• Title/Summary/Keyword: $Ni_2O_3$

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Stabilizing Li2O-based Cathode/Electrolyte Interfaces through Succinonitrile Addition

  • Myeong Jun Joo;Yong Joon Park
    • Journal of Electrochemical Science and Technology
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    • v.14 no.3
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    • pp.231-242
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    • 2023
  • Li2O-based cathodes utilizing oxide-peroxide conversion are innovative next-generation cathodes that have the potential to surpass the capacity of current commercial cathodes. However, these cathodes are exposed to severe cathode-electrolyte side reactions owing to the formation of highly reactive superoxides (Ox-, 1 ≤ x < 2) from O2- ions in the Li2O structure during charging. Succinonitrile (SN) has been used as a stabilizer at the cathode/electrolyte interface to mitigate cathode-electrolyte side reactions. SN forms a protective layer through decomposition during cycling, potentially reducing unwanted side reactions at the interface. In this study, a composite of Li2O and Ni-embedded reduced graphene oxide (LNGO) was used as the Li2O-based cathode. The addition of SN effectively thinned the interfacial layer formed during cycling. The presence of a N-derived layer resulting from the decomposition of SN was observed after cycling, potentially suppressing the formation of undesirable reaction products and the growth of the interfacial layer. The cell with the SN additive exhibited an enhanced electrochemical performance, including increased usable capacity and improved cyclic performance. The results confirm that incorporating the SN additive effectively stabilizes the cathode-electrolyte interface in Li2O-based cathodes.

Amorphous Carbon Films on Ni using with $CBr_4$ by Thermal Atomic Layer Deposition

  • Choe, Tae-Jin;Gang, Hye-Min;Yun, Jae-Hong;Jeong, Han-Eol;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.28.1-28.1
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    • 2011
  • We deposited the carbon films on Ni substrates by thermal atomic layer deposition (th-ALD), for the first time, using carbon tetrabromide ($CBr_4$) precursors and H2 reactants at two different temperatures (573 K and 673 K). Morphology of carbon films was characterized by scanning electron microscopy (SEM). The carbon films having amorphous carbon structures were analyzed by X-ray photoemission spectroscopy (XPS) and Raman spectroscopy. As the working temperature was increased from 573 K to 673 K, the intensity of C1s spectra was increased while that of O1s core spectra was reduced. That is, the purity of carbon films containing bromine (Br) atoms was increased. Also, the thin amorphous carbon films (ALD 3 cycle) were transformed to multilayer graphene segregated on Ni layer, through the post-annealing and cooling process.

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STM Investigation of Methanol Adsorption on Al2O3/NiAl(110) Deposited by Pulsed Injection

  • Lee, Youn-Joo;Choi, E.;Lyo, In-Whan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.318-318
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    • 2011
  • Etching of an ultrathin aluminum oxide film on NiAl(110) substrate by methanol is studied by home-built scanning tunneling microscopy at room-temperature. We deposited liquid methanol on thin alumina film by using a high speed solenoid valve suitable for deposition of thermally unstable molecules. It is found that only the reflection domain boundary between two domains was preferentially etched by methanol. Since the reflection domain boundary has many oxygen vacancies and irregular structures, judging from the fact, we assume that oxygen vacancies cause the chemically reactive phenomena of methanol in reflection domain boundary on an alumina film. The reactivity of the reflection domain boundary is attributed to the oxygen vacancies due to irregular structures. Similar reactivity is found on the oxygen deficient alumina produced on top of the intact alumina.

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Thickness Dependence of the Electrical Properties in NiCr Thin Film Resistors Annealed in a Vacuum Ambient for π - type Attenuator Applications

  • Phuong Nguyen Mai;Lee Won-Jae;Yoon Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.8
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    • pp.712-716
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    • 2006
  • NiCr thin films prepared on $SiO_2/Si$ substrates at room temperature by magnetron co-sputtering technique and then annealed in a vacuum ambient $(3{\times}10^{-6}\;Torr)\;at\;400^{\circ}C$. The grain size and crystallinity of the films increased with film thickness. The resistivity of the films slightly decreases as the film thickness increases, Temperature coefficient resistance (TCR) exhibits positive values irrespective of film thickness and TCR in the range of 50 to 400 nm thickness shows suitable values for the application of 10 dB in ${\pi}-type$ attenuators.

