• Title/Summary/Keyword: $In_2O_3-ZnO-SnO_2$

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Chracteristics of TCO with dopant in $In_2O_3-ZnO-SnO_2$

  • Won, Ju-Yeon;Choe, Byeong-Hyeon;Ji, Mi-Jeong;Seo, Han;Nam, Tae-Bang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.79-79
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    • 2009
  • Samples of Ta-doped in $In_2O_3-ZnO-SnO_2$(IZTO) with a doping level up to 4wt% were sintered at $1600^{\circ}C$ in $O_2$. The crystal phase of the samples was identified by an X-ray diffraction experiment. apparent density and porosity with sintered temperature from $1500^{\circ}C$ to $1640^{\circ}C$ are mesured by archimedes method. For each sample, the specific resistivity was determined. samples of sintered at $1600^{\circ}C$ had the highest density and lowest porousity and The Ta 0.25-wt%-doped IZTO ceramics had the lowest resistivity.

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Anomalous Behavior of Oxygen Gas Ratio-dependent Field Effect Mobility in In-Zn-Sn-O Thin Film Transistor

  • Hwang, A-Yeong;Won, Ju-Yeon;Je, So-Yeon;Ji, Hyeok;Jeong, Jae-Gyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.233-233
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    • 2014
  • InGaZnO 박막트랜지스터(TFT)는 기존의 널리 사용되던 비정질 실리콘보다 높은 전하이동도와 Ion/off, 우수한 균일성과 신뢰성의 장점으로 최근 AMOLED양산에 적용되기 시작 하였다. 그러나 60인치 이상의 대면적 디스플레이와 초고해상도의 성능을 동시에 만족하기 위해 10 cm2/Vs정도의 전하이동도를 가지는 InGaZnO로는 한계가 있어 30 cm2/Vs 이상의 전하이동도를 가지는 물질의 연구가 필요하다. 연구에서는 높은 전하이동도를 만족하기 위해 InO2를, 우수한 신뢰성을 가지는 SnO2를 포함하는 InZnSnO로 실험을 진행하였다. 스퍼터링 시스템에서 ITO 타겟과 ZTO 타겟을 사용하여 동시증착법으로 채널을 증착하였고, 산소 분압 변화시에 IZTO TFT 소자 특성의 의존성을 평가하였다. Ar : O2=10 : 0 일 때와 Ar : O2=7 : 3 일 때의 이동도가 각각 12.6cm2/Vs, 19.7cm2/Vs로 산소 비율이 증가함에 따라 전하이동도가 증가하였다. 기존 IGZO 산화물 반도체에서는 산소 비율이 증가하면 산소공공(VO) 농도감소로 인해 전하이동도가 감소한다. 이는 전하농도가 증가하면 전하이동도가 증가하는 percolation 전도기구로 이해할 수 있다. 그러나 본 IZTO 물질에서는 산소비율 증가에 따라 오히려 전하이동도가 증가하였는데, 이는 IZTO 반도체에 함유된 Sn 이온의 가전자상태가 +2/+4가의 상대적 비율이 산소농도에 따라 의존하기 때문인 것으로 분석되었다.

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The Effect of the Sn contents on Rapidly Solidified Ag-X%Zn Electric Contact Materials (급속응고한 Ag-X%Zn계 전기접점재료에 미치는 Sn함량의 영향)

  • Kim, Jong-Kyu;Jang, Dae-Jung;Ju, Kwang-Il;Lee, Eun-Ho;Um, Seung-Yeul;Nam, Tae-Woon
    • Journal of Korea Foundry Society
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    • v.28 no.4
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    • pp.184-189
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    • 2008
  • Ag-Cd alloy has been widely used as an electrical contact material, since Ag-Cd alloy has a good wear resistance and stable contact resistance. But nowadays Ag-Cd alloy is not considered as electrical contact material any more due to detrimental effect on environments. Currently, active researches are being performed on ($Ag-SnO_2$ and $Ag-SnO_{2}-In_{2}O_{3}$) as an alternative solution which can fix the remaining environmental problems. However, $In_{2}O_{3}$ is relatively expensive and Ag-Sn alloy has low wear resistance. Our recent research results show that Ag-X%Zn-Y%Sn has similar physical and chemical properties. In the present study, so we tried to change and to optimize the Zn oxide content to over 6 wt% and Sn oxide content with 0.5, 1.0, 1.5 wt%. Results obtained from the experiments on the Ag-X%ZnO-Y%$SnO_2$ are discussed.

