조에 의한 ITO 박막 제조 및 물성에 관한 연구)

  • 신성호;김현후;박광자
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.700-705
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    • 1997
  • Transparent conducting indium tin oxide (TC-ITO) thin films are deposited on soda lime glass by a dc magnetron sputtering technique having the unbalanced-magnet structure in order to improve the electrical/material characteristics and to avoid the surface damages. The material properties are measured by the x-ray diffractometer (XRD) and atomic force microscope (AFM). The (400) peak as the preferred orientation of <100> direction for ITO thin films is stabilized with the increase of substrate temperature. The surface roughness estimated by AFM 3D image at the substrate temperature of 40$0^{\circ}C$ is extremely uniform. The best resistivity of ITO films (5500 $\AA$ thick) at 40$0^{\circ}C$ is about 1.3$\times$10$^{-4}$ $\Omega$cm on the position of 4 cm from substrate center.

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Certification of magnification standards for the establishment of meter-traceability in microscopy (현미경의 길이표준 소급성 확립을 위한 배율 교정 시편 인증)

  • Kim J.A.;Kim J.W.;Park B.C.;Eom T.B.;Kang C.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.645-648
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    • 2005
  • Microscopy has enabled the development of many advanced technologies, and higher level microscopic techniques are required according to the increase of research in nano-technology and bio-technology fields. Therefore, in many applications, we need to measure the dimension of micro-scale parts accurately, not just to observe their shapes. To establish the meter-traceability in microscopy, gratings have been widely used as a magnification standard. KRISS provides the certification service of magnification standards using an optical diffractometer and a metrological AFM (MAFM). They are based on different measurement principles, and so can give complementary information for each other. In this paper, we describe the configuration of each system and measurement procedures to certificate grating pitch values of magnification standards. Several measurement results are presented, and the discussion about them are also given. Using the optical diffractometer, we can calibrate a grating specimen with uncertainty of less than 50 pm. The MAFM can measure a grating specimen of down to 100 nm pitch value, and the calibrated values usually have uncertainty less than 500 pm.

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A Study on Failure Analysis of Low Pressure Trubine Blade Using AFM and FEM (AFM과 FEH을 이용한 저압 터빈 블레이드의 파손해석에 관한 연구)

  • Hong, Soon-Hyeok;Cho, Seok-Swoo;Joo, Won-Sik
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.25 no.11
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    • pp.1705-1712
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    • 2001
  • Mechanical component has striation with constant width and SEM can estimate fracture type and loading condition. SEM has benefit to fatigue fracture analysis but striation can be observed according to the kind of material and range of crack growth rate and can't. In this case, it needs AFM that can measure 3-dimensional surface profile with resolution of atomic size. In this study. to find fracture reason of torsion-mounted blade in nuclear plant, we estimate the relation between stress intensity factor range and root mean square roughness in 12% Cr steel by AFM and predict in-service loading condition of turbine blade. failure analysis is performed by finite element method and Goodman diagram on torsion-mounted blade.

A Study on Failure Analysis of Low Pressure Turbine Blade in Nuclear Plant using AFM (AFM을 이용한 발전소용 저압 터빈 블레이드의 파손해석에 관한 연구)

  • Hong, Soon-Hyeok;Choi, Woo-Sung;Moon, Sung-Jun;Cho, Seok-Swoo;Joo, Won-Sik
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.10
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    • pp.61-68
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    • 2001
  • Turbine blade in nuclear plant is subject to cyclic bending fatigue by high steam pressure. Especially, fatigue fracture is caused by low stress below yielding stress. Photograph by SEM doesn't have striation but photograph by AFM has striation on the fatigue fractured surface of 12% Cr steel used in turbine blade. Surface roughness $R_q$ has the linear relation with respect to stress intensity factor range ΔK and is increased linearly according to load amplitude $\textit{\Delta}P$. In this study loading condition applied to turbine blade is predicted by the relation between the gradient of $R_q$ to $\textit{\Delta}K$ and load amplitude $\textit{\Delta}P$.

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