• Title/Summary/Keyword: 세정성능

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Formulation of Alternative Non-Aqueous Cleaning Agents to Chlorofluorocarbon Compounds for Cleaning Flux, Solder and Grease (Flux, Solder 및 Grease 세정용 CFC 대체 비수계 세정제 배합 연구)

  • Jung, Young Woo;Lee, Ho Yeoul;Lee, Myoung Jin;Song, Ah Ram;Bae, Jae Heum
    • Clean Technology
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    • v.12 no.4
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    • pp.250-258
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    • 2006
  • CFC compounds such as CFC-113 and 1,1,1-TCE, etc. have been used in various industries due to their excellent chemical stability, thermodynamic characteristics, non-inflammability and anti-corrosiveness. However, in oder to protect the earth environment, "the Montreal Protocol on substances that deplete the ozone layer" was adopted in 1989 for prevention of production and utilization of these CFC compounds and alternative cleaning agent have been required in the industry. The objective of this study is to develop non-aqueous cleaning agents that do not require major change of cleaning system, have excellent cleaning efficiency, are favorable to the environment, are harmless to the human body, and are not generated corrosive materials. In this work, non-aqueous cleaning agents have been formulated with glycol ether series and paraffinic hydrocarbon series with siloxane, and their physical properties and cleaning efficiencies were analyzed and compared with those of regulated materials. As a result of physical properties measurement of the formulated cleaning agents, it is expected that they may have good penetration ability into contaminated materials due to their properties with low density and low surface tension. Measurement of flash point and vapor pressure of the cleaning agents will be helpful for evaluation of their safety and working environment. The experimental results of cleaning flux, solder and grease by the formulated cleaning agents show that their cleaning abilities of soils were good and that there were no residues on the substance after cleaning. Therefore, alternative cleaning agents which have equivalent cleaning ability to regulating materials, good penetration ability and low hazard to human body, have been developed in this work.

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A study on silicon wafer surfaces treated with electrolyzed water (전리수에 의한 Si 웨이퍼 표면 변화 연구)

  • 김우혁;류근걸
    • Proceedings of the KAIS Fall Conference
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    • 2002.05a
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    • pp.218-221
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    • 2002
  • 80년대 반도체 산업의 급격한 성장으로 오늘날 반도체 산업은 반도체소자의 초고집적화, 웨이퍼의 대구경화로 발전이 거듭났으며, 소자의 성능과 생산 수율의 향상을 위하여 실리콘 웨이퍼의 세정하는 기술 및 연구를 계속 진행하고 있다. 기존의 반도체 세정은 과다한 화학약품의 사용으로 비 환경친화적이며, 이에 본 연구에서는 기존의 세정방법을 대체하기 위한 방법으로 환경친화적인 전리수를 이용한 반도체 세정법을 하였다. 이때 실리콘 웨이퍼 표면의 원자적 상태의 변화가 발생하여 다양한 방법으로 확인할 수 있다. 본 연구에서는 이러한 분석을 하기 위하여 기존세정의 화학약품과 전리수로 세정한 웨이퍼의 표면을 비교하였으며, 또한 온도 및 시간별 표면상태변화를 분석하였다. 특히 접촉각 변화에 중점을 두어 변화를 관찰하였으며, 음극수의 경우 17.28。, 양극수의 경우 34.l。의 낮은 접촉각을 얻을 수 있었다.

A Study on the Cleaning Characteristics according to the process gas of Low-Pressure Plasma (저압 플라즈마 세정가스에 따른 세정특성 연구)

  • Koo, H.J.;Ko, K.J.;Chung, C.K.
    • Clean Technology
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    • v.7 no.3
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    • pp.203-214
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    • 2001
  • A silicon oxide cleaning characteristic and its mechanism were studied in RF plasma cleaning system with various gases such as $CHF_3$, $CF_4$, Argon, oxygen and mixing gas. The experimental parameters - working pressure (100 mTorr), RF power (300 W, 500 W), electrode distance (5cm, 8cm, 11.5cm), cleaning time (90, 180 seconds), gas flow (50 sccm) were fixed to compare cleaning efficiency by gas types. The results were as follows. First, the argon plasma is retaining only physical sputtering effect and etch rate was low. Second, the oxygen plasma showed good cleaning efficiency in electrode distace of 5cm, 300W, 180secs, but surface roughness increased. Third, $CF_4$ Plasma could get the best cleaning efficiency. Fourth, $CHF_3$ plasma could know that addition gas that can lower the CFx/F ratio need. We could not get good cleaning efficiency in case of added argon to $CHF_3$. But, we could get good cleaning efficiency in case added oxygen.

