• Title/Summary/Keyword: 갈륨

Search Result 264, Processing Time 0.026 seconds

Electrolytic Hydrogen Production Using Solution Processed CIGS thin Film Solar Cells (용액 공정 CIGS 박막 태양 전지를 이용한 물 분해 수소 생산)

  • Jeon, Hyo Sang;Park, Se Jin;Min, Byoung Koun
    • Transactions of the Korean hydrogen and new energy society
    • /
    • v.24 no.4
    • /
    • pp.282-287
    • /
    • 2013
  • Hydrogen production from water using solar energy is attractive way to obtain clean energy resource. Among the various solar-to-hydrogen production techniques, a combination of a photovoltaic and an electrolytic cell is one of the most promising techniques in term of stability and efficiency. In this study, we show successful fabrication of precursor solution processed CIGS thin film solar cells which can generate high voltage. In addition, CIGS thin film solar cell modules producing over 2V of open circuit voltage were fabricated by connecting three single cells in series, which are applicable to water electrolysis. The operating current and voltage during water electrolysis was measured to be 4.23mA and 1.59V, respectively, and solar to hydrogen efficiency was estimated to be 3.9%.

Stimulated emission from optically pumped column-III nitride semiconductors at room temperature (III족 질화물 반도체의 실온 광여기 유도방출)

  • 김선태;문동찬
    • Electrical & Electronic Materials
    • /
    • v.8 no.3
    • /
    • pp.272-277
    • /
    • 1995
  • We report the properties of optically pumped stimulated emission at room temperature (RT) from column-III nitride semiconductors of GaN, AlGaN/GaN double heterostructure (DH) and AlGaN/GaInN DH which prepared on a sapphire substrate using an AIN buffer-layer by the nietalorganic vapor phase epitaxy (MOVPE) method. The peak wavelength of the stimulated emission at RT from AIGaN/GaN DH is 369nm and the threshold of excitation pumping power density (P$\_$th/) is about 84kW/cm$\^$2/, and they from AlGaN/GaInN DH are 402nm and 130kW/cm$\^$2/ at the pumping power density of 200kW/cm$\^$2/, respectively. The P$\_$th/ of AIGaN/GaN and AlGaN/GaInN DHs are lower than the single layers of GaN and GaInN due to optical confinement within the active layers of GaN and GaInN, respectively.

  • PDF

Optimization of the Gate Field-Plate Structure for Improving Breakdown Voltage Characteristics. (AlGaN/GaN HEMT의 항복전압특성 향상을 위한 게이트 필드플레이트 구조 최적화)

  • Son, Sung-Hun;Jung, Kang-Min;Kim, Su-Jin;Kim, Tae-Geun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2010.06a
    • /
    • pp.337-337
    • /
    • 2010
  • 갈륨-질화물 (GaN) 기반의 고 전자 이동도 트랜지스터 (High Electron Mobility Transistor, HEMT)는 GaN의 큰 밴드갭 (3.4~6.2 eV), 높은 항복전계 (Ec~3 MV/cm) 및 높은 전자 포화 속도 (saturation velocity $-107\;cm{\cdot}s-1$) 특성과 AlGaN/GaN 등과 같은 이종접합구조(Heterostructure )로부터 발생하는 높은 면밀도(Sheet Concentration)를 갖는 이차원 전자가스(Two-Dimensional Electron Gas, 2DEG) 채널로 인해 차세대 고출력/고전압 소자로서 각광받고 있다. 하지만 드레인 쪽의 게이트 에지부분에 집중되는 전계로 인한 애벌린치 할복현상(Breakdown)이 발생하는 문제점이 있다. 따라서 AlGaN/GaN HEMT의 항복전압 향상을 위한 방법으로 필드플레이트(Field-Plate) 구조가 많이 사용되고 있다. 본 논문에서는 2D 시뮬레이션을 통한 AlGaN/GaN HEMT의 필드플레이트 구조 최적화를 수행하였다. 이를 위해 ATLASTM 전산모사 프로그램을 이용하여 필드플레이트 길이, 절연체 증류 및 두께에 따른 전류 전압 특성 및 전계 분산효과에 대한 전산모사를 수행하여 그 결과를 비교, 분석 하였다, 이를 바탕으로 기존의 구조에 비해 약 300%이상 향상된 항복전압을 갖는 AlGaN/GaN HEMT의 최적화된 필드 플레이트 구조를 제안하였다.

