• 제목/요약/키워드: $TiO_2$ Films

검색결과 1,677건 처리시간 0.03초

Support Effect of Arc Plasma Deposited Pt Nanoparticles/TiO2 Substrate on Catalytic Activity of CO Oxidation

  • Qadir, Kamran;Kim, Sang Hoon;Kim, Sun Mi;Ha, Heonphil;Park, Jeong Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.261-261
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    • 2013
  • The smart design of nanocatalysts can improve the catalytic activity of transition metals on reducible oxide supports, such as titania, via strong metal-support interactions. In this work, we investigatedtwo-dimensional Pt nanoparticle/titania catalytic systems under the CO oxidation reaction. Arc plasma deposition (APD) and metal impregnation techniques were employed to achieve Pt nanoparticle deposition on titania supports, which were prepared by multitarget sputtering and sol-gel techniques. APD Pt nanoparticles with an average size of 2.7 nm were deposited on sputtered and sol-gel-prepared titania films to assess the role of the titania support on the catalytic activity of Pt under CO oxidation. In order to study the nature of the dispersed metallic phase and its effect on the activity of the catalytic CO oxidation reaction, Pt nanoparticles were deposited in varying surface coverages on sputtered titania films using arc plasma deposition. Our results show an enhanced activity of Pt nanoparticles when the nanoparticle/titania interfaces are exposed. APD Pt shows superior catalytic activity under CO oxidation, as compared to impregnated Pt nanoparticles, due to the catalytically active nature of the mild surface oxidation and the active Pt metal, suggesting that APD can be used for large-scale synthesis of active metal nanocatalysts.

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Pt-Ir($Pt_{80}Ir_{20}$)-alloy를 이용한 PZT 박막 캐패시터 특성 (PZT thin capacitor characteristics of the using Pt-Ir($Pt_{80}Ir_{20}$)-alloy)

  • 장용운;장진민;이형석;이상현;문병무
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.47-52
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    • 2002
  • A processing method is developed for preparing sol-gel derived $Pb(Zr_{1-x}Ti_x)O_3$ (x=0.5) thin films on Pt-Ir($Pt_{80}Ir_{20}$)-alloy substrates. The as-deposited layer was dried on a plate in air at $70^{\circ}C$. And then it was baked at $1500^{\circ}C$, annealed at $450^{\circ}C$ and finally annealed for crystallization at various temperatures ranging from $580^{\circ}C$ to $700^{\circ}C$ for 1hour in a tube furnace. The thickness of the annealed film with three layers was $0.3{\mu}m$. Crystalline properties and surface morphology were examined using X-ray diffractometer (XRD). Electrical properties of the films such as dielectric constant, C-V, leakage current density were measured under different annealing temperature. The PZT thin film which was crystallized at $600^{\circ}C$ for 60minutes showed the best structural and electrical dielectric constant is 577. C-V measurement show that $700^{\circ}C$ sample has window memory volt of 2.5V and good capacitance for bias volts. Leakage current density of every sample show $10^{-8}A/cm^2$ r below and breakdown voltage(Vb) is that 25volts.

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증착 조건이 KLN 박막의 형상에 미치는 영향 (The Effect of Deposition Parameters on the Morphology of KLN Thin Films)

  • 박성근;전병억;김진수;김지현;최병진;남기홍;류기홍;김기완
    • 한국재료학회지
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    • 제11권1호
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    • pp.27-33
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    • 2001
  • 본 실험에서는 $Pt/Ti/SiO_2/Si(100)$ 기판 위에 KLN 박막을 형성할 때 나타나는 4-fold 그레인의 성장 특성을 조사하기 위하여 공정 변수를 변화시키면서 박막을 제작하였다. 공정 변수는 기판 온도, 스퍼터링 압력, 고주파 전력을 선택하여 최적의 증착 조건 근방에서 공정 변수를 변화시키면서 실험하였다. K와 Li가 과량된 타겟을 사용하여 KLN 박막을 제조할 때 최적의 성장 조건은 고주파 전력 100 W, 공정압력 150 mTorr, 기판온도 $600^{\circ}C$이며 공정변수의 작은 변화에도 박막의 표면 형상은 매우 민감하게 변화하였다. KLN은 화합물을 구성하는 원소 사이의 증기화 온도의 차이가 많이나는 물질로서 고온 고진공의 환경에서 박막을 제조할 때 어려움이 있으며, 녹는점과 기판 온도와의 관계를 설명한 Thornton의 모델로 설명하기 어려운 현상이 나타났다. 이러한 것은 박막 물질을 이루는 구성 원소의 증기화 온도를 이용하여 이 현상을 간단하게 설명할 수 있었다.