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Ions Removal of Contaminated Water with Radioactive Ions by Reverse Osmosis Membrane Process (방사성이온으로 오염된 물의 역삼투막공정을 이용한 이온제거)

  • Shin, Do Hyoung;Cheong, Seong Ihl;Rhim, Ji Won
    • Membrane Journal
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    • v.26 no.5
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    • pp.401-406
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    • 2016
  • In this study, we have investigated the removal of the low level radioactive ions of Cs and I in water by the reverse osmosis (RO) process. The two RO modules produced in domestic region and the waste RO module after the cleaning process were selected. Then we compared removal performance of both Cs and I. The experiments are conducted by varying the concentration of feed, the pressure. As a results, it was confirmed that all three modules are higher I decontamination factor than Cs. And particularly, for the cleaned RO module, its decontamination factor of I was 1140. Since the results at low pressure condition were better than that at high pressure conditions, the use of the direct installation of RO modules on the tap water might be possible. In addition, it was confirmed that the waste RO module after cleaning process using EDTA, SBS and NaOH, increased the decontamination performance better than before cleaning, in particular, the recovery ratio after cleaning was 6.3% higher.

Development of Cleaning System of Electronic Components for the Remanufacturing of Laser Copy Machine (레이저 복합기의 재제조공정을 위한 전자부품 세정시스템의 개발)

  • Bae, Jae-Heum;Chang, Yoon-Sang
    • Clean Technology
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    • v.18 no.3
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    • pp.287-294
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    • 2012
  • In this study, performances of two cleaning methods were analyzed and a cleaning system was designed to develop a cleaning process of electronic components to remanufacture old laser copy machine. First, plasma cleaning as a dry cleaning method was executed to test cleaning ability. In cleaning of printed circuit board (PCB) by plasma, some damages were found near the metal parts, and considering the productivity, this method was not adequate for the cleaning of electronic components. With 4 different cleaning agents, ultrasonic cleaning tests were executed to select an optimal cleaning agent, aqueous agents showed superior cleaning performance compared to semi-aqueous and non-aqueous agents. Cleaning with aqueous cleaning agent A and 28 kHz ultrasonic frequency can be completed in 30 sec to 1 min. Finally, an ultrasonic cleaning system was constructed based on the pre-test results. Optimal cleaning conditions of 40 kHz and $50^{\circ}C$ were found in the field test. The productivity and economic efficiency in remanufacturing of laser copy machine are expected to increase by adapting developed ultrasonic cleaning system.

Application of Surfactant added DHF to Post Oxide CMP Cleaning Process (계면활성제가 첨가된 DHF의 Post-Oxide CMP 세정 공정에의 적용 연구)

  • Ryu, Chung;Kim, You-Hyuk
    • Journal of the Korean Chemical Society
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    • v.47 no.6
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    • pp.608-613
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    • 2003
  • In order to remove particles on surface of post-oxide CMP wafer, new cleaning solution was prepared by mixing with DHF (Diluted HF), nonionic surfactant PAAE (Polyoxyethylene Alkyl Aryl Ether), DMSO (Dimethylsulfoxide) and D.I.W.. Silicone wafers were intentionally contaminated by silica, alumina and PSL (polystylene latex) which had different zeta potentials in cleaning solution. This cleaning solution under megasonic irradiation could remove particles and metals simultaneously at room temperature in contrast to traditional AMP (mixture of $NH_4OH,\;H_2O_2$ and D.I.W) without any side effects such as increasing of microroughness, metal line corrosion and deposition of organic contaminants. This suggests that this cleaning solution would be useful future application with copper CMP in brush cleaning process as well as traditional post CMP cleaning process.

Cleaning of the Waste Reverse Osmosis Membrane Filters for the Household Water Purifier and Their Performance Enhancement Study (정수기용 역삼투 폐분리막 필터의 세정 및 성능 향상 연구)

  • Cho, Young Ju;Rhim, Ji Won
    • Membrane Journal
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    • v.27 no.3
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    • pp.232-239
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    • 2017
  • In this study, the regeneration investigation for waste reverse osmosis membrane filters which were discarded after use for the household water purifiers has been carried out. Sodium hydroxide, sodium bisulfate, and ethylenediamine tetra acetic acid(EDTA). as the chemical cleaning agents were used. And they were in-situ cleaned with the micro-bubble generator as well. The best result was obtained when both 0.1% EDTA and micro-bubbles were used for 30 min cleaning. Thus, when the performance of the brand new RO membrane and restorated RO membrane were compared, the flux, 19.9%, the recovery ratio 45% were enhanced while the salt rejection was reduced for NaCl 100 mg/L solution, in other words, it has been recovered to the original brand new RO membrane filter. Also the removal of pollutants on membrane surface was confirmed in a naked eye through the scanning electron microscopy. Finally, this research has provided the possibility of the re-use of the waste RO membrane filters of household water purifier which were reclaimed or incinerated after use.

