• 제목/요약/키워드: $NH_3$ gas

검색결과 801건 처리시간 0.025초

현장실험을 통한 축산시설로부터 배출되는 축산악취의 확산 평가 (Evaluation of Odor Dispersion from Livestock Building through Field Experiment)

  • 여욱현;이인복;하태환;데카노 크리스티나;김락우;이상연;김준규;최영배;박유미
    • 한국농공학회논문집
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    • 제61권6호
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    • pp.21-30
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    • 2019
  • Livestock odor is comprised of mixed type of odorous compounds. Among these, ammonia ($NH_3$) and hydrogen sulfide ($H_2S$) are the two known major odor causing substances. Because high odor concentration reduces productivity of livestock and causes damage to the surrounding communities, quantitative analysis is needed to manage the odor inside and outside the livestock facilities. It is also necessary to evaluate odor dispersion according to the distance between the receptors taking into account the influence of odor source and weather condition. Therefore, in this study, we tried to evaluate the internal environment and odor dispersion from experimental pig house considering weather conditions. An experimental farm was specifically selected to eliminate the interference of odors generated by adjacent farms. $NH_3$ and complex odor were quantitatively analyzed using a gas detector and air dilution sensory method. The concentration of $NH_3$ and complex odor in pig house showed a distinct concentration difference according to the cleaning and ventilation conditions. $NH_3$ concentration and complex odor was lower than emission standard in the pig house and at the site boundary. The average $NH_3$ concentration (P1~P3) and the $NH_3$ concentration at the site boundary (S1) were strongly correlated with R=0.77. While the correlation for complex odor inside and at the site boundary had R=0.52. The correlation coefficient between $NH_3$ and the complex odor was 0.80.

저압화학기상 성장법으로 제작된 $Si_{x}O_{y}N_{z}$의 알칼리이온 감지성에 관한 연구 (A Study on Alkali ion-Sensitivity of $Si_{x}O_{y}N_{z}$ Fabricated by Low Pressure Chemical Vapor Deposition)

  • 신백균;이덕출
    • 센서학회지
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    • 제6권3호
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    • pp.200-206
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    • 1997
  • 열산화시킨 실리콘 웨이퍼 위에 저압화학기상성장법으로 $SiCl_{2}H_{2}$, $NH_{3}$$N_{2}O$ 기체를 사용하여 실리콘 옥시나이트라이드($Si_{x}O_{y}N_{z}$) 층을 제작하였다. 세 가지의 다른 조성이 기체 유속비($NH_{3}/N_{2}O$)를 각기 0.2, 0.5 및 2로 변화시키고 $SiCl_{2}H_{2}$의 기체 유속은 고정시킴으로써 얻어졌다. 엘립소메트리와 HFCV(High Frequency Capacitance-Voltage) 측정법을 채택하여 굴절율, 유전율 및 조성의 차이를 각각 조사했다. 실리콘 옥시나이트라이드는 내부에 포함된 실리콘 나이트라이드 성분량에 관계없이 용액 중에서 순수한 실리콘 나이트라이드와 유사한 안정성을 보유했다. 실리콘 옥시나이트라이드 층 알칼리이온 감지성의 크기 순서는 실리콘 나이트라이드 성분량에 영향을 받았다. 보다 나은 알칼리이온 감지성이 실리콘 옥시나이트라이드의 벌크 내에 있는 실리콘 디옥시드의 성분량을 증가시킴으로써 얻어졌다.

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Transmission of Substituent Effects through 5-Membered Heteroaromatic Rings

