• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.140-141
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• 2000

집적광학 회로의 구성요소 중 광 결합기는 파장에 따른 채널간 결합기로써 WDM은 물론 광 스위칭 소자로서 매우 중요한 위치에 있다. 더우기 수직형의 구조를 갖는 광결합기가 새로이 제안되면서 결합 길이를 줄여 전체 소자길이를 감소시킴으로써 고집적화는 물론, 도파로를 진행하는 동안 겪게되는 도파 손실을 최소화하려는 움직임 또한 활발하다. 그러나 이들 수직형 광결합기는 결합효율을 높이기 위하여 대부분 상 하부 도파로의 구조가 동일한 대칭형으로 제작됨에 따라, 이들은 매우 까다롭고 복잡한 공정을 갖게된다. 또한 이러한 공정의 복잡성과 두 도파로의 대칭성을 위한 반복작업은 오히려 제작공정의 불완전함으로 인하여 이론상의 이상적 결합에 비하여 효율이나 성능 면에서 상당한 저하를 가져오게 된다. 최근 연구되고있는 대부분의 폴리머를 이용한 광 결합기 역시 대칭형 구조를 가지며 $O_2$ RIE(Reactive ion etching) 건식 식각법으로 제작된다.$^{[1]}$ (중략)

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.276-278
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• 1997

The reliable etching process is one of the essential steps in fabricating GaN based-device. High etch rate is needed to obtain a deeply etched structure and perfect anisotropic etched facet is needed to obtain lasing profile. In the research, therefore, we had proposed a planar inductively coupled plasma etcher (Planar ICP Etcher) as a high density plasma source, and studied the etching mechanism using the $CH_4/H_2$/Ar gas mixture. Dry etching characteristics such as etch rate, anisotropic etching profile and so on, for the III-V nitride layers were investigated using Planar ICP Etcher, based on the plasma characteristic as a variation of plasma process parameters.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.404-407
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• 2003

Among the ferroeletric thin films that have been widely investigated for ferroelectric random access memory (FRAM) applications, the $SrBi_2Ta_2O_9$ (SBT) thin film is appropriate as a memory capacitor material due to its excellent fatigue endurance. SBT thin films were etched in high-density $Cl_2/Ar$ in inductively coupled plasma. The maximum etch rate of SBT film is $1834\;{\AA}/min$ under $Cl_2/(Cl_2+Ar)$ of 30 %, rf power of 700 W, dc-bias voltage of -250 V, chamber pressure of 11 mTorr and gas flow rate of 20 sccm.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.11 no.6
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• pp.952-958
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• 2000

다양한 구조위 트랜스미션 라인과 힌지들을 갖는 고주파용 마이크로머신드 용량성 스위치들이 새롭게 디자인되었고 전기도금 기술, 저온 공정기술, 그리고 건식 식각기술들을 이용하여 제작되었다. 특히, 집적화된 용량성 스위치들이 높은 스위칭 on/off ratio와 on 캐패시턴스를 갖도록 하기 위하여 고유전율을 갖는 SrTiO3라는 상유전체를 절연체로 사용하였다. 제작된 스위치들은 8V의 구동전압, 0.08dB의 삽입손실, 42dB의 높은 isolation, 600의 on/off ratio, 그리고 50pF의 on 캐패시턴스의 특성들을 갖는다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.1
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• pp.7-14
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• 2002

In this paper, neutral networks are used to build models of oxide film etched In CHF$_3$/CF$_4$ with a magnetically enhanced reactive ion etcher(MERIE). A statistical 2$\^$4-1/ experimental design plus one center point was used to characterize relationships between process factors and etch responses. The factors that were varied include radio frequence(rf) power, pressure, CHF$_3$ and CF$_4$ flow rates. Resultant 9 experiments were used to train neural networks and trained networks were subsequently tested on its appropriateness using additionally conducted 8 experiments. A total of 17 experiments were thus conducted for this modeling. The etch responses modeled are dc bias voltage, etch rate and etch uniformity A qualitative, good agreement was obtained between predicted and observed behaviors.