Ga2O3 나노 밤송이의 제조 및 특성 분석

  • Park, Sin-Yeong;Gang, Hyeon-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.423-423
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    • 2012
  • ZnO, SnO2, In2O3:Sn와 같은 투명하고 전도성이 있는 박막은 panel display, 전자발광소자, 박막트랜지스터, 태양전지 등의 전극물질로서 폭넓게 사용되고 있다. 이러한 전극 물질을 이용하는 광전자소자의 성능을 개선하기 위해서는 가시광선영역에서 광투과율이 높고, 전기전도도가 좋아야 한다. 최근 ZnO, SnO2, In2O3, MgO, Ga2O3 등으로 이루어진 3원 또는 다원화합물로 제조된 산화물 박막이 새로운 투명한 전도성 박막으로 많은 관심을 끌고 있다. 본 연구에서는 Ga2O3 박막을 radio-frequency magnetron sputtering 방법을 이용하여 증착하였다. 기존에 사용되던 ceramic target을 개선하여 powder target을 사용하였다. 반응가스는 순수하게 Ar 가스만 사용하였고, Sapphire(0001) 기판을 사용하였다. 초기에는 flat한 layered 구조로 증착이 이루어졌으나, 증착시간이 20분이 지나면서부터는 밤송이 모양을 가지는 나노구조체가 생성되기 시작하였고, 이후 나노 밤송이의 밀도가 점차 증가하였다. Ga2O3 나노 밤송이의 특성에 대하여 발표할 예정이다.

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Phase Cooperation Between Mo-V-O and Metal Oxide in Selective Oxidation of Acrolein (아크롤레인 선택 산화반응에서 Mo-V-O와 금속산화물의 상간협동)

  • Park, D.W.;Na, S.E.;Kim, K.H.;Lee, W.H.;Chung, J.S.
    • Applied Chemistry for Engineering
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    • v.5 no.2
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    • pp.327-336
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    • 1994
  • The synergistic effects in mechanical mixture catalysts of Mo-V-O and metal oxide were investigated for the selective oxidation of acrolein. The metal oxides used are $SnO_2$, ${\alpha}-Sb_2O_4$, $WO_3$, ${\alpha}-Al_2O_3$, CuO, $MnO_2$, $Cu_2O$, MgO, CoO, and ZnO. Mechanical mixtures of Mo-V-O plus $SnO_2$ or ${\alpha}-Sb_2O_4$ had resulted in higher conversion of acrolein and higher yield of acrylic acid than Mo-V-O. The origin of the synergy is attributed to the cooperation of Mo-V-O and $SnO_2$ or ${\alpha}-Sb_2O_4$, in which $SnO_2$ or ${\alpha}-Sb_2O_4$ forms dissociated oxygens at their oxygen vacancies and transports them to Mo-V-O. $Cu_2O$, MgO, CuO, and $MnO_2$, increased conversion of acrolein but decreased yield of acrylic acid. CoO and ZnO inhibited the catalytic performance of Mo-V-O. The different role of these metal oxides is explained in terms of their oxidation-reduction properties.

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Effect of Annealing Temperatures on the Properties of Zn2SnO4 Thin Film (열처리 온도에 따른 Zn2SnO4 박막의 특성)

  • Shin, Johngeon;Cho, Shinho
    • Journal of the Korean Society for Heat Treatment
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    • v.32 no.2
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    • pp.74-78
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    • 2019
  • $Zn_2SnO_4$ thin films were deposited on quartzs substrates by using radio-frequency magnetron sputtering system. Thermal treatments at various temperatures were performed to evaluate the effect of annealing temperatures on the properties of $Zn_2SnO_4$ thin films. Surface morphologies were examined by using field emission-scanning electron microscopy and showed that sizes of grains were slightly increased and grain boundaries were clear with increasing annealing temperatures. The deposited $Zn_2SnO_4$ thin films on quartzs substrates were amorphous structures and no distinguishable crystallographic changes were observed with variations of annealing temperatures. The optical transmittance was improved with increasing annealing temperatures and was over 90% in the wavelength region between 350 and 1100 nm at the annealing temperature of $600^{\circ}C$. The optical energy bandgaps, which derived from the absorbance of $Zn_2SnO_4$ thin films, were increased from 3.34 eV to 3.43 eV at the annealing temperatures of $450^{\circ}C$ and $600^{\circ}C$, respectively. As the annealing temperature was increased, the electron concentrations were decreased. The electron mobility was decreased and resistivity was increased with increasing annealing temperatures with exception of $450^{\circ}C$. These results indicate that heat treatments at higher annealing temperatures improve the optical and electrical properties of rf-sputtered $Zn_2SnO_4$ thin films.

