• Title/Summary/Keyword: $TiO_2$ Films

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Fabrication of High-T$_c$ Superconducting Josephson Junctions by Ar lon Milling and E-Beam Lithography (Ar 이온빔 식각과 전자선리소그래피 방벙으로 제작한 고온초전도 조셉슨 접합)

  • Lee, Moon-Chul;Kim, In-Seon;Lee, Jeong-O;Yoo, Kyung-Hwa;Park, Yong-Ki;Park, Jong-Chul
    • 한국초전도학회:학술대회논문집
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    • v.9
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    • pp.91-94
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    • 1999
  • A new type of high-T$_c$ superconducting Josephson junctions has been prepared by Ar ion beam etching and electron beam lithography. YBa$_2Cu_3O_{7-x}$ (YBCO) films deposited on (001) SrTiO$_3$ single crystal substrate by pulsed laser deposition were patterned by Ar ion milling with photolithography. The narrow slit with a electroresist mask, about 1000 ${\AA}$ wide, was constructed over a 3 ${\sim}$ 5 ${\mu}$m bridge of a 1200-${\AA}$-thick YBCO film by electron beam lithography. The slit was then etched by the Ar ion beam to form a damaged 600-${\AA}$-thick YBCO. Thus prepared structure forms an S-N-S (YBCO - damaged YBCO - YBCO) type Josephson junctions. Those junctions exhibit RSI-like I-V characteristics at 77 K. The properties of the Josephson junctions such as I$_c$ R$_N$, and J$_c$ were characterized.

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A Study on the Switching and Retention Characteristics of PLT(5) Thin Films (PLT(5) 박막의 Switching 및 Retention 특성에 관한 연구)

  • Choi Joon Young;Chang Dong Hoon;Kang Seong Jun;Yoon Yung Sup
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.367-370
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    • 2004
  • We fabricated PLT(5) thin film on $Pt/TiO_x/SiO_2/Si$ substrate by using sol-gel method and investigated leakage current, switching and retention properties. The leakage current density of PLT(5) thin film was $3.56{\times}10^{-7}A/cm^2$ at 4V. In the examination of switching properties, pulse voltage and load resistance were $2V{\~}5V$ and $50{\Omega}{\~}3.3k{\Omega}$, respectively. Switching time had a tendency to decrease from 520ns to 140ns with the increase of pulse voltage, and also the time was increased from 140ns to $13.7{\mu}s$ with the increase of load resistance. The activation energy obtained from the relation of applied pulse voltage and switching time was about 143kV/cm. The error of switched charge density between hysteresis loop and experiment of polarization switching was about $10\%$. Also, polarization in retention was decreased as much as about $8\%$ after $10^5$s.

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A Study of Photoelectrolysis of Water by Use of Titanium Oxide Films (산화티타늄피막의 광 전기분해 특성에 대한 연구)

  • Park, Seong-Yong;Cho, Won-Il;Cho, Byung-Won;Lee, Eung-Cho;Yun, Kyung-Suk
    • Journal of Hydrogen and New Energy
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    • v.2 no.1
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    • pp.47-56
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    • 1990
  • Pure titanium rods were oxidized by anodic oxidation, furnace oxidation and flame oxidation and used as a electrode in the photodecomposition of water. The maximum photoelectrochemical conversion efficiency(${\eta}$) was found for flame oxidized electrode ($1200^{\circ}C$ for 2 min in air), 0.8 %. Anodically oxidized electrodes have minimum photoelectrochemical conversion efficiencies, 0.3 %. Furnace oxidized electrode ($800^{\circ}C$ for 10min in air) has 0.5% phtoelectrochemical efficiency and shows a band-gap energy of about 2.9eV. The efficiency shows a parallelism with the presence of the metallic interstitial compound $TiO_{O+X}$(X < 0.33) at the metal-semiconductor interface, the thickness of the sub oxide layer and that of the external rutile scale.

