• Clean Technology
• /
• v.18 no.1
• /
• pp.43-50
• /
• 2012

Cleaning procedure of solar silicon wafer, following ingot sawing process in solar cell production is studied. Types of solar silicon wafer can be divided into monocrystalline or multicrystalline, and slurry sawn wafer or diamond sawn wafer according to the ingot growing methods and the sawing methods, respectively. Wafer surface and contaminants can vary with these methods. The characterisitics of contaminants and wafer surface are investigated for each cleaning substrate, and appropriate cleaning agents are developed. Physical properties and cleaning ability of the cleaning agents are evaluated in order to verify the application in the industry. The wafers cleaned with the cleaning agents do not show any residual contaminants when analyzed by XPS and regular patterns are formed after texturization. Furthermore, the cleaning agents are applied in the production industry, which shows superior cleaning results compared to the existing cleaning agents.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.11 no.3
• /
• pp.795-801
• /
• 2010

As the fabrication technology of LCDs (Liquid Crystal Displays) advances, the size of mother glass substrates is getting larger, and the fabrication process is becoming finer. Accordingly, the importance of cleaning processes grows in the fabrication process of LCDs. In this study, we have compared and evaluated the particle removal efficiency for three different methods of physical cleaning, which are brush, bubble jet, and aqua/air cleaning. Using the seventh generation glass substrate, the particle removal efficiency has been investigated by changing operation conditions such as a flow rate of deionized water, pressure, contact depth between a brush bristle and a glass substrate, and so forth. In the case of brush cleaning, the cleaning efficiency barely changes after a critical point when the contact depth is varied. While the cleaning efficiency of bubble jet cleaning is almost independent of pressure, that of aqua/air cleaning is affected by pressure up to a critical point, but is not changed after it. We note the brush cleaning is the most effective among the three cleaning methods under our experimental conditions.

• Clean Technology
• /
• v.19 no.3
• /
• pp.264-271
• /
• 2013

In this study, we optimized the removal condition of contaminants attached on the scrap surface to recycle the scrap generated from the Zr alloy tube manufacturing process back to the nuclear grade. The main contaminant is remnant of watersoluble cooling lubricant that is used in the pilgering manufacture during the tube production, and it is assumed to be compressed and carbonized on the surface of tube. Zirlo alloy tube of ${\phi}9.50mm$, which has high occurrence frequency of scrap, was selected as the object to be cleaned, and cleaning abilities of reagents were evaluated by measuring the characteristics of contaminants remained and by analyzing the surface of the tube after cleaning process. For evaluation of each cleaning agent, we selected two types of sodium hydroxide series and three types of potassium hydroxide series. Furthermore, to confirm dependence on tempe-rature and ultrasonic intensities, cleaning at the room temperature, $40^{\circ}C$, and $60^{\circ}C$ was conducted, and results showed that higher the cleaning temperature and higher the ultrasonic intensity, better the cleaning effect. As a result of the bare-eye inspection, while the use of sodium hydroxide provided satisfactory condition on the tube surface, the use of potassium hydroxide series provided satisfactory condition on the tube surface only when the ultrasonic intensity was over 120 W. In the cleaning effect analysis using the gravimetric method, cleaning efficiency of sodium hydroxide series was as high as 97.6% ($60^{\circ}C$, 120 W), but since the tube surface condition was poor after the use of potassium hydroxide, the gravimetric method was not appropriate. In the analytical result of surface contaminants on the tube surface, C, O, Ca, and Zr were detected, and mainly C and O dominated the proportion of contaminants. It was also found that the degree of cleaning on the tube affected the componential ratio of C and O; if the degree of cleaning is high, or if cleaning is well-conducted, the proportion of C is decreased, and the proportion of O is increased. Based on these results, optimal cleaning for application in the industry can be expected by categorizing cleaning process into three steps of Alkali cleaning, Rinsing, and Drying and by adjusting cleaning parameters in each step.