  • PDF

Electrical Properties Depending on Active Layer Thickness and Annealing Temperature in Amorphous In-Ga-Zn-O Thin-film Transistors (활성층 두께 및 열처리 온도에 따른 비정질 인듐갈륨징크옥사이드 박막트랜지스터의 전기적 특성 변화)

  • Baek, Chan-Soo;Lim, Kee-Joe;Lim, Dong-Hyeok;Kim, Hyun-Hoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.25 no.7
    • /
    • pp.521-524
    • /
    • 2012
  • We report on variations of electrical properties with different active layer thickness and post-annealing temperature in amorphous In-Ga-Zn-O (IGZO) thin-film transistors (TFTs). In particular, subthreshold swing (SS) of the IGZO-TFTs was improved as increasing the active layer thickness at an given post-annealing temperature, accompanying the negative shift in turn-off voltage. However, as increasing post-annealing temperature, only turn-off voltage was shifted negatively with almost constant SS value. The effect of the active layer thickness and post-annealing temperature on electrical properties, such as SS, field effect mobility and turn-off voltage in IGZO-TFTs has been explained in terms of the variation of trap density in IGZO channel layer and at gate dielectric/IGZO interface.

Study on the Electrical Properties of a-IGZO TFTs Depending on Processing Parameters (공정 변수에 따른 비정질 인듐갈륨징크옥사이드 산화물 반도체 트랜지스터의 전기적 특성 연구)

  • Chong, Eu-Gene;Jo, Kyoung-Chol;Kim, Seung-Han;Lee, Sang-Yeol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.23 no.5
    • /
    • pp.349-352
    • /
    • 2010
  • Thin-film transistors (TFTs) were fabricated using amorphous indium gallium zinc oxide (a-IGZO) channels by rf-magnetron sputtering at room temperature. We have studied the effect of oxygen partial pressure on the threshold voltage($V_{th}$) of a-IGZO TFTs. Interestingly, the $V_{th}$ value of the oxide TFTs are slightly shifted in the positive direction due to increasing $O_2$ partial pressure from 0.007 to 0.009 mTorr. The device performance is significantly affected by varying $O_2$ ratio, which is closely related with oxygen vacancies provide the needed free carriers for electrical conduction.

A study of light output characteristics with various refractive indices and geometrical structures of the GaN based light-emitting device encapsulants (질화갈륨계 발광소자 봉지재의 굴절률 및 곡률 변화에 따른 광 출력 특성 연구)

  • Kim, Heyong-Jin;Yoo, Jin-Yeol;Kang, Young-Rae;Kim, Jae-Pil;Kwak, Joon-Seop
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
    • /
    • v.26 no.7
    • /
    • pp.1-8
    • /
    • 2012
  • In this paper, we improved the light extraction efficiency by structural change of LEDs on conventional LEDs. We simulated the LEDs light emission as functions of LED side wall angle, various refractive indices the geometrical structures and analyzed the condition improved the light efficiency. We present the results of experimerns and simulations for light output power from LEDs for various refractive indices and the geometrical structures of the LED encapsulants. When the side wall angle range was from 40[$^{\circ}$] to 30[$^{\circ}$], the LED emission increased. LED side wall angle onto LED using the simulation system with a fine tuning of the structure of the LEDs side wall angle is fabricated. Additionally, we changed the side wall angle of LED package with spherical structure and flat structure. The result of spherical structure ray tracting is higher compared with flat structure about 14[%].

A Study on the Reactor Configuration and Thermal Conditions for the Growth of High Quality Thin Film of GaN Layer (고품질 질화물 반도체 박막 성장을 위한 반응로 구조 및 열적 조건에 관한 연구)

  • Kim, Jin-Taek;Baek, Byung-Joon;Lee, Cheul-Ro;Pak, Bock-Choon
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.28 no.12
    • /
    • pp.1632-1639
    • /
    • 2004
  • Numerical calculation has been performed to investigate the transport phenomena in the horizontal reactor which has two different gas inlets for MOCVD(metalorganic chemical vapor deposition). The full elliptic governing equations for continuity, momentum, energy and chemical species are solved by using the commercial code FLUENT. It is investigated how thermal characteristics, reactor geometry, and the operating parameters affect flow fields, mass fraction of each reactants. The numerical simulations demonstrate that flow rate of each species, inlet geometry of the reactor, and its distance from the susceptor as well as the inclination of upper wall of reactor can be used effectively to optimize reactor performance. The commonly used idealized boundary conditions are also investigated to predict flow phenomena in the actual deposition system.

