• Journal of the Korean Ceramic Society
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• v.48 no.5
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• pp.439-446
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• 2011

Yttria stabilized zirconia (YSZ) coating was formed on AA1050 Al alloys by aerosol deposition (AD), and its electrochemical corrosion properties were investigated in 3.5 wt% NaCl and 0.5M $H_2SO_4$ solutions. The crack-free, dense, and ~5 ${\mu}m$ thick YSZ coating was successfully obtained by AD. The as-deposited coating was composed of cubic-YSZ nanocrystallites of ~10 nm size. The potentiodynamic test indicated that the YSZ coated Al alloy had much lower corrosion current densities (2 nA/$cm^2$) by comparison to uncoated sample and exhibited a passive behavior in anodic branch. Particularly, a pitting breakdown potential could not be identified in $H_2SO_4$. EIS tests revealed that the impedance of YSZ coated sample was ${\sim}10^6{\Omega}cm^2$ in NaCl and ${\sim}10^7{\Omega}cm^2$ in $H_2SO_4$, which was about 3 or 4 orders of magnitude higher than that of uncoated sample. Consequently, the corrosion resistance of Al alloy had been significantly enhanced by the YSZ coating.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.42.2-42.2
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• 2010

Transparent conducting oxides (TCOs) are of significant importance for their applications in various devices, such as light-emitting diodes, thin-film solar cells, organic light-emitting diodes, liquid crystal displays, and so on. In order for TCOs to contribute to the performance improvement of these devices, TCOs should have high transmittance and good electrical properties simultaneously. Sn-doped $In_2O_3$ (ITO) is the most commonly used TCO. However, indium is toxic and scarce in nature. Thus, ZnO has attracted a lot of attention because of the possibility for replacing ITO. In particular, group III impurity-doped ZnO showed the optoelectronic properties comparable to those of ITO electrodes. Al-doped ZnO exhibited the best performance among various doped ZnO films because of the high substitutional doping efficiency. However, in order for the Al-doped ZnO to replace ITO in electronic devices, their electrical and optical properties should further significantly be improved. In this connection, different ways such as a variation of deposition conditions, different deposition techniques, and post-deposition annealing processes have been investigated so far. Among the deposition methods, RF magnetron sputtering has been extensively used because of the easiness in controlling deposition parameters and its fast deposition rate. In addition, when combined with post-deposition annealing in a reducing ambient, the optoelectronic properties of Al-doped ZnO films were found to be further improved. In this presentation, we deposited Al-doped ZnO (ZnO:$Al_2O_3$ = 98:2 wt%) thin films on the glass and sapphire substrates using RF magnetron sputtering as a function of substrate temperature. In addition, the ZnO samples were annealed in different conditions, e.g., rapid thermal annealing (RTA) at $900^{\circ}C$ in $N_2$ ambient for 1 min, tube-furnace annealing at $500^{\circ}C$ in $N_2:H_2$=9:1 gas flow for 1 hour, or RTA combined with tube-furnace annealing. It is found that the mobilities and carrier concentrations of the samples are dependent on growth temperature followed by one of three subsequent post-deposition annealing conditions.

• Journal of the Korean institute of surface engineering
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• v.15 no.1
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• pp.11-18
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• 1982

80% Ni-Permalloy is soft magnetic material with high initial permeability and low magnetic coercive force Hc, and is used to computer memory cores and minirelays of communication e-ngineering. In this paper 80 Permalloy thin film on copper cathode was alloy-deposited from Watts so-lution contatining FeSO4$.$7H2O. The amount of FeSO4$.$7H2O in the solution, pH, temperature of the solution and plating current density were varied as parameters and the resulting comp-osition changes of deposited film were analyzed electrochemically with respect to the parame-ters. From the above procedure electroplating conditions for deposition of 80 Permalloy were est-ablished as following: 17-21 g/$\ell$ of FeSO4$.$7H2O in Watts solution, current density 1.0-2.0 Amp/dm2, pH 2.5-3.0 and temperature range of 50-60$^{\circ}C$.

• Asian Journal of Atmospheric Environment
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• v.10 no.2
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• pp.57-66
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• 2016

Wet deposition fluxes of ions at a coastal site in southwestern Japan in the period 1996-2003 were investigated to quantify the respective contributions of cyclone-, stationary front- and typhoon-associated rains. On average, the deposition fluxes of terrigenous-origin ions, nss-$SO_4{^{2-}}$, $NO_3{^-}$, $NH_4{^+}$ and nss-$Ca^{2+}$ were $37.6{\pm}7.3$, $16.3{\pm}4.2$, $19.0{\pm}3.4$ and $9.6{\pm}4.8meq\;m^{-2}yr^{-1}$, and those of $Na^+$ and $Cl^-$, the major ions in sea water, were $97.0{\pm}38.2$ and $115.2{\pm}48.2meq\;m^{-2}yr^{-1}$, respectively. Cyclone-associated rain constituted more than 50% of the fluxes of the terrigenous ions in almost all years. Stationary front-associated rain also contributed significantly, although the contribution was lower than the contribution by Cyclone-associated rain in almost all years. In particular, the wet deposition flux of nitrogen compounds of $NO_3{^-}$ and $NH_4{^+}$, which are important nutrients for micro-bioactivities in sea surface water, was dominated by cyclone-associated rain. Due to the extreme abundance of $Na^+$ and $Cl^-$ in the rainwater of typhoons, the fluxes of $Na^+$ and $Cl^-$ were contributed substantially by typhoons in years with typhoons' passage although cyclones were still the largest contributor to the fluxes. These results indicate the dominance of cyclones in the wet deposition to the East China Sea areas and the necessity to take rain types into account for a more accurate elucidation of the temporal and spatial variation of the wet deposition.