• Clean Technology
• /
• v.10 no.2
• /
• pp.73-87
• /
• 2004

In most of industrial fields, cleaning is employed for removing soils on their products or parts. Halogenated cleaning agents such as CFC-113, 1,1,1-TCE(1,1,1-trichloroethane), MC(methylene chloride) and TCE (trichloroethylene) have been used as cleaning ones in most of companies in the world since their excellent performance of cleaning ability and good material compatibility. However, CFC-113 and 1,1,1-TCE which are ozone destruction substances are not used any more in the advanced countries because of the which are ozone destruction substances are not used any more in the advanced countries because of the Montreal protocol. MC and TCE are now used restrictively at small part of industrial fields in most of countries since they are known to be hazardous or carcinogenic materials. Thus, it is indispensible that the alternative cleaning agents which are environmental-friendly and safe, and show good cleaning ability should be developed or utilized for replacement of the halogenated cleaning agents. Aqueous/semi-aqueous cleaning agents are evaluated to be promising alternative ones among various alternatives in environmental and economical view point. In this study, commercially available 12 aqueous and 6 semi-aqueous cleaning agents were selected and their physical properties, cleaning abilities, rinsing abilities and recycling of contaminated rinse water were measured and analyzed. Aqueous cleaning agents with higher wetting index showed better cleaning ability compared with those with lower wetting index. However wetting index did not have any correlation with cleaning ability in semi-aqueous cleaning agents. It was observed that soil concentration in aqueous and semi-aqueous cleaning agents should be maintained below the certain concentrations which depend on types of clearing agents. More than 70% soils in contaminated rinse water by some of aqueous and semi-aqueous clearing agents could be separated by simple settling method. This means that some cleaning agents with high oil-water separation efficiency will be effiective for recycling oil-contaminated rinse water. It was found that contaminated rinse water with aqueous agents was purified easiy by ultrafiltration method with PAN membrane of 30 kDa.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
• /
• v.6 no.1
• /
• pp.1-9
• /
• 2008

This study examined the effect of an electrokinetic-flushing remediation for a soil of a high permeability. The soil was sampled from the site around a research atomic reactor which had high hydro-conductivities due to a high content of sand in the soil. The flow rate of the washing reagent was fast at the beginning but it was reduced as time lapsed. In the case of using citric acid as a washing reagent, the flow rate was fastest, 78.7 ml/day. The removal efficiencies of $Co^{2+}$ and $Cs^+$ from a soil cell with acetic acid were the highest, which were 95.2% and 84.2% respectively. The soil waste-solution volume generated from the electrokinetic remediation was reduced to about 1/20 of that from the soil washing remediation. Meanwhile, the electrokinetic-flushing method enhanced the removal efficiencies of $Co^{2+}$ and $Cs^+$ from the soil by about 6% and 2% respectively, compared to those by the electrokinetic method. Consequently, it was found that the electrokinetic-flushing method was more effective for the remediation of a soil with a high permeability.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2014.11a
• /
• pp.118-119
• /
• 2014

원전 운전 중 2차계통 구성재료가 부식되어 철 산화물이 증기발생기 내부로 유입된다. 유입된 철산화물은 고온고압의 환경에서 침적되어 슬러지가 된다. 침적된 슬러지는 증기발생기 전열관 재료에 응력부식균열(SCC)을 일으키는 주원인으로 원전에서는 철 산화물의 유입을 최소화하기 위해 기동전 2차계통을 순환 세정하고 있다. 해외 원전에서는 고분자 아크릴산(Polyacrylic Acid)을 순환세정시 주입함으로써 2차계통 철 산화물 제거 효율을 높인 사례가 있었다. 이에 우리 원전에서도 기동전 순환세정시 고분자 아크릴산을 주입 적용하였다. 고분자 아크릴산 주입 전 필수적으로 이뤄져야할 연구는 고분자 아크릴산이 재료에 미치는 영향평가이다. 본 연구에서는 고분자 아크릴산 농도(1, 10, 100 ppm)에 따라 2차계통 구성재료인 SA106 Gr.B와 Alloy 690의 건전성에 미치는 영향를 수행하였다. 평가방법으로는 전기화학 분극실험, 시편을 침지시켜 실험 전, 후 무게 감량을 이용한 부식률 측정, 표면 상태분석등을 이용하여 종합적으로 평가하였다. 전기화학 분극실험과 부식률 측정결과, 고분자 아크릴산 농도가 높을수록 부식은 증가하였고 고분자 아크릴산 농도 100 ppm일 때 최대 부식률이 0.037 mils로 계산되었다. 이는 부식허용 기준치(5.8 mils)보다는 100배이상 낮았으며 표면분석 결과 고분자 아크릴산으로 인한 pitting 부식은 발생하지 않았다. 이와 같은 결과로 기동시 환경에서 고분자 아크릴산 농도 100 ppm까지는 재료 건전성에 미치는 영향은 거의 없는 것으로 판단된다.

