The Influence of Inhibitors Concentration on Dispersion Stability of Colloidal $SiO_2$ Slurry and its Effect on Cu CMP Process
(Cu CMP용 슬러리의 Inhibitor 농도가 Colloidal $SiO_2$ 분산안정성 및 Cu CMP 공정에 미치는 영향)
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- Proceedings of the Korean Ceranic Society Conference
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- 2003.10a
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- pp.83.1-83
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- 2003