• Korean Chemical Engineering Research
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• v.43 no.4
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• pp.495-502
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• 2005

Copper was plated on the tungsten substrate by use of a direct copper electroless plating. The optimum deposition conditions were found to be with a concentration of $CuSO_4$ 7.615 g/L, EDTA of 10.258 g/L, and glyoxylic acid of 7 g/L, respectively. The solution temperature was maintained at $60^{\circ}C$. The pH was varied from 11.0 to 12.8. After the deposition, the properties of the copper film were investigated with X-ray diffractometer (XRD), Field emission secondary electron microscope (FESEM), Atomic force microscope (AFM), X-ray photoelectron spectroscope (XPS), and Rutherford backscattering spectroscope (RBS). The best deposition condition was founded to be the solution pH of 11.8. In the case of 10 min deposition at the pH of 11.8, the grain shape was spherical, Cu phase was pure without impurity peak ($Cu_2O$ peak), and the surface root mean square roughness was about 11 nm. The thickness of the film turned out to be 140 nm after deposition for 12 min and the deposition rate was found to be about 12 nm/min. Increase in pH induced a formation of $Cu_2O$ phase with a long rectangular grain shape. The pH control seems to play an important role for the orientation of Cu in electroless deposition. The deposited copper concentration was 99 atomic percent according to RBS. The resulting Cu/W film yielded a good adhesive strength, because Cu/W alloy forms during electroless deposition.

• Journal of Korean Society for Atmospheric Environment
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• v.28 no.3
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• pp.294-305
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• 2012

The objective of this study is to estimate the chemical compositions and to identify qualitative sources of fall-out particles in study area. Also, this study used a spatial analysis to estimate spatial distributions and average deposition flux. In this study, the chemical compositions of fall-out particle samples collected at Muncheon lake from May 2010 to January 2011 were analyzed by ICP and IC. The monthly trend of deposition fluxes for fall-out particles showed highest in June ($107.61kg/km^2/day$) and lowest in October ($22.22kg/km^2/day$). The average fluxes of Fe, Si, Al, Zn and Ba are 0.44, 0.24, 0.20, 0.17, $0.09kg/km^2/day$, respectively. Also, the average fluxes of $NO_3^-$, $SO_4^{2-}$, $NH_4^+$, $Ca^{2+}$, and $Na^+$ are 6.48, 5.01, 4.96, 1.75, $1.37kg/km^2/day$, respectively. A Factor analysis identified four sources such as 1) nonferrous metal, motor vehicle, and agriculture, 2) soil, 3) field burning, incineration, and 4) road dust and oil burning. The IDW (inverse distance weighting) spatial analysis method was used to estimate spatial distribution and average deposition flux for fall-out particles. A total average deposition fluxes estimated in Muncheon lake were 936.15 kg/month. The spatial distribution trend of deposition flux showed higher at site 1 and 2 than at site 3, 4 because local road is adjacent to the site 1 and 2.

• Journal of Sensor Science and Technology
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• v.10 no.1
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• pp.80-85
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• 2001

$Hg_{1-x}Cd_xTe$(MCT) thin films were grown onto ITO glass and titanium plate by stationary cathodic electrodeposition in aqueous solution contained $CdSO_4$, $TeO_2$, and $HgCl_2$. During deposition two main fabrication parameters were taken into account deposition potential and growth temperature. MCT films deposited by varying two parameters were studied by X-ray diffraction, electron probe micro analyser(EPMA) and scanning electron microscope measurements. It was shown by XRD and EPMA measurements that the structure of MCT films was zinc blonde and the composition of MCT films can be controlled with the deposition potential.

• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1535-1537
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• 2003

Manganese oxide electrode was designed to improve electrical conductivity for dimensionally stable anode(DSA) using discreet variation (DV)-X${\alpha}$ method. It was calculated in DV-X${\alpha}$ method that the addition of nickel to manganese oxide reduce the energy band gap of manganese oxide electrode. Therefore, it is estimated that nickel in 3 additive elements of Ti, Ni and Sn is the best candidate to improve the electrical conductivity of manganese oxide. The anodically deposited manganese oxide which was produced in 0.2M $MnSO_4$ and 0.2M (Mn,Ni)$SO_4$ solution had $MnSO_4$ structure which was identified by XRD. The $MnSO_4$ films produced in both solutions over than 50mA/$cm^2$ of current density and long deposition time of 600sec showed low adhesion with Ti substrate.

• Journal of the Korean Institute of Telematics and Electronics
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• v.18 no.1
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• pp.35-40
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• 1981

Thin films of SnO2, SnO2-ZnO and ZnO were prepared by the spray. chemical vapor deposition and vacuum evaporation method. They had good sensitivity to various gases involving toxic gases(i. e. SO2, CO). The change in conductivity of thin film guts sensors prepared was considered as the change in carrier concentration caused by gas absorption. And also the conductivity of the thin film elements had great dependence on atmospheric pressuie around them.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.186-194
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• 2004

In this research, microfabrication technique using localized electrochemical deposition (LECD) with ultra short pulses is presented. Electric field is localized near the tool tip end region by applying a few hundreds of nano second pulses. Pt-Ir tip is used as a counter electrode and copper is deposited on the copper substrate in 0.5 M CuSO$_4$ and 0.5 M H$_2$SO$_4$ electrolyte. The effectiveness of this technique is verified by comparison with LECD using DC voltage. The deposition characteristics such as size, shape, surface, and structural density according to applied voltage and pulse duration are investigated. The proper condition is selected from the results of the experiments. Micro columns less than 10 $\mu$m in diameter are fabricated using this technique. The real 3D micro structures such as micro pattern and micro spring can be fabricated by this method. It is suggested that presented method can be used as an easy and inexpensive method for fabrication of microstructure with complex shape.