• Clean Technology
• /
• v.7 no.1
• /
• pp.13-25
• /
• 2001

With fast advancement of fine machineries and semiconductor industries in recent decades, the ultra-cleaning of organic chemicals, submicron particles from contaminated unit equipments and products such as silicon wafers becomes one of the most important steps for further advancement of such industries. To date, two kinds of ultra cleaning techniques are used; one is the wet-cleaning and the other is the dry cleaning. In case of wet cleaning, removal of organic contaminants and submicron particles is made by DIW with additives such as $H_2O_2$, $H_2SO_4$, HCl, $NH_4OH$ and HF, etc. While the wet cleaning method is most widely adopted for various occasions, it is inevitable to discharge significant amount of toxic waste waters in environment. Dry cleaning is an alternative method to mitigate environmental pollution of the wet cleaning with maintaining comparable degree of cleaning to the wet cleaning. Although there are various concept of dry cleaning have been devised, the dry cleaning with environmentally-benign solvent such as carbon dioxide proven to show high degree of cleaning from the contaminated porous surface as well as from the bare surface. Thus, special global attention has been placing on this technique since it has important advantages of simple process schemes and no environmentally concern, etc. Thus, this article critically reviews the state-of-the-art of the supercritical fluid drying with emphasis on the thermo-physical characteristics of the supercritical solvent, environmental gains compared to other dry cleaning methods, and the generic aspects of the basic design and processing engineering.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.655-655
• /
• 2013

그래핀은 높은 전자 이동도, 열전도도, 기계적 강도, 유연성 등의 고유한 특성으로 다양한 분야에 응용하기 위한 연구가 수행되고 있으며, 특히 전자 소자에의 적용에 관한 연구가 활발히 이루어지고 있다. 전자 소자에 적용하기 위해서는 성장 및 물성에 관한 규명, 응용 소자에 따른 특성 평가가 필요하다. 이러한 소자 특성은 그래핀 물성에 의한 영향이 기본적이지만 에칭, 전사 등의 공정 중 발생하는 오염, 표면 특성, 잔여물 등에 의한 물성 변화 또한 분석 및 제어에 관한 연구가 필요하다. 열화학증착법(thermal chemical vapor deposition)을 이용한 그래핀 합성은 구리 기판을 사용하며, 합성된 그래핀의 에칭, 박리 및 전사 공정이 있다. 이러한 공정 중 발생하는 오염 입자가 그래핀 표면에 흡착되거나, 제거되지 않은 PMMA 잔여물이 그래핀의 특성에 영향을 미치게 된다. 따라서 본 연구에서는 $CO_2$ 클러스터의 표면 충돌을 이용하여 이러한 오염 물질 및 잔여물을 제거하고 그래핀 표면을 평탄화하는 것에 관한 연구를 수행하였다. 가스 클러스터란 작동기체의 분자가 수십에서 수백 개 뭉쳐 있는 형태를 뜻하며 이렇게 형성된 클러스터는 수 nm 크기를 형성하게 된다. 그리고 짧은 시간의 응축에 의해 수십 nm 크기 까지 성장 하게 된다. 클러스터를 이용한 표면 처리는 충돌에 의한 제거에 기반 한다. 따라서 생성 및 가속되는 클러스터로부터 대상으로 전달되는 운동량의 정도가 세정 특성에 영향을 미치며 이는 생성되는 클러스터의 크기에 종속적이다. 생성 클러스터의 크기 분포는 분사거리, 유량, 분사 각도, 노즐 냉각 온도 등의 변수에 관한 함수이다. 본 연구에서는 이러한 변수들을 제어하여 클러스터를 이용한 그래핀 표면 처리 실험을 수행하였다. 평가는 클러스터 표면 처리 전과 후의 특성 비교에 기반 하였으며, 광학 현미경을 이용한 표면 형상 측정, 라만분광 분석, AFM을 이용한 표면 조도 측정, 그래핀 면저항 측정 결과를 비교하였다. 평가 결과를 통하여 표면 처리를 하지 않은 그래핀에 비하여 면저항과 표면 조도가 낮아지는 것을 확인 할 수 있었다. 또한 클러스터 세정은 300 mm 웨이퍼 크기 이상의 대면적을 짧은 시간에 건식으로 세정할 수 있다는 장점이 있어 향후 최적화를 통해 그래핀 양산 시 특성 향상을 위한 후처리 방법으로 사용될 수 있음을 확인하였다.