  • 이익훈;리순기;김창곤;정동수;김찬경
    • Bulletin of the Korean Chemical Society
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    • 제21권9호
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    • pp.882-890
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    • 2000
  • Ab initio calculations are carried out on protonation equilibria of 5-memberedheteroaromatic aldehydes (5MHAs;heteroatom Y = NH, O, PH,and S and substituentZ = NH2, OCH3, SCH3, CH3, H, Cl, CHO, CN,NO2) at the $MP2}6-31G*$ level. Naturalbond orbital (NBO) analyses show that the optimal localized natural Lewis structures of the protonated aldehydes,(P), are ortho (C3) protonated (for Y = O, PH and S) and N-pro-tonated (for Y = NH) forms in contrast to the standard structural Lewis formula for aldehydes, (R). The delo-calizability of ${\pilone}-pairon$ the heteroatom $(n{\pi}(Y))$ is in the order Y = NH > O > S > PH. The transmission efficiency of (Z) substituent effects to the carbonyl moiety run parallel to the delocalizability of $n{\pi}(Y)$ for R,but is dominantly influenced by the cationic charge on $C{\alpha}(C{\alpha}+)$ for P, which is in the reverse order of thede-localizability of $n{\pi}(Y).$ The Hammett ${\rho}values$ for variation of Z in the protonation are determined by the dif-ference in the transmission efficiencies between Pand R stateat simple interpretation of their magnitude is not warranted. However,the magnitude of the gas-phase ${\rho}z+$ values decreases as the level ofcomputation is raised from RHF/3-21G* to RHF/6-31G* and to $MP2}6-31G*$ but increases again at the MP4SDQ/6-31G* level. Further decrease occurs when solvent effect (water) is accounted for by the SCRF method. Comparison of the SCRF ${\rho}z+values$ with those determined in the aqueous acid solution for Y = S and CHCH shows inadequacy of accounting for the solvent effects on the ${\rho}values$ by a continuum model. It is noteworthy that semiempirical calculations, especially theAM1 method, give even lower magnitude of the gas-phase ${\rho}values.

종속영양세균과 독립영양세균을 고정화한 Polyurethane Biofilter의 돈분뇨 악취제거 (Removal of Malodorous Gases from Swine Manure by a Polyurethane Biofilter Inoculated with Heterotrophic and Autotrophic Bacteria.)

  • 이연옥;조춘구;류희욱;조경숙
    • 한국미생물·생명공학회지
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    • 제30권1호
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    • pp.91-97
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    • 2002
  • Removal of malodorous gases from swine manure by a polyurethane biofilter inoculated with heterotrophic and autotrophic bacteria was investigated. Ammonia, hydrogen sulfide and other gases could be efficiently treated at 3~3.6 second of empty bed retention time by the polyurethane biofilter. In the range of SV $200~l,200h^{-1}$ , the average removal efficiency of odor was about 89% when the odor unit of inlet gas was below 4100. Odor elimination capacity of the polyurethane biofilter was$ 1.8$\times$10^{5}$ $~5.0$\times$10^{7}$OUㆍm$^{-3}$$h^{-1}$ that were 84~90% of the inlet load. The critical loads of $NH_3$ and $H_2$S, which mean 97% removal with respect to the inlet loads, were 31 and $27 g.m^{-3}$$h^{-1}$ , respectively. The maximum elimination capacities of $NH_3$ and $H_2$S were 56 and $157 gㆍm^{-3}$ ㆍh$^{-1}$ , respectively. Although the removability for$ NH_3$ and $H_2$S was not influenced by $H_2$S$NH_3$ ratio (ppmv/ppmv), the $H_2$S removability was inhibited by high $H_2$S concentration more than 80 ppmv.

플라즈마 화학 증착법을 이용한 탄소나노튜브의 촉매 성장에 관한 연구 (Catalytic growth of carbon nanotubes using plasma enhanced chemical vapor deposition(PECVD))

  • 정성회;장건익
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.935-938
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    • 2001
  • Carbon nanotubes(CNTs) was successfully grown on Ni coated silicon wafer substrate by applying PECVD technique(Plasma Enhanced Chemical Vapor Deposition). As a catalyst, Ni thin film of thickness ranging from 15∼30nm was prepared by electron beam evaporator method. In order to find the optimum growth condition, the type of the gas mixture such as C$_2$H$_2$-NH$_3$was systematically investigated by adjusting the gas mixing ratio in temperature of 600$^{\circ}C$ under the pressure of 0.4 torr. The diameter of the grown CNTs was 40∼150nm. As NH$_3$etching time increased the diameters of the nanotubes decreased whereas the density of nanotubes increased. TEM images clearly demonstrated synthesized nanotubes was multiwalled. We investigated electrical properties for the application of FED.

