• Title/Summary/Keyword: 렌즈 투과형

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A Comparative Study on Prescription Lenses Standards (주문형 렌즈의 규격 비교 연구)

  • Moon, Byeong-Yeon;Paik, Sun-Mok;Yu, Dong-Sik
    • Journal of Korean Ophthalmic Optics Society
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    • v.14 no.1
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    • pp.17-21
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    • 2009
  • Purpose: To evaluate and analyze the quality of Korean prescription lenses according to international standards. Methods: We measured the refractive power, the thickness at optical center and the transmittance, and then made a comparative analysis them with foreign brand products according to international standards. Results: Most of Korean products had good qualities on the refractive power and transmittance, even if there was out of tolerance in a case of korean products. Conclusions: To ensure a higher preference of Korean products in the home and abroad marketplace, a high-powered quality control and marketing strategy are necessary to domestic lens manufacturers.

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Simultaneous Determination of Both Surface Profiles of a Bifocal Lens Using Dual-Wavelength Transmission Deflectometry With Liquid (액체와 2 파장 투과형 편향법을 이용한 다초점 렌즈 양면 프로파일 동시측정)

  • Shin, Sanghoon;Yu, Younghun
    • Korean Journal of Optics and Photonics
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    • v.26 no.3
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    • pp.147-154
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    • 2015
  • We propose a method for simultaneously measuring the front and back surface profiles of transparent optical components. The proposed method combines dual-wavelength transmission deflectometry with liquids to record distorted phases at different wavelengths, and then numerically reconstructs the three-dimensional phase information to image the front and back surfaces of the lens. We propose a theoretical model to determine the surface information, and a bifocal lens is experimentally investigated. Unlike conventional transmission deflectometry, our proposed method supports direct observation of the front and back surface profiles of the optical elements.

Convergence study of blue light transmittance comparison between tips for light curing machine and commercially available blue light blocking lenses and yellow tinted lenses (광중합기용 팁과 시판용 청광 차단 렌즈 및 노란색 착색 렌즈의 청광 투과율 비교 융합 연구)

  • Lee, Sook-Jeong
    • Journal of the Korea Convergence Society
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    • v.12 no.7
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    • pp.125-131
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    • 2021
  • Blue light with strong energy is required for light-curing resin treatment, which is being used more frequently in dentistry. To reduce the risk of exposure to scattered light, we tried to use colored lenses. The tips for light curing machine and a commercially available yellow-type blue-light blocking lens and a yellow lens colored with yellow dye, which are expected to be effective in blocking blue light, were placed in a UV-Vis spectrometer device, and transmission and blocking of blue light were tested respectively. As a result, the average blue light blocking rate of the light curing machine tips was 99.49%, and the C lens with the highest color density among commercially available lenses showed a high blue light blocking rate of 99.54%. In the case of lenses tinted with yellow, the yellow tinted C lens with the highest tint concentration showed 87.57% of blue light blocking rate. It is judged that the side effects related to the eyes caused by blue light can be reduced if a yellow-type commercially available or colored lens is worn along with a light curing machine tip during resin treatment.

Properties of Sunglass Lenses by Non-Destructive Test for the Sunglass Standards (비파괴식 검사를 통한 선글라스의 품질에 관한 연구)

  • Lim, Yong-Moo;Shim, Moon-Sik;Sim, Hyun-Seog;Kim, Sang-Moon
    • Journal of Korean Ophthalmic Optics Society
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    • v.6 no.1
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    • pp.125-131
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    • 2001
  • In this study, we compared the properties of 23 high and 55 low price sunglass lenses with the standards in the ordinary optical properties, materials, coloration, UV, IR and luminous transmittance, color acceptance for traffic signal, chromaticity and contrast sensitivity. The ordinary optical properties of the lenses met comparatively the requirements of the KS standard. The HIGH-type and LOW-type lenses were primarily made by glass and acrylate, respectively. In the coloration, HIGH-type was in group around neutral color but LOW-type was distributed widely on the line between 570 nm and 485 nm. There are fails in 7% of HIGH-type and 18% of LOW-type in the stimulus purity of the luminous transmittance. Wavelength of the UV/VIS cut-off was over 350 nm for HIGH-type but 6% of LOW-type was under 350 nm. In the erythemal UV, all HIGH-type met the needs of standards but 5 LOW-type failed with DIN standard In the near UV, KS standard worked in stringency, and HIGH-type showed more failure than LOW-type. The characteristics of the IR transmittance of HIGH-type was better than that of LOW-type. In the color acceptance of traffic signal, all HIGH-type met the needs of ANSI standards but 21.8% of LOW-type failed with the standard. In the contrast sensitivity tested with various coloured sunglasses, the value increased with increasing of Land decreasing of test distance. In view of the results so far, HIGH-type met with excellent properties as compared with LOW-type.

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Development of UV imprinting process for micro lens array of image sensor (UV 임프린트를 이용한 이미지 센서용 마이크로 렌즈 어레이 성형 공정 개발)

  • Lim, Ji-Seok;Kim, Seok-Min;Jeong, Gi-Bong;Kim, Hong-Min;Kang, Shin-Il
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.17-21
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    • 2005
  • High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

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Development of UV imprinting process for micro lens array of image sensor (UV 임프린트를 이용한 이미지 센서용 마이크로 렌즈 어레이 성형 공정 개발)

  • Lim, Ji-Seok;Kim, Seok-Min;Jeong, Gi-Bong;Kim, Hong-Min;Kang, Shin-Il
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.2
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    • pp.91-95
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    • 2006
  • High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

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Dynamic Analysis of a Tilting Actuator (틸팅 액츄에이터의 동특성 해석)

  • Im, Hyung-Bin;Chung, Jin-Tai;Ryu, Jae-Wook;Bang, Hyun-Chol
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2006.05a
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    • pp.207-212
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    • 2006
  • A dynamic analysis of a tilting actuator for projection TV is presented in this study. Generally, an excessive vibration of a tilting actuator is occurred a lowering of video quality of projection TV because of a dynamic unstability of it. Therefore, a dynamic analysis of a tilting actuator system is positively necessary. In this study, a mathematical model about a mirror-reactive type tilting actuator is presented and evidenced by experiment. A FEM model of a lens-transmissive type tilting actuator is presented and we made prototype of it. Then, it is evidenced by experiment. Besides, a design for hinge configuration of it is presented.

