• Electrical & Electronic Materials
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• v.8 no.1
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• pp.102-113
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• 1995

일반적으로 단결정 실리콘은 거의 모든 전자소자의 재료로서 널리 사용되고 있으며 제조공정기술 또한 상당한 수준에 도달하고 있다. 최근에는 실리콘 자체의 우수한 압저항효과, 기계적 특성 그리고 반도체 제조공정을 이용한 미세가공기술인 마이크로머시닝을 이용하는 반도체 압력센서에 대한 연구가 활발히 진행되고 있다. 기계식 압력센서에 비해서 전기적 변화를 이용하는 반도체 압력센서에서는 소형, 저가격, 고신뢰성, 고감도, 다기능, 고분해, 고성능 및 집적화 등의 우수한 특성을 지니고 있다. 본고에서는 이러한 특성을 가지는 반도체 압력센서중 특히, 압저항형과 용량형 압력센서의 구조와 원리, 그리고 연구.개발동향 및 향후 전망에 관해서 기술하였다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.36 no.7
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• pp.777-787
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• 2012

The transient analysis for the output voltage of a piezoresistive microaccelerometer takes a relatively high computation time because at least two iterations are required to calculate the piezoresistive-structural coupled response at each time step. In this study, the high computational cost for calculating the transient output voltage is considerably reduced by an approach integrating the mode superposition method and the least square method. In the approach, data on static displacement and output voltage calculated by piezoresistive-structural coupled simulation for three acceleration inputs are used to develop a quadratic regression model, relating the output voltage to the displacement at a certain observation point. The transient output voltage is then approximated by a regression model using the displacement response cheaply calculated by the mode superposition method. A high-impact microaccelerometer subject to several types of acceleration inputs such as 100,000 G shock, sine, step, and square pulses are adopted as a numerical example to represent the efficiency and accuracy of the suggested approach.

• Journal of the Korean Society of Propulsion Engineers
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• v.22 no.6
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• pp.111-117
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• 2018

In this study, an MEMS thrust measurement system was designed and a study on the performance prediction of system was performed to evaluate the performance of micro thruster. Thrust measurement system consists of beam, membrane, and piezoresistive sensor. An FEM analysis was carried out to verify the stability of the system, confirm the stress variation at the beam, and position the piezoresistive sensor. The stability of the designed system was verified by comparing the yield strength of the material with the maximum stress. The piezoresistive sensor was designed to be 20% of the length of the beam to obtain a high gauge factor. The size of the membrane and the beam of the reference model were designed to be $15mm{\times}15mm$, and $500{\mu}m{\times}500{\mu}m$, respectively.

• Journal of Sensor Science and Technology
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• v.7 no.5
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• pp.300-305
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• 1998

In this paper, integrated pressure sensor with calibration of offset voltage and full scale output and temperature compensation of offset voltage and full scale output were designed. The signal conditioning circuitry are designed that calibrate the offset voltage and full scale output to desired values and minimize the temperature drift of offset voltage and full scale output. Designed circuits are simulated using SPICE in a bipolar technology. The ion implanted resistor of different temperature coefficient were used to trimming the desired values. As a results, offset voltage was calibrated to 0.133V and the temperature drift of offset voltage was reduced to $42\;ppm/^{\circ}C$. Also, the full scale output was calibrated to 4.65V and the temperature coefficient of full scale output was reduced to $40ppm/^{\circ}C$ after temperature compensation.

• Journal of Sensor Science and Technology
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• v.5 no.5
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• pp.31-37
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• 1996

This paper presents characteristics of pressure sensor using shear-type piezoresistor of LPCVD(low pressure chemical vapour deposition) grown polycrystalline silicon films. The sensor has 3.1mV/V of pressure sensitivity in the pressure range of $1kgf/cm^{2}$, ${\pm}0.012%FS/^{\circ}C$ of TCO, and ${\pm}0.08%FS/^{\circ}C$ of TCS in the temperature range of $-20{\sim}+125^{\circ}C$. It showed ${\pm}0.2%FS$ of hysteresis and ${\pm}1.5%FS$ of non-linearity. Shear-type polycrystalline silicon pressure sensor can eliminate temperature dependence of offset caused by resistors mismatch and be used in relatively wide temperature range, compared to the conventional full-bridge silicon pressure sensors.

• Proceedings of the KAIS Fall Conference
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• 2001.05a
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• pp.269-272
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• 2001

실리콘 마이크로머시닝 기술과 바이폴라 공정으로 집적화된 압력센서를 제작하고 동작특성 평가를 수행하였다. 센서부 보상파라미터를 추출하였고 트리밍 공정을 통하여 출력전압의 보상을 수행하였다. 센서 특성은 압저항 위치, 마스크 정렬 오차, 다이어프램 정밀두께제어 정도, 보호막의 과도식각 정도 등에 의하여 민감하게 좌우됨을 알 수 있었다. 웨이퍼별 샘플추출을 통하여 센서부 감도는 평균 0.653mV/kPa, 감도의 온도계수는 -2078.8ppm/℃, 옵셋 전압은 30.78mV, 옵셋전압의 온도계수는 32.11㎶/℃로 측정되었다. 추출된 샘플의 다이어프램 두께오차는 27±2.5㎛였다. 센서부 특성평가 결과를 통하여 신호처리회로의 옵셋 및 스팬보상, 온도보상을 위한 트리밍 공정을 수행한 결과 개발사양을 만족하는 결과를 얻을 수 있었다.