경사입사각증착법을 이용한 이산화 티타늄 박막 기반의 고반사 분포 브래그 반사기 제작 및 특성

  • Guan, Xiang-Yu;Im, Jeong-U;Jeong, Gwan-Su;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.350.1-350.1
    • /
    • 2014
  • 분포 브래그 반사기(distributed Bragg reflector; DBR)는 광센서, 도파로, 태양전지, 반도체 레이저 다이오드, 광검출기와 같은 고성능 광 및 광전소자 응용분야에 널리 사용되고 있다. 일반적으로, DBR은 박막의 두께를 4분의 1 파장(${\lambda}/4$)으로 가지는 서로 다른 저굴절율 물질과 고굴절율 물질을 교대로 적층 (pair)한 다중 pair로 제작되어지며, DBR의 반사 특성과 반사대역폭은 두 물질의 굴절율 차이와 pair의 수에 영향을 받는다. 그러나, 서로 다른 굴절율을 갖는 두 물질을 이용하는 DBR의 경우, 두 물질간 열팽창계수의 불일치, 접착력 문제, 높은 굴절율 차이를 갖는 물질 선택의 어려움 등 많은 문제점을 지니고 있다. 최근, 경사입사각증착법을 이용한 동일 재료(예, 인듐 주석 산화물, 게르마늄, 실리콘)기반의 DBR 제작 및 특성에 대한 연구가 보고되고 있다. 높은 입사각을 갖고 박막이 증착될 경우, 저율을 갖는 다공박막 제작이 가능하여 경사입사각증착법으로 homogeneous 물질 기반의 고반사 특성을 갖는 다중 pair의 DBR을 제작할 수 있다. 본 실험은, 갈륨비소 기판 위에 경사입사각증착법 및 전자빔증착법을 이용하여 중심파장 960 nm가 되는 이산화 티타늄 기반의 DBR을 제작하였고, 제작된 샘플의 증착된 박막의 표면 및 단면의 프로파일은 주사전자현미경을 사용하여 관찰하였으며, UV-Vis-NIR 스펙트로미터를 이용하여 반사율 특성을 조사하였다.

  • PDF

Design of High-Gain OP AMP Input Stage Using GaAs MESFETs (갈륨비소 MESFET를 이용한 고이득 연산 증폭기의 입력단 설계)

  • 김학선;김은노;이형재
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.17 no.1
    • /
    • pp.68-79
    • /
    • 1992
  • In the high speed analog system satellite communication system, video signal processing and optical fiber interface circuits, GaAs high gain operational amplifier is advantageous due to obtain a high gain because of its low transconductance and other drawbacks, such as low frequency dispersion and process variation. Therefore in this paper, a circuit techniques for improving the voltage gain for GaAs MESFET amplifier is presented. Also, various types of existing current mirror and current mirror proposed are compared.To obtain the high differential gain, bootstrap gain enhancement technique is used and common mode feedback is employed in differential amplifier.The simulation results show that gain is higher than that of basic amplifier about 18.6dB, and stability and frequency performance of differential amplifier are much improved.

  • PDF

The study of Germanium analysis by Adsorption Stripping Voltammetry (흡착벗김 전압전류법을 이용한 게르마늄 분석에 관한 연구)

  • Yun, Young Ja;Jeong, David;Namgung, Mi Ok
    • Analytical Science and Technology
    • /
    • v.8 no.2
    • /
    • pp.171-179
    • /
    • 1995
  • This is an analytical study of germanium by adsorption stripping squarewave voltammetry. Tannic acid was used as a ligand. The accumulation potential was -0.2V, accumulation time was carried out for 60 second under constant stirring, followed by a 20 second quiescent period, and frequency was 10Hz. A hanging mercury drop electrode was used as a working electrode and acetate buffer solution, pH=4.5, as supporting electrolyte. The proper conditions of ligand for germanium analysis was established. The effect of metal ions(lead, cupper, silicon, tin, gallium) on germanium peak was also studied.

  • PDF