• Title/Summary/Keyword: $O_2$ Sensor

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Fabrication of ${\gamma}-Fe_2O_3$ Thin Film for Chemical Sensor Application (화학센서용 다공성 ${\gamma}-Fe_2O_3$ 박막 제조)

  • Kim, Bum-Jin;Lim, Il-Sung;Jang, Gun-Eik
    • Journal of Sensor Science and Technology
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    • v.8 no.2
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    • pp.171-176
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    • 1999
  • ${\gamma}-Fe_2O_3$ thin films on $Al_2O_3$ substrate were prepared by the oxidation of $Fe_3O_4$ thin films processed by PECVD(Plasma-Enhanced Chemical Vapor Deposition) technique. The phase transformation of ${\gamma}-Fe_2O_3$ thin films was mainly controlled by the substrate temperature and oxidation process of $Fe_3O_4$ phase. $Fe_3O_4$ phase was obtained at the deposition temperature of $200{\sim}300^{\circ}C$. $Fe_3O_4$ phase could be transformed into ${\gamma}-Fe_2O_3$ phase under controlled oxidation at $280{\sim}300^{\circ}C$. $Fe_3O_4$ and ${\gamma}-Fe_2O_3$ obtained by oxidation of $Fe_3O_4$ phase had the same spinel structure and were coexisted. The oxidized ${\gamma}-Fe_2O_3$ thin film on $Al_2O_3$ substrate showed a porous island structure.

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SOl Pressure Sensors (SOI 압력(壓力)센서)

  • Chung, Gwiy-Sang;Ishida, Makoto;Nakamura, Tetsuro
    • Journal of Sensor Science and Technology
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    • v.3 no.1
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    • pp.5-11
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    • 1994
  • This paper describes the characteristics of a piezoresistive pressure sensor fabricated on a SOI (Si-on-insulator) structure, in which the SOI structures of Si/$SiO_{2}$/Si and Si/$Al_{2}O_{3}$/Si were formed by SDB (Si-wafer direct bonding) technology and hetero-epitaxial growth, respectively. The SOI pressure sensors using the insulator of a SOI structure as the dielectrical isolation layer of piezoresistors, were operated at higher temperatures up to $300^{\circ}C$. In the case of pressure sensors using the insulator of a SOI structure as an etch-stop layer during the formation of thin Si diaphragms, the pressure sensitivity variation of the SOI pressure sensors was controlled to within a standard deviation of ${\pm}2.3%$ over 200 devices. Moreover, the pressure sensors fabricated on the double SOI ($Si/Al_{2}O_{3}/Si/SiO_{2}/Si$) structures formed by combining SDB technology with epitaxial growth also showed very excellent characteristics with high-temperature operation and high-resolution.

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Effect of Working Temperature on Sensitivity of Au/SnO2 Core-Shell Structure Nanoparticles for CO Gas (Au/SnO2 core-shell 나노구조 센서의 구동온도가 CO 감동에 미치는 영향)

  • Yu, Yeon-Tae
    • Journal of Sensor Science and Technology
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    • v.21 no.6
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    • pp.456-460
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    • 2012
  • Au/$SnO_2$ core-shell structure nanoparticles (NPs) were synthesized by microwave hydrothermal method, and the effect of working temperature on sensitivity of Au/$SnO_2$ core-shell NPs for CO gas was investigated. The $SnO_2$ shell layer was consisted of $SnO_2$ primary particles with 4.5 nm diameter. The response of Au/$SnO_2$ core-shell NPs for CO gas was maximized at the working temperature of $350^{\circ}C$ while the sensitivity increased with decreasing the working temperature due to the low grain size effect of $SnO_2$ NPs on the response of CO gas.

Development of a New Copper(II) Ion-selective Poly(vinyl chloride) Membrane Electrode Based on 2-Mercaptobenzoxazole

  • Akhond, Morteza;Ghaedi, Mehrorang;Tashkhourian, Javad
    • Bulletin of the Korean Chemical Society
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    • v.26 no.6
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    • pp.882-886
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    • 2005
  • Copper(II) ion-selective PVC membrane electrode based on 2-mercaptobenzoxazole as a new ionophore and o-nitrophenyl octyl ether (o-NPOE) as plasticizer is proposed. This electrode revealed good selectivity for $Cu^{2+}$ over a wide variety of other metal ions. Effects of experimental parameters such as membrane composition, nature and amount of plasticizer, and concentration of internal solution on the potential response of $Cu^{2+}$ sensor were investigated. The electrode exhibits good response for $Cu^{2+}$ in a wide linear range of 5.0 ${\times}$ 10−.6-1.6 ${\times}$ $10^{-2}$ mol/L with a slope of 29.2 ${\pm}$ 2.0 mV/decade. The response time of the sensor is less than 10 s, and the detection limit is 2.0 ${\times}$ $10^{-6}$ mol/L. The electrode response was stable in pH range of 4-6. The lifetime of the electrode was about 2 months. The electrode revealed comparatively good selectivities with respect to many alkali, alkaline earth, and transition metal ions.