• Journal of Dental Rehabilitation and Applied Science
• /
• v.36 no.2
• /
• pp.104-111
• /
• 2020

Purpose: The purpose of this study is comparing the efficiency of debris removal of passive ultrasonic irrigation depend on different protocols. Materials and Methods: Forty-eight mandibular premolars were randomly divided into 2 groups depend on vibration power (Weak and Strong, n = 24). And then two groups were subdivided into 3 groups depend on the number of times that PUI used (1, 2 and 3, n = 8). After standardization, teeth were split into two halves. On the wall of one half of root canal, three depressions were cut at 1, 3 and 5 mm from the apex and in the same way two depressions were cut on the other half of root canal at 2, 4 mm from the apex. Each depression was filled with mixture of dentine and NaOCl. After irrigation, images of the root canal wall were taken, and then the amount of remaining dentine debris was evaluated. Results: There was no significant difference between weak and strong power of vibration groups. Weak vibration groups did not show significant difference depend on the different number of times PUI used. But in the strong vibration groups, twice and three times used groups show better removal efficiency. Conclusion: The removal efficiency of dentine debris is not significantly different depend on the power of vibration. And multiple use of PUI could have better irrigating effects at the apical third area in the strong vibration group.

• Journal of Dental Rehabilitation and Applied Science
• /
• v.33 no.2
• /
• pp.97-105
• /
• 2017

Purpose: The purpose of this study was comparing the efficacy of passive irrigation (PI) and passive ultrasonic irrigation (PUI) for ability to remove debriment of canals. Materials and Methods: Mandibular premolars were decoronated and standardized to 16 mm length. After root canal enlargement and half separating longitudinally, standardized groove of 4 mm length, 0.2 mm width and 0.5 mm depth were formed on the dentin wall of one half. Three depressions in the canal wall of the opposite half, 0.3 mm in diameter and 0.5 mm in depth, were formed. After each groove and depression was filled with dentin debris, two sections of each half were reassembled using impression putty material. In group 1 the canals were irrigated with 2.5% NaOCl by PI. In group 2 the canals were irrigated with 2.5% NaOCl by PUI. Before and after root canal irrigation, the root canal wall of the section was taken with a microscope and a digital camera as images. The amount of dentin debris remaining in grooves and depressions was assessed using a scoring system. Results: There was no significant difference between PI and PUI except for the middle 1/3 of the root canal (P = 0.004). Conclusion: At the middle 1/3 of the root canal, PUI removed more dentine debris than PI. But the removal efficiency of dentin debris is not significantly different between the PUI and PI at the apical area of root canal in mandibular premolars.