• Title/Summary/Keyword: 광학계 측정법

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유도결합플라즈마 공정에서 조건별 플라즈마 방출광 세기 변화에 따른 전자온도의 전기적, 광학적 진단에 관한 연구

  • Lee, Ye-Seul;Park, Hye-Jin;Choe, Jin-U;Kim, U-Jae;Hwang, Sang-Hyeok;Jo, Tae-Hun;Yun, Myeong-Su;Gwon, Gi-Cheong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.215.1-215.1
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    • 2016
  • 플라즈마는 반도체, 디스플레이, 태양전지 등 다양한 산업 분야에 이용된다. 플라즈마 공정 시 수율 향상을 위해 플라즈마를 진단하는 기술이 필요한데, 대표적으로 전자온도가 있다. 반도체 공정의 낮은 압력과 높은 밀도의 플라즈마에서 전자온도는 1~10 eV 정도인데, 0.5 eV정도의 아주 적은 차이로도 공정 결과에 큰 영향을 미친다. 플라즈마의 전자온도를 측정하는 방법은 전기적 탐침 방법인 랑뮤어 탐침(Langmuir Probe)과 와이즈 프로브(Wise Probe)를 이용한 방법, 그리고 광학적 방법인 방출분광법(OES : Optical Emission Spectroscopy)이 있다. 전기적 탐침 방법은 직접 플라즈마 내부에 탐침을 넣기 때문에 불활성 기체를 사용한 공정에서는 잘 작동하지만 건식식각이나 증착에 사용할 경우 탐침의 오염으로 인한 오동작, 공정 시 생성된 샘플에 영향을 줄 수 있다는 단점이 있다. 반면에 방출분광법은 광학적 진단으로, 플라즈마를 사용하는 공정 진행 중에 외부에 광학계를 설치하여 플라즈마에서 발생하는 빛을 광학적으로 분석하기 때문에 공정에 영향을 미치지 않고, 공정 장비에 적용이 쉬운 장점을 가지고 있다. 본 연구에서는 RF Power를 인가한 유도결합플라즈마(ICP : Inductively Coupled Plasma) 공정에서 아르곤 가스와 산소 혼합가스 분압과 인가전압을 변화시켜 플라즈마 방출광 세기 변화에 따른 전자온도를 측정하였다. 전자온도 측정에는 전기적 방법인 랑뮤어 탐침, 와이즈 프로브를 이용한 방법과 광학적 방법인 방출분광법을 사용하여 측정하였으며 이를 비교 분석하였다.

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Determination of optical constants and structures of ZnO:Ga films using spectroscopic ellipsometry (분광타원법을 이용한 ZnO:Ga 박막의 광학상수 및 두께 결정)

  • 신상균;김상준;김상열;유윤식
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.07a
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    • pp.38-39
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    • 2003
  • 전기적 저항이 낮은 투명 박막 물질은 현재 flat panel display, electroluminescent device, thin film transistor, solar cell 등 여러 분야에서 연구되고 있다. 그 중에서도 특히 ZnO:Ga는 현재 많이 쓰이는 ITO보다 화학적, 열적으로 안정한 상태를 보이는 투명 전도 산화막 물질로써 본 연구에서는 분광타원법을 이용하여 ZnO:Ga의 광학적 특성을 분석하였다. 본 연구를 위한 시료는 온도에 따른 ZnO:Ga/Sapphire 박막, $O_2$의 압력에 따른 ZnO:Ga/Sapphire 박막, Ga의 doping 농도에 따른 ZnO:Ga/Sapphire 박막으로 제작하였으며, 위상변조형 분광타원계(spectroscopic Phase Modulated Ellipsometer, Jobin-Yvon, UVISEL)를 사용하여 측정대역을 0.74 ~ 4.5 eV, 입사각을 70$^{\circ}$로 하여 측정하였다. (중략)

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Profiling of fine displacement of spherical surface using Fourier transform method (푸리에 변환 간섭 해석법을 이용한 구면의 미세 변위 측정)

  • 손영준;주신호;권진혁;최옥식
    • Korean Journal of Optics and Photonics
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    • v.8 no.3
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    • pp.199-203
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    • 1997
  • Fine displacement of spherical suface was detected and analyzed by Twyman-Green interferometer and the interferogram analysis using Fourier transform method. The surface profile was obtained from single interferogram by introducing the carrier freguency to the interferogram. The interferogram was processed in the spatial frequency domain by fast Fourier transform, and the phase distribution was obtained by inverse Fourier transform. The 3-dimensional distribution for the surface displacement was obtained. It was compared with the calculated surface displacement and the error was less than λ/10.

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A Study on Measurement of Internal Defects of Pressure Vessel by Digital Shearography(II) (전자 전단 간섭법을 이용한 압력용기의 내부결함 측정에 관한 연구(II) (전자 전단 간섭법을 이용한 압력용기의 내부결함 검출 시스템의 오차 분석))

  • Kang, Young-June;Park, Nak-Kyu;Ryu, Won-Jae;Kim, Dong-Woo
    • Journal of the Korean Society for Nondestructive Testing
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    • v.22 no.4
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    • pp.402-410
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    • 2002
  • Recently the necessity of study on optical measuring method using laser to detect the pipeline's defect in nuclear facilities, chemical industries and power plants has been increased. Because laser light can be delivered to a remote area without any difficulties, the application of laser in many industries can solve several difficulties from the limitation of access in danger area and reduce the risks of workers. Therefore, we applied a new experimental technique to the measurement of internal defects in pressure vessels with the combination of shearography and image processing technique and detected the internal cracks of pressure vessels in the former paper. In this paper, we used the same optical system as in the former study and found the optimum shearing magnitude by comparing the real length of specimen with experimental results. A variety of conditions were applied to certify the validity of this method. Actually, several specimens which have different lengths and depths were used in this experiment under the three diverse pressure. Consequently, we have carried out this experiment to determine the limit of measurement ability with analyzing errors.