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Reflow of Sn Solder Bumps using Rapid Thermal Annealing(RTA) method and Intermetallic Formation (급속 열처리 방법에 의한 Sn 솔더 범프의 리플로와 금속간 화합물 형성)

  • Yang, Ju-Heon;Cho, Hae-Young;Kim, Young-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.15 no.4
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    • pp.1-7
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    • 2008
  • We studied a growth behavior of Intermetallic compounds(IMCs) during solder bumping with two reflow methods. Ti(50 nm), Cu($1{\mu}m$), Au(50 nm) and Ti(50 nm) thin films were deposited on $SiO_2$/Si wafer using the DC magnetron sputtering system as the under bump metallization(UBM). And the $5{\mu}m$ thick Cu bumps and $20{\mu}m$ thick Sn bumps were fabricated on UBM by electroplating. Sn bumps were reflowed in RTA(Rapid Thermal Annealing) system and convection reflow oven. When RTA system was used, reflow was possible without using flux and IMC thickness formed in the solder interface was thinner than that of a convectional method.

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Fabrication and Characterization of Tunable Bandpass Filter using BST Thin Films

  • Kim, Il-Doo;Kim, Duk-Su;Park, Kyu-Sung;Kim, Ho-Gi
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.581-584
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    • 2002
  • In this work, a CPW resonator was designed and fabricated to investigate the basic microwave properties, such as effective dielectric constant, of BST thin films. Their properties were used as basic data to simulate and design CPW tunable bandpass filter. We also report on gold/$Ba_{0.5}Sr_{0.5}TiO_3$(BST) ferroelectric thin film C-band tunable bandpass filters(BPFs) designed and fabricated on magnesium oxide substrates using CPW structure. The 2 pole filter was designed for a center frequency of 5.88 GHz with a bandwidth of 9 %. The BST based CPW filter offers a high sensitivity parameter as well as a low loss parameter. The tuning range for the bandpass filter with CPW structure was determined to be 170 MHz.

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Fabrication of Organic-Inorganic Nano Hybrid Superlattice Thin Films by Molecular Layer Deposition

  • Cho, Bo-Ram;Yang, Da-Som;Sung, Myung-M.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.115-115
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    • 2011
  • Nano hybrid superlattices consisting of organic and inorganic components have great potential for creation of new types of functional material by utilizing the wide variety of properties which differ from their constituents. They provide the opportunity for developing new materials with new useful properties. Herein, we fabricated new type of organic-inorganic nano hybrid superlattice thin films by a sequential, self-limiting surface chemistry process known as molecular layer depostion (MLD) combined with atomic layer deposition (ALD). An organic layer was formed at $150^{\circ}C$ using MLD with repeated sequintial adsorption of Hydroquinone and Titanium tetrachloride. A $TiO_2$ inorganic nanolayer was deposited at the same temperature using ALD with alternating surface-saturating reactions of Titanium tetrachloride and water. Using UV-Vis spectroscopy, we confirmed visible light absorption by LMCT. And FTIR spectroscopy and XPS were employed to determine the chemical composition. Ellipsometry and TEM analysis were also used to confirm linear growth of the film versus number of MLD cycles at all same temperature. In addition, p-n junction diodes domonstrated in this study suggest that the film can be suitable for n-type semiconductors.

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Dielectric Properties and Leakage Current Characteristics of PZT Heterolayered Thin Films by the Sol-Gel Method (Sol-Gel 법으로 제작한 PZT이종층 박막의 운전 및 누설전류 특성)

  • Shim, Kwang-Taek;Lee, Young-Hie;Lee, Sung-Gap;Bae, Seon-Gi
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1229-1231
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    • 1997
  • In this work, PZT(20/80)/(80/20) heterolayered thin film that has the tetragonal and rhombohedral structure was fabricated by Sol-Gel method spin-coated on the Pt/Ti/$SiO_2$/Si substrate by turns. The thickness of PZT-1 film obtained by six-times of drying/sintering process was about 480[nm]. This procedure was repeated several times to form PZT heterolayered thim film. PZT-5 thin films with top layer of tetragonal PZT(20/80) thin film showed dense grain structure and PZT-6 thin film with top layer of rhombohedral PZT(80/20) thin film showed the microstructure without rosette. Dielectric constant increased with increasing the number of coatings, and it was about 13S5 at PZT-6 thin film. Dielectric loss was not depend on the number of coatings.