A Study on the Detergency Performance of Zeolite A in the Detergent Solution (세제용액 중에서 Zeolite A의 세정성능에 관한 연구)

  • Kang, Yun-Seog;Kim, Hyun-Chang;Nam, Ki-Dae
    • Applied Chemistry for Engineering
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    • v.8 no.4
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    • pp.624-630
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    • 1997
  • Zeolite A helps an increase of detergency performance according to showing the ion exchange effect for polyvalant ions and it's detergency performance could be calculated quantitatively by using the disperse stabilization theory because it is water-insoluble material and is as colloid particles in aqueous solution. In this study, zeta potential of carbon black, cellulose, and Zeolite A were measured in each inorganic salt solutions and applied to the theory of Heterocoagulation in order to evaluate the detergency performance of Zeolite A about the particulate soil at the view point of interaction potential energy. Zeolite A was shown help an increase of detergency performance according to the increasing of the steric repulsion between Zeolite A and cellulose in $Na2CO_3$ solution and the decrease of re-deposition of carbon black on the fabric by rapid coagulation with carbon black in $Na_2SO_4$ solution.

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A Study on the Evaluation of Cleaning Ability Using Optically Stimulated Electron Emission Method (광전자방출(OSEE)법을 이용한 세정성 평가 연구)

  • Min, Hye-Jin;Shin, Jin-Ho;Bae, Jae-Heum
    • Clean Technology
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    • v.14 no.2
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    • pp.95-102
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    • 2008
  • In order to choose alternative environmental-friendly cleaning agents, it is very important in the present point that the systematic selection procedures should be introduced and applied to the industry through the evaluation of their cleaning ability, environmental characteristics, and economical factors, and that the objective and effective evaluation methods of cleanliness should be established for the industry. Thus, a novel cleaning evaluation method utilizing optically stimulated electron emission (OSEE) among various methods of cleaning ability was studied in this study. The contaminants used in this cleaning experiments were flux, solder, grease, cutting oil, and mixed soil of 35% grease and 65% cutting oil. The cleaning agents developed or prepared in our laboratory were employed and their cleaning ability were comparatively evaluated by the OSEE, gravimetry and contact angle methods. The experimental results in this work showed that flux cleaning efficiency measured by the OSEE method was similar to that of the gravimetric method, but that the OSEE method could not be compared with gravimetric method for the case of solder or grease cleaning because the contaminants radiate or absorb ultra-violet light. In case of cutting oil cleaning, the gravimetric method indicated its limitation of cleaning efficiency of cutting oil since it showed cleaning efficiency of 100%, even though residual soil remaining on the substrate surface a little after its cleaning. The comparative experimental results of cleaning ability evaluated by the OSEE- and contact angle measurement methods showed that they were similar in case of cleaning of flux, mixed soil and cutting oil. It was judged that the contact angle measurement method could evaluate the cleaning ability more precisely than the OSEE method for cleaning solder and grease.

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A Development of Maintenance Decision Support System for Gas Turbine Engine (가스터빈 엔진 정비 의사결정 지원시스템 개발)

  • Ki, Ja-Young;Kang, Myoung-Cheol;Lee, Myung-Kuk;Rho, Hong-Suk
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2012.05a
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    • pp.586-591
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    • 2012
  • The solution of maintenance decision support system for the gas turbine engine, which is currently operating in GUNSAN combined cycle power plant, was developed and is consist of online monitoring module, periodic performance trending module, optimal compressor washing interval analysis module and hot component management module. Also, GUI platform was applied to this solution for the user to monitoring the analyzed result of engine performance condition and then to make a decision of the consequent maintenance action. In online condition monitoring module, the performance degradation of engine is provided by the analysis of difference between the real time measurement data compared to exist engine performance. The optimal compressor washing interval module produced the washing interval of maximum net profit value by researching the maintenance expense and the loss profit value corresponds to the performance degradation with economic assessment algorithm. Thus, this solution support the user to enable the optimal maintenance and operation of gas turbine engine with overall analysis of engine condition and main information.

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