Surface-error Measurement for a Convex Aspheric Mirror Using a Double-stitching Method (이중 정합법을 이용한 볼록비구면 반사경의 형상 오차 측정)

  • Kim, Goeun;Lee, Yun-Woo;Yang, Ho-Soon
    • Korean Journal of Optics and Photonics
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    • v.32 no.6
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    • pp.314-322
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    • 2021
  • A reflecting telescope consists of a concave primary mirror and a convex secondary mirror. The primary mirror is easy to measure, because it converges the beam from an interferometer, while the secondary mirror diverges the beam and so is not easy to measure, even though it is smaller than the primary mirror. In addition, the Korsch-type telescope uses the central area of the secondary mirror, so that the entire area of the secondary mirror needs to be measured, which the classical Hindle test cannot do. In this paper, we propose a double-stitching method that combines two separate area measurements: the annular area, measured using the Hindle stitching method, and the central area, measured using a spherical wave from the interferometer. We test the surface error of a convex asphere that is 202 mm in diameter, with 499 mm for its radius of curvature and -4.613 for its conic constant. The surface error is calculated to be 19.5±1.3 nm rms, which is only 0.7 nm rms different from the commercial stitching interferometer, ASI. Also, the two results show a similar 45° astigmatism aberration. Therefore, our proposed method is found to be valuable for testing the whole area of a convex asphere.

Precise Measurement of Optical Anisotropy of Rubbed Polyimide on Patterned Glass and its Nanoscale Variation (패턴이 있는 유리기층 위 러빙된 Polyimide의 광학 이방성 미세변화 정밀 측정)

  • Kim, Ha-Rang;Kim, Sang-Youl
    • Korean Journal of Optics and Photonics
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    • v.20 no.5
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    • pp.281-287
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    • 2009
  • The optical anisotropy of rubbed PI(polyimide) film on patterned LCD glass substrate is analyzed using polarimetry. The direction of the optic axis and the magnitude of the very small retardation ($\sim$ 0.4 nm or less) is precisely measured by using a transmission ellipsometer. The variation of the optical anisotropy is presented as the curve of the optic axis versus the magnitude of the phase retardation and it is explained by using a simple optical model.

OPTICAL PROPERTY AND ALIGNMENT OF KAO WIDE FIELD TELESCOPE (NEOPAT-3) (광시야 망원경 3호기 (NEOPAT-3)의 광학계 특성 및 조정)

  • Yuk, In-Soo;Kyeong, Jae-Mann;Yoon, Joh-Na;Yoon, Jae-Hyuck;Yim, Hong-Suh;Moon, Hong-Kyu;Han, Won-Yong;Byun, Yon-Ik;Kang, Yong-Woo;Yu, Sung-Yeol
    • Journal of Astronomy and Space Sciences
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    • v.21 no.4
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    • pp.417-428
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    • 2004
  • We have investigated the optical property of the KAO(Korea Astronomy Observatory) wide field telescope (named NEOPAT-3; Near Earth Object and Satellite Patrol-3) and aligned optical system. The NEOPAT-3 is restricted to V,R,I-filters because of the refractive property of the correcting lens system. Because of the fast focal ratio, the optical performance of the NEOPAT-3 is very sensitive to its alignment factors of the optical system. To make the spot radius smaller than $8{\mu}m$ in rms over 2degree${\times}2$degree field, the optical system must satisfy the following conditions: 1) The tilt error between detector plane and focal plane should be less than 0.05degree. 2) The decenter error between the primary mirror and the correcting lens system should be less than 1mm. 3) The distance error between the primary mirror and the correcting lens system should be less than 2.3mm. In order to align the optical system accurately, we measured the aberrations of the telescope quantitatively by means of curvature sensing technique. NEOPAT-3 is installed temporary on the roof of the TRAO(Taeduk Radio Astronomy Observatory) main building to normalize system performance and to develop automatic observation.

Direct Measurement of Distortion of Optical System of Lithography (노광 광학계의 왜곡수차 측정에 관한 연구)

  • Joo, WonDon;Lee, JiHoon;Chae, SungMin;Kim, HyeJung;Jung, Mee Suk
    • Korean Journal of Optics and Photonics
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    • v.23 no.3
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    • pp.97-102
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    • 2012
  • In general, one of the methods used to measure distortion is to use the full image of the regular pattern. However, because of low accuracy, this method is mainly used for an optical system such as a camera.. In order to measure distortion with high accuracy less than 1um, one can use the method of measuring the exact position of a mask image. In this case, a high accuracy stage with a laser encoder is required. In this paper, we investigate measurement of the distortion of high accuracy with a simple manual stage. The main idea is that we split and measure the mask image with the overlapping area by using CCD or CMOS, and then we get an exact position of the mask image by integrating the adjacent split images. We use the Canny Edge Detection method to get the position information of the mask image and we researched the process to exactly calculate distortion by using coordinate transformations and a least square method.