The fabrication and study of NiCr thin film resister (NiCr 박막저항의 제작 및 특성연구)

  • Ryu, Je-Cheon;Kim, Dong-Jin;Park, Jong-Wan;Kim, Yong-Il;Kim, Kyu-Tae;Song, Yang-Sup;Yu, Kwang-Min
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1640-1642
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    • 2000
  • We were fabricated of NiCr thin film resitors(TFR) on $Al_{2}O_3$ substrates by dc magnetic sputtering, system. The characteristics of electrical resistance by substrates & annealing condition on the resistors were studied by X-ray Diff. and SEM, ESCA.

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Effect of Alloying Elements of Si, Mn, Ni, and Cr on Oxidation of Steels between 1050℃ and 1200℃ in Air (강의 대기 중 1050~1200℃의 산화에 미치는 합금원소 Si, Mn, Ni, Cr의 영향)

  • Lee, Dong Bok
    • Korean Journal of Metals and Materials
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    • v.50 no.4
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    • pp.300-309
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    • 2012
  • Low-carbon steels and a stainless steel were oxidized isothermally and cyclically between $1050^{\circ}C$ and $1200^{\circ}C$ for up to 100 min in air to find the effect of alloying elements of Si, Mn, Ni, and Cr on their oxidation. The most active alloying element of Si was scattered inside the oxide scale, at the scale-alloy interface and as internal oxide precipitates beneath the oxide scale. Manganese, which could not effectively improve the oxidation resistance, was rather uniformly distributed in the oxide scale. Nickel and chromium tended to present at the lower part of the oxide scale. Excessively thick porous scales formed on the low-carbon steels, whereas thin but non-adherent scales containing $Cr_2O_3$ formed on the stainless steel.

The effect of the gold based bonding agents on the bond between Ni-Cr alloys and ceramic restorations (Ni-Cr합금과 도재간의 결합력에 gold-based bonding agent가 미치는 영향)

  • Lee, Jung-Hwan;Joo, Kyu-Ji
    • Journal of Technologic Dentistry
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    • v.29 no.2
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    • pp.213-223
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    • 2007
  • The success of a porcelain fused to metal (PFM) restoration depends upon the quality of the porcelain-metal bond. The adhesion between metal substructure and dental porcelain is related to the diffusion of oxygen to the reaction layer formed on cast-metal surface during firing. The purposed of this investigation was to study the effects of gold based bonding agent on Ni-Cr alloy-ceramic adhesion between porcelain matrix, gold based bonding agent and metal substructure interface. gold based bonding agent have been applied as an intermediate layer between a metal substructure and a ceramic coating. gold based bonding agent(Aurofilm NP, Metalor, Swiss) was applied on Ni-Cr alloy surface by four method. Surfaces only air abraded with 110${\beta}\neq$ Al2O3 particles were used as control. metal ceramic adhesion was evaluated by a biaxial flexure test(N=5) and volume fraction of adherent porcelain was determined by SEM/EDS analysis. Result of this study suggest that the layering sequence of gold based bonding agent is very important and can improve porcelain adherence to PFM.

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The Effect of ${\pi}$ Bonds on the Dipole Moments for Octahedral [M(Ⅲ)$A_3B_3$] Type Complexes [M(Ⅲ) = Ti(Ⅲ), V(Ⅲ), Cr(Ⅲ), Co(Ⅲ) and Ni(Ⅱ) ; A = O or N; B = N, Cl or S] (팔면체 [M(Ⅲ)$A_3B_3$] 형태 착물의 쌍극자모멘트에 대한 ${\pi}$ 결합의 영향 [M(Ⅲ) = Ti(Ⅲ), V(Ⅲ), Cr(Ⅲ), Fe(Ⅲ) 및 Ni(Ⅱ) ; A = O 또는 N ; B = N, S 또는 Cl])

  • Sang Woon Ahn;En Suh Pakr;Kee Hag Lee
    • Journal of the Korean Chemical Society
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    • v.25 no.2
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    • pp.61-66
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    • 1981
  • A method for calculation of the contribution of $\pi$ bonding molecular orbitals to the dipole moments for octahedral [M(III)$A_3B_3$] type complexes has been developed [M(III) = Ti(III), V(III), Cr(III), Fe(III) or Co(III); A = O or N; B = N, S or Cl]. The contribution of ${\pi}$ bonding molecular orbitals to the dipole moments is found to be smaller than that of ${\sigma}$ bonding molecular orbitals but this contribution may not be negligible even for chelate complexes in which delocalization of ${\pi}$ electron is assumed. The calculated dipole moments (u = $u_{\sigma}$ + $u_{\pi}$) are closer to the experimental values than those for the case where only ${\sigma}$ bonds are assumed to be formed.