Elect of Catalytic Configuration on Sensing Properties of Nano Gas Sensor (나노 가스 감지 소자의 특성에 미치는 촉매 구조의 영향)

  • Hong, Sung-Jei;Isshiki Minoru;Han, Jeong-In
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.10
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    • pp.917-923
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    • 2005
  • In this paper, effect of catalytic configuration on the sensing properties of $SnO_2$ nanoparticle gas sensitive thick film was investigated. Two types of catalytic configuration, mono and binary, were made on the $SnO_2$ nanoparticle. In case of mono catalytic system, $3 wt\%$ Pd or Pt catalyst was doped onto the $SnO_2$ nanoparticle, respectively. In case of binary catalytic system, Pd and Pt was doped simultaneously with concentration ratio of 1:2 to 2:1 onto the $SnO_2$ nanoparticle. After doping, gas sensitive thick film was printed on alumina substrate and heat-treated at 450 to $600^{\circ}C$. Gas sensing properties was evaluated using 500 to 10,000 ppm $CH_4$ gas. As a result, gas sensitive thick film with binary catalytic system showed unstable phenomena that the gas sensitivity was changed according to aging time. In contrary, the mono catalytic system showed relatively stable phenomena despite of aging time. Especially, gas sensitive thick film doped with $3 wt\%$ Pt catalyst and heat-treated at $500^{\circ}C$ showed good sensing properties such as 0.57 of $R_{3500}/R_{1000}$ and very small variation within $3.5\%$ after aging for 5 hours, and response time was very short less than 20 seconds.

Hydrocarbon Gas-sensing Properties of Catalytic Combustion Type Gas Sensor (접촉연소식 가스센서의 탄화수소계 가스 감응 특성)

  • Lee, Dae-Sik;Lee, Sang-Mun;Nam, Ki-Hong;Han, Sang-Do;Lee, Duk-Dong
    • Journal of Sensor Science and Technology
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    • v.8 no.4
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    • pp.327-332
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    • 1999
  • Catalytic combustion type gas sensors were fabricated by using noble metal(Pt and Pd) added ${\gamma}-Al_2O_3$ powder with specific surface area of $200\;m^2/g$. The fabricated sensor showed power consumption of 500 mW at the operating voltage of 1.75 V and high sensitivity of about 120 mV for butane, methane, or propane 100%LEL, respectively. The sensor properties also showed good linearity to hydrocarbon gas concentration variation, reproductivity and stability for relative humidity variation. And it showed high stability in butane ambient for 100 days.

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Preparation of SnO and SnO, SnO2 fine powder by hydrazine method (Hydrazine법에 의한 SnO, SnO2 미분말의 합성)

  • Kim, Kang-Min;Kim, Ki-Won;Cho, Pyeong-Seok;Lee, Jong-Heun
    • Journal of Sensor Science and Technology
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    • v.14 no.5
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    • pp.297-301
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    • 2005
  • Nanocrystalline SnO and $SnO_{2}$ powder have been prepared by hydrazine method. Sn-Hydrazine complex was formed by the reduction between aqueous $SnCl_{2}$ solution and hydrazine monohydrate. $SnO_{2}$ nano powder was prepared by the decomposition of Sn-Hydrazine complex at $450^{\circ}C$. When NaOH was added to Sn-hydrazine complex, SnO powder with nano-sheet morphology could be prepared. This can be attributed to the role of $OH^{-}$ ion as a reducing agent.

Development of the high temperature silicon pressure sensor (고온용 실리콘 압력센서 개발)

  • Kim, Mi-Mok;Chul, Nam-Tae;Lee, Young-Tae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.147-150
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    • 2003
  • In this paper, We fabricated a high temperature pressure sensor using SBD(silicon- direct-bonding) wafer of $Si/SiO_2$/Si-sub structure. This sensor was very sensitive because the piezoresistor is fabricated by single crystal silicon of the first layer of SDB wafer. Also, it was possible to operate the sensor at high temperature over $120^{\circ}C$ which is the temperature limitation of general silicon sensor because the piezoresistor was dielectric isolation from silicon substrate using silicon dioxide of the second layer. The sensitivity of this sensor is very high as the measured result of D2200 shows $183.6\;{\mu}V/V{\cdot}kPa$. Also, the output characteristic of linearity was very good. This sensor was available at high temperature as $300^{\circ}C$.

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Development of the High Temperature Silicon Pressure Sensor (고온용 실리콘 압력센서 개발)

  • Kim, Mi-Mook;Nam, Tae-Chul;Lee, Young-Tae
    • Journal of Sensor Science and Technology
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    • v.13 no.3
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    • pp.175-181
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    • 2004
  • A pressure sensor for high temperature was fabricated by using a SDB(Silicon-Direct-Bonding) wafer with a Si/$SiO_{2}$/ Si structure. High pressure sensitivity was shown from the sensor using a single crystal silicon of the first layer as a piezoresistive layer. It also was made feasible to use under the high temperature as of over $120^{\circ}C$, which is generally known as the critical temperature for the general silicon sensor, by isolating the piezoresistive layer dielectrically and thermally from the silicon substrate with a silicon dioxide layer of the second layer. The pressure sensor fabricated in this research showed very high sensitivity as of $183.6{\mu}V/V{\cdot}kPa$, and its characteristics also showed an excellent linearity with low hysteresis. This sensor was usable up to the high temperature range of $300^{\circ}C$.