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Layout of Long-pass-edge Filter Correspond with the Optical Transmission in Crystalline (수정체 광투과에 대응하는 LPE Filter 설계)

  • Kim, YongGeun
    • Journal of Korean Ophthalmic Optics Society
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    • v.4 no.2
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    • pp.57-63
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    • 1999
  • The optical absorption and transmittance of cow' crystalline were measured by spectrophotometer in the 200~800nm wavelength regions. The optical absorptions of crystalline composed of a high absorption band in the UV-A, UV-B, and appeared the light transmittance edge in the 400nm wavelength region, and completely transmitted without the absorption in the high wavelength regions than 400nm. Also, the optical absorption and transmittance had no temperature dependence. The optical transmittance spectrum of crystalline concord with the thin film structure of $n_0/(0.5H)L(LH)^6(0.5H)/n_s$ and $n_0{\mid}(0.5LH0.5L)^kL/1.25{\mid}4.0$ of long-pass edge filter form. In the artificial crystalline and inter lens layout, long-pass edge filter layout can UV cut off.

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Design of silicon subwavelength structures with extremely transparent property for mid-infrared applications (고투과특성을 지닌 중적외선용 무반사 실리콘 서브파장구조 설계)

  • Sin, Myeong-Gyu;Lee, Jong-Heon;Song, Yeong-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.282.2-282.2
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    • 2016
  • 중적외선 물질에는 Ge, ZnS, ZnSe, Si 등이 있으나 고굴절율이므로 반사가 매우 크게 발생을 한다. 이를 줄이기 위해 다층 박막 무반사 코팅을 일반적으로 사용하지만 열에 취약함, 적합한 물질을 찾는 것이 매우 어려움, 다층 박막으로 제작 시 두께가 매우 두꺼워짐의 단점이 있다. 또한 Ge, ZnS, ZnSe 의 소재는 가격이 Silicon에 비해 매우 비싸다. 그러므로 RCWA(Rigorous Coupled Wavelength Analysis) 시뮬레이션을 이용하여 상대적으로 저렴한 소재임에도 고투과성을 지닌 중적외선용 무반사 실리콘 서브파장구조(Subwavelength Structures, SWSs)를 제안한다. 본 연구에서는 원기둥, 원뿔, 파라볼라, 잘린 원뿔(truncated cone) 등의 형태에 따른 투과율 특성을 파악하여 최적구조가 파라볼라 형태임을 증명하였다. 또한 서브파장구조의 주기, 높이의 특성을 조절하여 공정 시의 종횡비(Aspect ratio)를 고려한 최적형태를 제안하였다. 중적외선 영역($3{\mu}m{\sim}5{\mu}m$)에서 일반 Silicon의 적외선 영역에서 평균 55%의 낮은 투과율을 보이나, 양면에 무반사 구조를 설계 하였을 때 평균 94%의 높은 투과율을 확인할 수 있다. 다양한 형태를 가진 무반사 실리콘 서브파장 구조물을 RCWA 방식으로 계산함으로서 특성을 파악하며 최적구조를 설계 할 수 있다. 또한 단면에 비하여 양면으로 SWSs 구조를 제작할 시 매우 두드러지는 투과특성을 확인할 수 있다. 고굴절율이지만 뛰어난 투과특성을 이용하여 초소형 적외선 카메라 렌즈 뿐만 아니라 적외선 광검출기, 광학 필터 등에 이용 가능할 것으로 예상된다.

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Measurement of Width and Step-Height of Photolithographic Product Patterns by Using Digital Holography (디지털 홀로그래피를 이용한 포토리소그래피 공정 제품 패터닝의 폭과 단차 측정)

  • Shin, Ju Yeop;Kang, Sung Hoon;Ma, Hye Joon;Kwon, Ik Hwan;Yang, Seung Pil;Jung, Hyun Chul;Hong, Chung Ki;Kim, Kyeong Suk
    • Journal of the Korean Society for Nondestructive Testing
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    • v.36 no.1
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    • pp.18-26
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    • 2016
  • The semiconductor industry is one of the key industries of Korea, which has continued growing at a steady annual growth rate. Important technology for the semiconductor industry is high integration of devices. This is to increase the memory capacity for unit area, of which key is photolithography. The photolithography refers to a technique for printing the shadow of light lit on the mask surface on to wafer, which is the most important process in a semiconductor manufacturing process. In this study, the width and step-height of wafers patterned through this process were measured to ensure uniformity. The widths and inter-plate heights of the specimens patterned using photolithography were measured using transmissive digital holography. A transmissive digital holographic interferometer was configured, and nine arbitrary points were set on the specimens as measured points. The measurement of each point was compared with the measurements performed using a commercial device called scanning electron microscope (SEM) and Alpha Step. Transmission digital holography requires a short measurement time, which is an advantage compared to other techniques. Furthermore, it uses magnification lenses, allowing the flexibility of changing between high and low magnifications. The test results confirmed that transmissive digital holography is a useful technique for measuring patterns printed using photolithography.