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Single layer antireflection coating on PET substrates for display applications

  • Gowtham, M.;Mangalaraj, D.;Seo, Chang-Ki;Shim, Myung-Suk;Hwang, Sun-Woo;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.988-991
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    • 2004
  • In the present investigation, we tried AR coating simulation by using the "Essential Macleod optical coating design and analysis" program. After various run of the program we selected appropriate materials which have specific refractive indices and for that thickness was optimized to get the low reflectance. By comparing the simulated results for the different materials,we found that $SiO_2$ and TiN are the appropriate materials for this Flat panel device (FPD) application. Thin films of these materials were deposited using RF magnetron sputtering and Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) methods on Polyethyleneterephthalate (PET) substrates. Spectroscopic ellipsometer (SE MF-1000) and UV-Vis spectrophotometer (SCINCO) were used for the optical characterization. The obtained experimental results are in good agreement with the simulation results.

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Observation of Carrier Multiplication via Internal Quantum Efficiency Exceeding 100% in PbS QDs Monolayer Solar Cells

  • Park, So Yeon;Chung, Hyun Suk;Han, Gill Sang;Su, Jang Ji;Jung, Hyun Suk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.467.1-467.1
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    • 2014
  • Quantum dots (QD) solar cells has received considerable attention due to their potential of improving the overall conversion efficiency by harvesting excess energy via multiple excitons generation (MEG). Although there have been many reports which show MEG phenomena by using optical measurement of quantum dots themselves, carrier multiplication in real QD photovoltaic devices has been sparsely reported due to difficulty in dissociation of excitons and charge collection. In this reports, heterojunction QD solar cells composed of PbS QD monolayer on highly crystalline $TiO_2$ thin films were fabricated by using Langmuir-Blodgett deposition technique to significantly reduce charge recombination at the interfaces between each QD. The PbS CQDs monolayer was characterized by using UV-vis, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The internal quantum efficiency (IQE) for the monolayer QD solar cells was obtained by measurement of external quantum efficiency and determining light absorption efficiency of active layer. Carrier multiplication was observed by measuring IQE greater than 100% over threshold photon energy. Our findings demonstrate that monolayer QD solar cell structure is potentially capable of realizing highly efficient solar cells based on carrier multiplication.

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YBCO coated conductor의 초전도 특성에 미치는 박막 증착 온도/압력의 영향 (The effect of deposition temperature/pressure on the superconducting properties of YBCO coated conductor)

  • 박찬;고락길;정준기;최수정;송규정;박유미;신기철;;유상임
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 초전도 자성체 연구회
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    • pp.30-33
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    • 2003
  • YBCO coated conductor, also called the 2nd generation high temperature superconducting wire, consists of oxide multi-layer hetero-epitaxial thin films. Pulsed laser deposition (PLD) is one of many film deposition methods used to make coated conductor, and is the one known to be the best to make superconducting layer so far. As a part of the effort to make long length coated conductor, the optimum deposition condition of YBCO film on single crystal substrate (SrTiO3) was investigated using PLD. Substrate temperature, oxygen partial pressure, and laser fluence were varied to find the best combination to grow high quality YBCO film.