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Synthesis and Properties of Polydentate Schiff Base Ligands having $N_nO_2$ (n=3~5) Donor Atoms and their Transition Metal Complexes (여러자리 질소-산소계 시프염기 리간드와 전이금속착물의 합성 및 특성)

  • Kim, Sun-Deuk;Shin, Yun-Yeol;Park, Sung-Woo
    • Analytical Science and Technology
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    • v.11 no.5
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    • pp.366-373
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    • 1998
  • Polydentate Schiff base ligands, BSDT(1,9-bis(2-hydroxyphenyl)-2,5,8-triaza-1,8-nonadiene) having $N_3O_2$ atoms, BSTT(1,12-bis(2-hydroxyphenyl)-2,5,8,11-tetraaza-1,11-dodecadiene) having $N_4O_2$ atoms, BSTP(1,15-bis(2-hydroxyphenyl)-2,5,8,11,14-pentaaza-1,14-pentadodecadiene) having $N_5O_2$ atoms were synthesized. Protonation constants of these polydentate ligands were measured by potentiometry. Stability constants of the complexes between these ligands and the metal ions such as Cu(II), Ni(II) and Zn(II) were measured in DMSO by a polarographic method. It was observed that all metal(II) ions employed in this study formed 1:1 complexes with Schiff base ligands. Stability constants for the complex formation were in the order of Cu(II)>Ni(II)>Zn(II), and for the ligands were in the order of BSTP>BSTT>BSDT. There are due to the increase in the number of donor atoms. Both enthalpy and entropy changes were obtained in negative values. Exothermicity for the complex formation indicated tight binding between the ligands and metal ions. The negative entropy change would be related to the fact that solvent molecules are strongly interacting with the metal complexes.

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Dielectric and Piezoelectric Characteristics of 0.94$(K_{0.5}Na_{0.5})NbO_3$-0.06Ba$(Zr_{0.05}Ti_{0.95})O_3$ Ceramics System According to the variations of sintering aids (소결조재 변화에 따른 0.94$(K_{0.5}Na_{0.5})NbO_3$-0.06Ba$(Zr_{0.05}Ti_{0.95})O_3$ 세라믹스의 유전 및 압전특성)

  • Seo, Byeong-Ho;Kim, Do-Hyung;Lee, Yu-Hyong;Yoo, Ju-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.205-205
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    • 2008
  • PZT 세라믹은 우수한 유전 및 압전특성을 갖고 있어 변압기, 센서 및 엑츄에이터 등에 널리 응용되고 있다. 그러나, 우수한 특성에도 불구하고 PZT세라믹스의 소결시 PbO의 높은 유독성 및 휘발로 인하여 환경오염을 야기 시킨다. 그러므로 PbO로 구성된 세라믹을 대체하기 위한 우수한 압전특성을 가진 비납계 세라믹스 개발이 연구의 주류를 이루고 있다. 그 중 비납계 NKN와 BZT는 대체물질로 많이 관심을 받고 있다. 이는 일반적인 NKN조성은 우수한 압전성과 높은 큐리온도를 가지고 있을 뿐만 아니라, BZT조성의 Zr성분이 큐리온도를 낮추거나 유전특성을 졸게 하여 유전율 곡선을 완화하게 하는 특징이 있다. 하지만 NKN은 $1140^{\circ}C$이상의 소결온도에서 K의 휘발특성으로 인해 소성 후에도 주변의 수분을 흡수하는 조해성이 발생하는 문제가 발생한다. 그래서 본 연구에서는 낮은 온도에서 NKN계 세라믹스의 밀도를 증가시킬 뿐만 아니라, 우수한 유전 및 압전특성을 갖는 세라믹스를 제조하고자 비납계 $0.94(K_{0.5}Na_{0.5})NbO_3-0.06Ba(Zr_{0.05}Ti_{0.95})O_3$ (NKN-BZT)의 조성을 사용하였고 소결조제로는 $MnO_2$, NiO, $Bi_2O_3$, ZnO, $Li_2CO_3$, CuO등을 변화주어 유전 및 압전 특성을 알아보았다.

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