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Anodization Process of the YBa2Cu3O7-x Strip Lines by the Conductive Atomic Force Microscope Tip (전도성 AFM 탐침에 의한 YBa2Cu3O7-x 스트립 라인의 산화피막 형성)

  • 고석철;강형곤;임성훈;한병성;이해성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.875-881
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    • 2004
  • Fundamental results obtained from an atomic force microscope (AFM) chemically-induced direct nano-lithography process are presented, which is regarded as a simple method for fabrication nm-scale devices such as superconducting flux flow transistors (SFFTs) and single electron tunneling transistors (SETs). Si cantilevers with Pt coating and with 30 nm thick TiO coating were used as conducting AFM tips in this study. We observed the surfaces of superconducting strip lines modified by AFM anodization' process. First, superconducting strip lines with scan size 2 ${\mu}{\textrm}{m}$${\times}$2 ${\mu}{\textrm}{m}$ have been anodized by AFM technology. The surface roughness was increased with the number of AFM scanning, The roughness variation was higher in case of the AFM tip with a positive voltage than with a negative voltage in respect of the strip surface. Second, we have patterned nm-scale oxide lines on ${YBa}-2{Cu}_3{O}_{7-x}$ superconducting microstrip surfaces by AFM conductive cantilever with a negative bias voltage. The ${YBa}-2{Cu}_3{O}_{7-x}$ oxide lines could be patterned by anodization technique. This research showed that the critical characteristics of superconducting thin films were be controlled by AFM anodization process technique. The AFM technique was expected to be used as a promising anodization technique for fabrication of an SFFT with nano-channel.

Effect of HA Crystals Precipitated by Hydrothermal-Treatment on the Bioactivity of Ti-6Al-7Nb Alloy (열수처리에 의해 석출된 HA 결정이 Ti-6Al-7Nb 합금의 생체활성에 미치는 영향)

  • Kwon O. S.;Choi S. K.;Moon J. W.;Lee M. H.;Bae T. S.;Lee O. Y.
    • Korean Journal of Materials Research
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    • v.14 no.9
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    • pp.607-613
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    • 2004
  • This study was to investigate the surface properties of electrochemically oxidized Ti-6Al-7Nb alloy by anodic spark discharge technique. Anodizing was performed at current density 30 $mA/cm^2$ up to 300 V in electrolyte solutions containing $DL-{\alpha}$-glycerophosphate disodium salt hydrate($DL-{\alpha}$-GP) and calcium acetate (CA). Hydrothermal treatment was done at $300^{\circ}C$ for 2 hrs to produce a thin outermost layer of hydroxyapatite (HA). The bioactivity was evaluated from HA formation on the surfaces in a Hanks' solution with pH 7.4 at $36.5^{\circ}C$ for 30 days. The size of micropores and the thickness of oxide film increased and complicated multilayer by increasing the spark forming voltage. Needle-like HA crystals were observed on anodic oxide film after the hydrothermal treatment at $300^{\circ}C$ for 2 hrs. When increasing $DL-{\alpha}$-GP in electrolyte composition, the precipitated HA crystals showed the shape of thick and shorter rod. However, when increasing CA, the more fine needle shape HA crystals were appeared. The bioactivity in Hanks' solution was accelerated when the oxide films composed with strong anatase peak with presence of rutile peak. The increase of amount of Ca and P was observed in groups having bioactivity in Hanks' solution. The Ca/P ratio of the precipitated HA layer was equivalent to that of HA crystal and it was closer to 1.67 as increasing the immersion time in Hanks' solution.

A Study on the Photocatalytic Degradation of VOC over TiO2 Coated on Glass Bead (산화티탄 광촉매를 이용한 VOC 가스 처리효과에 관한 연구)

  • Yun, Seok-Yeong;No, Jun-Hyeong;Park, Sun-Je;Lee, Seung-Ho
    • Korean Journal of Materials Research
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    • v.10 no.5
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    • pp.328-334
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    • 2000
  • The photocatalyst of $TiO_2$coated on glass bead was prepared from sol-gel method to remove the VOC (vola-tile organic compounds) by the photocatalytic reaction. The coated films were characterized by X-ray diffraction(XRD), specific surface area(BET), and scanning electron microscopy observation (SEM), The gas-phase photocatalytic degradation of trichloroethylene(TCE) and benzene with coated titanium dioxide on glass beads was in-vestigated using a fixed bed reactor. The degradation was calculated by the concentration difference with the retained on the reactor with aid of gas chromatography. At steady state, conversion yields were obtained for 80% of trichloroeth-vlene in 400 ppmv concentration and 65% on benzene in the range of concentration from 50 to 300 ppmv, respectively.

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