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$TiO_2$분말 제조 및 Verneuil 법에 의한 Rutile 단결정 성장 (Synthesis of $TiO_2$ Powders and Growth of Rutile by Verneuil Method)

  • 전형탁;김복희;손선기;오근호
    • 한국결정성장학회지
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    • 제2권1호
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    • pp.60-69
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    • 1992
  • $TiCl_4$와(NH_4)_2SO_4$를 액상 반응시켜 암모늄 티타늄 설페이트를 형성시킨 뒤 하소하여 미립의 $TiO_2$분말을 만들었다. Anatase 분말로 Verneuil장치에서 Rutile단결정을 성장시킨 뒤 물성을 조사하였다. 최적의 성장조건은 $H_2:O_2=3:1$ 성장온도는 $1900^{\circ}C$ 분말공급속도는 10g/hr였다.

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Laser CVD법에 의해 퇴적된 OXYNITRIDE막의 특성에 관한 고찰 (A study on the characteristics of the OXYNITRIDE film deposited by Laser CVD)

  • 김강덕;신상우;정문남;김종관;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1428-1430
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    • 1996
  • Thin Silicon oxynitride(SiON) films have been chemically deposited using 193nm ArF Excimer Laser CVD, with $Si_{2}H_{8}$, $N_{2}O$, and $NH_3$ as the reactive gases and $N_2$ as the carrier gas. Experimental results show that deposition rate and refractive index have a strong dependence on substrate temperature, chamber pressure, gas ratio, laser power and laser beam height. Electrical characterization of oxynitride films demonstrates that for $NH_{3}/N_{2}O$ flow ratios ranging from 0.25 to 1, the leakage currents, the interface trap density and the capacitances (dielect ric constant) increase and the dielectric breakdown fields decrease

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저온 반응장에서 요소 수용액의 환원제 전환에 관한 실험적 연구 (An Experimental Study on Conversion of Reducing Agent from Aqueous Urea Solutions under Low Reaction Temperature)

  • 구건우;홍정구
    • 한국분무공학회지
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    • 제20권1호
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    • pp.20-27
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    • 2015
  • Urea-SCR which is one of the aftertreatment technologies for reducing the NOx emission is widely used. An experimental study was performed to investigate urea decomposition under various thermo-fluid conditions, with different temperatures and velocities of inflow gas, and urea solution quantities. 40 wt. % aqueous urea solutions were used in this study. The inflow gas conditions were similar to the exhaust conditions of a large marine engine. The spray performance of urea solution injector was identical under all experimental conditions. The conversion efficiency of $NH_3$ was larger than that of HNCO under all experimental conditions, unlike for the theoretical thermolysis reaction.

Ni 박막 촉매 Etching 조건에 따른 탄소나노튜브 성장 (Growth of Carbon Nanotubes Depending on Etching Condition of Ni-catalytic Layer)

  • 정성희;장건익;류호진
    • 한국전기전자재료학회논문지
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    • 제14권9호
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    • pp.751-756
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    • 2001
  • Carbon nanotubes(CNTs) was successfully grown on Ni coated silicon wafer substrate by PECVD technique(Plasma Enhanced Chemical Vapor Deposition). As a catalyst, Ni thin film of thickness ranging from 15∼30nm was prepared by electron beam evaporator system. In order to find the find the optimum growth condition, initially two different types of gas mixtures such as C$_2$H$_2$-NH$_3$ and C$_2$H$_2$-NH$_3$-Ar were systematically investigated by adjusting the gas mixing ratio in temperature of 600$^{\circ}C$ under 0.4 torr. The diameter of the grown CNTs was 40∼200nm. The diameter of the CNTs increases with increasing the Ni particles size. TEM images clearly demonstrated synthesized nanotubes to be multiwalled.

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확산 알루미나이드 코팅의 속도론적 해석 (Kinetic Analysis of Diffusion Aluminide Coating)

  • 손희식;김문일
    • 한국표면공학회지
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    • 제28권3호
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    • pp.152-163
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    • 1995
  • A theoretical model which combines gaseous transport and solid state diffusion with the multi-component equilibrium at the gas/pack and gas/coating interfaces was used to study the kinetics of diffusion aluminide coating. The diffusion aluminide coatings were applied by pack cementation with Ni substrate under argon atmosphere in the high activity and the low activity pack containing $NH_4CL$ or $AlF_3$ activator. On the basis of the process conditions, the suggested model allows the surface composition, the growth rate of coating layers and the aluminium concentration profiles in coatings to be calculated. In the case of $NH_4$Cl activator, careful consideration was required in the analysis, because activator contains nitrogen and hydrogen as well as halogen element to activate the pack. A good agreement is obtained between the theoretical predictions and the experimental results.

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