• Journal of the Korean institute of surface engineering
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• v.42 no.4
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• pp.169-172
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• 2009

We investigated the dry-etching mechanism of the TiN thin film using a $Cl_2$/Ar inductively coupled plasma system. To understand the effect of the $Cl_2$/Ar gas mixing ratio, we etched the TiN thin film by varying $Cl_2$/Ar gas mixing ratio. When the gas mixing ratio was 100% $Cl_2$, the highest etch rate was obtained. The chemical reaction on the surface was investigated with X-ray photoelectron spectroscopy (XPS). Scanning electron microscopy (SEM) was used to examine etched profiles of the TiN thin film.

• Journal of Sensor Science and Technology
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• v.15 no.4
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• pp.245-250
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• 2006

In this paper, glass cap wafer for MEMS device package is fabricated by using sand blaster dry etcher and Its surface is studied. The surface of dry etched glass is analyzed by using SEM, and many glass particles and micro cracks are observed. If these kind of particles were dropped from glass to the surface of device, It would make critical failure to the operation of device. So, several cleaning and etching methods are induced to remove these kinds of dormant failure mode and optimized condition is found out.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.417-420
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• 2004

The electrical effects of dry-etch on n-type GaN by an inductively coupled $Cl_2/CH_4/H_2/Ar$ plasma were investigated as a function of ion energy, by means of ohmic and Schottky metallization method. The specific contact resistivity(${\rho}_c$) of ohmic contact was decreased, while the leakage current in Schottky diode was increased with increasing ion energy due to the preferential sputtering of nitrogen. At a higher rf power, an additional effect of damage was found on the etched sample, which was sensitive to the dopant concentration in terms of the ${\rho}_c$ of ohmic contact. This was attributed to the effects such as the formation of deep acceptor as well as the electron-enriched surface layer within the depletion layer. Furthermore, thermal annealing process enhanced the ohmic and Schottky property of heavily damaged surface.

• Journal of the Korean Vacuum Society
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• v.4 no.3
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• pp.293-300
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• 1995

p-doped poly-Si/SiO2/Si 기판위에 저압 화학증착법(LPCVD)으로 증착한 텅스텐 실리사이드(WS2.7)막을$ 850^{\circ}C$에서 20분 동안 N2 분위기에서 열처리한 후에 건식 분위기에서 열산화하였다. 다결정 실리콘의 인도핑(doping)레벨에 따른 텅스텐 폴리사이드(WSi2.5/poly-Si)막의 산화 성장률과 텅스텐 폴리사이드막의 산화 메카니즘에 대하여 연구하였다. 텅스텐 폴리사이드막의 산화 성장률은 다결정 실리콘의 인(p) 도핑 레벨이 증가함에 따라 증가하였다. 텅스텐 폴리사이드막의 산화는 텅스텐 실리사이드층의 과잉(excess)Si가 초기 산화과정 동안 소모된 후에 다결정 실리콘층의 Si가 소모되었다. 산화막과 산화막을 식각(etching)한 후에 텅스텐 실리사이드막의 표면 거칠기는 다결정 실리？의 인 농도가 적을수록 평탄하였다.

• Journal of the Korean Society for Nondestructive Testing
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• v.28 no.5
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• pp.395-400
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• 2008

Alternating magnetic field was used for detection of surface flaws on nonmagnetic and magnetic metallic specimens. The nondestructive sensor probe was composed of the planar coil with inductive magnetic thin film yoke as a sensing component and a single straight typed exciting coil. The planar inductive coil sensor with magnetic yoke was fabricated by sputtering, electroplating, dry etching and photolithography process. The alternative currents with the range of 0.1A to 1.0A (0.7 MHz to 1.8 MHz) were applied to the exciting coil. The specimens were prepared with the slit shaped artificial surface flaws (minimum depth and width; 0.5 mm) on metallic plate (Al; nonmagnetic metal and FeC; magnetic metal). The detected signal for the positions and shapes of surface flaws on specimens were obtained with high sensitivity and high signal to ratio. The measured output signals by the non-contacted scanning on surface of FeC specimen with micron-sized crack were converted to the images of the flaws. And these results were compared with the optical images, respectively.