The Effect of the Zn contents on Rapidly Solidified Ag-Zn Electric Contact Materials. (급속응고한 Ag-Zn계 전기접점재료에 미치는 Zn함량의 영향)

  • Kim, Jong Kyu;Jang, Dae Jung;Ju, Kwang Il;Lee, Eun Ho;Um, Seung Yeul;Nam, Tae Woon
    • Korean Journal of Metals and Materials
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    • v.46 no.7
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    • pp.443-448
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    • 2008
  • Contact materials are used in many electrical devices. Ag-Cd alloy has been widely used in electrical part, because Ag-Cd alloy has a good wear resistance and stable contact resistance. But nowadays Ag-Cd alloy isn't being used because of environmental challenges. Currently new research is being done on ($Ag-SnO_2$ and $Ag-SnO_2-In_2O_3$) as an alternative solution to fix any remainly environmental challenges. However $In_2O_3$ is more expensive and Ag-Sn alloy has low wear resistance. According to our research data Zn has a similar physical and chemical property. In this work, so we changed and optimized the Zn oxide to over 4 and added Sn oxide ratio 0.5, 1.0, 1.5wt%. Conclusions from the data recorded from the experiment of $Ag-ZnO-SnO_2$ are as follows.

Growth of ZnSnO3 Thin Films on c-Al2O3 (0001) Substrate by Pulsed Laser Deposition

  • Manh, Trung Tran;Lim, Jae-Ryong;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.5
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    • pp.297-302
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    • 2014
  • $La_{0.5}Sr_{0.5}CoO_3$ (LSCO) electrode thin films with a resistivity of ~ 1,600 ${\mu}{\Omega}cm$ were grown on c-$Al_2O_3$ (0001) substrate. $ZnSnO_3$ (ZTO) thin films with different thicknesses were directly grown on LSCO/c-$Al_2O_3$ (0001) substrates at a substrate temperature that ranged from 550 to $750^{\circ}C$ using Pulsed Laser Deposition (PLD). The secondary phase $Zn_2SnO_4$ occurred during the growth of ZTO films and it became more significant with further increasing substrate temperature. Polarization-electric-field (P-E) hysteresis characteristics, with a remnant polarization and coercive field of 0.05 ${\mu}C/cm^2$ and 48 kV/cm, respectively, were obtained in the ZTO film grown at $700^{\circ}C$ in 200 mTorr.

The Influence of Ag Thickness on the Electrical and Optical Properties of ZnO/Ag/SnO2 Tri-layer Films

  • Park, Yun-Je;Choi, Jin-Young;Choe, Su-Hyeon;Kim, Yu-Sung;Cha, Byung-Chul;Kim, Daeil
    • Journal of the Korean institute of surface engineering
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    • v.52 no.3
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    • pp.145-149
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    • 2019
  • Transparent and conductive ZnO/Ag/SnO2 (ZAS) tri-layer films were deposited onto glass substrates at room temperature by using radio frequency (RF) and direct current (DC) magnetron sputtering. The thickness values of the ZnO and $SnO_2$ thin films were kept constant at 50 nm and the value for Ag interlayer was varied as 5, 10, 15, and 20 nm. In the XRD pattern the diffraction peaks were identified as the (002) and (103) planes of ZnO, while the (111), (200), (220), and (311) planes could be attributed to the Ag interlayer. The optical transmittance and electrical resistivity were dependent on the thickness of the Ag interlayer. The ZAS films with a 10 nm thick Ag interlayer exhibited a higher figure of merit than the other ZAS films prepared in this study. From the observed results, a ZAS film with a 10 nm thick Ag interlayer was believed to be an alternative transparent electrode candidate for various opto-electrical devices.

Structural Properties of MO-SiO$_2$(M=Zn, Sn, In, Ag, Ni) by Sol-Gel Method (졸겔법으로 제조된 MO-$SiO_2$(M=Zn,Sn,In,Ag,Ni)의 구조특성)

  • Sin, Yong-Uk;Kim, Sang-U
    • Korean Journal of Materials Research
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    • v.11 no.7
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    • pp.603-608
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    • 2001
  • $MO-SiO_2$ (M = Zn, Sn, In, Ag, Ni) binary silica gels were synthesized by sol-gel method and their structural change with the kind of metal ions was characterized by XRD, FT- IR and $^{29}$Si-NMR. Although X-ray analysis showed partial recrystallization of $AgNO_3$ in $Ag-SiO_2$gel, crystalline phase formed by the bonding between metal ion and the silica matrix didn't appear in all $MO-SiO_2$ gels. The FT-IR analysis showed that Zn, Sn and in partially formed Si-O-M bonding in silica matrix and made an shift of absorption peak to by Si-O-Si symmetrical vibration. In addition, $^{29}Si-NMR$ studies showed that Zn, Sn and In didn't affect sol-gel process of silica and were linked with non-bridging oxygen of the linear silica structure, which formed imperfect network because of low temperature sol-gel process. Ag and Ni make a role of catalysis on sol-gel process, resulting in densifying the silica network structure.

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