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Si 기판에 제작된 AAO 박막의 기공 형성 최적화에 관한 연구 (A Study of Pore Formation of AAO Film on Si Substrate with Optimizing Process)

  • 권순일;양계준;송우창;이재형;임동건
    • 한국전기전자재료학회논문지
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    • 제21권5호
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    • pp.415-420
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    • 2008
  • AAO films were fabricated on two kinds of substrates such as $Al/SiO_2/Si$ and Al/Ni/Ti/Si. To obtain well-aligned AAO film, we optimized process condition for buffer layer, electrolyte and voltage. In the case of oxalic acid, the AAO film with pore size of approximately 45 nm was obtained at voltage of 40 V, temperature of $10^{\circ}C$, oxalic acid of 0.3 M and widening time of 60 min. Then the thickness of barrier is less than 600 nm. In the case of sulfuric acid, the AAO film has pore size of 40 nm and barrier thickness of 400 nm with optimum conditions such as voltage of 25 V, temperature of $8^{\circ}C$, sulfuric acid of 0.3 M and widening time of 60 min.

적색 양자점 필름을 이용한 백색 발광 다이오드의 연색성 개선에 대한 광학 시뮬레이션 연구 (Optical Simulation Study of the Improvement of Color-rendering Characteristics of White Light-emitting Diodes by Using Red Quantum-dot Films)

  • 이기정;홍승찬;이정균;고재현
    • 한국광학회지
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    • 제32권4호
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    • pp.163-171
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    • 2021
  • 조명에 사용되는 일반적인 백색 발광 다이오드는 청색 발광 다이오드 위에 황색 형광체를 입힌 구조가 보편적이나 발광 스펙트럼상 짙은 적색 성분이 부족해서 조명의 연색성이 떨어지는 문제가 있다. 본 연구에서는 백색 발광 다이오드의 연색 특성을 개선하기 위해 적색 양자점 조명을 백색 조명의 확산판에 적용한 후 광학 시뮬레이션을 이용해 광구조를 최적화하고자 하였다. 양자점의 평균 자유 행정 및 확산판 내 TiO2 입자의 농도를 조절해 연색지수, 휘도 등 광특성을 조사했다. 대부분의 조건에서 연색지수는 90을 넘었고 이는 적색 양자점 필름의 적용이 일반적인 백색 발광 다이오드의 연색 특성을 개선하는 데 효과적인 방법임을 보여준다. 색좌표의 각도 의존성은 확산판과 조명 하단의 반사판 사이에 형성되는 광학적 공동 구조를 활용함으로써 제거할 수 있었는데 이는 공동 내 위치한 양자점 필름을 통한 빛의 다중 투과가 시야각에 따른 광경로의 차이를 줄였기 때문으로 해석된다.

InGaZnO active layer 두께에 따른 thin-film transistor 전기적인 영향

  • 우창호;김영이;안철현;김동찬;공보현;배영숙;서동규;조형균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.5-5
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    • 2009
  • Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

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Synthesis and Photovoltaic Properties of Polymers Based on Cyclopentadithiophene and Benzimidazole Units

  • Song, Su-Hee;Park, Sei-Jung;Kwon, Soon-Cheol;Shim, Joo-Young;Jin, Young-Eup;Park, Sung-Heum;Kim, Il;Lee, Kwang-Hee;Suh, Hong-Suk
    • Bulletin of the Korean Chemical Society
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    • 제33권6호
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    • pp.1861-1866
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    • 2012
  • The new semiconducting copolymers with 4,4-dialkyl-$4H$-cyclopenta[2,1-$b$:3,4-$b^{\prime}$]dithiophene and 2,2-dimethyl-$2H$-benzimidazole units were synthesized. The fused aromatic rings, such as cyclopentadithiophene (CPDT) unit, can make the polymer backbone more rigid and coplanar, which induces long conjugation length, narrow band gap, and strong intermolecular ${\pi}-{\pi}$ interaction. The stacking ability was controlled through attaching of linear or branched alkyl side chains. The spectra of PEHCPDTMBI and PHCPDTMBI in the solid films show absorption bands with maximum peaks at 401, 759 and 407, 768 nm, and the absorption onsets at 925 and 954 nm, corresponding to band gaps of 1.34 and 1.30 eV, respectively. The devices comprising PHCPDTMBI with $TiO_X$ showed a $V_{OC}$ of 0.39 V, a $J_{SC}$ of 1.14 $mA/cm^2$, and a $FF$ of 0.34, giving a power conversion efficiency of 0.15%. The PHCPDTMBI with linear alkyl chain on CPDT shows good solubility in organic solvent with higher PCE value than that of PEHCPDTMBI.